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公开(公告)号:US10069065B2
公开(公告)日:2018-09-04
申请号:US14676233
申请日:2015-04-01
Applicant: Texas Instruments Incorporated
Inventor: Arup Polley , Archana Venugopal , Robert Reid Doering , Luigi Colombo
Abstract: Graphene Hall sensors, magnetic sensor systems and methods for sensing a magnetic field using an adjustable gate voltage to adapt the Hall sensor magnetic field sensitivity according to a control input for environmental or process compensation and/or real-time adaptation for balancing power consumption and minimum detectable field performance. The graphene Hall sensor gate voltage can be modulated and the sensor output signal can be demodulated to combat flicker or other low frequency noise. Also, graphene Hall sensors can be provided with capacitive coupled contacts for reliable low impedance AC coupling to instrumentation amplifiers or other circuits using integral capacitance.
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公开(公告)号:US10001529B2
公开(公告)日:2018-06-19
申请号:US14936631
申请日:2015-11-09
Applicant: Texas Instruments Incorporated
Inventor: Arup Polley , Archana Venugopal , Luigi Colombo , Robert R. Doering
CPC classification number: G01R33/07 , G01R33/0029 , G01R33/0041 , G01R33/075 , G01R33/1284 , H01L43/04 , H01L43/06 , H01L43/10
Abstract: A Graphene Hall sensor (GHS) is provided with a modulated gate bias signal in which the modulated gate bias signal alternates at a modulation frequency between a first voltage that produces a first conductivity state in the GHS and a second voltage that produces approximately a same second conductivity state in the GHS. A bias current is provided through a first axis of the GHS. A resultant output voltage signal is provided across a second axis of the Hall sensor that includes a modulated Hall voltage and an offset voltage, in which the Hall voltage is modulated at the modulation frequency. An amplitude of the Hall voltage that does not include the offset voltage is extracted from the resultant output voltage signal.
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公开(公告)号:US20180151463A1
公开(公告)日:2018-05-31
申请号:US15361390
申请日:2016-11-26
Applicant: Texas Instruments Incorporated
Inventor: Archana Venugopal , Benjamin Stassen Cook , Luigi Colombo , Robert Reid Doering
IPC: H01L23/367 , H01L23/522 , H01L23/373 , H01L21/768
Abstract: An integrated circuit has a thermal routing structure above a top interconnect level. The top interconnect level includes interconnects connected to lower interconnect levels, and does not include bond pads, probe pads, input/output pads, or a redistribution layer to bump bond pads. The thermal routing structure extends over a portion, but not all, of a plane of the integrated circuit containing the top interconnect level. The thermal routing structure includes a layer of nanoparticles in which adjacent nanoparticles are attached to each other. The layer of nanoparticles is free of an organic binder material. The thermal routing structure has a thermal conductivity higher than the metal in the top interconnect level. The layer of nanoparticles is formed by an additive process.
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公开(公告)号:US20240321677A1
公开(公告)日:2024-09-26
申请号:US18397476
申请日:2023-12-27
Applicant: Texas Instruments Incorporated
Inventor: Jingjing Chen , Archana Venugopal
IPC: H01L23/38 , H01L23/532 , H01L29/78
CPC classification number: H01L23/38 , H01L23/53209 , H01L29/7824
Abstract: Semiconductor devices including thermoelectric coolers and method of operating the semiconductor devices are described. A semiconductor device includes an SOI substrate with one or more components (e.g., a transistor) generating heat during operation. The semiconductor device includes a thermoelectric cooler surrounding the transistor. The thermoelectric cooler includes a first electrode laterally surrounding the transistor, a holey silicon region laterally surrounding and contacting the first electrode, and a second electrode laterally surrounding and contacting the holey silicon region. The thermoelectric cooler, when activated, can reduce operating temperature of the transistor. In some cases, pre-cooling may be done to further reduce the operating temperature.
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公开(公告)号:US11355414B2
公开(公告)日:2022-06-07
申请号:US16586720
申请日:2019-09-27
Applicant: Texas Instruments Incorporated
Inventor: Benjamin Stassen Cook , Nazila Dadvand , Daniel Lee Revier , Archana Venugopal
IPC: H01L23/373 , H01L23/00 , H01L23/498 , H01L21/48 , H01L21/285
Abstract: In described examples, a circuit (e.g., an integrated circuit) includes a semiconductor substrate that includes a frontside surface and a backside surface. A circuit element is included at the frontside surface. An optional electrical insulator layer can be included adjacent to the backside surface. A distributor layer is included adjacent to the backside surface. In some examples, the distributor layer includes a distributor material that includes a matrix of cohered nanoparticles and metallic particles embedded by the cohered nanoparticles.
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公开(公告)号:US11309388B2
公开(公告)日:2022-04-19
申请号:US16995563
申请日:2020-08-17
Applicant: Texas Instruments Incorporated
Inventor: Benjamin Stassen Cook , Luigi Colombo , Nazila Dadvand , Archana Venugopal
IPC: H01L29/15 , H01L29/16 , H01L29/423 , H01L29/808 , H01L29/66
Abstract: A switchable array includes: a microstructure of interconnected units formed of graphene tubes with open spaces in the microstructure bounded by the graphene tubes; at least one JFET gate in at least one of the graphene tubes; and a control line having an end connected to the at least one JFET gate. The control line extends to a periphery of the microstructure.
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公开(公告)号:US11145598B2
公开(公告)日:2021-10-12
申请号:US16236042
申请日:2018-12-28
Applicant: TEXAS INSTRUMENTS INCORPORATED
Inventor: Benjamin Stassen Cook , Nazila Dadvand , Archana Venugopal , Luigi Colombo
IPC: H01L23/528 , H01L21/768 , H01L23/532
Abstract: An interconnect structure for a semiconductor device includes a plurality of unit cells. Each unit cell is formed of interconnected conducting segments. The plurality of unit cells forms a conducting lattice.
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公开(公告)号:US11081593B2
公开(公告)日:2021-08-03
申请号:US16661758
申请日:2019-10-23
Applicant: Texas Instruments Incorporated
Inventor: Archana Venugopal , Luigi Colombo
IPC: H01L29/786 , H01L29/66 , H01L21/02 , H01L29/20 , H01L29/267 , H01L29/49 , H01L29/45 , H01L29/16 , H01L29/778
Abstract: A microelectronic device includes a gated graphene component. The gated graphene component has a graphitic layer containing one or more layers of graphene. The graphitic layer has a channel region, a first contact region adjacent to the channel region and a second contact region adjacent to the channel region. A patterned hexagonal boron nitride (hBN) layer is disposed on the graphitic layer above the channel region. A gate is located over the patterned hBN layer above the channel region. A first connection is disposed on the graphitic layer in the first contact region, and a second connection is disposed on the graphitic layer in the second contact region. The patterned hBN layer does not extend completely under the first connection or under the second connection. A method of forming the gated graphene component in the microelectronic device is disclosed.
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公开(公告)号:US20210098331A1
公开(公告)日:2021-04-01
申请号:US16586720
申请日:2019-09-27
Applicant: Texas Instruments Incorporated
Inventor: Benjamin Stassen Cook , Nazila Dadvand , Daniel Lee Revier , Archana Venugopal
IPC: H01L23/373 , H01L23/00 , H01L23/498 , H01L21/48 , H01L21/285
Abstract: In described examples, a circuit (e.g., an integrated circuit) includes a semiconductor substrate that includes a frontside surface and a backside surface. A circuit element is included at the frontside surface. An optional electrical insulator layer can be included adjacent to the backside surface. A distributor layer is included adjacent to the backside surface. In some examples, the distributor layer includes a distributor material that includes a matrix of cohered nanoparticles and metallic particles embedded by the cohered nanoparticles.
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公开(公告)号:US10861763B2
公开(公告)日:2020-12-08
申请号:US15361397
申请日:2016-11-26
Applicant: Texas Instruments Incorporated
Inventor: Benjamin Stassen Cook , Archana Venugopal , Luigi Colombo , Robert Reid Doering
IPC: H01L23/34 , H01L23/495 , H01L23/48 , H01L23/52 , H01L23/367 , H01L27/02 , H01L21/3205 , H01L21/324 , H01L21/768 , H01L23/373 , H01L23/522 , H01L23/528 , H01L23/532 , H01L21/74
Abstract: An integrated circuit has a substrate which includes a semiconductor material, and an interconnect region disposed on the substrate. The integrated circuit includes a thermal routing trench in the substrate. The thermal routing trench includes a cohered nanoparticle film in which adjacent nanoparticles are cohered to each other. The thermal routing trench has a thermal conductivity higher than the semiconductor material contacting the thermal routing trench. The cohered nanoparticle film is formed by an additive process.
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