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公开(公告)号：US20240060908A1
公开(公告)日：2024-02-22
申请号：US18499784
申请日：2023-11-01
发明人： Chan Kwon LEE , Moon Young JEON , Jung HUR , Deok Hwa HONG , Eun Ha JO
CPC分类号： G01N21/9501 , G01N21/4738
摘要： An inspection apparatus may include: a structured-light source configured to sequentially radiate a plurality of structured lights having one phase range; a lens configured to adjust, for each of the plurality of structured lights, optical paths of light beams corresponding to phases of the phase range such that a light beam corresponding to one phase of the phase range arrives at each point of a partial region on an object; an image sensor configured to capture a plurality of reflected lights generated by the structured lights being reflected from the partial region; and a processor configured to acquire a light quantity value of the reflected lights; and derive an angle of the surface by deriving phase values of the reflected lights based on the light quantity value for the reflected lights.
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公开(公告)号：US20240060907A1
公开(公告)日：2024-02-22
申请号：US18340394
申请日：2023-06-23
发明人： Youngsun Choi , Soonyang Kwon , Kwangrak Kim , Jiwoong Kim , Jangryul Park , Myungjun Lee
CPC分类号： G01N21/9501 , G01N21/31 , G01N2201/068 , G02B21/248
摘要： In a focus control method of a spectroscopic measuring apparatus, the spectroscopic measuring apparatus having a first objective lens and a second objective lens equipped with a microsphere is provided. A sample is placed on a stage. A spectrum is obtained while moving the second objective lens vertically downward. A light intensity function that changes with a distance from a sample surface is obtained from the spectrum. A focal position of the second objective lens is determined from a threshold value of the light intensity function.
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公开(公告)号：US20240060904A1
公开(公告)日：2024-02-22
申请号：US18344484
申请日：2023-06-29
发明人： Jeong Moon LEE , Dae Hong KIM
CPC分类号： G01N21/8851 , G01N21/8806 , G01N21/9501 , G01N2021/8874 , G01N2021/8809 , G01N2021/8887
摘要： A defect inspection device according to one or more embodiments includes an inspection device for detecting a defect by line-scanning an object, and for generating review image data for the defect, a height measurer for acquiring a reference height of the defect and a height of the defect, and for generating height data of the defect, and a defect classifier for classifying the defect based on the review image data and the height data.
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54.发明公开公开(公告)号：US20240053280A1
公开(公告)日：2024-02-15
申请号：US18229606
申请日：2023-08-02
申请人： KLA Corporation
发明人： Ming Di , Yih-Chung Chang , Xi Chen , Dawei Hu , Ce Xu , Bowei Huang , Igor Baskin , Mark Allen Neil , Tianhao Zhang , Malik Karman Sadiq , Shankar Krishnan , Jenching Tsai , Carlos L. Ygartua , Yao-Chung Tsao , Qiang Zhao
CPC分类号： G01N21/9501 , H01L22/12
摘要： Methods and systems for compensating systematic errors across a fleet of metrology systems based on a trained error evaluation model to improve matching of measurement results across the fleet are described herein. In one aspect, the error evaluation model is a machine learning based model trained based on a set of composite measurement matching signals. Composite measurement matching signals are generated based on measurement signals generated by each target measurement system and corresponding model-based measurement signals associated with each target measurement system and reference measurement system. The training data set also includes an indication of whether each target system is operating within specification, an indication of the values of system model parameter of each target system, or both. In some embodiments, the composite measurement matching signals driving the training of the error evaluation model are weighted differently, for example, based on measurement sensitivity, measurement noise, or both.
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公开(公告)号：US11900586B2
公开(公告)日：2024-02-13
申请号：US17121760
申请日：2020-12-15
发明人： Chien-Huei Chen , Pei-Chao Su , Xiaomeng Chen , Chan-Ming Chang , Shih-Yung Chen , Hung-Yi Chung , Kuang-Shing Chen , Li-Jou Lee , Yung-Cheng Lin , Wei-Chen Wu , Shih-Chang Wang , Chien-An Lin
CPC分类号： G06T7/001 , G01N21/8851 , G01N21/9505 , G06N3/04 , G06N3/08 , G06T7/0006 , G01N2021/8854 , G01N2021/8887 , G06T2207/20081 , G06T2207/20084 , G06T2207/30141 , G06T2207/30148 , G06T2207/30168
摘要： A hot spot defect detecting method and a hot spot defect detecting system are provided. In the method, hot spots are extracted from a design of a semiconductor product to define a hot spot map comprising hot spot groups, wherein local patterns in a same context of the design yielding a same image content are defined as a same hot spot group. During runtime, defect images obtained by an inspection tool performing hot scans on a wafer manufactured with the design are acquired and the hot spot map is aligned to each defect image to locate the hot spot groups. The hot spot defects in each defect image are detected by dynamically mapping the hot spot groups located in each defect image to a plurality of threshold regions and respectively performing automatic thresholding on pixel values of the hot spots of each hot spot group in the corresponding threshold region.
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公开(公告)号：US20240044806A1
公开(公告)日：2024-02-08
申请号：US18267137
申请日：2021-02-18
发明人： Hisaaki KANAI , Masami MAKUUCHI
CPC分类号： G01N21/94 , G01N21/9501 , G01N21/39 , G01N21/47 , G01N2021/392 , G01N2021/4709 , G01N2021/4735
摘要： An optical foreign matter inspection device includes a rotation stage; a laser light source; a sensor that is a charge accumulation type sensor; a detecting circuit; a light emission timing signal generating circuit configured to generate a light emission timing synchronizing signal synchronized with laser emission; a trigger signal generating circuit configured to receive a first signal (a stage encoder signal) indicating a rotation state of a sample, and generate a trigger signal synchronized with the light emission timing synchronizing signal; a number-of-emitted-pulse calculating circuit configured to receive the light emission timing synchronizing signal and the first signal, and calculate the number of pulses in each period corresponding to a position in a radial direction of the sample; and a processing system configured to measure a state of each position on a surface of the sample by using a detection signal and the number of pulses.
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公开(公告)号：US20240027366A1
公开(公告)日：2024-01-25
申请号：US17621237
申请日：2021-11-25
发明人： Yali LIU , Yongzhen JIA
CPC分类号： G01N21/9515 , G01N21/8851 , G01N2201/063 , G01N2021/8887 , G01N2021/9513
摘要： The present application provides a detection method of a crease degree of a screen and a visual detection device, the detection method includes: providing detection rays and obliquely irradiating the detection rays onto a surface to be measured of a folding screen; acquiring detection rays reflected by the surface to be measured of the folding screen to obtain a corresponding light source reflection image; analyzing the light source reflection image to obtain an evaluation index of an crease degree of the folding screen; and evaluating the crease degree of the folding screen.
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58.发明公开公开(公告)号：US20240027365A1
公开(公告)日：2024-01-25
申请号：US18479152
申请日：2023-10-02
发明人： Kazuya KIJIMA
CPC分类号： G01N21/9501 , G06T7/11 , G01N2021/8864
摘要： A detection apparatus that detects a mark formed on a substrate is provided. The detection apparatus comprises a detection optical system that irradiates light on the mark on the substrate held by a stage and detects an image of the mark, and a processor that performs a detection process of the mark based on the image of the mark. The processor finds a detection value indicating a position of the mark in an observation field of the detection optical system based on the image of the mark, finds a subregion in which the mark is located among a plurality of subregions in the observation field, and corrects the detection value based on a correction value corresponding to the found subregion among correction values predetermined for the plurality of subregions, respectively.
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公开(公告)号：US11879853B2
公开(公告)日：2024-01-23
申请号：US17672832
申请日：2022-02-16
申请人： KLA Corporation
CPC分类号： G01N21/9501 , G01N21/47 , G02B27/281 , G02B27/283 , H04N23/56 , H04N23/75
摘要： An inspection system may include an illumination source to generate an illumination beam, illumination optics to direct the illumination beam to a sample at an off-axis angle along an illumination direction, and collection optics to collect scattered light from the sample in a dark-field mode, where the scattered light from the sample includes surface haze associated with light scattered from a surface of the sample, and where at least a at least a portion of the surface haze has elliptical polarizations. The system may further include pupil-plane optics to convert the polarizations of the surface haze across the pupil to linear polarization that is aligned parallel to a selected haze orientation direction. The system may include a linear polarizer to reject the surface haze aligned parallel to this haze orientation direction and a detector to generate a dark-field image of the sample based on light passed by the linear polarizer.
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60.发明授权公开(公告)号：US11867640B2
公开(公告)日：2024-01-09
申请号：US17127928
申请日：2020-12-18
发明人： Fu-Li Wang , Li Yu
IPC分类号： G01N21/95
CPC分类号： G01N21/951
摘要： A defective soldering point intensive extent analysis system for solder paste inspection and a method thereof are disclosed. After the circuit board is set with soldering pastes, the solder paste inspection can immediately detect a circuit board to generate a detection log, the information of defective soldering points in the detection log is analyzed to determine an aggregate of the defective soldering points set on the circuit board, so as to find a defective soldering point area, and generate and display defective soldering point alert information according to statistics of the defective soldering point area, thereby achieving the technical effect of conveniently analyzing the defective soldering points on the circuit board for accurate repair.
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