Abstract:
Sputter deposition systems and methods for depositing film coatings on one or more substrates are disclosed. The systems and methods are used to prevent or reduce an amount of defects within a deposited film. The methods involve removing defect-related particles that are formed during a deposition process from certain regions of the sputter deposition system and preventing the defect-related particles from detrimentally affecting the quality of the deposited film. In particular embodiments, methods involve creating a flow of gas from a deposition region to a particle collection region the sputter deposition system such that the defect-related particles are entrained within the flow of gas and away from the deposition region. In particular embodiments, the sputter deposition system is a meta-mode sputter deposition system.
Abstract:
Liquid crystal display (LCD) touch screens integrate touch sensing elements with display circuitry and may include in-plane-switching (IPS) LCDs. A method of operating the integrated touch sensing elements with the display circuitry includes dividing touch-sensing circuitry of the touch screen into a plurality of drive segments, each drive segment overlapping one or more display rows; updating the display at a predetermined refresh rate; stimulating the plurality of drive segments at a predetermined scan rate; and changing the sequence of stimulating the plurality of drive segments as required to prevent simultaneously stimulating a drive segment that overlaps a display row currently being updated.
Abstract:
A display may have a thin-film transistor layer and a color filter layer. The display may include light blocking structures formed on a transparent substrate. In one arrangement, a clear planarization layer may be formed over the light blocking structures. The thin-film transistor layer may be formed over the planarization layer. The color filter layer may be integrated with the thin-film transistor layer. At least light blocking structures and the planarization layer should be formed from high temperature resistance material. In another arrangement, the color filter layer may be formed on the light blocking structures. A clear planarization layer may then be formed over the color filter layer. The thin-film transistor layer may be formed on the planarization layer. In this arrangement, the color filter layer also needs to be formed from thermal resistance material.
Abstract:
Embodiments of the present disclosure relate to display devices and methods for manufacturing display devices. Specifically, embodiments of the present disclosure employ an enhanced etching process to create uniformity in the gate insulator of thin-film-transistor (TFTs) by using an active layer to protect the gate insulator from inadvertent etching while patterning an etch stop layer.
Abstract:
Methods of fabrication of a touch sensor panel using laser ablation are provided. The fabricated touch sensor panel can have touch sensors disposed on a surface of a substrate. A fabrication method can include depositing a first conductive layer onto a substrate in a touch sensor region and a border region, depositing a second conductive layer onto the first conductive layer in the border region, and ablating the second conductive layer at removal locations in the border region to define border traces for providing off-panel connections to touch sensors in the touch sensor region. This fabrication method can advantageously provide touch sensors in a fabrication process with high throughput using low cost material and equipment.
Abstract:
Fabrication of thin sheets of glass or other substrate material for use in devices such as touch sensor panels is disclosed. A pair of thick glass sheets, typically with thicknesses of 0.5 mm or greater each, may each be patterned with thin film on a surface, sealed together to form a sandwich with the patterned surfaces facing each other and spaced apart by removable spacers, either or both thinned on their outside surfaces to thicknesses of less than 0.5 mm each, and separated into two thin glass sheets. A single thick glass sheet, typically with a thickness of 0.5 mm or greater, may be patterned, covered with a protective layer over the pattern, thinned on its outside surface to a thickness of less than 0.5 mm, and the protective layer removed. This thinness of less than 0.5 mm may be accomplished using standard LCD equipment, despite the equipment having a sheet minimum thickness requirement of 0.5 mm.
Abstract:
An electronic device may be provided with an organic light-emitting diode display with minimized border regions. The border regions may be minimized by providing conductive structures that pass through polymer layers of the display and/or conductive structures that wrap around an edge of the display and couple conductive traces on the display to conductive traces on additional circuitry that is mounted behind the display.
Abstract:
Liquid crystal display (LCD) touch screens integrate touch sensing elements with display circuitry and may include in-plane-switching (IPS) LCDs. A method of operating the integrated touch sensing elements with the display circuitry includes dividing touch-sensing circuitry of the touch screen into a plurality of drive segments, each drive segment overlapping one or more display rows; updating the display at a predetermined refresh rate; stimulating the plurality of drive segments at a predetermined scan rate; and changing the sequence of stimulating the plurality of drive segments as required to prevent simultaneously stimulating a drive segment that overlaps a display row currently being updated.
Abstract:
A method is provided for fabricating a back channel etching (BCE) oxide thin film transistor (TFT) for a liquid crystal display. The method includes forming a first metal layer having a first portion and a second portion over a substrate, depositing a gate insulator over the first metal layer, and disposing a semiconductor layer over the gate insulator. The method also includes depositing a half-tone photoresist to cover a first portion of the semiconductor layer and the first portion of the first metal layer. The half-tone photoresist has a first portion and a second portion thicker than the first portion. The first portion has a via hole above the second portion of the first metal layer. The second portion of the half-tone photoresist covers the first portion of the first metal layer. The method further includes etching a portion of the gate insulator through the via hole such that the second portion of the first metal layer is exposed, removing the first portion of the half-tone photoresist while remaining the second portion of the half-tone photoresist, and etching to remove a second portion of the semiconductor layer that is not covered by the half-tone photoresist.
Abstract:
One embodiment may take the form of a UV mask for use while curing sealant on LCD displays. The UV mask includes a mother glass and a UV mask layer on the mother glass. A UV absorption film is located adjacent the UV mask layer and an anti-reflection (AR) film is located adjacent the UV absorption film.