Abstract:
A semiconductor device including a nonvolatile memory element, the nonvolatile memory element, including: a first region, a second region formed adjacent to the first region, and a third region formed adjacent to the second region; the nonvolatile memory element further including a semiconductor layer, a separating insulation layer which is formed on the semiconductor layer and which demarcates a forming region of the nonvolatile memory element, a first diffusion layer which is formed on the semiconductor layer of the first region, a first source region and a first drain region formed on the first diffusion layer, a second diffusion layer which is separated from the first diffusion layer and which is formed on a periphery of the first diffusion layer and on the semiconductor layer of the second region, a second source region and a second drain region formed on the second diffusion layer, a third diffusion layer formed on the semiconductor layer of the third region, a first insulation layer formed above the semiconductor layer of the forming region of the nonvolatile memory element, and a first conductive layer formed above the first insulation layer.
Abstract:
A semiconductor device includes a semiconductor element that is set up on a semiconductor layer, a light shielding wall that is set up around the semiconductor element, a hole that is set up on the light shielding wall, and a wiring layer that is electrically connected to the semiconductor element and is drawn out through the hole to the outside of the light shielding wall. The wiring layer has a pattern including a first part that is located within the hole and a second part that is located on the outside of the hole and has a larger width compared to the width of the first part, the width of the second part being the same with or larger than the width of the hole.
Abstract:
Crystals of 5-[2-amino-4-(2-furyl)pyrimidin-5-yl]-1-methylpyridin-2(1H)-one having a diffraction peak at a diffraction angle (2θ±0.2°) of 9.7° and/or 21.9° in a powder X-ray diffraction are suitable for an active ingredient of a preventing and therapeutic agent for diseases such as constipation. Crystals of 5-[2-amino-4-(2-furyl)pyrimidin-5-yl]-1-methylpyridin-2(1H)-one hydrate and amorphous 5-[2-amino-4-(2-furyl)pyrimidin-5-yl]-1-methylpyridin-2(1H)-one hydrate are also suitable for an active ingredient of a preventing and therapeutic agent for diseases such as constipation.
Abstract:
The present invention relates to calcium bis[(2S)-3-[3-[(2S)-3-(4-chloro-2-cyanophenoxy)-2-fluoropropoxy]phenyl]-2-isopropoxypropionate] represented by formula (I), a hydrate thereof, a crystal of the compound of formula (I), and a crystal of the hydrate of the compound of formula (I) which are useful as pharmaceuticals, and to processes for producing the same, and intermediates therefore, and processes for production thereof.[Problem] There is need for (2S)-3-[3-[(2S)-3-(4-chloro-2-cyanophenoxy)-2-fluoropropoxy]phenyl]-2-isopropoxypropionic acid, in the form of a drug substance, purified so as to minimize a residual solvent content and having a uniformized specification and a highly favorable workability, and a process for producing the same. [Solution] Crystalline calcium bis[(2S)-3-[3-[(2S)-3-(4-chloro-2-cyanophenoxy)-2-fluoropropoxy]phenyl]-2-isopropoxypropionate], a calcium salt of (2S)-3-[3-[(2S)-3-(4-chloro-2-cyanophenoxy)-2-fluoropropoxy]phenyl]-2-isopropoxypropionic acid, solves the above problem. [Selected Drawing] None
Abstract:
The present invention relates to calcium bis[(2S)-3-[3-[(2S)-3-(4-chloro-2-cyanophenoxy)-2-fluoropropoxy]phenyl]-2-isopropoxypropionate] represented by formula (I), a hydrate thereof, a crystal of the compound of formula (I), and a crystal of the hydrate of the compound of formula (I) which are useful as pharmaceuticals, and to processes for producing the same, and intermediates therefore, and processes for production thereof. [Problem]There is need for (2S)-3-[3-[(2S)-3-(4-chloro-2-cyanophenoxy)-2-fluoropropoxy]phenyl]-2-isopropoxypropionic acid, in the form of a drug substance, purified so as to minimize a residual solvent content and having a uniformized specification and a highly favorable workability, and a process for producing the same. [Solution]Crystalline calcium bis[(2S)-3-[3-[(2S)-3-(4-chloro-2-cyanophenoxy)-2-fluoropropoxy]phenyl]-2-isopropoxypropionate], a calcium salt of (2S)-3-[3-[(2S)-3-(4-chloro-2-cyanophenoxy)-2-fluoropropoxy]phenyl]-2-isopropoxypropionic acid, solves the above problem. [Selected Drawing] None
Abstract:
To provide a nonvolatile semiconductor memory device in which a disturb voltage onto a non-selected memory cell in writing operation is lessened, a nonvolatile semiconductor memory device, includes: a memory cell array equipped with a plurality of memory cells, a plurality of word lines, a plurality of bit lines, and a plurality of source lines; a word line control circuit to control the plurality of word lines; and a line control circuit to control the plurality of bit lines and the plurality of source lines. Each of the plurality of memory cells is equipped with a gate electrode, a first impurity region, a second impurity region, and an electron trap region, which is positioned between the gate electrode and a substrate, and is formed at least at the first impurity region side of both the first impurity region and second impurity region. At the time when a writing operation is performed for a selected memory cell, the word line control circuit provides a selected word line connected to the selected memory cell with a selection voltage, provides a non-selected word line with a first mis-erasing prevention voltage, and provides a source line that is not connected to the selected memory cell with a second mis-erasing prevention voltage.
Abstract:
A semiconductor device includes a semiconductor element that is set up on a semiconductor layer, a light shielding wall that is set up around the semiconductor element, a hole that is set up on the light shielding wall, and a wiring layer that is electrically connected to the semiconductor element and is drawn out through the hole to the outside of the light shielding wall. The wiring layer has a pattern including a first part that is located within the hole and a second part that is located on the outside of the hole and has a larger width compared to the width of the first part, the width of the second part being the same with or larger than the width of the hole.
Abstract:
A semiconductor device of the present invention has memory cells. Each of the memory cells includes a word gate formed over a semiconductor substrate with a first gate insulating layer interposed therebetween, an impurity layer, and first and second control gates in a shape of sidewalls. Each of the first and second control gates has a rectangular or square cross-sectional shape.
Abstract:
A fabrication method of a semiconductor device which has on the same semiconductor layer a transistor with a different high voltage gate as well as a high voltage drain and an MNOS memory transistor.