公开(公告)号：US20180374727A1

公开(公告)日：2018-12-27

申请号：US16010530

申请日：2018-06-18

申请人： TOKYO ELECTRON LIMITED

发明人： Risako MIYOSHI

IPC分类号： H01L21/67 ,  H01J37/32 ,  G05D11/13

摘要： In one embodiment, a vaporizer is connected to a chamber of a substrate processing apparatus through a gas supply line and a gas introduction port. An exhaust device is connected to the gas supply line. The substrate processing apparatus includes a pressure sensor that obtains a measurement value of a pressure of the gas supply line. A method according to the embodiment includes supplying a processing gas to the chamber from the vaporizer through the gas supply line, and monitoring a change of the measurement value obtained by the pressure sensor in a state in which supply of the processing gas to the gas supply line is stopped.

公开(公告)号：US10146233B2

公开(公告)日：2018-12-04

申请号：US15091442

申请日：2016-04-05

申请人： HORIBA STEC, Co., Ltd.

发明人： Toshihiro Kashima ,  Kohei Honda ,  Tatsuya Hayashi

IPC分类号： G05D11/13

摘要： Provided is a flow rate ratio control device that even in change periods during which the actual flow rates of component gases change along with a change in the target total flow rate or target mixing ratio of mixed gas, can keep the actual total flow rate or actual mixing ratio of the mixed gas constant. Target flow rates set in flow rate control devices have continuous change periods during which target flow rate values continuously change from pre-change to post-change target flow rate values, respectively and correspondingly; and the time lengths of the continuous change periods are set to at least a followable time during which a flow rate control device of which a response speed to an actual component fluid flow rate is lowest allows the actual component fluid flow rate to substantially follow the target flow rate in the continuous change periods.

公开(公告)号：US10120366B2

公开(公告)日：2018-11-06

申请号：US14848208

申请日：2015-09-08

申请人： Haas Automation, Inc.

发明人： Gene F. Haas ,  Kurt P. Zierhut ,  Don P. Earl ,  Leonid Yukhtman

IPC分类号： G05B19/404 ,  G05D11/13 ,  B23Q11/10

摘要： A machine tool coolant supply system includes a chassis configured to mount the coolant supply system to a coolant storage tank of a machine tool. The coolant supply system further includes a concentrate tank arranged within the chassis, a first flow control valve coupled to the concentrate tank, a second flow control valve coupled to a water supply line, and a mixer configured to mix a concentrate with water. The mixer includes a first inlet coupled to the first flow control valve and configured to receive the concentrate from the concentrate tank via the first flow control valve, a second inlet coupled to the second flow control valve and configured to receive the water from the water supply line via the second flow control valve, and an outlet configured to dispense a mixture of the concentrate and the water into the coolant storage tank of the machine tool. The coolant supply system further includes a control line arranged in electrical communication with the first flow control valve and the second flow control valve, wherein the control line is configured to communicate control signals from a machine tool control system to actuate the first flow control valve and the second flow control valve to control a ratio of the concentrate and the water supplied to the mixer.

公开(公告)号：US10081000B2

公开(公告)日：2018-09-25

申请号：US14443204

申请日：2013-11-15

申请人： Entegris, Inc.

发明人： Francisco Javier Machuca ,  Ronald Chiarello

IPC分类号： B01F15/00 ,  B01F15/04 ,  G05D11/13 ,  B01F15/02

CPC分类号： B01F15/0429 ,  B01F15/0022 ,  B01F15/00233 ,  B01F15/00246 ,  B01F15/00253 ,  B01F15/00259 ,  B01F15/00285 ,  B01F15/00292 ,  B01F15/026 ,  B01F2015/0221 ,  G05D11/138

摘要： Embodiments provide mixing methods, systems, apparatuses, devices and assemblies that enable high-accuracy mixing of two or more substances in a manner that controls the concentrations of one or more substances in the resulting mixture. A mixing apparatus (100) may enable mixing of two or more substances at a mixing zone or conduit (112). The mixing apparatus may include one or more sensors (120) for detecting one or more characteristics of the mixture during the mixing process. The sensors may detect the mixture characteristics continuously, at intervals or as prompted by a user. The mixture characteristics may be used, in the sensors or in control circuitry, to generate an indication of the concentration of a first constituent substance in the mixture. Based on the detected concentration, the mixing apparatus may automatically adjust a supply of the first substance to the mixing zone or conduit (112).

公开(公告)号：US10076735B2

公开(公告)日：2018-09-18

申请号：US14783937

申请日：2014-04-16

申请人： GAMBRO LUNDIA AB

发明人： Olof Jansson ,  Sture Hobro ,  Lennart Jonsson

IPC分类号： B01F15/00 ,  B01F15/02 ,  A61M1/16 ,  B01F15/04 ,  G05D11/13

CPC分类号： B01F15/0022 ,  A61M1/1656 ,  A61M1/1666 ,  B01F15/00285 ,  B01F15/0243 ,  B01F15/042 ,  B01F2015/0221 ,  G05D11/138

摘要： A system and method for dosing at least two concentrates into water for on-line preparation of a medical fluid may include a main line for feeding of water, a first line with a first pump for feeding a first concentrate into the main line at a first mixing point, a second line with a second pump for feeding a second concentrate into the main line at a second mixing point, wherein a main concentration sensor measures the concentration in the main line downstream of the first and the second mixing points, wherein control of the dosing of the first concentrate is initially under feedback control from the main concentration sensor to the first pump, and when a value for a feeding parameter for the first pump is determined the feedback control is moved, so that the value for the feeding parameter is used to control the first pump.

公开(公告)号：US10047593B2

公开(公告)日：2018-08-14

申请号：US14719450

申请日：2015-05-22

申请人： SCHLUMBERGER TECHNOLOGY CORPORATION

发明人： Xiangdong Qiu ,  Stephen Dyer

IPC分类号： E21B43/16 ,  C09K8/72 ,  E21B47/06 ,  G05D11/13

摘要： In one possible implementation, fresh hydrochloric acid or (partially) spent hydrochloric acid can be pressurized by a pressure source. The pressurized acid from the acid source is injected into a wellbore during an acidizing operation. In addition, a carbon dioxide source may be provided. Acid from the acid source is combined with carbon dioxide from the carbon dioxide source, and the combined acid and carbon dioxide, pressurized by the pressure source, are injected into the wellbore during the acidizing operation. A processor located at the earth's surface or downhole may be provided. The processor can monitor the relative proportions of carbon dioxide and acid in the acid/carbon dioxide combination, as well as the pressure of the acid/carbon dioxide combination at an injection site in the wellbore. Acidizing operation management decisions can be made based on the monitored relative proportions and/or the monitored pressure.

公开(公告)号：US10041234B2

公开(公告)日：2018-08-07

申请号：US15786703

申请日：2017-10-18

申请人： KOHLER MIRA LIMITED

发明人： Kevin T. Peel

IPC分类号： E03B1/00 ,  E03C1/04 ,  B05D1/24 ,  B05B1/18 ,  G05D23/19 ,  G05D23/185 ,  G05D23/13 ,  G05D11/16 ,  G05D11/13 ,  G05D7/06 ,  F17D1/00 ,  F16K49/00 ,  F16K31/04 ,  F16K27/02 ,  F16K11/00 ,  F16K11/24 ,  F16K11/22 ,  F16K1/44 ,  E03C1/05 ,  E03C1/044 ,  E03C1/02 ,  E03B7/07 ,  E03B7/00 ,  B05B1/24

CPC分类号： E03C1/055 ,  B05B1/18 ,  B05B1/24 ,  B05D1/24 ,  E03B7/006 ,  E03B7/074 ,  E03B7/075 ,  E03B7/078 ,  E03C1/02 ,  E03C1/04 ,  E03C1/0404 ,  E03C1/0409 ,  E03C1/044 ,  F16K1/44 ,  F16K11/22 ,  F16K11/24 ,  F16K19/00 ,  F16K19/006 ,  F16K27/0263 ,  F16K31/04 ,  F16K49/002 ,  F17D1/00 ,  G05D7/0617 ,  G05D11/13 ,  G05D11/16 ,  G05D23/1393 ,  G05D23/1858 ,  G05D23/19 ,  G05D23/1917 ,  H05K999/99 ,  Y10T137/0318 ,  Y10T137/0329 ,  Y10T137/0391 ,  Y10T137/0424 ,  Y10T137/6606 ,  Y10T137/7759 ,  Y10T137/8376 ,  Y10T137/8593 ,  Y10T137/86389 ,  Y10T137/87668 ,  Y10T137/87684 ,  Y10T137/87692

摘要： A mixing valve having a housing and first and second flow control valves. The housing has a mixing chamber, a first outlet, and a second outlet. The first flow control valve controls fluid flow through the first outlet to the mixing chamber, and the second flow control valve controls fluid flow through the second outlet to the mixing chamber. The first and second outlets each have a size so that the mixing valve has a flow coefficient of approximately 2.5 in a mid-open position of both flow control valves, and the housing has a length dimension, a width dimension, and a thickness dimension, and the largest of these dimensions is no more than approximately 65 millimeters.

公开(公告)号：US10007238B1

公开(公告)日：2018-06-26

申请号：US14602392

申请日：2015-01-22

申请人： John C. Taube

发明人： John C. Taube

IPC分类号： G05B13/02 ,  G05D11/13

CPC分类号： G05D11/13 ,  A61M16/024 ,  A61M16/125 ,  A61M16/16 ,  A61M16/161 ,  A61M2202/0208 ,  A61M2205/13 ,  A61M2205/18 ,  A61M2205/3368 ,  A61M2205/502 ,  A61M2205/8206 ,  A61M2205/8262 ,  A61M2230/06 ,  A61M2230/205 ,  A61M2230/005 ,  A61M2202/0007

摘要： An adaptive gas mixture controller system. A pulse oximeter interface receives pulse oximeter data. A gas blender interface communicates with a separate externally connected gas blender. A processor receives pulse oximeter data via the pulse oximeter interface and outputs data to the gas blender interface for adaptive feedback control of the gas mixture based upon the SpO2 level signals from the pulse oximeter interface. When the processor receives data from the gas blender indicating that the gas mixture has been manually changed, enters a manual override mode and halts sending adaptive feedback control signals to the gas blender. This abstract is not to be considered limiting, since other embodiments may deviate from the features described in this abstract.

公开(公告)号：US20180161906A1

公开(公告)日：2018-06-14

申请号：US15893738

申请日：2018-02-12

申请人： Lincoln Global, Inc.

发明人： Loren C. Smith ,  Douglas S. Perry ,  William Hopper

IPC分类号： B23K3/08 ,  B23K1/008 ,  G05D11/13 ,  B23K3/02 ,  B23K37/00

CPC分类号： B23K3/08 ,  B23K1/008 ,  B23K3/022 ,  B23K37/006 ,  G05D11/132 ,  Y10T137/2703

摘要： A brazing system has a first gas source, a second gas source, an enclosure, a brazing torch, and a control system configured to control a ratio of the first gas source and the second gas source.

公开(公告)号：US20180094808A1

公开(公告)日：2018-04-05

申请号：US15722246

申请日：2017-10-02

申请人： Siemens Aktiengesellschaft

发明人： Rainer Lochschmied ,  Mike Schmanau ,  Bernd Schmiederer

IPC分类号： F23N1/02 ,  F23N5/18 ,  G05D11/13 ,  F23D14/60 ,  F04D29/42

CPC分类号： F23N1/022 ,  F04D29/4213 ,  F04D29/4226 ,  F23D14/60 ,  F23N5/184 ,  F23N2005/181 ,  F23N2033/08 ,  G05D11/13

摘要： The present disclosure deals with the measurement of flows of a fluid in a combustion device. In particular embodiments, the teachings may be employed in the measurement of flows of fluids such as air in the presence of turbulence. For example, a combustion device may include: a burner; a side duct; and a feed duct. The side duct may include a mass flow sensor and a flow resistance element. The mass flow sensor detects a mass flow through the side duct. The flow resistance element subdivides the side duct. A connector of the feed duct comprises a Pitot probe. A first section of the Pitot probe projects into the feed duct and a sub area facing towards the outlet of the feed duct of the first section of the Pitot probe comprises the inlet of the Pitot probe.