Array of cells including a selection bipolar transistor and fabrication method thereof
    1.
    发明授权
    Array of cells including a selection bipolar transistor and fabrication method thereof 有权
    包括选择双极晶体管的单元阵列及其制造方法

    公开(公告)号:US07446011B2

    公开(公告)日:2008-11-04

    申请号:US11551170

    申请日:2006-10-19

    IPC分类号: H01L21/8222

    摘要: A cell array is formed by a plurality of cells each including a selection bipolar transistor and a storage component. The cell array is formed in a body including a common collector region of P type; a plurality of base regions of N type, overlying the common collector region; a plurality of emitter regions of P type formed in the base regions; and a plurality of base contact regions of N type and a higher doping level than the base regions, formed in the base regions, wherein each base region is shared by at least two adjacent bipolar transistors.

    摘要翻译: 单元阵列由多个单元形成,每个单元包括选择双极晶体管和存储组件。 电池阵列形成在包括P型共用集电极区域的主体中; 多个N型基极区,覆盖在公共集电极区域上; 在基区中形成多个P型发射极区; 以及形成在所述基极区域中的多个N型基极接触区域和比所述基极区域更高的掺杂水平的基极接触区域,其中每个基极区域由至少两个相邻的双极晶体管共享。

    Sublithographic contact structure, phase change memory cell with optimized heater shape, and manufacturing method thereof
    2.
    发明申请
    Sublithographic contact structure, phase change memory cell with optimized heater shape, and manufacturing method thereof 有权
    亚光刻接触结构,具有优化的加热器形状的相变存储单元及其制造方法

    公开(公告)号:US20060049391A1

    公开(公告)日:2006-03-09

    申请号:US11258340

    申请日:2005-10-24

    IPC分类号: H01L47/00

    摘要: An electronic semiconductor device has a sublithographic contact area between a first conductive region and a second conductive region. The first conductive region is cup-shaped and has vertical walls which extend, in top plan view, along a closed line of elongated shape. One of the walls of the first conductive region forms a first thin portion and has a first dimension in a first direction. The second conductive region has a second thin portion having a second sublithographic dimension in a second direction transverse to the first dimension. The first and the second conductive regions are in direct electrical contact at their thin portions and form the sublithographic contact area. The elongated shape is chosen between rectangular and oval elongated in the first direction. Thereby, the dimensions of the contact area remain approximately constant even in presence of a small misalignment between the masks defining the conductive regions.

    摘要翻译: 电子半导体器件具有在第一导电区域和第二导电区域之间的亚光刻接触面积。 第一导电区域是杯状的并且具有垂直壁,其在顶部平面图中沿着细长形状的封闭线延伸。 第一导电区域的一个壁形成第一薄部分并且具有在第一方向上的第一尺寸。 第二导电区域具有第二薄部分,该第二薄部分具有横向于第一尺寸的第二方向的第二亚光刻尺寸。 第一和第二导电区域在其薄部分处直接电接触并形成亚光刻接触区域。 细长形状选择在第一方向上伸长的矩形和椭圆形之间。 因此,即使在限定导电区域的掩模之间存在小的不对准的情况下,接触区域的尺寸也保持近似恒定。

    Sublithographic contact structure, phase change memory cell with optimized heater shape, and manufacturing method thereof
    3.
    发明授权
    Sublithographic contact structure, phase change memory cell with optimized heater shape, and manufacturing method thereof 有权
    亚光刻接触结构,具有优化的加热器形状的相变存储单元及其制造方法

    公开(公告)号:US07372166B2

    公开(公告)日:2008-05-13

    申请号:US11258340

    申请日:2005-10-24

    IPC分类号: H01L23/48

    摘要: An electronic semiconductor device has a sublithographic contact area between a first conductive region and a second conductive region. The first conductive region is cup-shaped and has vertical walls which extend, in top plan view, along a closed line of elongated shape. One of the walls of the first conductive region forms a first thin portion and has a first dimension in a first direction. The second conductive region has a second thin portion having a second sublithographic dimension in a second direction transverse to the first dimension. The first and the second conductive regions are in direct electrical contact at their thin portions and form the sublithographic contact area. The elongated shape is chosen between rectangular and oval elongated in the first direction. Thereby, the dimensions of the contact area remain approximately constant even in presence of a small misalignment between the masks defining the conductive regions.

    摘要翻译: 电子半导体器件具有在第一导电区域和第二导电区域之间的亚光刻接触面积。 第一导电区域是杯状的并且具有垂直壁,其在顶部平面图中沿着细长形状的封闭线延伸。 第一导电区域的一个壁形成第一薄部分并且具有在第一方向上的第一尺寸。 第二导电区域具有第二薄部分,该第二薄部分具有横向于第一尺寸的第二方向的第二亚光刻尺寸。 第一和第二导电区域在其薄部分处直接电接触并形成亚光刻接触区域。 细长形状选择在第一方向上伸长的矩形和椭圆形之间。 因此,即使在限定导电区域的掩模之间存在小的不对准的情况下,接触区域的尺寸也保持近似恒定。

    Array of cells including a selection bipolar transistor and fabrication method thereof
    4.
    发明授权
    Array of cells including a selection bipolar transistor and fabrication method thereof 有权
    包括选择双极晶体管的单元阵列及其制造方法

    公开(公告)号:US07135756B2

    公开(公告)日:2006-11-14

    申请号:US10680727

    申请日:2003-10-07

    IPC分类号: H01L27/102

    摘要: A cell array is formed by a plurality of cells each including a selection bipolar transistor and a storage component. The cell array is formed in a body including a common collector region of P type; a plurality of base regions of N type, overlying the common collector region; a plurality of emitter regions of P type formed in the base regions; and a plurality of base contact regions of N type and a higher doping level than the base regions, formed in the base regions, wherein each base region is shared by at least two adjacent bipolar transistors.

    摘要翻译: 单元阵列由多个单元形成,每个单元包括选择双极晶体管和存储组件。 电池阵列形成在包括P型共用集电极区域的主体中; 多个N型基极区,覆盖在公共集电极区域上; 在基区中形成多个P型发射极区; 以及形成在所述基极区域中的多个N型基极接触区域和比所述基极区域更高的掺杂水平的基极接触区域,其中每个基极区域由至少两个相邻的双极晶体管共享。

    Sublithographic contact structure, phase change memory cell with optimized heater shape, and manufacturing method thereof
    5.
    发明授权
    Sublithographic contact structure, phase change memory cell with optimized heater shape, and manufacturing method thereof 有权
    亚光刻接触结构,具有优化的加热器形状的相变存储单元及其制造方法

    公开(公告)号:US06972430B2

    公开(公告)日:2005-12-06

    申请号:US10371154

    申请日:2003-02-20

    IPC分类号: G11C11/56 H01L27/24 H01L45/00

    摘要: An electronic semiconductor device has a sublithographic contact area between a first conductive region and a second conductive region. The first conductive region is cup-shaped and has vertical walls which extend, in top plan view, along a closed line of elongated shape. One of the walls of the first conductive region forms a first thin portion and has a first dimension in a first direction. The second conductive region has a second thin portion having a second sublithographic dimension in a second direction transverse to the first dimension. The first and the second conductive regions are in direct electrical contact at their thin portions and form the sublithographic contact area. The elongated shape is chosen between rectangular and oval elongated in the first direction. Thereby, the dimensions of the contact area remain approximately constant even in presence of a small misalignment between the masks defining the conductive regions.

    摘要翻译: 电子半导体器件具有在第一导电区域和第二导电区域之间的亚光刻接触面积。 第一导电区域是杯状的并且具有垂直壁,其在顶部平面图中沿着细长形状的封闭线延伸。 第一导电区域的一个壁形成第一薄部分并且具有在第一方向上的第一尺寸。 第二导电区域具有第二薄部分,该第二薄部分具有横向于第一尺寸的第二方向的第二亚光刻尺寸。 第一和第二导电区域在其薄部分处直接电接触并形成亚光刻接触区域。 细长形状选择在第一方向上伸长的矩形和椭圆形之间。 因此,即使在限定导电区域的掩模之间存在小的不对准的情况下,接触区域的尺寸也保持近似恒定。

    ARRAY OF CELLS INCLUDING A SELECTION BIPOLAR TRANSISTOR AND FABRICATION METHOD THEREOF
    6.
    发明申请
    ARRAY OF CELLS INCLUDING A SELECTION BIPOLAR TRANSISTOR AND FABRICATION METHOD THEREOF 有权
    包括选择性双极晶体管的细胞阵列及其制备方法

    公开(公告)号:US20070099347A1

    公开(公告)日:2007-05-03

    申请号:US11551170

    申请日:2006-10-19

    IPC分类号: H01L21/00

    摘要: A cell array is formed by a plurality of cells each including a selection bipolar transistor and a storage component. The cell array is formed in a body including a common collector region of P type; a plurality of base regions of N type, overlying the common collector region; a plurality of emitter regions of P type formed in the base regions; and a plurality of base contact regions of N type and a higher doping level than the base regions, formed in the base regions, wherein each base region is shared by at least two adjacent bipolar transistors.

    摘要翻译: 单元阵列由多个单元形成,每个单元包括选择双极晶体管和存储组件。 电池阵列形成在包括P型共用集电极区域的主体中; 多个N型基极区,覆盖在公共集电极区域上; 在基区中形成多个P型发射极区; 以及形成在所述基极区域中的多个N型基极接触区域和比所述基极区域更高的掺杂水平的基极接触区域,其中每个基极区域由至少两个相邻的双极晶体管共享。

    Self-Aligned Bipolar Junction Transistors
    8.
    发明申请
    Self-Aligned Bipolar Junction Transistors 审中-公开
    自对准双极结晶体管

    公开(公告)号:US20110084247A1

    公开(公告)日:2011-04-14

    申请号:US12969652

    申请日:2010-12-16

    IPC分类号: H01L45/00 H01L27/082

    摘要: A plurality of bipolar transistors are formed by forming a common conduction region, a plurality of control regions extending each in an own active areas on the common conduction region, a plurality of silicide protection strips, and at least one control contact region. Silicide regions are formed on the second conduction regions and the control contact region. The second conduction regions may be formed by selectively implanting a first conductivity type dopant areas on a first side of selected silicide protection strips. The control contact region is formed by selectively implanting an opposite conductivity type dopant on a second side of the selected silicide protection strips.

    摘要翻译: 通过形成公共导电区域,在公共导电区域上的自身有效区域中延伸的多个控制区域,多个硅化物保护带和至少一个控制接触区域来形成多个双极晶体管。 在第二导电区域和控制接触区域上形成硅化物区域。 可以通过在所选择的硅化物保护条的第一侧选择性地注入第一导电类型的掺杂剂区域来形成第二导电区域。 通过在所选择的硅化物保护带的第二侧选择性地注入相反的导电型掺杂剂来形成控制接触区域。

    Process for manufacturing a phase change memory array in Cu-damascene technology and phase change memory array thereby manufactured
    9.
    发明授权
    Process for manufacturing a phase change memory array in Cu-damascene technology and phase change memory array thereby manufactured 有权
    因此制造Cu-damascene技术和相变存储器阵列中的相变存储器阵列的制造方法

    公开(公告)号:US07606056B2

    公开(公告)日:2009-10-20

    申请号:US11317622

    申请日:2005-12-22

    IPC分类号: G11C5/06

    摘要: A process for manufacturing a phase change memory array includes the steps of: forming a plurality of phase change memory cells in an array region of a semiconductor wafer, the phase change memory cells arranged in rows and columns according to a row direction and to a column direction, respectively; forming a control circuit in a control region of the semiconductor wafer; forming a plurality of first bit line portions for mutually connecting phase change memory cells arranged on a same column; forming first level electrical interconnection structures; and forming second level electrical interconnection structures above the first level electrical interconnection structures. The first level electrical interconnection structures include second bit line portions laying on and in contact with the first bit line portions and projecting from the first bit line portions in the column direction for connecting the first bit line portions to the control circuit.

    摘要翻译: 一种相变存储器阵列的制造方法包括以下步骤:在半导体晶片的阵列区域中形成多个相变存储单元,根据行方向排列成行和列的相变存储单元和列 方向; 在所述半导体晶片的控制区域中形成控制电路; 形成多个第一位线部分,用于相互连接布置在同一列上的相变存储器单元; 形成一级电互连结构; 以及在所述第一级电互连结构之上形成第二级电互连结构。 第一级电互连结构包括布置在第一位线部分上并与第一位线部分接触的第二位线部分,并且在列方向上从第一位线部分突出以将第一位线部分连接到控制电路。

    Content addressable memory cell
    10.
    发明授权
    Content addressable memory cell 有权
    内容可寻址存储单元

    公开(公告)号:US07227765B2

    公开(公告)日:2007-06-05

    申请号:US10970842

    申请日:2004-10-20

    IPC分类号: G11C15/00

    摘要: A content addressable memory cell for a non-volatile content addressable memory, including a non-volatile storage element for storing a content digit, a selection input for selecting the memory cell, a search input for receiving a search digit, and a comparison circuit arrangement for comparing the search digit to the content digit and for driving a match output of the memory cell so as to signal a match between the content digit and the search digit. The non-volatile storage element include at least one phase-change memory element for storing in a non-volatile way the respective content digit.

    摘要翻译: 一种用于非易失性内容可寻址存储器的内容可寻址存储器单元,包括用于存储内容数位的非易失性存储元件,用于选择存储单元的选择输入,用于接收搜索数字的搜索输入以及比较电路装置 用于将搜索数字与内容数字进行比较,并用于驱动存储器单元的匹配输出,以便发出内容数字和搜索数字之间的匹配。 非易失性存储元件包括用于以非易失性方式存储相应内容数字的至少一个相变存储器元件。