公开(公告)号：US20130081278A1

公开(公告)日：2013-04-04

申请号：US13600490

申请日：2012-08-31

申请人： Hiroaki Shimizu ,  Tetsuro Hashiguchi

发明人： Hiroaki Shimizu ,  Tetsuro Hashiguchi

IPC分类号： B26B19/28

CPC分类号： B26B19/063

摘要： A hair remover comprises a main unit having a gripper, a head unit having a blade for removing hair, and a drive unit for driving said blade. The hair remover further comprises a rotating mechanical section and a rotating mechanical section. Said rotating mechanical section has a turn plate which is configured to rotate with respect to said main unit. Said main unit supports rotatably said head unit through said turn plate. Said swinging mechanical section is configured to swing said head unit with respect to said turn plate.

摘要翻译： 毛发去除器包括具有夹持器的主单元，具有用于去毛发的刀片的头单元和用于驱动所述刀片的驱动单元。 除毛器还包括旋转机械部分和旋转机械部分。 所述旋转机械部分具有相对于所述主单元旋转的转板。 所述主单元通过所述转板支撑所述头单元。 所述摆动机械部分构造成相对于所述转板摆动所述头单元。

公开(公告)号：US20130017500A1

公开(公告)日：2013-01-17

申请号：US13467549

申请日：2012-05-09

申请人： Jiro Yokoya ,  Tsuyoshi Nakamura ,  Hiroaki Shimizu ,  Masaru Takeshita ,  Hideto Nito ,  Hirokuni Saito

发明人： Jiro Yokoya ,  Tsuyoshi Nakamura ,  Hiroaki Shimizu ,  Masaru Takeshita ,  Hideto Nito ,  Hirokuni Saito

IPC分类号： G03F7/20

CPC分类号： G03F7/0045 ,  G03F7/0397 ,  G03F7/203 ,  G03F7/2041 ,  G03F7/26 ,  G03F7/38

摘要： A method of forming a resist pattern, including forming a resist film on a substrate using a resist composition comprising a base component that exhibits increased solubility in an alkali developing solution and a photo-base generator component; exposing the resist film; baking the exposed resist film, such that, at an exposed portion thereof, the base generated from the photo-base generator component upon the exposure and an acid provided to the resist film are neutralized, and at an unexposed portion of the resist film, the solubility of the base component in an alkali developing solution is increased by the acid provided to the resist film; and subjecting the resist film to alkali development, thereby forming a negative-tone resist pattern in which the unexposed portion of the resist film has been dissolved and removed.

摘要翻译： 一种形成抗蚀剂图案的方法，包括使用包含在碱性显影液中显示出增加的溶解度的基础成分的抗蚀剂组合物和光产生剂组分在基材上形成抗蚀剂膜; 曝光抗蚀膜; 烘烤曝光的抗蚀剂膜，使得在曝光部分，曝光时由光产生器部件产生的基底和提供给抗蚀剂膜的酸被中和，并且在抗蚀剂膜的未曝光部分， 碱性成分在碱性显影液中的溶解度通过提供于抗蚀剂膜的酸而增加; 并对抗蚀剂膜进行碱显影，从而形成抗蚀剂膜的未曝光部分已被溶解并除去的负色调抗蚀剂图案。

公开(公告)号：US08347508B2

公开(公告)日：2013-01-08

申请号：US12644696

申请日：2009-12-22

申请人： Hiroaki Shimizu ,  Hiroshi Shigeta ,  Shin Hosokawa ,  Jyuzaemon Iwasaki

发明人： Hiroaki Shimizu ,  Hiroshi Shigeta ,  Shin Hosokawa ,  Jyuzaemon Iwasaki

IPC分类号： B26B19/28 ,  B26B21/52

CPC分类号： B26B19/28 ,  B26B19/048

摘要： An electric shaver includes a rod-shaped body part, a head part, and a link mechanism. The head part projects from one end portion, in a longitudinal direction, of the body part and is swingably attached to the body part with a support base between the body part and the head part. The head part includes a shaving portion and a drive mechanism. The shaving portion is formed to be elongated in a direction orthogonal to a projecting direction of the head part and has paired blades configured to operate relative to each other. The drive mechanism is configured to drive at least one of the paired blades. The link mechanism includes two link arms each connected to the support base and the head part respectively at connecting axes parallel to a longitudinal direction of the shaving portion. The link mechanism is configured to support the head part on the support base swingably. The two link arms are disposed asymmetrically with respect to a straight line passing on a center of gravity of the head part and extending parallel with the projecting direction of the head part, when viewed in the longitudinal direction of the shaving portion.

摘要翻译： 电动剃须刀包括杆状主体部分，头部部分和连杆机构。 头部从身体部分的纵向方向的一个端部突出，并且在身体部分和头部之间具有支撑基座可摆动地附接到主体部分。 头部包括剃​​须部分和驱动机构。 剃须部形成为在与头部的突出方向正交的方向上伸长，并且具有被配置为相对于彼此操作的成对刀片。 所述驱动机构配置成驱动所述成对刀片中的至少一个。 连杆机构包括两个连杆臂，每个连杆臂分别在平行于剃须部分的纵向方向的连接轴线处分别连接到支撑基座和头部部分。 连杆机构构造为可摆动地支撑支撑基座上的头部。 两个连杆臂相对于通过头部的重心的直线不对称地设置，并且在沿着剃须部的纵向观察时与头部的突出方向平行地延伸。

公开(公告)号：US08252505B2

公开(公告)日：2012-08-28

申请号：US12371876

申请日：2009-02-16

申请人： Akiya Kawaue ,  Keita Ishiduka ,  Kensuke Matsuzawa ,  Yoshiyuki Utsumi ,  Hiroaki Shimizu

发明人： Akiya Kawaue ,  Keita Ishiduka ,  Kensuke Matsuzawa ,  Yoshiyuki Utsumi ,  Hiroaki Shimizu

IPC分类号： G03F7/004 ,  C07D493/08 ,  C07D495/08

CPC分类号： C07D493/08 ,  C07D493/18 ,  G03F7/0045 ,  G03F7/0397

摘要： A resist composition including a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the acid generator component (B) includes an acid generator (B1) consisting of a compound represented by general formula (b1-2) shown below: [Chemical Formula 1] A+Z−  (b1-2) wherein A+ represents an organic cation; and Z− represents an anionic cyclic group, wherein the cyclic group includes an ester linkage within the ring structure, two mutually different groups are bonded to the ring structure, one of these groups includes an ester linkage in which a carbon atom that constitutes part of the ester linkage is bonded directly to the ring structure, and the other group includes an anion moiety.

摘要翻译： 一种抗蚀剂组合物，其包含在酸性作用下在碱性显影液中表现出改变的溶解性的碱成分（A）和曝光时产生酸的酸产生剂成分（B），其中，所述酸发生剂成分（B）含有酸 [化学式1] A + Z-（b1-2）其中A +表示有机阳离子，由式（b1-2）表示的化合物组成的发生剂（B1） Z-表示阴离子性环状基团，其中环状基团在环结构中包含酯键，两个相互不同的基团与环结构键合，这些基团之一包括酯键，其中构成 酯键直接键合到环结构上，另一个基团包括阴离子部分。

公开(公告)号：US08068957B2

公开(公告)日：2011-11-29

申请号：US12069051

申请日：2008-02-07

申请人： Hiroaki Shimizu

发明人： Hiroaki Shimizu

IPC分类号： B60R22/00

CPC分类号： B60R1/00 ,  B60R2300/105 ,  B60R2300/301 ,  B60R2300/404 ,  B60R2300/70 ,  B60R2300/806 ,  B62D15/027

摘要： A vehicular backing operation assist apparatus is coupled with a movement direction demand unit for demanding a forward or backward movement of the vehicle and a change detection unit for detecting a change of a state of the vehicle taking place in association with a start-up of the vehicle. A reverse departure, which is a backing operation for exiting a parking state, is determined to be performed if a transit period from when the change of the state is detected to when the backward movement is demanded, is within a predetermined period. A reverse parking, which is a backing operation for entering a parking state, is performed, if the transit period is greater than or equal to the predetermined period. An assist control unit then provides an assist item for a backing operation relative to either the reverse departure or the reverse parking, which is determined to be performed.

摘要翻译： 车辆背衬操作辅助装置与用于要求车辆的向前或向后移动的移动方向要求单元联接，以及变化检测单元，用于检测与起动的车辆的状态的变化， 车辆。 如果从检测到状态的改变到需要向后移动的过渡时间在预定时间段内，则确定作为退出停车状态的后退操作的反向离开。 如果过渡期间大于或等于预定周期，则执行作为进入停车状态的后退操作的倒车停车。 然后，辅助控制单元提供相对于被确定要执行的反向离开或倒车停放的后台操作的辅助项目。

公开(公告)号：US20110241645A1

公开(公告)日：2011-10-06

申请号：US13040225

申请日：2011-03-03

申请人： Hiroaki Shimizu ,  Susumu Hoshino

发明人： Hiroaki Shimizu ,  Susumu Hoshino

IPC分类号： G05F3/02

CPC分类号： H01S5/0427 ,  H03K17/04123 ,  H03K17/122

摘要： A current source circuit has a voltage application terminal that is applied with a prescribed voltage; an output terminal that outputs the current; a first MOS transistor of which a source is connected to the voltage application terminal; a second MOS transistor of which a source is connected to a drain of the first MOS transistor and a drain is connected to the output terminal; a third MOS transistor of which a source is connected to the voltage application terminal; a fourth MOS transistor of which a source is connected to a drain of the third MOS transistor and a drain is connected to the output terminal. The current source circuit, in a state where the bias voltage is applied to the first input terminal such that the predetermined current flows into the first and fourth MOS transistors, controls turning ON/OFF of the second MOS transistor and the third MOS transistor so as to synchronize according to the switch voltage applied to the second input terminal.

摘要翻译： 电流源电路具有施加规定电压的施加电压端子; 输出电流的输出端子; 源极连接到电压施加端子的第一MOS晶体管; 源极连接到第一MOS晶体管的漏极并且漏极连接到输出端子的第二MOS晶体管; 第三MOS晶体管，其源极连接到电压施加端子; 第四MOS晶体管，其源极连接到第三MOS晶体管的漏极，漏极连接到输出端子。 电流源电路在将偏置电压施加到第一输入端子使得预定电流流入第一和第四MOS晶体管的状态下，控制第二MOS晶体管和第三MOS晶体管的导通/截止，以便 根据施加到第二输入端子的开关电压进行同步。

公开(公告)号：US07919651B2

公开(公告)日：2011-04-05

申请号：US12536779

申请日：2009-08-06

申请人： Daiju Shiono ,  Takahiro Dazai ,  Hiroaki Shimizu

发明人： Daiju Shiono ,  Takahiro Dazai ,  Hiroaki Shimizu

IPC分类号： C07C69/73 ,  C07C69/66

CPC分类号： G03F7/0397 ,  C07C69/73 ,  C07C2603/74 ,  C07D307/77 ,  C07D307/93 ,  C07D493/20 ,  C08F220/28 ,  Y10S430/106 ,  Y10S430/111

摘要： A compound represented by general formula (I) shown below; and a polymeric compound having a structural unit (a0) represented by general formula (a0-1) shown below: wherein R1 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; A represents a divalent hydrocarbon group of 2 or more carbon atoms which may have a substituent; B represents a divalent hydrocarbon group of 1 or more carbon atoms which may have a substituent; and R2 represents an acid dissociable, dissolution inhibiting group.

摘要翻译： 由下述通式（I）表示的化合物; 和具有如下所示的通式（a0-1）表示的结构单元（a0）的高分子化合物：其中R1表示氢原子，低级烷基或卤代低级烷基; A表示可以具有取代基的2个以上碳原子的二价烃基; B表示可以具有取代基的1个以上碳原子的二价烃基; R2代表酸解离，溶解抑制基团。

公开(公告)号：US20100233626A1

公开(公告)日：2010-09-16

申请号：US12721291

申请日：2010-03-10

申请人： Hiroaki Shimizu ,  Hideto Nito ,  Junichi Tsuchiya ,  Takahiro Dazai

发明人： Hiroaki Shimizu ,  Hideto Nito ,  Junichi Tsuchiya ,  Takahiro Dazai

IPC分类号： G03F7/027 ,  G03F7/20

CPC分类号： G03F7/2041 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

摘要： A positive resist composition including a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0-1) (R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R2 represents a divalent linking group, R3 represents a cyclic group containing —SO2— within the ring skeleton thereof) and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group, an acid-generator component (B) and a fluorine-containing polymeric compound (F1) having a structural unit containing a base dissociable group.

摘要翻译： 一种正性抗蚀剂组合物，其包含具有由通式（a0-1）表示的结构单元（a0）的聚合化合物（A1）（R表示氢原子，1〜5个碳原子的烷基或卤代烷基1 至5个碳原子，R 2表示二价连接基团，R 3表示在其环骨架中含有-SO 2 - 的环状基团）和衍生自含有酸解离，溶解抑制基团的酸的丙烯酸酯的结构单元（a1） - 发酵剂组分（B）和含有碱解离基团的结构单元的含氟聚合物（F1）。

公开(公告)号：US20100233623A1

公开(公告)日：2010-09-16

申请号：US12717785

申请日：2010-03-04

申请人： Tsuyoshi Kurosawa ,  Hiroaki Shimizu

发明人： Tsuyoshi Kurosawa ,  Hiroaki Shimizu

IPC分类号： G03F7/004 ,  G03F7/20

CPC分类号： G03F7/0046 ,  G03F7/0397

摘要： A positive resist composition including: a polymeric compound (A1) having a structural unit (a0) that contains a “cyclic group containing —SO2—” on the side chain terminal, and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group; an acid generator component (B); and a fluorine-containing resin component having a structural unit (f1) represented by general formula (f1-0): wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Q0 represents a single bond or a divalent linking group having a fluorine atom; and RX0 represents an acid dissociable, dissolution inhibiting group-containing group which may contain a fluorine atom, with the provision that at least one fluorine atom is contained in formula (f1-0).

摘要翻译： 一种正性抗蚀剂组合物，包括：具有在侧链末端含有“-SO 2 - ”的环状基团的结构单元（a0）的高分子化合物（A1）和来自含有 酸解离，溶解抑制组; 酸产生剂组分（B）; 和具有由通式（f1-0）表示的结构单元（f1））的含氟树脂组分：其中R表示氢原子，1至5个碳原子的烷基或1至5个碳的卤代烷基 原子 Q0表示单键或具有氟原子的二价连接基团; 并且RX0表示可含有氟原子的含酸解离性，溶解抑制基团的基团，其规定式（f1-0）中至少含有一个氟原子。

公开(公告)号：US07776510B2

公开(公告)日：2010-08-17

申请号：US12135680

申请日：2008-06-09

申请人： Takeshi Iwai ,  Hideo Hada ,  Keita Ishiduka ,  Akiya Kawaue ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Tsuyoshi Nakamura ,  Komei Hirahara ,  Yuichi Suzuki ,  Takehiro Seshimo

发明人： Takeshi Iwai ,  Hideo Hada ,  Keita Ishiduka ,  Akiya Kawaue ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Tsuyoshi Nakamura ,  Komei Hirahara ,  Yuichi Suzuki ,  Takehiro Seshimo

IPC分类号： G03F7/004 ,  G03F7/30 ,  C07C381/12

CPC分类号： C07C309/06 ,  C07C309/04 ,  C07C309/10 ,  C07C381/12 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0397 ,  Y10S430/111 ,  Y10S430/123

摘要： A compound represented by general formula (b-14); and acid generator consisting of the compound; and a resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-14): wherein R7″ to R9″ each independently represents an aryl group or an alkyl group, wherein two of R7″ to R9″ may be bonded to each other to form a ring with the sulfur atom, and at least one of R7″ to R9″ represents a substituted aryl group in which a portion or all of the hydrogen atoms are substituted with an alkoxyalkyloxy group or an alkoxycarbonylalkyloxy group; and X− represents an anion.

摘要翻译： 由通式（b-14）表示的化合物; 和由该化合物组成的酸发生剂; 以及抗蚀剂组合物，其包含在酸的作用下在碱性显影液中溶解度变化的碱成分（A）和暴露时产生酸的酸发生剂成分（B），所述酸发生剂成分（B）含有酸 由通式（b1-14）表示的化合物构成的发光体（B1）：其中，R7“〜R9”各自独立地表示芳基或烷基，其中，R7“〜R9”中的2个可以相互键合而成 与硫原子形成环，并且R 7“至R 9”中的至少一个表示其中一部分或全部氢原子被烷氧基烷氧基或烷氧基羰基烷氧基取代的取代芳基; X-表示阴离子。