公开(公告)号：US20060049391A1

公开(公告)日：2006-03-09

申请号：US11258340

申请日：2005-10-24

申请人： Giulio Casagrande ,  Roberto Bez ,  Fabio Pellizzer

发明人： Giulio Casagrande ,  Roberto Bez ,  Fabio Pellizzer

IPC分类号： H01L47/00

CPC分类号： G11C11/56 ,  G11C11/5678 ,  G11C13/0004 ,  H01L27/2445 ,  H01L45/06 ,  H01L45/1233 ,  H01L45/126 ,  H01L45/144 ,  H01L45/1691

摘要： An electronic semiconductor device has a sublithographic contact area between a first conductive region and a second conductive region. The first conductive region is cup-shaped and has vertical walls which extend, in top plan view, along a closed line of elongated shape. One of the walls of the first conductive region forms a first thin portion and has a first dimension in a first direction. The second conductive region has a second thin portion having a second sublithographic dimension in a second direction transverse to the first dimension. The first and the second conductive regions are in direct electrical contact at their thin portions and form the sublithographic contact area. The elongated shape is chosen between rectangular and oval elongated in the first direction. Thereby, the dimensions of the contact area remain approximately constant even in presence of a small misalignment between the masks defining the conductive regions.

摘要翻译： 电子半导体器件具有在第一导电区域和第二导电区域之间的亚光刻接触面积。 第一导电区域是杯状的并且具有垂直壁，其在顶部平面图中沿着细长形状的封闭线延伸。 第一导电区域的一个壁形成第一薄部分并且具有在第一方向上的第一尺寸。 第二导电区域具有第二薄部分，该第二薄部分具有横向于第一尺寸的第二方向的第二亚光刻尺寸。 第一和第二导电区域在其薄部分处直接电接触并形成亚光刻接触区域。 细长形状选择在第一方向上伸长的矩形和椭圆形之间。 因此，即使在限定导电区域的掩模之间存在小的不对准的情况下，接触区域的尺寸也保持近似恒定。

公开(公告)号：US20050024933A1

公开(公告)日：2005-02-03

申请号：US10836651

申请日：2004-04-30

申请人： Fabio Pellizzer ,  Roberto Bez

发明人： Fabio Pellizzer ,  Roberto Bez

IPC分类号： H01L27/24 ,  H01L45/00 ,  G11C11/00

CPC分类号： H01L27/2445 ,  H01L45/06 ,  H01L45/1233 ,  H01L45/126

摘要： A process for manufacturing a memory device having selector bipolar transistors for storage elements, includes the steps of: in a semiconductor body, forming at least a selector transistor, having at least an embedded conductive region, and forming at least a storage element, stacked on and electrically connected to the selector transistor; moreover, the step of forming at least a selector transistor includes forming at least a raised conductive region located on and electrically connected to the embedded conductive region.

摘要翻译： 一种用于制造具有用于存储元件的选择器双极晶体管的存储器件的方法，包括以下步骤：在半导体本体中，至少形成至少具有嵌入的导电区域的选择晶体管，并形成至少一个存储元件，堆叠在 并电连接到选择晶体管; 此外，形成至少选择晶体管的步骤包括至少形成位于并电连接到嵌入的导电区域的凸起的导电区域。

公开(公告)号：US07372166B2

公开(公告)日：2008-05-13

申请号：US11258340

申请日：2005-10-24

申请人： Giulio Casagrande ,  Roberto Bez ,  Fabio Pellizzer

发明人： Giulio Casagrande ,  Roberto Bez ,  Fabio Pellizzer

IPC分类号： H01L23/48

CPC分类号： G11C11/56 ,  G11C11/5678 ,  G11C13/0004 ,  H01L27/2445 ,  H01L45/06 ,  H01L45/1233 ,  H01L45/126 ,  H01L45/144 ,  H01L45/1691

摘要： An electronic semiconductor device has a sublithographic contact area between a first conductive region and a second conductive region. The first conductive region is cup-shaped and has vertical walls which extend, in top plan view, along a closed line of elongated shape. One of the walls of the first conductive region forms a first thin portion and has a first dimension in a first direction. The second conductive region has a second thin portion having a second sublithographic dimension in a second direction transverse to the first dimension. The first and the second conductive regions are in direct electrical contact at their thin portions and form the sublithographic contact area. The elongated shape is chosen between rectangular and oval elongated in the first direction. Thereby, the dimensions of the contact area remain approximately constant even in presence of a small misalignment between the masks defining the conductive regions.

摘要翻译： 电子半导体器件具有在第一导电区域和第二导电区域之间的亚光刻接触面积。 第一导电区域是杯状的并且具有垂直壁，其在顶部平面图中沿着细长形状的封闭线延伸。 第一导电区域的一个壁形成第一薄部分并且具有在第一方向上的第一尺寸。 第二导电区域具有第二薄部分，该第二薄部分具有横向于第一尺寸的第二方向的第二亚光刻尺寸。 第一和第二导电区域在其薄部分处直接电接触并形成亚光刻接触区域。 细长形状选择在第一方向上伸长的矩形和椭圆形之间。 因此，即使在限定导电区域的掩模之间存在小的不对准的情况下，接触区域的尺寸也保持近似恒定。

公开(公告)号：US07227171B2

公开(公告)日：2007-06-05

申请号：US10313991

申请日：2002-12-05

申请人： Roberto Bez ,  Fabio Pellizzer ,  Caterina Riva ,  Romina Zonca

发明人： Roberto Bez ,  Fabio Pellizzer ,  Caterina Riva ,  Romina Zonca

IPC分类号： H01L29/04

CPC分类号： G11C13/0004 ,  H01L27/2445 ,  H01L45/06 ,  H01L45/1233 ,  H01L45/126 ,  H01L45/144 ,  H01L45/1691 ,  Y10S438/947

摘要： A contact structure, including a first conducting region having a first thin portion with a first sublithographic dimension in a first direction; a second conducting region having a second thin portion with a second sublithographic dimension in a second direction transverse to said first direction; the first and second thin portions being in direct electrical contact and defining a contact area having a sublithographic extension. The thin portions are obtained using deposition instead of lithography: the first thin portion is deposed on a wall of an opening in a first dielectric layer; the second thin portion is obtained by deposing a sacrificial region on vertical wall of a first delimitation layer, deposing a second delimitation layer on the free side of the sacrificial region, removing the sacrificial region to form a sublithographic opening that is used to etch a mold opening in a mold layer and filling the mold opening.

摘要翻译： 一种接触结构，包括：第一导电区域，具有在第一方向上具有第一亚光刻尺寸的第一薄部分; 第二导电区域，具有第二薄部分，具有横向于所述第一方向的第二方向的第二亚光刻尺寸; 第一和第二薄部分直接电接触并且限定具有亚光刻延伸部的接触区域。 使用沉积代替光刻获得薄部分：第一薄部分被放置在第一介电层中的开口的壁上; 通过在第一限定层的垂直壁上去除牺牲区域，在牺牲区域的自由侧上取代第二限定层，去除牺牲区域以形成用于蚀刻模具的亚光刻开口来获得第二薄部分 在模具层中开口并填充模具开口。

公开(公告)号：US07135756B2

公开(公告)日：2006-11-14

申请号：US10680727

申请日：2003-10-07

申请人： Fabio Pellizzer ,  Giulio Casagrande ,  Roberto Bez

发明人： Fabio Pellizzer ,  Giulio Casagrande ,  Roberto Bez

IPC分类号： H01L27/102

CPC分类号： H01L27/2445 ,  H01L27/101 ,  H01L27/2463 ,  H01L29/685 ,  H01L45/06 ,  H01L45/1233

摘要： A cell array is formed by a plurality of cells each including a selection bipolar transistor and a storage component. The cell array is formed in a body including a common collector region of P type; a plurality of base regions of N type, overlying the common collector region; a plurality of emitter regions of P type formed in the base regions; and a plurality of base contact regions of N type and a higher doping level than the base regions, formed in the base regions, wherein each base region is shared by at least two adjacent bipolar transistors.

摘要翻译： 单元阵列由多个单元形成，每个单元包括选择双极晶体管和存储组件。 电池阵列形成在包括P型共用集电极区域的主体中; 多个N型基极区，覆盖在公共集电极区域上; 在基区中形成多个P型发射极区; 以及形成在所述基极区域中的多个N型基极接触区域和比所述基极区域更高的掺杂水平的基极接触区域，其中每个基极区域由至少两个相邻的双极晶体管共享。

公开(公告)号：US20060202245A1

公开(公告)日：2006-09-14

申请号：US11337787

申请日：2006-01-23

申请人： Paola Zuliani ,  Fabio Pellizzer ,  Roberto Bez

发明人： Paola Zuliani ,  Fabio Pellizzer ,  Roberto Bez

IPC分类号： H01L29/94

CPC分类号： H01L27/2436 ,  H01L27/2472 ,  H01L45/06 ,  H01L45/1233 ,  H01L45/126 ,  H01L45/144

摘要： A phase-change memory device, wherein memory cells form a memory array arranged in rows and columns. The memory cells are formed by a MOS selection device and a phase-change region connected to the selection device. The selection device is formed by first and second conductive regions which extend in a semiconductor substrate and are spaced from one another via a channel region, and by an isolated control region connected to a respective row and overlying the channel region. The first conductive region is connected to a connection line extending parallel to the rows, the second conductive region is connected to the phase-change region, and the phase-change region is connected to a respective column. The first connection line is a metal interconnection line and is connected to the first conductive region via a source-contact region made as point contact and distinct from the first connection line.

摘要翻译： 一种相变存储器件，其中存储器单元形成以行和列布置的存储器阵列。 存储单元由连接到选择装置的MOS选择装置和相变区域形成。 选择装置由在半导体衬底中延伸并且经由沟道区彼此间隔开的第一和第二导电区域以及连接到相应行并且覆盖沟道区域的隔离控制区域形成。 第一导电区域连接到与行平行延伸的连接线，第二导电区域连接到相变区域，并且相变区域连接到相应的列。 第一连接线是金属互连线，并且通过作为点接触而不同于第一连接线的源极接触区域连接到第一导电区域。

公开(公告)号：US06972430B2

公开(公告)日：2005-12-06

申请号：US10371154

申请日：2003-02-20

申请人： Giulio Casagrande ,  Roberto Bez ,  Fabio Pellizzer

发明人： Giulio Casagrande ,  Roberto Bez ,  Fabio Pellizzer

IPC分类号： G11C11/56 ,  H01L27/24 ,  H01L45/00

CPC分类号： G11C11/56 ,  G11C11/5678 ,  G11C13/0004 ,  H01L27/2445 ,  H01L45/06 ,  H01L45/1233 ,  H01L45/126 ,  H01L45/144 ,  H01L45/1691

摘要： An electronic semiconductor device has a sublithographic contact area between a first conductive region and a second conductive region. The first conductive region is cup-shaped and has vertical walls which extend, in top plan view, along a closed line of elongated shape. One of the walls of the first conductive region forms a first thin portion and has a first dimension in a first direction. The second conductive region has a second thin portion having a second sublithographic dimension in a second direction transverse to the first dimension. The first and the second conductive regions are in direct electrical contact at their thin portions and form the sublithographic contact area. The elongated shape is chosen between rectangular and oval elongated in the first direction. Thereby, the dimensions of the contact area remain approximately constant even in presence of a small misalignment between the masks defining the conductive regions.

摘要翻译： 电子半导体器件具有在第一导电区域和第二导电区域之间的亚光刻接触面积。 第一导电区域是杯状的并且具有垂直壁，其在顶部平面图中沿着细长形状的封闭线延伸。 第一导电区域的一个壁形成第一薄部分并且具有在第一方向上的第一尺寸。 第二导电区域具有第二薄部分，该第二薄部分具有横向于第一尺寸的第二方向的第二亚光刻尺寸。 第一和第二导电区域在其薄部分处直接电接触并形成亚光刻接触区域。 细长形状选择在第一方向上伸长的矩形和椭圆形之间。 因此，即使在限定导电区域的掩模之间存在小的不对准的情况下，接触区域的尺寸也保持近似恒定。

公开(公告)号：US06891747B2

公开(公告)日：2005-05-10

申请号：US10372761

申请日：2003-02-20

申请人： Roberto Bez ,  Fabio Pellizzer ,  Marina Tosi ,  Romina Zonca

发明人： Roberto Bez ,  Fabio Pellizzer ,  Marina Tosi ,  Romina Zonca

IPC分类号： G11C11/56 ,  H01L27/24 ,  H01L45/00 ,  G11C11/00

CPC分类号： H01L45/06 ,  G11C11/5678 ,  G11C13/0004 ,  H01L27/2445 ,  H01L45/1233 ,  H01L45/126 ,  H01L45/144 ,  H01L45/1691

摘要： The phase change memory cell is formed by a resistive element and by a memory region of a phase change material. The resistive element has a first thin portion having a first sublithographic dimension in a first direction; and the memory region has a second thin portion having a second sublithographic dimension in a second direction transverse to the first dimension. The first thin portion and the second thin portion are in direct electrical contact and define a contact area of sublithographic extension. The second thin portion is delimited laterally by oxide spacer portions surrounded by a mold layer which defines a lithographic opening. The spacer portions are formed after forming the lithographic opening, by a spacer formation technique.

摘要翻译： 相变存储单元由电阻元件和相变材料的存储区形成。 电阻元件具有在第一方向上具有第一亚光刻尺寸的第一薄部分; 并且所述存储区域具有第二薄部分，所述第二薄部分具有横向于所述第一尺寸的第二方向的第二亚光刻尺寸。 第一薄部分和第二薄部分直接电接触并限定亚光刻延伸部分的接触面积。 第二薄部分被由限定光刻开口的模具层围绕的氧化物间隔部分侧向限定。 通过间隔物形成技术在形成光刻开口之后形成间隔部分。

公开(公告)号：US07446011B2

公开(公告)日：2008-11-04

申请号：US11551170

申请日：2006-10-19

申请人： Fabio Pellizzer ,  Giulio Casagrande ,  Roberto Bez

发明人： Fabio Pellizzer ,  Giulio Casagrande ,  Roberto Bez

IPC分类号： H01L21/8222

CPC分类号： H01L27/2445 ,  H01L27/101 ,  H01L27/2463 ,  H01L29/685 ,  H01L45/06 ,  H01L45/1233

摘要： A cell array is formed by a plurality of cells each including a selection bipolar transistor and a storage component. The cell array is formed in a body including a common collector region of P type; a plurality of base regions of N type, overlying the common collector region; a plurality of emitter regions of P type formed in the base regions; and a plurality of base contact regions of N type and a higher doping level than the base regions, formed in the base regions, wherein each base region is shared by at least two adjacent bipolar transistors.

摘要翻译： 单元阵列由多个单元形成，每个单元包括选择双极晶体管和存储组件。 电池阵列形成在包括P型共用集电极区域的主体中; 多个N型基极区，覆盖在公共集电极区域上; 在基区中形成多个P型发射极区; 以及形成在所述基极区域中的多个N型基极接触区域和比所述基极区域更高的掺杂水平的基极接触区域，其中每个基极区域由至少两个相邻的双极晶体管共享。

公开(公告)号：US07307451B2

公开(公告)日：2007-12-11

申请号：US10948079

申请日：2004-09-23

申请人： Fabio Pellizzer ,  Guido De Sandre ,  Roberto Bez

发明人： Fabio Pellizzer ,  Guido De Sandre ,  Roberto Bez

IPC分类号： H03K19/177 ,  G11C11/34

CPC分类号： G11C13/0004 ,  G11C16/0416 ,  H03K3/0375 ,  H03K19/1776

摘要： The present invention proposes a Field Programmable Gate Array device comprising a plurality of configurable electrical connections, a plurality of controlled switches, each one adapted to activating/de-activating at least one respective electrical connection in response to a switch control signal and a control unit including an arrangement of a plurality of control cells. Each control cells controls at least one of said controlled switches by the respective switch control signal, each control cell including a volatile storage element adapted to storing in a volatile way a control logic value corresponding to a preselected status of the at least one controlled switch, and providing to the controlled switch said switch control signal corresponding to the stored logic value. Each control cell further includes a non-volatile storage element coupled to the volatile storage element, the non-volatile storage element being adapted to storing in a non-volatile way the control logic value.

摘要翻译： 本发明提出了一种现场可编程门阵列器件，其包括多个可配置的电连接，多个受控开关，每个控制开关适于响应于开关控制信号激活/去激活至少一个相应的电连接，控制单元 包括多个控制单元的布置。 每个控制单元通过相应的开关控制信号控制所述受控开关中的至少一个，每个控制单元包括易失性存储元件，其适于以易失性方式存储对应于至少一个受控开关的预选状态的控制逻辑值， 以及向受控开关提供与所存储的逻辑值对应的所述开关控制信号。 每个控制单元还包括耦合到易失性存储元件的非易失性存储元件，非易失性存储元件适于以非易失性方式存储控制逻辑值。