Magnetic element with improved out-of-plane anisotropy for spintronic applications
    61.
    发明申请
    Magnetic element with improved out-of-plane anisotropy for spintronic applications 有权
    具有改进的自旋电子应用的面外各向异性的磁性元件

    公开(公告)号:US20120205758A1

    公开(公告)日:2012-08-16

    申请号:US12931866

    申请日:2011-02-11

    IPC分类号: H01L29/82 H01L21/8246

    摘要: A magnetic element is disclosed wherein first and second interfaces of a free layer with a Hk enhancing layer and tunnel barrier, respectively, produce enhanced surface perpendicular anisotropy to lower switching current or increase thermal stability in a magnetic tunnel junction (MTJ). In a MTJ with a bottom spin valve configuration where the Hk enhancing layer is an oxide, the capping layer contacting the Hk enhancing layer is selected to have a free energy of oxide formation substantially greater than that of the oxide. The free layer may be a single layer or composite comprised of an Fe rich alloy such as Co20Fe60B20. With a thin free layer, the interfacial perpendicular anisotropy may dominate the shape anisotropy to generate a magnetization perpendicular to the planes of the layers. The magnetic element may be part of a spintronic device or serve as a propagation medium in a domain wall motion device.

    摘要翻译: 公开了一种磁性元件,其中具有Hk增强层和隧道势垒的自由层的第一和第二界面分别产生增强的表面垂直各向异性以降低开关电流或增加磁性隧道结(MTJ)中的热稳定性。 在具有底部自旋阀结构的MTJ中,其中Hk增强层是氧化物,选择与Hk增强层接触的覆盖层,以使氧化物形成的自由能基本上大于氧化物的自由能。 自由层可以是由富含Fe的合金如Co20Fe60B20组成的单层或复合材料。 利用薄的自由层,界面垂直各向异性可以支配形状各向异性以产生垂直于层的平面的磁化。 磁性元件可以是自旋电子器件的一部分或用作域壁运动装置中的传播介质。

    Underlayer for high amplitude spin valve sensors
    62.
    发明授权
    Underlayer for high amplitude spin valve sensors 有权
    用于高振幅自旋阀传感器的底层

    公开(公告)号:US06954342B2

    公开(公告)日:2005-10-11

    申请号:US09846707

    申请日:2001-04-30

    摘要: A spin valve sensor system and a method for fabricating the same are provided. Such spin valve sensor includes a pinned layer having a pinned layer magnetization. Also included is a free layer disposed adjacent the pinned layer. The free layer has a free layer magnetization perpendicular to the pinned layer magnetization in the absence of an external field. A pinning layer is disposed adjacent the pinned layer for fixing the pinned layer magnetization. Further included is an underlayer disposed adjacent the pinning layer. Such underlayer comprises NiFeX. Disposed adjacent the underlayer and the pinning layer is an upper layer. The upper layer comprises a material selected from the group consisting of NiFe and CoFe for increasing a GMR ratio associated with the SV sensor.

    摘要翻译: 提供一种自旋阀传感器系统及其制造方法。 这种自旋阀传感器包括具有钉扎层磁化的钉扎层。 还包括邻近被钉扎层设置的自由层。 自由层在没有外部场的情况下具有垂直于被钉扎层磁化的自由层的磁化。 钉扎层邻近被钉扎层设置以固定被钉扎层的磁化。 还包括设置在钉扎层附近的底层。 这种底层包括NiFeX。 邻近下层设置并且钉扎层是上层。 上层包括选自NiFe和CoFe的材料,用于增加与SV传感器相关联的GMR比。

    Spin valve magnetic properties with oxygen-rich NiO underlayer
    64.
    发明授权
    Spin valve magnetic properties with oxygen-rich NiO underlayer 失效
    自旋阀磁性能与富氧NiO底层

    公开(公告)号:US06867951B1

    公开(公告)日:2005-03-15

    申请号:US09614945

    申请日:2000-07-12

    申请人: Witold Kula

    发明人: Witold Kula

    IPC分类号: G11B5/39

    CPC分类号: G11B5/3903

    摘要: In a spin valve, an underlayer is made of oxygen-rich nickel oxide to enhance the giant magnetoresistive ratio (ΔR/R). The oxygen-rich nickel oxide film is made using reactive sputtering of a nickel target in an oxygen-rich sputtering atmosphere consisting substantially of pure oxygen and argon gases. The total pressure of the oxygen-rich atmosphere is reduced during the oxygen-rich nickel oxide film formation to additionally enhance the ΔR/R value. A spin valve including two adjacent oxygen-rich nickel oxide underlayers provides a higher ΔR/R ratio at a given pinning strength Hua than does a spin valve having only one oxygen-rich nickel oxide underlayer.

    摘要翻译: 在自旋阀中,底层由富氧氧化镍制成,以增强巨磁阻比(DeltaR / R)。 富氧镍氧化物膜是使用基于纯氧和氩气组成的富氧溅射气氛中的镍靶的反应溅射制成的。 在富氧氧化镍膜形成期间,富氧气氛的总压降低,以增加ΔR/ R值。 包括两个相邻的富氧氧化镍底层的自旋阀在给定的钉扎强度华氏度下提供比仅具有一个富氧氧化镍底层的自旋阀更高的ΔR/ R比。

    Magnetic element with improved out-of-plane anisotropy for spintronic applications
    65.
    发明授权
    Magnetic element with improved out-of-plane anisotropy for spintronic applications 有权
    具有改进的自旋电子应用的面外各向异性的磁性元件

    公开(公告)号:US09006704B2

    公开(公告)日:2015-04-14

    申请号:US12931866

    申请日:2011-02-11

    摘要: A magnetic element is disclosed wherein first and second interfaces of a free layer with a Hk enhancing layer and tunnel barrier, respectively, produce enhanced surface perpendicular anisotropy to lower switching current or increase thermal stability in a magnetic tunnel junction (MTJ). In a MTJ with a bottom spin valve configuration where the Hk enhancing layer is an oxide, the capping layer contacting the Hk enhancing layer is selected to have a free energy of oxide formation substantially greater than that of the oxide. The free layer may be a single layer or composite comprised of an Fe rich alloy such as Co20Fe60B20. With a thin free layer, the interfacial perpendicular anisotropy may dominate the shape anisotropy to generate a magnetization perpendicular to the planes of the layers. The magnetic element may be part of a spintronic device or serve as a propagation medium in a domain wall motion device.

    摘要翻译: 公开了一种磁性元件,其中具有Hk增强层和隧道势垒的自由层的第一和第二界面分别产生增强的表面垂直各向异性以降低开关电流或增加磁性隧道结(MTJ)中的热稳定性。 在具有底部自旋阀结构的MTJ中,其中Hk增强层是氧化物,选择与Hk增强层接触的覆盖层,以使氧化物形成的自由能基本上大于氧化物的自由能。 自由层可以是由富含Fe的合金如Co20Fe60B20组成的单层或复合材料。 利用薄的自由层,界面垂直各向异性可以支配形状各向异性以产生垂直于层的平面的磁化。 磁性元件可以是自旋电子器件的一部分或用作域壁运动装置中的传播介质。

    Memory cells, semiconductor device structures, memory systems, and methods of fabrication
    67.
    发明授权
    Memory cells, semiconductor device structures, memory systems, and methods of fabrication 有权
    存储单元,半导体器件结构,存储器系统和制造方法

    公开(公告)号:US08923038B2

    公开(公告)日:2014-12-30

    申请号:US13527173

    申请日:2012-06-19

    IPC分类号: G11C11/15 G11C11/00 H01L29/82

    摘要: Methods of forming magnetic memory cells are disclosed. Magnetic and non-magnetic materials are formed into a primal precursor structure in an initial stress state of essentially no strain, compressive strain, or tensile strain. A stress-compensating material, e.g., a non-sacrificial, conductive material, is formed to be disposed on the primal precursor structure to form a stress-compensated precursor structure in a net beneficial stress state. Thereafter, the stress-compensated precursor structure may be patterned to form a cell core of a memory cell. The net beneficial stress state of the stress-compensated precursor structure lends to formation of one or more magnetic regions, in the cell core, exhibiting a vertical magnetic orientation without deteriorating a magnetic strength of the one or more magnetic regions. Also disclosed are memory cells, memory cell structures, semiconductor device structures, and spin torque transfer magnetic random access memory (STT-MRAM) systems.

    摘要翻译: 公开了形成磁存储器单元的方法。 磁性和非磁性材料在基本上没有应变,压缩应变或拉伸应变的初始应力状态下形成原始前体结构。 形成应力补偿材料,例如非牺牲导电材料,以设置在原始前体结构上以在净有益应力状态下形成应力补偿前体结构。 此后,应力补偿前体结构可以被图案化以形成存储单元的单元芯。 应力补偿前体结构的净有益应力状态有助于在电池芯中形成一个或多个磁性区域,呈现垂直磁性取向而不会使一个或多个磁性区域的磁强度恶化。 还公开了存储器单元,存储单元结构,半导体器件结构和自旋转矩传递磁随机存取存储器(STT-MRAM)系统。

    Storage element for STT MRAM applications
    68.
    发明授权
    Storage element for STT MRAM applications 有权
    STT MRAM应用的存储元件

    公开(公告)号:US08921961B2

    公开(公告)日:2014-12-30

    申请号:US13617432

    申请日:2012-09-14

    IPC分类号: H01L29/82 H01L21/02 H01L21/00

    摘要: An improved PMA STT MTJ storage element, and a method for forming it, are described. By inserting a suitable oxide layer between the storage and cap layers, improved PMA properties are obtained, increasing the potential for a larger Eb/kT thermal factor as well as a larger MR. Another important advantage is better compatibility with high processing temperatures, potentially facilitating integration with CMOS.

    摘要翻译: 描述了改进的PMA STT MTJ存储元件及其形成方法。 通过在存储层和盖层之间插入合适的氧化物层,获得改进的PMA性质,增加更大的Eb / kT热因子的可能性以及较大的MR。 另一个重要的优点是更好的与高处理温度的兼容性,有可能促进与CMOS的集成。

    Co/Ni Multilayers with Improved Out-of-Plane Anisotropy for Magnetic Device Applications
    69.
    发明申请
    Co/Ni Multilayers with Improved Out-of-Plane Anisotropy for Magnetic Device Applications 有权
    具有改进的磁性器件应用的平面各向异性的Co / Ni多层

    公开(公告)号:US20140017820A1

    公开(公告)日:2014-01-16

    申请号:US14032599

    申请日:2013-09-20

    IPC分类号: H01L43/12

    摘要: A method for forming a MTJ in a spintronic device is disclosed and includes a thin seed layer that enhances perpendicular magnetic anisotropy (PMA) in an overlying laminated layer with a (Co/Ni)n composition. The seed layer is preferably NiCr, NiFeCr, Hf, or a composite thereof. Furthermore, a magnetic layer such as CoFeB may be formed between the laminated layer and a tunnel barrier layer to serve as a transitional layer between a (111) laminate and (100) MgO tunnel barrier. There may be a Ta insertion layer between the CoFeB layer and laminated layer to promote (100) crystallization in the CoFeB layer. The laminated layer may be used as a reference layer, dipole layer, or free layer in a MTJ. Annealing between 300° C. and 400° C. may be used to further enhance PMA in the laminated layer.

    摘要翻译: 公开了一种用于在自旋电子器件中形成MTJ的方法,并且包括在(Co / Ni)n组成的上覆层压层中增强垂直磁各向异性(PMA)的薄籽晶层。 种子层优选为NiCr,NiFeCr,Hf或其复合物。 此外,可以在层压层和隧道势垒层之间形成诸如CoFeB的磁性层,以用作(111)层压体和(100)MgO隧道势垒之间的过渡层。 在CoFeB层和层叠层之间可以存在Ta插入层,以促进CoFeB层中的(100)结晶。 叠层可以用作MTJ中的参考层,偶极子层或自由层。 在300℃和400℃之间的退火可用于进一步增强层压层中的PMA。

    MEMORY CELLS, SEMICONDUCTOR DEVICE STRUCTURES, MEMORY SYSTEMS, AND METHODS OF FABRICATION
    70.
    发明申请
    MEMORY CELLS, SEMICONDUCTOR DEVICE STRUCTURES, MEMORY SYSTEMS, AND METHODS OF FABRICATION 有权
    存储器单元,半导体器件结构,存储器系统和制造方法

    公开(公告)号:US20130334630A1

    公开(公告)日:2013-12-19

    申请号:US13527173

    申请日:2012-06-19

    IPC分类号: H01L29/82 H01L21/8246

    摘要: Methods of forming magnetic memory cells are disclosed. Magnetic and non-magnetic materials are formed into a primal precursor structure in an initial stress state of essentially no strain, compressive strain, or tensile strain. A stress-compensating material, e.g., a non-sacrificial, conductive material, is formed to be disposed on the primal precursor structure to form a stress-compensated precursor structure in a net beneficial stress state. Thereafter, the stress-compensated precursor structure may be patterned to form a cell core of a memory cell. The net beneficial stress state of the stress-compensated precursor structure lends to formation of one or more magnetic regions, in the cell core, exhibiting a vertical magnetic orientation without deteriorating a magnetic strength of the one or more magnetic regions. Also disclosed are memory cells, memory cell structures, semiconductor device structures, and spin torque transfer magnetic random access memory (STT-MRAM) systems.

    摘要翻译: 公开了形成磁存储器单元的方法。 磁性和非磁性材料在基本上没有应变,压缩应变或拉伸应变的初始应力状态下形成原始前体结构。 形成应力补偿材料,例如非牺牲导电材料,以设置在原始前体结构上以在净有益应力状态下形成应力补偿前体结构。 此后,应力补偿前体结构可以被图案化以形成存储单元的单元芯。 应力补偿前体结构的净有益应力状态有助于在电池芯中形成一个或多个磁性区域,呈现垂直磁性取向而不会使一个或多个磁性区域的磁强度恶化。 还公开了存储器单元,存储单元结构,半导体器件结构和自旋转矩传递磁随机存取存储器(STT-MRAM)系统。