公开(公告)号：US20110140334A1

公开(公告)日：2011-06-16

申请号：US12636328

申请日：2009-12-11

申请人： Steven M. Zuniga ,  Derek G. Aqui ,  Andrew J. Nagengast ,  Keenan Leon Guerrero ,  Harish K. Bolla ,  Aditya Agarwal

发明人： Steven M. Zuniga ,  Derek G. Aqui ,  Andrew J. Nagengast ,  Keenan Leon Guerrero ,  Harish K. Bolla ,  Aditya Agarwal

IPC分类号： B23Q3/00

CPC分类号： H01L21/68728 ,  H01L21/6719 ,  H01L21/68707 ,  H01L21/68764 ,  H01L21/68771

摘要： A system for simultaneously treating multiple workpieces is configured with sites, configured to hold respective workpieces, affixed on a rotatable base. Each site has a shelf accommodating an interior space and may be positioned by base rotation in alignment with a station of fixed location. Each station is equipped with an active component. The active components are movable simultaneously within respective stations into the respective interior spaces of respective aligned sites.

摘要翻译： 用于同时处理多个工件的系统被配置有被固定在可旋转底座上的各个工件的位置。 每个场地具有容纳内部空间的搁架，并且可以通过基座旋转定位成与固定位置的工位对准。 每个车站都配有一个有源组件。 有源部件可以在相应的站内同时移动到各个对准的位置的相应的内部空间中。

公开(公告)号：US07927190B2

公开(公告)日：2011-04-19

申请号：US12049650

申请日：2008-03-17

申请人： Hung Chih Chen ,  Steven M. Zuniga ,  Charles C. Garretson ,  Douglas R. McAllister ,  Jian Lin ,  Stacy Meyer ,  Sidney P. Huey ,  Jeonghoon Oh ,  Trung T. Doan ,  Jeffrey Schmidt ,  Martin S. Wohlert ,  Kerry F. Hughes ,  James C. Wang ,  Danny Cam Toan Lu ,  Romain Beau De Lamenie ,  Venkata R. Balagani ,  Aden Martin Allen ,  Michael Jon Fong

发明人： Hung Chih Chen ,  Steven M. Zuniga ,  Charles C. Garretson ,  Douglas R. McAllister ,  Jian Lin ,  Stacy Meyer ,  Sidney P. Huey ,  Jeonghoon Oh ,  Trung T. Doan ,  Jeffrey Schmidt ,  Martin S. Wohlert ,  Kerry F. Hughes ,  James C. Wang ,  Danny Cam Toan Lu ,  Romain Beau De Lamenie ,  Venkata R. Balagani ,  Aden Martin Allen ,  Michael Jon Fong

IPC分类号： B24B5/00

CPC分类号： B24B37/32 ,  Y10T29/49815

摘要： A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions.

公开(公告)号：US07842158B2

公开(公告)日：2010-11-30

申请号：US11837412

申请日：2007-08-10

申请人： Hung Chih Chen ,  Jeonghoon Oh ,  Tsz-Sin Siu ,  Thomas B. Brezoczky ,  Steven M. Zuniga

发明人： Hung Chih Chen ,  Jeonghoon Oh ,  Tsz-Sin Siu ,  Thomas B. Brezoczky ,  Steven M. Zuniga

IPC分类号： B24B29/00

CPC分类号： B24B37/30

摘要： A carrier head for chemical mechanical polishing of a substrate includes a base and a flexible membrane extending beneath the base. The flexible membrane includes a central portion with an outer surface providing a substrate receiving surface, a perimeter portion connecting the central portion to the base, and at least one flap extending from an inner surface of the central portion. The flap divides a volume between the flexible membrane and the base into a plurality of chambers, and the flap includes a laterally extending first section and an angled second section extending beneath the first section and connecting the laterally extending first section to the central portion.

摘要翻译： 用于基板的化学机械抛光的承载头包括基部和在基部下方延伸的柔性膜。 柔性膜包括具有提供基板接收表面的外表面的中心部分，将中心部分连接到基部的周边部分和从中心部分的内表面延伸的至少一个折片。 翼片将柔性膜和基部之间的体积分成多个室，并且该翼片包括横向延伸的第一部分和在第一部分下方延伸并且将横向延伸的第一部分连接到中心部分的成角度的第二部分。

公开(公告)号：US07815495B2

公开(公告)日：2010-10-19

申请号：US11734063

申请日：2007-04-11

申请人： Kun Xu ,  Jimin Zhang ,  James C. Wang ,  Thomas H. Osterheld ,  Yutao Ma ,  Steven M. Zuniga ,  Jin Yi

发明人： Kun Xu ,  Jimin Zhang ,  James C. Wang ,  Thomas H. Osterheld ,  Yutao Ma ,  Steven M. Zuniga ,  Jin Yi

IPC分类号： B24B53/12

CPC分类号： B24B53/017 ,  B24B29/005 ,  B24B53/12

摘要： A pad conditioner is provided for conditioning a polishing pad in chemical mechanical planarization (CMP). The pad conditioner comprises a plastic abrasive portion having a first hardness and optionally a brush portion having a second hardness less than the first hardness. The plastic abrasive portion comprises a base plate and a plurality of plastic nodules formed on a surface of the base plate, each of the plastic nodules having a planar top surface, wherein the planar top surface is positioned to substantially contact a polishing pad. The brush portion may be positioned adjacent to the plastic abrasive portion, the brush portion having a plurality of brush elements positioned to substantially contact the pad.

摘要翻译： 提供了用于在化学机械平面化（CMP）中调理抛光垫的衬垫调节器。 衬垫调节剂包括具有第一硬度的塑料磨料部分和任选地具有小于第一硬度的第二硬度的刷部分。 塑料研磨部分包括基板和形成在基板的表面上的多个塑料结节，每个塑料结节具有平坦的顶表面，其中平面顶表面被定位成基本接触抛光垫。 刷部分可以定位成与塑料研磨部分相邻，刷部分具有多个刷子元件，其定位成基本上接触焊盘。

公开(公告)号：US20100151777A1

公开(公告)日：2010-06-17

申请号：US12698912

申请日：2010-02-02

申请人： Steven M. Zuniga ,  Andrew J. Nagengast ,  Jeonghoon Oh

发明人： Steven M. Zuniga ,  Andrew J. Nagengast ,  Jeonghoon Oh

IPC分类号： B24D15/00

CPC分类号： B24B37/32

摘要： A carrier head that has a base assembly, a retaining ring assembly, a carrier ring, and a flexible membrane is described. A carrier ring has an annular upper portion and an annular lower portion having a lower surface with a smaller inner diameter than the upper surface of the annular upper portion, wherein the carrier ring circumferentially surrounds a retaining ring and has a lower surface to contact a polishing pad.

摘要翻译： 描述了具有基座组件，保持环组件，载体环和柔性膜的承载头。 承载环具有环形上部和环形下部，其具有比环形上部的上表面更小的内径的下表面，其中承载环周向地包围保持环并且具有接触抛光的下表面 垫。

公开(公告)号：US20100136892A1

公开(公告)日：2010-06-03

申请号：US12698009

申请日：2010-02-01

申请人： Steven M. Zuniga ,  Andrew J. Nagengast ,  Jeonghoon Oh

发明人： Steven M. Zuniga ,  Andrew J. Nagengast ,  Jeonghoon Oh

IPC分类号： B24B41/06

CPC分类号： B24B37/32 ,  B24B37/30

摘要： A carrier head that has a housing, a base assembly, a retaining ring, a carrier ring, and a flexible membrane is described. The base assembly is vertically movable relative to the housing. The retaining ring is connected to and vertically movable relative to the base assembly and has a lower surface configured to contact a polishing pad and an inner surface configured to circumferentially surround the edge of a substrate to retain the substrate. The carrier ring is connected to and vertically fixed relative to the base assembly, circumferentially surrounds the retaining ring to prevent lateral motion of the retaining ring, and has a bottom surface configured to contact a polishing pad.

摘要翻译： 描述了具有壳体，基座组件，保持环，载体环和柔性膜的承载头。 基座组件相对于外壳可垂直移动。 保持环相对于基座组件连接并且可垂直移动，并且具有被配置为接触抛光垫的下表面和被配置为周向围绕衬底的边缘以保持衬底的内表面。 承载环相对于基座组件连接并且垂直固定，周向地包围保持环以防止保持环的横向运动，并且具有构造成接触抛光垫的底表面。

公开(公告)号：US07699688B2

公开(公告)日：2010-04-20

申请号：US11741677

申请日：2007-04-27

申请人： Steven M. Zuniga ,  Andrew J. Nagengast ,  Jeonghoon Oh

发明人： Steven M. Zuniga ,  Andrew J. Nagengast ,  Jeonghoon Oh

IPC分类号： B24B21/18

CPC分类号： B24B37/32

摘要： A carrier head that has a base assembly, a retaining ring assembly, a carrier ring, and a flexible membrane is described. A carrier ring has an annular upper portion and an annular lower portion having a lower surface with a smaller inner diameter than the upper surface of the annular upper portion, wherein the carrier ring circumferentially surrounds a retaining ring and has a lower surface to contact a polishing pad.

摘要翻译： 描述了具有基座组件，保持环组件，载体环和柔性膜的承载头。 承载环具有环形上部和环形下部，其具有比环形上部的上表面更小的内径的下表面，其中承载环周向地包围保持环并且具有接触抛光的下表面 垫。

公开(公告)号：US07654888B2

公开(公告)日：2010-02-02

申请号：US11862096

申请日：2007-09-26

申请人： Steven M. Zuniga ,  Andrew J. Nagengast ,  Jeonghoon Oh

发明人： Steven M. Zuniga ,  Andrew J. Nagengast ,  Jeonghoon Oh

IPC分类号： B24B41/06

CPC分类号： B24B37/32 ,  B24B37/30

摘要： A carrier head that has a housing, a base assembly, a retaining ring, a carrier ring, and a flexible membrane is described. The base assembly is vertically movable relative to the housing. The retaining ring is connected to and vertically movable relative to the base assembly and has a lower surface configured to contact a polishing pad and an inner surface configured to circumferentially surround the edge of a substrate to retain the substrate. The carrier ring is connected to and vertically fixed relative to the base assembly, circumferentially surrounds the retaining ring to prevent lateral motion of the retaining ring, and has a bottom surface configured to contact a polishing pad.

摘要翻译： 描述了具有壳体，基座组件，保持环，载体环和柔性膜的承载头。 基座组件相对于外壳可垂直移动。 保持环相对于基座组件连接并且可垂直移动，并且具有被配置为接触抛光垫的下表面和被配置为周向围绕衬底的边缘以保持衬底的内表面。 承载环相对于基座组件连接并且垂直固定，周向地包围保持环以防止保持环的横向运动，并且具有构造成接触抛光垫的底表面。

公开(公告)号：US07527271B2

公开(公告)日：2009-05-05

申请号：US11757069

申请日：2007-06-01

申请人： Jeonghoon Oh ,  Andrew Nagengast ,  Steven M. Zuniga ,  Hung Chih Chen

发明人： Jeonghoon Oh ,  Andrew Nagengast ,  Steven M. Zuniga ,  Hung Chih Chen

IPC分类号： B23B31/30

CPC分类号： H01L21/6838 ,  B24B37/30 ,  H01L21/67005 ,  Y10T29/5313 ,  Y10T279/11

摘要： The present invention relates to an apparatus and method for improving and speeding up substrate loading process. One embodiment provides a method for vacuum chucking a substrate. The method comprises venting a center chamber of a flexible membrane configured for mounting the substrate, moving the substrate such that a backside of the substrate is in full contact with the flexible membrane, and vacuuming the center chamber to vacuum chuck the backside of the substrate to the flexible membrane.

摘要翻译： 本发明涉及一种用于改善和加速基板加载过程的装置和方法。 一个实施例提供了用于真空吸附衬底的方法。 该方法包括将配置用于安装衬底的柔性膜的中心室排出，移动衬底，使得衬底的背面与柔性膜完全接触，并且抽真空中心室以将衬底的背面真空吸附到 柔性膜。

公开(公告)号：US07520955B1

公开(公告)日：2009-04-21

申请号：US09848830

申请日：2001-05-03

申请人： Steven M. Zuniga ,  Thomas H. Osterheld

发明人： Steven M. Zuniga ,  Thomas H. Osterheld

IPC分类号： B24B5/00 ,  B24B29/00

CPC分类号： B24B41/06 ,  B24B37/30 ,  B24B37/32

摘要： A carrier head for a chemical mechanical polishing apparatus includes a retaining ring having a flexible lower portion and a rigid upper portion.

摘要翻译： 用于化学机械抛光装置的承载头包括具有柔性下部和刚性上部的保持环。