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公开(公告)号：US4933714A
公开(公告)日：1990-06-12
申请号：US368978
申请日：1989-06-20
IPC分类号： G03F7/20
CPC分类号： G03F7/70075 , G03F7/70233 , G03F7/70366
摘要： A master disk is positioned such that a radial portion thereof is within a restricted field having good imagery of an optical projection system. A second blank disk is positioned such that the image location extends along a radial portion thereof. As the two disks are rotated synchronously a pattern in an annular area is formed on the blank disk replicating the master. Good imagery of the pattern is obtained with a simple system having an image field less than the size of the object being reproduced.
摘要翻译： 主盘被定位成使得其径向部分在具有良好的光学投影系统的图像的受限场中。 第二空白盘定位成使得图像位置沿其径向部分延伸。 当两个盘同步旋转时，在复制主机的空白盘上形成环形区域中的图案。 通过具有小于被再现对象的尺寸的图像场的简单系统来获得图案的良好图像。
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62.发明授权Systems and methods for insitu lens cleaning using ozone in immersion lithography 有权在浸没式光刻中使用臭氧进行透镜清洁的系统和方法公开(公告)号：US08817226B2
公开(公告)日：2014-08-26
申请号：US12128035
申请日：2008-05-28
申请人： Harry Sewell , Louis John Markoya
发明人： Harry Sewell , Louis John Markoya
CPC分类号： G03F7/70341 , G03F7/70925 , G03F7/70983
摘要： An immersion lithography apparatus is provided that includes an energy source, a projection optical system, a stage, a showerhead including an immersion liquid supply device and an immersion liquid discharge device that produces a flow of liquid within an exposure zone, and a cleaning device that cleans a portion of the projection optical system having been contacted with the immersion liquid by means of a cleaning gas. In an embodiment, the cleaning device includes an ozone generation unit produces a flow of ozone into the exposure zone. In embodiments, the apparatus includes a stage that includes a dose sensor and/or an ultra-violet light source. A method for insitu cleaning of a final lens element within an immersion lithography system having an immersion fluid showerhead that provides immersion fluid to an exposure zone of the immersion lithography system is also provided.
摘要翻译： 提供了一种浸没式光刻设备，其包括能量源，投影光学系统，平台，包括浸没液体供应装置的喷头和在曝光区域内产生液体流的浸没液体排出装置，以及清洁装置， 通过清洁气体清洁已经与浸没液接触的投影光学系统的一部分。 在一个实施例中，清洁装置包括臭氧产生单元产生臭氧流入曝光区域。 在实施例中，该装置包括包括剂量传感器和/或紫外光源的平台。 还提供了一种用于在浸没式光刻系统内对最终透镜元件进行真空清洁的方法，其具有向浸没式光刻系统的曝光区域提供浸没流体的浸没式液体喷头。
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公开(公告)号：US20120075606A1
公开(公告)日：2012-03-29
申请号：US13256372
申请日：2010-03-18
CPC分类号： G03F1/84
摘要： A mask inspection system with Fourier filtering and image compare can include a first detector, a dynamic Fourier filter, a controller, and a second detector. The first detector can be located at a Fourier plane of the inspection system and can detect a first portion of patterned light produced by an area of a mask. The dynamic Fourier filter can be controlled by the controller based on the detected first portion of the patterned light. The second detector can detect a second portion of the patterned light produced by the section of the mask and transmitted through the dynamic Fourier filter. Further, the mask inspection system can include a data analysis device to compare the second portion of patterned light with another patterned light. Consequently, the mask inspection system is able to detect any possible defects on the area of the mask more accurately and with higher resolution.
摘要翻译： 具有傅立叶滤波和图像比较的掩模检查系统可以包括第一检测器，动态傅立叶滤波器，控制器和第二检测器。 第一检测器可以位于检查系统的傅立叶平面处，并且可以检测由掩模的区域产生的图案化光的第一部分。 动态傅立叶滤波器可以由控制器基于检测到的图案化光的第一部分来控制。 第二检测器可以检测由掩模的部分产生并通过动态傅立叶滤波器传输的图案化光的第二部分。 此外，掩模检查系统可以包括数据分析装置，以将图案化的光的第二部分与另一图案化的光进行比较。 因此，掩模检查系统能够更精确地并且以更高的分辨率检测掩模区域上的任何可能的缺陷。
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64.发明授权公开(公告)号：US07995185B2
公开(公告)日：2011-08-09
申请号：US11634924
申请日：2006-12-07
IPC分类号： G03B27/52
CPC分类号： G03B27/72 , G03F7/70258 , G03F7/70341 , G03F7/7085 , G03F7/70858
摘要： Immersion lithography aberration control systems and methods that compensate for a heating effect of exposure energy in an immersion fluid across an exposure zone are provided. An aberration control system includes actuators that adjust optical elements within the immersion lithography system and a fluid heating compensation module coupled to the actuators. The fluid heating adjustment module determines actuator commands to make aberration adjustments to optical elements within the immersion lithography system based on changes in one or more of a flow rate of the immersion liquid, an exposure dose and a reticle pattern image. In an embodiment, the aberration control system includes an interferometric sensor that pre-calibrates aberrations based on changes in operating characteristics related to the immersion fluid. Methods are provided that calibrate aberrations, determine actuator adjustments and implement actuator adjustments upon changes in operating characteristics to control aberration effects.
摘要翻译： 提供了浸没光刻像差控制系统和补偿曝光区域中浸没流体中曝光能量的加热效应的方法。 像差控制系统包括调节浸没式光刻系统内的光学元件的致动器和耦合到致动器的流体加热补偿模块。 流体加热调节模块基于浸入液体的流速，曝光剂量和掩模版图案图像中的一个或多个的变化来确定致动器命令以对浸没式光刻系统内的光学元件进行像差调整。 在一个实施例中，像差控制系统包括干涉测量传感器，其基于与浸没流体相关的操作特性的变化来预校准像差。 提供校准像差的方法，确定致动器调节并且在操作特性的变化中实施致动器调节以控制像差效应。
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公开(公告)号：US07897058B2
公开(公告)日：2011-03-01
申请号：US11435296
申请日：2006-05-17
申请人： Richard Johannes Franciscus Van Haren , Maurits Van Der Schaar , Ewoud Vreugdenhil , Harry Sewell
发明人： Richard Johannes Franciscus Van Haren , Maurits Van Der Schaar , Ewoud Vreugdenhil , Harry Sewell
CPC分类号： H01L21/76816 , H01L21/0337 , H01L21/0338 , H01L21/31144
摘要： A method of forming features, e.g. contact holes, at a higher density than is possible with conventional lithographic techniques involves forming an array of sacrificial positive features, conformally depositing a sacrificial layer so that negative features are formed interleaved with the positive features, directionally etching the sacrificial layer and removing the sacrificial features. The result is an array of holes at a higher density than the original sacrificial features. These may then be transferred into the underlying substrate using a desired process. Also, the method may be repeated to create arrays at even higher densities.
摘要翻译： 形成特征的方法，例如 以比常规光刻技术更高的密度接触孔包括形成牺牲性特征阵列，从而保形地沉积牺牲层，使得负特征与正特征交错形成，定向蚀刻牺牲层并去除牺牲特征 。 结果是以比原始牺牲特征更高的密度的孔阵列。 然后可以使用所需的方法将这些物质转移到下面的基底中。 此外，可以重复该方法以以更高的密度创建阵列。
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66.发明申请公开(公告)号：US20100301458A1
公开(公告)日：2010-12-02
申请号：US12725026
申请日：2010-03-16
申请人： Harry Sewell , Mircea Dusa , Richard Johannes Franciscus Van Haren , Manfred Gawein Tenner , Maya Angelova Doytcheva
发明人： Harry Sewell , Mircea Dusa , Richard Johannes Franciscus Van Haren , Manfred Gawein Tenner , Maya Angelova Doytcheva
IPC分类号： H01L23/544 , H01L21/027 , G03B27/42
CPC分类号： G03F9/7046 , G03F7/0035 , G03F7/105 , G03F7/70466 , G03F9/7076 , H01L21/0273 , H01L21/32139
摘要： A system and method of manufacturing a semiconductor device lithographically and an article of manufacture involving a lithographic double patterning process having a dye added to either the first or second lithographic pattern are provided. The dye is used to detect the location of the first lithographic pattern and to directly align the second lithographic pattern to it. The day may be fluorescent, luminescent, absorbent, or reflective at a specified wavelength or a given wavelength band. The wavelength may correspond to the wavelength of an alignment beam. The dye allows for detection of the first lithographic pattern even when it is over coated with a radiation sensitive-layer (e.g., resist).
摘要翻译： 提供光刻制造半导体器件的系统和方法以及涉及具有添加到第一或第二光刻图案上的染料的光刻双重图案化工艺的制品。 该染料用于检测第一光刻图案的位置，并将第二光刻图案直接对准。 这一天可以是在指定波长或给定波长带处的荧光，发光，吸收或反射。 波长可对应于对准光束的波长。 染料允许检测第一光刻图案，即使当其涂覆有辐射敏感层（例如抗蚀剂）时。
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公开(公告)号：US20090257044A1
公开(公告)日：2009-10-15
申请号：US12419819
申请日：2009-04-07
CPC分类号： G03F7/70283 , G03F7/70208
摘要： A lithographic apparatus and method for simultaneously exposing two patterning devices onto a substrate is disclosed. In an embodiment, a lithographic apparatus includes a plurality of illumination systems for receiving and conditioning a pulsed radiation beam, a beam director arranged between a source of the pulsed radiation and the illumination systems for alternately directing pulses of the radiation beam to the respective illumination systems, a support table for holding a plurality of patterning devices, each of the patterning devices being capable of imparting a respective conditioned radiation beam with a pattern in its cross-section to form a plurality of patterned radiation beams, and a projection system configured to project each of the plurality of patterned radiation beams coincidentally onto a target portion of a substrate. In an embodiment, the substrate is covered with a phase change material.
摘要翻译： 公开了一种用于将两个图案形成装置同时曝光到基板上的光刻设备和方法。 在一个实施例中，光刻设备包括用于接收和调理脉冲辐射束的多个照明系统，布置在脉冲辐射源和用于将辐射束的脉冲交替地指向各个照明系统的照明系统之间的光束导向器 ，用于保持多个图案形成装置的支撑台，每个图案形成装置能够在其横截面中赋予具有图案的各个经调节的辐射束以形成多个图案化的辐射束，以及投影系统，其被配置为投影 多个图案化的辐射束中的每一个巧合地放置在基板的目标部分上。 在一个实施例中，衬底被相变材料覆盖。
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68.发明授权Interferometric lithography system and method used to generate equal path lengths of interfering beams 有权用于产生相等路径长度的干涉光束的干涉光刻系统和方法公开(公告)号：US07561252B2
公开(公告)日：2009-07-14
申请号：US11320473
申请日：2005-12-29
CPC分类号： G03B27/54 , G03F7/70408
摘要： A system and method are provided for writing patterns onto substrates. First and second beams are directed to converge and substantially overlap in a common region on a substrate. This can be done so that the first and second beams are mutually temporally coherent and spatially coherent in the region of overlap to form interference fringes to define a writing image. A beam width of the first and second beams is adjusted. This can be done so that respective path lengths of the beams are matched when they reach the common region to ensure the first and second beams are mutually spatially coherent and temporally coherent across an entire width of the common region. In one example, the substrate is moved with respect to the writing image, while writing patterns onto the substrate. In another example, the substrate remains stationary.
摘要翻译： 提供了将图案写入基板的系统和方法。 引导第一和第二光束在基板上的公共区域中会聚并基本重叠。 这可以进行，使得第一和第二波束在重叠区域中相互时空相干和空间相干以形成干涉条纹以限定写入图像。 调整第一和第二光束的光束宽度。 这可以进行，使得当它们到达公共区域时，波束的相应路径长度匹配，以确保第一和第二波束在公共区域的整个宽度上相互空间相干和时间相干。 在一个示例中，当将图案写入基板时，基板相对于写入图像移动。 在另一个实例中，衬底保持静止。
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公开(公告)号：US07548301B2
公开(公告)日：2009-06-16
申请号：US11337691
申请日：2006-01-24
申请人： Harry Sewell
发明人： Harry Sewell
CPC分类号： G03F7/70566 , A61B6/4435 , G03F7/70283 , G03F7/70291
摘要： A maskless pattern generating system for use in lithographic processing includes a liquid crystal pixel array. The system generates a light beam and applies a voltage level to each pixel of the pixel array to modulate a polarization state of the light beam so as to create a pattern image. The voltage levels correspond to greyscale levels assigned to the pixels. The system can receive a control signal input based on pattern information that defines the pattern image. The setting of the individual voltage levels can allow the liquid crystal pixel array to act as a phase shift mask, can allow the pattern image to be shifted, and can allow the manipulation of a pattern image edge. This maskless pattern writing system acts as a light valve to control pattern imagery, on a pixel by pixel basis, for the purposes of direct writing patterns.
摘要翻译： 用于光刻处理的无掩模图案生成系统包括液晶像素阵列。 该系统产生一个光束，并且将一个电压电平施加到像素阵列的每个像素上，以调制光束的偏振状态，从而产生一个图形图像。 电压电平对应于分配给像素的灰度级。 系统可以基于定义图案图像的图案信息接收控制信号输入。 各个电压电平的设置可以允许液晶像素阵列用作相移掩模，可以允许图案图像被移动，并且可以允许图案图像边缘的操纵。 为了直接写入图案，该无掩模图案书写系统充当光阀，以逐个像素为基础来控制图案图像。
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70.发明申请Systems and Methods for Insitu Lens Cleaning Using Ozone in Immersion Lithography 有权在沉浸光刻中使用臭氧进行透镜清洁的系统和方法公开(公告)号：US20090109411A1
公开(公告)日：2009-04-30
申请号：US12128035
申请日：2008-05-28
申请人： Harry Sewell , Louis John Markoya
发明人： Harry Sewell , Louis John Markoya
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/70925 , G03F7/70983
摘要： An immersion lithography apparatus is provided that includes an energy source, a projection optical system, a stage, a showerhead including an immersion liquid supply device and an immersion liquid discharge device that produces a flow of liquid within an exposure zone, and a cleaning device that cleans a portion of the projection optical system having been contacted with the immersion liquid by means of a cleaning gas. In an embodiment, the cleaning device includes an ozone generation unit produces a flow of ozone into the exposure zone. In embodiments, the apparatus includes a stage that includes a dose sensor and/or an ultra-violet light source. A method for insitu cleaning of a final lens element within an immersion lithography system having an immersion fluid showerhead that provides immersion fluid to an exposure zone of the immersion lithography system is also provided.
摘要翻译： 提供了一种浸没式光刻设备，其包括能量源，投影光学系统，平台，包括浸没液体供应装置的喷头和在曝光区域内产生液体流的浸没液体排出装置，以及清洁装置， 通过清洁气体清洁已经与浸没液接触的投影光学系统的一部分。 在一个实施例中，清洁装置包括臭氧产生单元产生臭氧流入曝光区域。 在实施例中，该装置包括包括剂量传感器和/或紫外光源的平台。 还提供了一种用于在浸没式光刻系统内对最终透镜元件进行真空清洁的方法，其具有向浸没式光刻系统的曝光区域提供浸没流体的浸没式液体喷头。
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