公开(公告)号：US20080106181A1

公开(公告)日：2008-05-08

申请号：US11299725

申请日：2005-12-13

申请人： Shinichi Kawate ,  Takeo Tsukamoto

发明人： Shinichi Kawate ,  Takeo Tsukamoto

IPC分类号： H01J63/04 ,  H01J1/02 ,  H01J1/62

CPC分类号： H01J9/025 ,  B01J23/44 ,  B01J23/63 ,  B01J23/89 ,  B01J23/8913 ,  B01J23/892 ,  B01J35/0013 ,  B01J37/347 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  C01B32/162 ,  D01F9/127 ,  D01F9/1273 ,  H01J2201/30469 ,  Y10S977/724 ,  Y10S977/749

摘要： A method of making an electron-emitting device has the steps of disposing a film containing metal on a substrate, arranging a plurality of catalytic particles on the film containing metal, and heat-treating the substrate on which the plurality of catalytic particles are arranged under circumstance including hydrocarbon gas and hydrogen to form a plurality of carbon fibers. Catalytic particles contain Pd and at least one element selected from the group consisting of Fe, Co, Ni, Y, Rh, Pt, La, Ce, Pr, Nd, Gd, Tb, Dy, Ho, Er and Lu, and 20˜80 atm % (atomic percentage) or more of the at least one element is contained in the catalytic particles relative to Pd.

摘要翻译： 制造电子发射器件的方法具有以下步骤：在基片上设置含有金属的膜，将多个催化剂颗粒排列在含有金属的膜上，并对其上排列有多个催化剂颗粒的基板进行热处理 包括烃气体和氢气以形成多个碳纤维。 催化剂颗粒含有Pd和选自Fe，Co，Ni，Y，Rh，Pt，La，Ce，Pr，Nd，Gd，Tb，Dy，Ho，Er和Lu中的至少一种元素， 相对于Pd，催化颗粒中含有80atm％（原子百分比）或更多的至少一种元素。

公开(公告)号：US07227311B2

公开(公告)日：2007-06-05

申请号：US09941780

申请日：2001-08-30

申请人： Takeo Tsukamoto

发明人： Takeo Tsukamoto

IPC分类号： G09G3/10

CPC分类号： B82Y10/00 ,  H01J1/304 ,  H01J2201/30469 ,  H01J2329/00

摘要： An electron-emitting device in which the specific capacitance and the drive voltage are reduced, and which is capable of obtaining a finer electron beam by controlling the trajectory of emitted electrons. An electron-emitting portion of an electron-emitting member is positioned between the height of a gate and the height of an anode. When the distance between the gate and a cathode is d; the potential difference at driving the device is V1; the distance between the anode and the substrate is H; and the potential difference between the anode and the cathode is V2, then the electric field E1=V1/d during driving is configured to be within the range from 1 to 50 times E2=V2/H.

摘要翻译： 比电容和驱动电压降低的电子发射器件，并且能够通过控制发射的电子的轨迹获得更细的电子束。 电子发射部件的电子发射部分位于栅极的高度和阳极的高度之间。 当栅极和阴极之间的距离为d时; 驱动器件的电位差为V 1; 阳极和衬底之间的距离为H; 并且阳极和阴极之间的电位差为V 2，则驱动期间的电场E 1 = V 1 / d被配置为在E 2 = V 2 / H的1至50倍的范围内。

公开(公告)号：US07176145B2

公开(公告)日：2007-02-13

申请号：US10763337

申请日：2004-01-26

申请人： Takeo Tsukamoto

发明人： Takeo Tsukamoto

IPC分类号： H01L21/31 ,  H01L21/469

CPC分类号： H01L21/31051

摘要： In forming a high density plasma oxide film, a projection shaped like the mesa, the peaked roof, the cone or the like is formed on an element formation region. This projection gives rise to a problem of producing a polishing scar when the CMD (Chemical Mechanical Polishing) with a ceria slurry is performed. A film having a polishing rate equivalent to the one of the high density plasma oxide film is formed on the high density plasma oxide film to reinforce a projection in the shape of a triangular prism, a cone or such, and, thereafter, the polishing is carried out, using a ceria slurry. In another method, after the first CMP polishing is performed, using a silica slurry containing grains of small particle size which make no aggregation, the second CMP polishing is performed, using a ceria slurry.

摘要翻译： 在形成高密度等离子体氧化物膜时，在元件形成区域上形成像台面一样的凸起，峰顶，锥体等。 当进行具有二氧化铈浆料的CMD（化学机械抛光）时，该投影产生产生抛光疤痕的问题。 在高密度等离子体氧化物膜上形成具有与高密度等离子体氧化物膜相当的抛光速率的膜，以加强呈三棱柱形，锥形等形状的突出部，然后将抛光 使用二氧化铈浆料进行。 在另一种方法中，在进行第一CMP抛光之后，使用含有不具有聚集性的小粒径颗粒的二氧化硅浆料，使用二氧化铈浆料进行第二次CMP抛光。

公开(公告)号：US07104859B2

公开(公告)日：2006-09-12

申请号：US10802854

申请日：2004-03-18

申请人： Takeo Tsukamoto ,  Shinichi Kawate ,  Kazunari Oyama ,  Takahiro Sato ,  Shin Kitamura ,  Kazuya Miyazaki ,  Takashi Iwaki ,  Akira Shimazu

发明人： Takeo Tsukamoto ,  Shinichi Kawate ,  Kazunari Oyama ,  Takahiro Sato ,  Shin Kitamura ,  Kazuya Miyazaki ,  Takashi Iwaki ,  Akira Shimazu

IPC分类号： H01J9/00

CPC分类号： B82Y30/00 ,  B82Y10/00 ,  B82Y40/00 ,  C01B32/162 ,  C23C16/0281 ,  C23C16/26 ,  D01F9/1275 ,  H01J2201/30469 ,  H01J2209/0223 ,  Y10T428/2913

摘要： In a method for manufacturing carbon fibers by means of a thermal CVD method through catalysts, the method capable of obtaining a uniform film thickness regardless of a growth position and a growth area on a substrate is provided. The substrate on which a catalyst layer is formed is disposed in a reaction container. An atmosphere in the reaction container is set to be a reduced pressure atmosphere including a carbon containing gas having a partial pressure of 10 Pa or less, and the substrate is heated in the atmosphere to grow carbon fibers on the catalyst layer.

摘要翻译： 在通过热CVD法通过催化剂制造碳纤维的方法中，提供了能够获得与基板上的生长位置和生长面积无关的均匀膜厚度的方法。 其上形成有催化剂层的基板设置在反应容器中。 将反应容器的气氛设定为包含分压为10Pa以下的含碳气体的减压气氛，在大气中加热基板，在催化剂层上生长碳纤维。

公开(公告)号：US20060199389A1

公开(公告)日：2006-09-07

申请号：US11366433

申请日：2006-03-03

申请人： Takeo Tsukamoto

发明人： Takeo Tsukamoto

IPC分类号： H01L21/302 ,  H01L21/31

CPC分类号： H01L21/76819 ,  H01L21/31053 ,  H01L21/31055

摘要： A method of manufacturing a semiconductor device according to the present invention, comprising the steps of: forming a first insulating film on a substrate that is provided with a structure; forming a second insulating film on the first insulating film; polishing at least the second insulating film; forming a third insulating film on the polished second insulating film; and etching a remaining film including at least the second insulating film or the third insulating film so that an exposed surface of the second insulating film and the third insulating film is parallel with a surface of the substrate.

摘要翻译： 根据本发明的制造半导体器件的方法，包括以下步骤：在具有结构的衬底上形成第一绝缘膜; 在所述第一绝缘膜上形成第二绝缘膜; 至少抛光第二绝缘膜; 在抛光的第二绝缘膜上形成第三绝缘膜; 并且蚀刻至少包括第二绝缘膜或第三绝缘膜的残留膜，使得第二绝缘膜和第三绝缘膜的暴露表面与基板的表面平行。

公开(公告)号：US07057336B2

公开(公告)日：2006-06-06

申请号：US10391573

申请日：2003-03-20

申请人： Fumio Kishi ,  Masato Yamanobe ,  Takeo Tsukamoto ,  Toshikazu Ohnishi ,  Keisuke Yamamoto ,  Sotomitsu Ikeda ,  Yasuhiro Hamamoto ,  Kazuya Miyazaki

发明人： Fumio Kishi ,  Masato Yamanobe ,  Takeo Tsukamoto ,  Toshikazu Ohnishi ,  Keisuke Yamamoto ,  Sotomitsu Ikeda ,  Yasuhiro Hamamoto ,  Kazuya Miyazaki

IPC分类号： H01J29/46

CPC分类号： H01J29/481 ,  H01J1/316 ,  H01J9/027 ,  H01J31/127 ,  H01J2201/3165 ,  H01J2329/00 ,  H01J2329/0489

摘要： An electron-emitting device comprises a pair of electrodes and an electroconductive film arranged between the electrodes and including an electron-emitting region carrying a graphite film. The graphite film shows, in a Raman spectroscopic analysis using a laser light source with a wavelength of 514.5 nm and a spot diameter of 1 μm, peaks of scattered light, of which 1) a peak (P2) located in the vicinity of 1,580 cm−1 is greater than a peak (P1) located in the vicinity of 1,335 cm−1 or 2) the half-width of a peak (P1) located in the vicinity of 1,335 cm−1 is not greater than 150 cm−1.

摘要翻译： 电子发射器件包括一对电极和布置在电极之间的导电膜，并且包括携带石墨膜的电子发射区域。 石墨膜在使用波长514.5nm的激光光源和光点直径为1μm的拉曼光谱分析中显示出散射光的峰值，其中1）位于1,580cm附近的峰（P2） ^{-1 大于位于1,335cm -1附近的峰（P1）或2）位于附近的峰（P1）的半峰宽 为1,335厘米-1以下不大于150厘米-1。}

公开(公告)号：US07012362B2

公开(公告)日：2006-03-14

申请号：US09940642

申请日：2001-08-29

申请人： Shinichi Kawate ,  Takeo Tsukamoto

发明人： Shinichi Kawate ,  Takeo Tsukamoto

IPC分类号： H01J1/62

CPC分类号： B82Y10/00 ,  H01J1/304 ,  H01J9/025 ,  H01J31/127 ,  H01J2201/30469 ,  Y10S977/842 ,  Y10S977/843 ,  Y10S977/939

摘要： Provided are electron-emitting devices, electron sources, and image-forming apparatus improved in electron emission efficiency and in convergence of trajectories of emitted electrons. An electron-emitting device has a first electrode and a second electrode placed in opposition to each other with a gap between first and second electrodes on a surface of a substrate, and a plurality of fibers electrically connected to the first electrode and containing carbon as a main component, and the fibers are placed on a surface of the first electrode facing the second electrode.

公开(公告)号：US20060009107A1

公开(公告)日：2006-01-12

申请号：US11021473

申请日：2004-12-23

申请人： Takeo Tsukamoto

发明人： Takeo Tsukamoto

IPC分类号： H01J9/00

CPC分类号： B82Y10/00 ,  H01J1/304 ,  H01J9/025 ,  H01J29/868 ,  H01J2201/30469 ,  H01J2329/00

摘要： A method of manufacturing an electron emission element, comprising forming common wire electrodes (signal lines) (4a, 4b) on a substrate (1) and forming electron emission units including fibrous material assemblies (6a, 6b) on the common wire electrodes (4a, 4b), respectively, for preventing abnormal discharge caused by an antistatic film (7) with no deterioration in characteristics of the electron emission element. The electrode forming is followed by forming resist patterns (40a, 40b) covering at least part of the common wire electrodes (4a, 4b) before the antistatic film is formed. Thereafter the resist patterns (40a, 40b) on the common wire electrodes (4a, 4b) are removed together with the antistatic film (7) before the electron emission unit is formed, so that the electron emission units made of the fibrous material assemblies (6a, 6b) are formed on the common wire electrodes (4a, 4b) from which the resist patterns (40a, 40b) have been removed.

摘要翻译： 一种制造电子发射元件的方法，包括在基底（1）上形成公共线电极（信号线）（4a，4b）并形成包括在共同的纤维材料组件（6a，6b）上的电子发射单元 用于防止由电子发射元件的特性劣化而导致的抗静电膜（7）引起的异常放电的线电极（4a，4b）。 在形成抗静电膜之前，电极形成之后形成覆盖至少一部分公共电极线（4a，4b）的抗蚀剂图案（40a，40b）。 此后，在形成电子发射单元之前，共同线电极（4a，4b）上的抗蚀剂图案（40a，4b）与抗静电膜（7）一起被去除，使得由 纤维材料组件（6a，6b）形成在去除了抗蚀剂图案（40a，40b）的公共线电极（4a，4b）上。

公开(公告)号：US06975338B2

公开(公告)日：2005-12-13

申请号：US10448029

申请日：2003-05-30

申请人： Shuji Hirai ,  Takeo Tsukamoto

发明人： Shuji Hirai ,  Takeo Tsukamoto

IPC分类号： G03G15/00 ,  B41J2/435

CPC分类号： G03G15/5058 ,  G03G2215/0119

摘要： An image quality detecting apparatus detects image quality based on a specified image pattern formed on an image carrier. This apparatus includes a light-emitting device that radiates a spotlight on the image carrier, a lens, a scanning unit that scans the image pattern with the spotlight, and a photoelectric conversion element that detects a quantity of light reflected from the image pattern and the image carrier or light transmitted through the image pattern and the image carrier during the scanning. The image quality is detected by setting a diameter of the spotlight at least in a scanning direction to the reciprocal number of a spatial frequency or smaller in which human eyesight is the most sensitive, for example, to 1000 μm or less.

摘要翻译： 图像质量检测装置基于形成在图像载体上的指定图像图案来检测图像质量。 该装置包括：在图像载体上照射聚光灯的发光装置，透镜，用聚光灯扫描图像图案的扫描单元和检测从图像图案反射的光量的光电转换元件， 在扫描期间通过图像图案和图像载体传输的图像载体或光。 通过将聚光灯的直径至少在扫描方向上设定为人眼最敏感的空间频率或更小的倒数，例如达到1000μm以下，来检测图像质量。

公开(公告)号：US20050032255A1

公开(公告)日：2005-02-10

申请号：US10942901

申请日：2004-09-17

申请人： Shin Kitamura ,  Takeo Tsukamoto

发明人： Shin Kitamura ,  Takeo Tsukamoto

IPC分类号： H01J1/30 ,  H01J1/304 ,  H01J9/02 ,  H01L21/00

CPC分类号： B82Y10/00 ,  H01J1/304 ,  H01J1/316 ,  H01J9/025 ,  H01J31/127 ,  H01J2201/30469

摘要： A method for producing a durable electron-emitting device having a uniform electron emission characteristic, an electron source, and an image-forming apparatus having a uniform display characteristic for a long period are provided. The method for producing an electron-emitting device according to the present invention includes the steps of: disposing a cathode electrode on a surface of a substrate; providing an electrode opposite the cathode electrode; disposing plural pieces of fiber containing carbon as a main component on the cathode electrode; and applying potential higher than potential applied to the cathode electrode under depressurized condition to an electrode opposite the cathode electrode.

摘要翻译： 提供一种制造具有均匀的电子发射特性的耐用的电子发射器件的方法，电子源和长时间具有均匀的显示特性的图像形成装置。 根据本发明的电子发射器件的制造方法包括以下步骤：将阴极设置在衬底的表面上; 提供与阴极相对的电极; 在所述阴极上设置多个含有碳的纤维作为主要成分; 并且在减压条件下将施加到阴极上的电位的电位施加到与阴极相对的电极。