公开(公告)号：US20120196226A1

公开(公告)日：2012-08-02

申请号：US13343481

申请日：2012-01-04

申请人： Shinji Kumada ,  Satoshi Maemori ,  Masatoshi Arai ,  Daiju Shiono

发明人： Shinji Kumada ,  Satoshi Maemori ,  Masatoshi Arai ,  Daiju Shiono

IPC分类号： G03F7/20 ,  G03F7/004

CPC分类号： G03F7/0045 ,  G03F7/0397 ,  G03F7/20

摘要： A resist composition including a base component (A), which exhibits changed solubility in a developing solution under the action of acid and can be used in a lithography process that employs light having a wavelength of 193 nm or less as the exposure light source, an acid generator component (B) which generates acid upon exposure, and a polymeric compound (C) having a structural unit (c0) represented by general formula (c0) shown below, wherein the amount of the polymeric compound (C) is less than 25 parts by mass relative to 100 parts by mass of the base component (A). In the formula, R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, and R1 represents an organic group having one or more primary or secondary alcoholic hydroxyl groups, or a chain-like tertiary alcoholic hydroxyl group.

摘要翻译： 一种抗蚀剂组合物，其包含在酸的作用下在显影液中溶解度变化的碱成分（A），可以用于使用波长为193nm以下的光作为曝光光源的光刻工序， 暴露时产生酸的酸产生剂组分（B）和具有如下所示的通式（c0）表示的结构单元（c0）的聚合化合物（C），其中聚合化合物（C）的量小于25 相对于100质量份的基础成分（A）为质量份。 在该式中，R表示氢原子，1〜5个碳原子的烷基或1〜5个碳原子的卤代烷基，R1表示具有一个或多个伯或仲醇羟基的有机基团，或 链状叔醇羟基。

公开(公告)号：US07901865B2

公开(公告)日：2011-03-08

申请号：US11574805

申请日：2005-09-02

申请人： Taku Hirayama ,  Daiju Shiono ,  Hideo Hada

发明人： Taku Hirayama ,  Daiju Shiono ,  Hideo Hada

IPC分类号： G03F7/004 ,  G03F7/028 ,  G03F7/039

CPC分类号： G03F7/0392 ,  G03F7/0045 ,  G03F7/0048 ,  Y10S430/114

摘要： A resist composition that includes a base material component (A), which contains acid-dissociable, dissolution-inhibiting groups and exhibits increased alkali solubility under the action of acid, an acid generator component (B) that generates acid on exposure, and an organic solvent (C), in which the components (A) and (B) are dissolved in the organic solvent (C), wherein the base material component (A) contains a protected form (A1) of a polyhydric phenol compound (a) having two or more phenolic hydroxyl groups and a molecular weight within a range from 300 to 2,500, in which either a portion of, or all of, the phenolic hydroxyl groups are protected with acid-dissociable, dissolution-inhibiting groups, and the organic solvent (C) comprises an alcohol.

摘要翻译： 一种抗蚀剂组合物，其包含基质成分（A），其含有酸解离的溶解抑制基团，并且在酸的作用下显示出增加的碱溶解性，在曝光时产生酸的酸产生剂组分（B）和有机 其中组分（A）和（B）溶解在有机溶剂（C）中的溶剂（C），其中基材组分（A）含有多元酚化合物（a）的保护形式（A1） 两个或更多个酚羟基和分子量在300-2,500的范围内，其中酚羟基的一部分或全部被酸解离的溶解抑制基团保护，并且有机溶剂（ C）包含醇。

公开(公告)号：US07862981B2

公开(公告)日：2011-01-04

申请号：US11917458

申请日：2006-06-07

申请人： Daiju Shiono ,  Taku Hirayama ,  Hideo Hada

发明人： Daiju Shiono ,  Taku Hirayama ,  Hideo Hada

IPC分类号： G03C1/00 ,  C07C39/12

CPC分类号： C07C69/712 ,  C07C2603/74 ,  G03F7/0392 ,  G03F7/0397

摘要： A compound including a polyhydric phenol compound represented by general formula (I) shown below (wherein R11 to R17 each independently represents an alkyl group of 1 to 10 carbon atoms or aromatic hydrocarbon group which may contain a hetero atom in the structure thereof, and X represents an aliphatic cyclic group) and having a molecular weight of 300 to 2,500, in which some or all of the hydrogen atoms of the phenolic hydroxyl groups are substituted with acid dissociable, dissolution inhibiting groups; a positive resist composition containing the compound; and a method of forming a resist pattern using the positive resist composition.

摘要翻译： 含有下述通式（I）表示的多元酚化合物的化合物（其中，R 11〜R 17各自独立地表示碳原子数1〜10的烷基或其结构中可含有杂原子的芳香族烃基，X 代表脂族环基），其分子量为300-2,500，其中酚羟基的一些或全部氢原子被酸解离的溶解抑制基团取代; 含有该化合物的正性抗蚀剂组合物; 以及使用正性抗蚀剂组合物形成抗蚀剂图案的方法。

公开(公告)号：US20100009284A1

公开(公告)日：2010-01-14

申请号：US11917458

申请日：2006-06-07

申请人： Daiju Shiono ,  Taku Hirayama ,  Hideo Hada

发明人： Daiju Shiono ,  Taku Hirayama ,  Hideo Hada

IPC分类号： G03F7/20 ,  C07C39/17 ,  C07C69/712 ,  G03F7/004

CPC分类号： C07C69/712 ,  C07C2603/74 ,  G03F7/0392 ,  G03F7/0397

摘要： A compound including a polyhydric phenol compound represented by general formula (I) shown below (wherein R11 to R17 each independently represents an alkyl group of 1 to 10 carbon atoms or aromatic hydrocarbon group which may contain a hetero atom in the structure thereof, and X represents an aliphatic cyclic group) and having a molecular weight of 300 to 2,500, in which some or all of the hydrogen atoms of the phenolic hydroxyl groups are substituted with acid dissociable, dissolution inhibiting groups; a positive resist composition containing the compound; and a method of forming a resist pattern using the positive resist composition.

摘要翻译： 含有下述通式（I）表示的多元酚化合物的化合物（其中，R 11〜R 17各自独立地表示碳原子数1〜10的烷基或其结构中可含有杂原子的芳香族烃基，X 代表脂族环基），其分子量为300-2,500，其中酚羟基的一些或全部氢原子被酸解离的溶解抑制基团取代; 含有该化合物的正性抗蚀剂组合物; 以及使用正性抗蚀剂组合物形成抗蚀剂图案的方法。

公开(公告)号：US20090202939A1

公开(公告)日：2009-08-13

申请号：US12299371

申请日：2007-03-20

申请人： Daiju Shiono ,  Taku Hirayama ,  Hideo Hada

发明人： Daiju Shiono ,  Taku Hirayama ,  Hideo Hada

IPC分类号： G03F7/004 ,  C07C69/612 ,  G03F7/20

CPC分类号： C07C69/712 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0392

摘要： Disclosed are a compound that can be used for a resist composition, a positive resist composition that includes the compound, and a method for forming a resist pattern.Specifically disclosed is a compound represented by a formula (A-1). In the formula (A-1), R11 to R17 each represents an alkyl group or an aromatic hydrocarbon group; g and j each represents an integer of 1 or greater, and k and q each represents an integer of 0 or greater, provided that g+j+k+q is not greater than 5; b represents an integer of 1 or greater, and l and m each represents an integer of 0 or greater, provided that b+l+m is not greater than 4; c represents an integer of 1 or greater, and n and o each represents an integer of 0 or greater, provided that c+n+o is not greater than 4; A represents a trivalent aromatic cyclic group, alkyl group or aliphatic cyclic group, or a trivalent organic group having an aromatic cyclic group or an aliphatic cyclic group; and Z represents a group represented by a formula (z1). In the formula (z1), Y represents an alkylene group, a divalent aromatic hydrocarbon group or aliphatic cyclic group, or a divalent organic group having an aromatic hydrocarbon group or an aliphatic cyclic group; and R′ represents an acid dissociable, dissolution inhibiting group.

摘要翻译： 公开了可用于抗蚀剂组合物的化合物，包含该化合物的正型抗蚀剂组合物和形成抗蚀剂图案的方法。 具体公开的是由式（A-1）表示的化合物。 式（A-1）中，R 11〜R 17表示烷基或芳香族烃基， g和j各自表示1或更大的整数，并且k和q各自表示0或更大的整数，条件是g + j + k + q不大于5; b表示1或更大的整数，并且l和m各自表示0或更大的整数，条件是b + 1 + m不大于4; c表示1或更大的整数，并且n和o各自表示0或更大的整数，条件是c + n + o不大于4; A表示三价芳族环状基团，烷基或脂肪族环状基团，或具有芳香族环状基团或脂肪族环状基团的三价有机基团， Z表示由式（z1）表示的基团。 式（z1）中，Y表示亚烷基，二价芳香族烃基或脂肪族环状基团，或具有芳香族烃基或脂肪族环状基团的二价有机基团， 并且R'表示酸解离，溶解抑制基团。

公开(公告)号：US20090117488A1

公开(公告)日：2009-05-07

申请号：US11994602

申请日：2006-06-30

申请人： Takako Hirosaki ,  Daiju Shiono ,  Taku Hirayama ,  Hideo Hada

发明人： Takako Hirosaki ,  Daiju Shiono ,  Taku Hirayama ,  Hideo Hada

IPC分类号： G03F7/004 ,  C07C69/76 ,  G03F7/26

CPC分类号： G03F7/0397 ,  C07C67/343 ,  C07C69/712 ,  C07C2603/74 ,  G03F7/0045

摘要： The present invention provides a positive resist composition and a resist pattern forming method that are capable of forming a resist pattern with a reduced level of roughness. The positive resist composition includes the compound represented by the general formula (I) below. The present invention also provides the resist pattern forming method using the positive resist composition above. [wherein, in formula (I), R11 and R12 each represents, independently, an alkyl group of 1 to 10 carbon atoms or an aromatic hydrocarbon group, and may include a hetero atom in the structure thereof; R21 to R24 each represents, independently, a hydrogen atom or an acid dissociable, dissolution inhibiting group, and two of the R21 to R24 represents a hydrogen atom and the others represents an acid dissociable, dissolution inhibiting group; X is a group represented by general formulas (Ia) or (Ib) below].

摘要翻译： 本发明提供能够形成具有降低的粗糙度的抗蚀剂图案的正型抗蚀剂组合物和抗蚀剂图案形成方法。 正型抗蚀剂组合物包括由下述通式（I）表示的化合物。 本发明还提供了使用上述正型抗蚀剂组合物的抗蚀剂图案形成方法。 式（I）中，R 11和R 12分别独立地表示1〜10个碳原子的烷基或芳香族烃基，其结构中可以含有杂原子; R21〜R24各自独立地表示氢原子或酸解离的溶解抑制基团，R21〜R24中的两个表示氢原子，其余表示酸解离，溶解抑制基团。 X为下述通式（Ia）或（Ib）表示的基团。

公开(公告)号：US20090092921A1

公开(公告)日：2009-04-09

申请号：US11914451

申请日：2006-04-26

申请人： Takako Hirosaki ,  Daiju Shiono ,  Taku Hirayama

发明人： Takako Hirosaki ,  Daiju Shiono ,  Taku Hirayama

IPC分类号： G03F7/004 ,  G03F7/20

CPC分类号： G03F7/0392 ,  G03F7/0045 ,  G03F7/0397

摘要： A positive resist composition includes a base material component (A) which exhibits increased alkali solubility under an action of an acid, and an acid generator component (B) which generates an acid upon exposure, wherein the base material component (A) contains a compound (A1) in which phenolic hydroxyl groups in a polyhydric phenol compound (a) containing two or more phenolic hydroxyl groups and having a molecular weight of 300 to 2,500 are protected with acid dissociable, dissolution inhibiting groups, and the compound (A1) exhibits a standard deviation (sn) of the number of protective groups per molecule of less than 1, or exhibits a standard deviation (sp) of a protection ratio (mol %) per molecule of less than 16.7.

摘要翻译： 正型抗蚀剂组合物包括在酸作用下表现出增加的碱溶解性的基材组分（A）和暴露时产生酸的酸产生剂组分（B），其中所述基材组分（A）含有化合物 （A1），其中含有两个或多个酚羟基并且分子量为300〜2500的多元酚化合物（a）中的酚羟基被酸解离的溶解抑制基团保护，化合物（A1）表现出 每分子保护基团数目的标准偏差（sn）小于1，或每分子保护率（mol％）的标准偏差（sp）小于16.7。

公开(公告)号：US20090035691A1

公开(公告)日：2009-02-05

申请号：US11817012

申请日：2006-02-20

申请人： Daiju Shiono ,  Taku Hirayama ,  Hideo Hada

发明人： Daiju Shiono ,  Taku Hirayama ,  Hideo Hada

IPC分类号： G03F7/004 ,  G03F7/20 ,  C07C69/76 ,  C07C39/15

CPC分类号： G03F7/0397 ,  C07C69/712 ,  C07C2601/14 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0392 ,  Y10S430/106

摘要： A positive resist composition that includes a base material component (A) that contains an acid-dissociable, dissolution-inhibiting group and exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the base material component (A) contains a compound (A1), in which either a portion of, or all of, the hydrogen atoms of phenolic hydroxyl groups within a polyhydric phenol compound with a molecular weight of 300 to 2,500 represented by a general formula (I) shown below have been substituted with at least one group selected from the group consisting of acid-dissociable, dissolution-inhibiting groups represented by a general formula (II) shown below and acid-dissociable, dissolution-inhibiting groups represented by a general formula (III) shown below.

摘要翻译： 一种正性抗蚀剂组合物，其包含含有酸解离的溶解抑制基团并且在酸的作用下表现出增加的碱溶解性的基材成分（A）和暴露时产生酸的酸产生剂成分（B），其中 基材成分（A）含有化合物（A1），其中分子量为300〜2,500的多元酚化合物中的酚羟基的氢原子的一部分或全部由通式 下述的（I）所示的化合物被选自由下述通式（II）表示的酸解离性，溶解抑制基团和酸解离性，通式 式（III）如下所示。

公开(公告)号：US20080020288A1

公开(公告)日：2008-01-24

申请号：US11574805

申请日：2005-09-02

申请人： Taku Hirayama ,  Daiju Shiono ,  Hideo Hada

发明人： Taku Hirayama ,  Daiju Shiono ,  Hideo Hada

IPC分类号： G03C1/04 ,  G03C5/00

CPC分类号： G03F7/0392 ,  G03F7/0045 ,  G03F7/0048 ,  Y10S430/114

摘要： A resist composition that includes a base material component (A), which contains acid-dissociable, dissolution-inhibiting groups and exhibits increased alkali solubility under the action of acid, an acid generator component (B) that generates acid on exposure, and an organic solvent (C), in which the components (A) and (B) are dissolved in the organic solvent (C), wherein the base material component (A) contains a protected form (A1) of a polyhydric phenol compound (a) having two or more phenolic hydroxyl groups and a molecular weight within a range from 300 to 2,500, in which either a portion of, or all of, the phenolic hydroxyl groups are protected with acid-dissociable, dissolution-inhibiting groups, and the organic solvent (C) comprises an alcohol.

摘要翻译： 一种抗蚀剂组合物，其包含基质成分（A），其含有酸解离的溶解抑制基团，并且在酸的作用下显示出增加的碱溶解性，在曝光时产生酸的酸产生剂组分（B） 其中组分（A）和（B）溶解在有机溶剂（C）中的溶剂（C），其中基材组分（A）含有多元酚化合物（a）的保护形式（A1） 两个或更多个酚羟基和分子量在300-2,500的范围内，其中酚羟基的一部分或全部被酸解离的溶解抑制基团保护，并且有机溶剂（ C）包含醇。

公开(公告)号：US20070275328A1

公开(公告)日：2007-11-29

申请号：US11807042

申请日：2007-05-24

申请人： Daiju Shiono ,  Hideo Hada

发明人： Daiju Shiono ,  Hideo Hada

IPC分类号： G03F7/26

CPC分类号： G03F7/0045 ,  G03F7/0392

摘要： A decomposable composition including a compound (I) represented by general formula (I) shown below and a compound (II) represented by general formula (II) shown below: [wherein R1 represents a hydrogen atom, a halogen atom, an alkyl group or a halogenated alkyl group; and R2, R3 and R4 each independently represents a monovalent organic group.]

摘要翻译： 含有下述通式（I）表示的化合物（I）和下述通式（II）表示的化合物（II））的分解性组合物：[其中R 1表示氢原子， 卤素原子，烷基或卤代烷基; R 2，R 3和R 4各自独立地表示一价有机基团。