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    INTERFACIAL POLYMERIZATION METHODS FOR MAKING FLUOROALCOHOL-CONTAINING POLYAMIDES
    61.
    发明申请
    INTERFACIAL POLYMERIZATION METHODS FOR MAKING FLUOROALCOHOL-CONTAINING POLYAMIDES 审中-公开
    用于制备含氟聚醇的界面聚合方法

    公开(公告)号：US20100216967A1

    公开(公告)日：2010-08-26

    申请号：US12390118

    申请日：2009-02-20

    申请人： Robert David Allen ,  Na Young-Hye ,  Ratnam Sooriyakumaran ,  Masaki Fujiwara ,  Kazuhiro Yamanaka

    发明人： Robert David Allen ,  Na Young-Hye ,  Ratnam Sooriyakumaran ,  Masaki Fujiwara ,  Kazuhiro Yamanaka

    IPC分类号： C08G69/42

    CPC分类号： C08G69/28 ,  B01D61/025 ,  B01D67/0006 ,  B01D69/125 ,  B01D71/56 ,  B01D2323/40

    摘要： A method including reacting a chemical mixture (A) and a chemical mixture (B) to form a polymeric compound, wherein where (A) and (B) are immiscible with each other, and wherein:(A) is an aqueous base comprising a monomeric polyamine reactant having one or more hexafluoroalcohol groups represented by Formula 1: wherein R0 represents an organic group selected from the group consisting of aliphatic, alicyclic, aromatic, heterocyclic groups and combinations thereof, m is an integer of 2 or more, and n is an integer of 1 or more,and(B) is organic and comprises a monomeric polyfunctional acyl halide reactant represented by Formula 2: R1COX)p   Formula 2 wherein R1 represents an organic group selected from the group containing aliphatic alicyclic, aromatic, heterocyclic groups and combinations thereof, X is selected from the group consisting of fluorine, chlorine, bromine and iodine, and p represents an integer of 2 or more.

    摘要翻译： 一种方法，包括使化学混合物（A）和化学混合物（B）反应以形成聚合化合物，其中（A）和（B）彼此不混溶，其中：（A）是包含 具有一个或多个由式1表示的六氟醇基团的单体多胺反应物：其中R 0表示选自脂族，脂环族，芳族，杂环基及其组合的有机基团，m为2以上的整数，n为 整数为1以上，（B）为有机物，且由式2表示的单体多官能酰基卤化物反应物：R 1 = CO 2）其中R 1表示选自脂族脂环族，芳香族，杂环基 基团及其组合，X选自氟，氯，溴和碘，p表示2以上的整数。

    Negative Resists Based on Acid-Catalyzed Elimination of Polar Molecules
    62.
    发明申请
    Negative Resists Based on Acid-Catalyzed Elimination of Polar Molecules 失效
    基于酸催化消除极性分子的消极抗性

    公开(公告)号：US20080233517A1

    公开(公告)日：2008-09-25

    申请号：US11924005

    申请日：2007-10-25

    申请人： Robert David Allen ,  Gregory Breyta ,  Phillip Joe Brock ,  Richard A. DiPietro ,  David R. Medeiros ,  Ratnam Sooriyakumaran

    发明人： Robert David Allen ,  Gregory Breyta ,  Phillip Joe Brock ,  Richard A. DiPietro ,  David R. Medeiros ,  Ratnam Sooriyakumaran

    IPC分类号： G03F7/004

    CPC分类号： G03F7/0046 ,  C08F220/24 ,  C08F222/06 ,  C08F232/08 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0395

    摘要： The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and solubility modulation. The first monomer provides an acid catalyzed polarity switch upon elimination of the polar functional group, whereas, the second monomer provides aqueous dissolution. The polymers of the present invention may be incorporated into negative resist compositions, which may also include photoacid generators, crosslinking agents, basic compounds, solvents, dissolution accelerators, photobase generators, latent basic compounds, surfactants, adhesion promoters, and anti-foaming agents.

    摘要翻译： 本发明提供了可用于负性抗蚀剂组合物的聚合物。 本发明的聚合物包含（1）具有极性官能团的第一单体; （2）第二单体; 和（3）赋予选自可交联官能团，耐蚀刻性和溶解度调制中的至少一种特性的第三单体。 第一单体在消除极性官能团时提供酸催化的极性开关，而第二单体提供水溶解。 本发明的聚合物可以并入负性抗蚀剂组合物，其还可以包括光酸产生剂，交联剂，碱性化合物，溶剂，溶解促进剂，光碱产生剂，潜碱性化合物，表面活性剂，粘合促进剂和消泡剂。

    Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions
    63.
    发明授权
    Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions 有权
    氟化倍半硅氧烷聚合物及其在平版光刻胶组合物中的应用

    公开(公告)号：US07261992B2

    公开(公告)日：2007-08-28

    申请号：US10079289

    申请日：2002-02-19

    申请人： Ratnam Sooriyakumaran ,  Robert David Allen ,  Debra Fenzel-Alexander

    发明人： Ratnam Sooriyakumaran ,  Robert David Allen ,  Debra Fenzel-Alexander

    IPC分类号： G03F7/038 ,  G03F7/30 ,  G03F7/11

    CPC分类号： G03F7/0757 ,  G03F7/0045 ,  G03F7/0046

    摘要： Fluorocarbinol- and/or fluoroacid-functionalized silsesquioxane polymers and copolymers are provided. The polymers are substantially transparent to ultraviolet radiation (UV), i.e., radiation of a wavelength less than 365 nm and are also substantially transparent to deep ultraviolet radiation (DUV), i.e., radiation of a wavelength less than 250 nm, including 157 nm, 193 nm and 248 nm radiation, and are thus useful in single and bilayer, positive and negative, lithographic photoresist compositions, providing improved sensitivity and resolution. A process for using the composition to generate resist images on a substrate is also provided, i.e., in the manufacture of integrated circuits or the like.

    摘要翻译： 提供氟代甲醇和/或氟酸官能化的倍半硅氧烷聚合物和共聚物。 聚合物对紫外线（UV）基本上是透明的，即波长小于365nm的辐射，并且对深紫外辐射（DUV）也是基本透明的，即波长小于250nm（包括157nm）的辐射， 193 nm和248 nm辐射，因此可用于单层和双层，正面和负面，平版印刷光刻胶组合物，提供更高的灵敏度和分辨率。 还提供了使用该组合物在衬底上产生抗蚀剂图像的方法，即在集成电路等的制造中。

    PHOTORESIST TOPCOAT FOR A PHOTOLITHOGRAPHIC PROCESS
    67.
    发明申请
    PHOTORESIST TOPCOAT FOR A PHOTOLITHOGRAPHIC PROCESS 有权
    用于光刻机工艺的光刻胶贴片

    公开(公告)号：US20090011377A1

    公开(公告)日：2009-01-08

    申请号：US12128129

    申请日：2008-05-28

    申请人： Robert David Allen ,  Ratnam Sooriyakumaran ,  Linda Karin Sundberg

    发明人： Robert David Allen ,  Ratnam Sooriyakumaran ,  Linda Karin Sundberg

    IPC分类号： G03F7/20

    CPC分类号： C08G77/04 ,  C08G77/045 ,  G03F7/0752 ,  G03F7/11 ,  G03F7/2041

    摘要： A method of forming an image using a topcoat composition. A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas TmR3 where m is equal to 8, 10 or 12 and QnMnR1,R2,R3 where n is equal to 8, 10 or 12 are provided. The functional groups include aqueous base soluble moieties. Mixtures of the functionalized polyhedral oligomeric silsesquioxanes derivatives are highly suitable as a topcoat for photoresist in photolithography and immersion photolithography applications.

    摘要翻译： 使用面漆组合物形成图像的方法。 提供了式TmR3的官能化多面体低聚倍半硅氧烷衍生物，其中m等于8,10或12，QnMnR1，R2，R3其中n等于8,10或12的组合物。 官能团包括碱水溶性部分。 官能化多面体低聚倍半硅氧烷衍生物的混合物非常适合用作光刻和浸没光刻应用中的光致抗蚀剂的顶涂层。

    Composite filtration membranes and methods of preparation thereof
    70.
    发明授权
    Composite filtration membranes and methods of preparation thereof 有权
    复合过滤膜及其制备方法

    公开(公告)号：US08727135B2

    公开(公告)日：2014-05-20

    申请号：US12873361

    申请日：2010-09-01

    申请人： Joy Cheng ,  Ratnam Sooriyakumaran ,  Ankit Vora

    发明人： Joy Cheng ,  Ratnam Sooriyakumaran ,  Ankit Vora

    IPC分类号： B01D39/00 ,  B01D39/14 ,  C08L75/00 ,  B01D67/00 ,  B05D5/00 ,  B29C44/04

    CPC分类号： B01D71/40 ,  B01D2325/48 ,  C08F8/00 ,  C08F220/14 ,  C08F220/20 ,  C08F220/28 ,  C08F2810/20

    摘要： A composition comprises a crosslinked poly(meth)acrylate comprising two or more poly(meth)acrylate backbones covalently linked to a bridging group, the backbones comprising i) respective first repeat units, each of which comprises a first side chain ester moiety comprising a hydrophilic poly(alkylene oxide) chain segment, ii) respective second repeat units, each of which comprises a second side chain ester moiety directly linked to the bridging group through a linking group selected from the group consisting of carbamate groups, urea groups, and thiocarbamate groups, and iii) respective third repeat units, each of which comprises a hydrophobic side chain moiety not directly linked to any bridging group. Composite filtration membranes having a selective layer that comprises the composition exhibit useful anti-fouling and/or salt rejection characteristics.

    摘要翻译： 共聚物包含共价连接到桥连基团的两个或多个聚（甲基）丙烯酸酯主链的交联的聚（甲基）丙烯酸酯，所述主链包含i）各自的第一重复单元，每个第一重复单元包含第一侧链酯部分，其包含亲水 聚（环氧烷）链段，ii）各自的第二重复单元，每个第二重复单元包含通过选自氨基甲酸酯基团，脲基团和硫代氨基甲酸酯基团的连接基团与桥连基团直接连接的第二侧链酯部分 ，和iii）各自的第三重复单元，其各自包含不直接连接到任何桥连基团的疏水侧链部分。 具有包含该组合物的选择层的复合过滤膜表现出有用的防污和/或拒盐特性。