摘要:
In a split gate type nonvolatile memory device and a method of fabricating the same. A supplementary layer pattern is disposed on a source region of a semiconductor substrate. Since the source region is vertically extended by virtue of the presence of the supplementary layer pattern, it is therefore possible to increase an area of a region where a floating gate overlaps the source region and the supplementary layer pattern. Accordingly, the capacitance of a capacitor formed between the source and the floating gate increases so that it is possible for the nonvolatile memory device to perform program/erase operations at a low voltage level.
摘要:
A method of forming a split-gate non-volatile memory cell can include forming first and second adjacent floating gates self-aligned to a field oxide region therebetween. An oxide layer is formed covering the first and second adjacent floating gates and the field oxide region, the oxide layer electrically isolates the first and second adjacent floating gates from one another. A control gate is formed on the oxide layer on the first and second adjacent floating gates. Related devices are also disclosed.
摘要:
The present invention discloses a remote controlling system for an electric device which can control operations of electric devices such as a washer and a dryer and display states thereof. The remote controlling system for the electric device includes one or more electric devices for communicating with a remote controlling device through a wireless communication network, transmitting state information to the remote controlling device according to a state request command from the remote controlling device, and controlling a predetermined operation according to an operation control command from the remote controlling device, and the remote controlling device supplied with power by a common power source, for transmitting the state request command to the electric device selected by the user, receiving the state information from the electric device, and displaying the state information, or transmitting the operation control command to the electric device.
摘要:
The present invention relates to a terbium borate-based yellow phosphor, a preparation method thereof, and a white semiconductor light emitting device incorporating the same. The terbium borate-based yellow phosphor of the present invention is represented by the general formula (Tb1-x-y-zREXAy)3DaBbO12:Cez (where, RE is at least one rare earth element selected from the group consisting of Y, Lu, Sc, La, Gd, Sm, Pr, Nd, Eu, Dy, Ho, Er, Tm and Yb; A is a typical metal element selected from the group consisting of Li, Na, K, Rb, Cs and Fr; D is a typical amphoteric element selected from the group consisting of Al, In and Ga; 0≦x
摘要翻译:本发明涉及一种硼酸铽基黄色荧光体及其制备方法以及包含该荧光体的白色半导体发光装置。 本发明的基于硼酸铋的黄色荧光体由通式(Tb 1-xy z)表示,其中N 其中,RE至少为C 1〜C 12 一种选自Y,Lu,Sc,La,Gd,Sm,Pr,Nd,Eu,Dy,Ho,Er,Tm和Yb的稀土元素; A是选自以下的典型金属元素: Li,Na,K,Rb,Cs和Fr; D是选自Al,In和Ga的典型两性元素; 0 <= x <0.5; 0 <= y <0.5; 0
摘要:
A fabrication method of a self-aligned ferroelectric gate transistor using a buffer layer of high etching selectivity is disclosed. A stacked structure is formed with a buffer layer with high etching selectivity inserted between a silicon substrate and a ferroelectric layer, and etching is performed on a portion where a source and a drain will be formed and then stopped at the buffer layer, thereby fabricating a self-aligned ferroelectric gate transistor without damage to the silicon thin film, and thus, an integration degree of a chip can be improved.
摘要:
In a local-length nitride SONOS device and a method for forming the same, a local-length nitride floating gate structure is provided for mitigating or preventing lateral electron migration in the nitride floating gate. The structure includes a thin gate oxide, which leads to devices having a lower threshold voltage. In addition, the local-length nitride layer is self-aligned, which prevents nitride misalignment, and therefore leads to reduced threshold voltage variation among the devices.
摘要:
The present invetion relates to a UV-cured multi-component polymer blend electrolyte, lithium secondary battery and their fabrication method, wherein the UV-cured multi-component polymer blend electrolyte, comprises: A) function-I polymer obtained by curing ethyleneglycoldi-(meth)acrylate oligomer of formula 1 by UV irradiation, CH2═CR1COO(CH2CH2O)nCOCR2═CH2 (1) wherein,R1 and R2 are independently a hydrogen or methyl group, and n is an integer of 3-20;B) function-II polymer selected from the group consisting of PAN-based polymer, PMMA-based polymer and mixtures thereof; C) function-III polymer selected from the group consisting of PVdF-based polymer, PVC-based polymer and mixtures thereof; and D) organic electrolyte solution in which lithium salt is dissolved in a solvent.
摘要:
In a local-length nitride SONOS device and a method for forming the same, a local-length nitride floating gate structure is provided for mitigating or preventing lateral electron migration in the nitride floating gate. The structure includes a thin gate oxide, which leads to devices having a lower threshold voltage. In addition, the local-length nitride layer is self-aligned, which prevents nitride misalignment, and therefore leads to reduced threshold voltage variation among the devices.
摘要:
A method and apparatus for reproducing a multimedia content are provided. The apparatus includes: a receiver which is configured to receive, through different paths, a first signal including a left-side image and a first synchronization information item, and a second signal including a right-side image and a second synchronization information item; and a signal processor which is configured to synchronize and reproduce the left-side image and the right-side image using the first synchronization information item and the second synchronization information item.
摘要:
In a method of manufacturing a semiconductor device, a split gate structure is formed on a cell region of a substrate including the cell region and a logic region. The logic region has a high voltage region, an ultra high voltage region and a low voltage region, and the split gate structure includes a first gate insulation layer pattern, a floating gate, a tunnel insulation layer pattern and a control gate. A spacer layer is formed on the split gate structure and the substrate. The spacer layer is etched to form a spacer on a sidewall of the split gate structure and a second gate insulation layer pattern on the ultra high voltage region of the substrate. A gate electrode is formed on each of the high voltage region of the substrate, the second gate insulation layer pattern, and the low voltage region of the substrate.