Multilayers Having Reduced Perpendicular Demagnetizing Field Using Moment Dilution for Spintronic Applications
    1.
    发明申请
    Multilayers Having Reduced Perpendicular Demagnetizing Field Using Moment Dilution for Spintronic Applications 审中-公开
    具有减少垂直退磁场的多层使用瞬时应用的瞬间稀释

    公开(公告)号:US20140035074A1

    公开(公告)日:2014-02-06

    申请号:US14047130

    申请日:2013-10-07

    IPC分类号: H01L43/02 H01L43/12

    摘要: A magnetic element is disclosed that has a composite free layer with a FM1/moment diluting/FM2 configuration wherein FM1 and FM2 are magnetic layers made of one or more of Co, Fe, Ni, and B and the moment diluting layer is used to reduce the perpendicular demagnetizing field. As a result, lower resistance x area product and higher thermal stability are realized when perpendicular surface anisotropy dominates shape anisotropy to give a magnetization perpendicular to the planes of the FM1, FM2 layers. The moment diluting layer may be a non-magnetic metal like Ta or a CoFe alloy with a doped non-magnetic metal. A perpendicular Hk enhancing layer interfaces with the FM2 layer and may be an oxide to increase the perpendicular anisotropy field in the FM2 layer. A method for forming the magnetic element is also provided.

    摘要翻译: 公开了具有FM1 /力矩稀释/ FM2配置的复合自由层的磁性元件,其中FM1和FM2是由Co,Fe,Ni和B中的一种或多种构成的磁性层,并且力矩稀释层用于减少 垂直退磁场。 结果,当垂直表面各向异性支配形状各向异性以产生垂直于FM1,FM2层的平面的磁化时,实现较低的电阻x面积乘积和较高的热稳定性。 瞬时稀释层可以是非磁性金属如Ta或具有掺杂的非磁性金属的CoFe合金。 垂直的Hk增强层与FM2层接合,并且可以是氧化物以增加FM2层中的垂直各向异性场。 还提供了形成磁性元件的方法。

    Co/Ni Multilayers with Improved Out-of-Plane Anisotropy for Magnetic Device Applications
    2.
    发明申请
    Co/Ni Multilayers with Improved Out-of-Plane Anisotropy for Magnetic Device Applications 有权
    具有改进的磁性器件应用的平面各向异性的Co / Ni多层

    公开(公告)号:US20140015079A1

    公开(公告)日:2014-01-16

    申请号:US14032593

    申请日:2013-09-20

    IPC分类号: H01L43/10

    摘要: A MTJ for a spintronic device is disclosed and includes a thin seed layer that enhances perpendicular magnetic anisotropy (PMA) in an overlying laminated layer with a (Co/Ni)n composition or the like where n is from 2 to 30. The seed layer is preferably NiCr, NiFeCr, Hf, or a composite thereof with a thickness from 10 to 100 Angstroms. Furthermore, a magnetic layer such as CoFeB may be formed between the laminated layer and a tunnel barrier layer to serve as a transitional layer between a (111) laminate and (100) MgO tunnel barrier. There may be a Ta insertion layer between the CoFeB layer and laminated layer to promote (100) crystallization in the CoFeB layer. The laminated layer may be used as a reference layer, dipole layer, or free layer in a MTJ. Annealing between 300° C. and 400° C. may be used to further enhance PMA in the laminated layer.

    摘要翻译: 公开了一种用于自旋电子器件的MTJ,并且包括薄层种子层,其通过(Co / Ni)n组合物等在上层叠层中提高垂直磁各向异性(PMA),其中n为2至30.种子层 优选为NiCr,NiFeCr,Hf,或其复合物,厚度为10〜100埃。 此外,可以在层压层和隧道势垒层之间形成诸如CoFeB的磁性层,以用作(111)层压体和(100)MgO隧道势垒之间的过渡层。 在CoFeB层和层叠层之间可以存在Ta插入层,以促进CoFeB层中的(100)结晶。 叠层可以用作MTJ中的参考层,偶极子层或自由层。 在300℃和400℃之间的退火可用于进一步增强层压层中的PMA。

    Multilayers having reduced perpendicular demagnetizing field using moment dilution for spintronic applications
    4.
    发明授权
    Multilayers having reduced perpendicular demagnetizing field using moment dilution for spintronic applications 有权
    具有减少的垂直退磁场的多层使用瞬时应用的时间稀释

    公开(公告)号:US09048411B2

    公开(公告)日:2015-06-02

    申请号:US14047130

    申请日:2013-10-07

    摘要: A magnetic element is disclosed that has a composite free layer with a FM1/moment diluting/FM2 configuration wherein FM1 and FM2 are magnetic layers made of one or more of Co, Fe, Ni, and B and the moment diluting layer is used to reduce the perpendicular demagnetizing field. As a result, lower resistance x area product and higher thermal stability are realized when perpendicular surface anisotropy dominates shape anisotropy to give a magnetization perpendicular to the planes of the FM1, FM2 layers. The moment diluting layer may be a non-magnetic metal like Ta or a CoFe alloy with a doped non-magnetic metal. A perpendicular Hk enhancing layer interfaces with the FM2 layer and may be an oxide to increase the perpendicular anisotropy field in the FM2 layer. A method for forming the magnetic element is also provided.

    摘要翻译: 公开了具有FM1 /力矩稀释/ FM2配置的复合自由层的磁性元件,其中FM1和FM2是由Co,Fe,Ni和B中的一种或多种构成的磁性层,并且力矩稀释层用于减少 垂直退磁场。 结果,当垂直表面各向异性支配形状各向异性以产生垂直于FM1,FM2层的平面的磁化时,实现较低的电阻x面积乘积和较高的热稳定性。 瞬时稀释层可以是非磁性金属如Ta或具有掺杂的非磁性金属的CoFe合金。 垂直Hk增强层与FM2层接合,并且可以是氧化物以增加FM2层中的垂直各向异性场。 还提供了形成磁性元件的方法。

    MTJ element for STT MRAM
    5.
    发明授权
    MTJ element for STT MRAM 有权
    STT MRAM的MTJ元素

    公开(公告)号:US08900884B2

    公开(公告)日:2014-12-02

    申请号:US13525502

    申请日:2012-06-18

    IPC分类号: H01L21/00 H01L29/82

    CPC分类号: H01L43/10 H01L43/08 H01L43/12

    摘要: An all (111) MTJ stack is disclosed in which there are no transitions between different crystalline orientations when going from layer to layer. This is accomplished by providing strongly (111)-textured layers immediately below the MgO tunnel barrier to induce a (111) orientation therein.

    摘要翻译: 公开了所有(111)MTJ堆叠,其中当从层到层不同时,不同结晶取向之间没有转变。 这通过在MgO隧道势垒正下方提供强(111) - 纹理层以在其中诱导(111)取向来实现。

    Engineered magnetic layer with improved perpendicular anisotropy using glassing agents for spintronic applications
    6.
    发明授权
    Engineered magnetic layer with improved perpendicular anisotropy using glassing agents for spintronic applications 有权
    具有改进的垂直各向异性的工程磁性层,使用玻璃化剂进行自旋电子应用

    公开(公告)号:US08698260B2

    公开(公告)日:2014-04-15

    申请号:US13548859

    申请日:2012-07-13

    IPC分类号: H01L29/82

    CPC分类号: H01L43/08 H01L43/10

    摘要: A magnetic element in a spintronic device or serving as a propagation medium in a domain wall motion device is disclosed wherein first and second interfaces of a free layer with a perpendicular Hk enhancing layer and tunnel barrier, respectively, produce enhanced surface perpendicular anisotropy to increase thermal stability in a magnetic tunnel junction. The free layer may be a single layer or a composite and is comprised of a glassing agent that has a first concentration in a middle portion thereof and a second concentration less than the first concentration in regions near first and second interfaces. A CoFeB free layer selectively crystallizes along first and second interfaces but maintains an amorphous character in a middle region containing a glass agent providing the annealing temperature is less than the crystallization temperature of the middle region.

    摘要翻译: 公开了一种自旋电子器件中的磁性元件或用作畴壁运动装置中的传播介质的磁性元件,其中分别具有垂直Hk增强层和隧道势垒的自由层的第一和第二界面产生增强的表面垂直各向异性以增加热量 磁性隧道结中的稳定性。 自由层可以是单层或复合物,并且由在中间部分具有第一浓度并且在第一和第二界面附近的区域中的第二浓度小于第一浓度的玻璃化剂组成。 CoFeB自由层选择性地沿着第一和第二界面结晶,但是在含有玻璃试剂的中间区域保持非晶形特征,提供退火温度小于中间区域的结晶温度。

    MTJ Element for STT MRAM
    7.
    发明申请
    MTJ Element for STT MRAM 有权
    STT MRAM的MTJ元素

    公开(公告)号:US20130334629A1

    公开(公告)日:2013-12-19

    申请号:US13525502

    申请日:2012-06-18

    IPC分类号: H01L43/10 H01L43/12

    CPC分类号: H01L43/10 H01L43/08 H01L43/12

    摘要: An all (111) MTJ stack is disclosed in which there are no transitions between different crystalline orientations when going from layer to layer. This is accomplished by providing strongly (111)-textured layers immediately below the MgO tunnel barrier to induce a (111) orientation therein.

    摘要翻译: 公开了所有(111)MTJ堆叠,其中当从层到层不同时,不同结晶取向之间没有转变。 这通过在MgO隧道势垒正下方提供强(111) - 纹理层以在其中诱导(111)取向来实现。

    Free Layer with High Thermal Stability for Magnetic Device Applications by Insertion of a Boron Dusting Layer
    8.
    发明申请
    Free Layer with High Thermal Stability for Magnetic Device Applications by Insertion of a Boron Dusting Layer 有权
    通过插入硼粉尘层的磁性器件应用具有高热稳定性的自由层

    公开(公告)号:US20130270523A1

    公开(公告)日:2013-10-17

    申请号:US13448557

    申请日:2012-04-17

    IPC分类号: H01L43/10 H01L43/12

    摘要: A boron or boron containing dusting layer such as CoB or FeB is formed along one or both of top and bottom surfaces of a free layer at interfaces with a tunnel barrier layer and capping layer to improve thermal stability while maintaining other magnetic properties of a MTJ stack. Each dusting layer has a thickness from 0.2 to 20 Angstroms and may be used as deposited, or at temperatures up to 400° C. or higher, or following a subsequent anneal at 400° C. or higher. The free layer may be a single layer of CoFe, Co, CoFeB or CoFeNiB, or may include a non-magnetic insertion layer. The resulting MTJ is suitable for STT-MRAM memory elements or spintronic devices. Perpendicular magnetic anisotropy is maintained in the free layer at temperatures up to 400° C. or higher. Ku enhancement is achieved and the retention time of a memory cell for STT-MRAM designs is increased.

    摘要翻译: 在具有隧道势垒层和封盖层的界面处,在自由层的顶表面和底表面中的一个或两个上形成含硼或含硼的除尘层,以改善热稳定性,同时保持MTJ堆叠的其它磁性能 。 每个除尘层的厚度为0.2至20埃,可用于沉积,或在高达400℃或更高的温度下使用,或随后在400℃或更高温度下退火。 自由层可以是CoFe,Co,CoFeB或CoFeNiB的单层,或者可以包括非磁性插入层。 所得MTJ适用于STT-MRAM存储器元件或自旋电子器件。 垂直磁各向异性在高达400℃或更高的温度下保持在自由层中。 实现了Ku增强,并且用于STT-MRAM设计的存储单元的保留时间增加。

    High Thermal Stability Reference Structure with Out-of-Plane Aniotropy for Magnetic Device Applications
    9.
    发明申请
    High Thermal Stability Reference Structure with Out-of-Plane Aniotropy for Magnetic Device Applications 有权
    用于磁性器件应用的具有非平面各向异性的高热稳定性参考结构

    公开(公告)号:US20130224521A1

    公开(公告)日:2013-08-29

    申请号:US13406972

    申请日:2012-02-28

    IPC分类号: G11B5/66 H01F41/22 H01F41/14

    摘要: Enhanced Hc and Hk in addition to higher thermal stability to 400° C. are achieved in magnetic devices by adding dusting layers on top and bottom surfaces of a spacer in a synthetic antiferromagnetic (SAF) structure to give a RL1/DL1/spacer/DL2/RL2 reference layer configuration where RL1 and RL2 layers exhibit perpendicular magnetic anisotropy (PMA), the spacer induces antiferromagnetic coupling between RL1 and RL2, and DL1 and DL2 are dusting layers that enhance PMA. RL1 and RL2 layers are selected from laminates such as (Ni/Co)n, L10 alloys, or rare earth-transition metal alloys. The reference layer may be incorporated in STT-MRAM memory elements or in spintronic devices including a spin transfer oscillator. Dusting layers and a similar SAF design may be employed in a free layer for Ku enhancement and to increase the retention time of a memory cell.

    摘要翻译: 通过在合成反铁磁(SAF)结构中在间隔物的顶表面和底表面上添加除尘层,得到RL1 / DL1 /间隔物/ DL2,在磁性器件中,除了通过在400℃下的更高的热稳定性之外,增强了Hc和Hk / RL2参考层配置,其中RL1和RL2层表现出垂直的磁各向异性(PMA),间隔物引起RL1和RL2之间的反铁磁耦合,DL1和DL2是增强PMA的除尘层。 RL1和RL2层选自诸如(Ni / Co)n,L10合金或稀土 - 过渡金属合金的层压体。 参考层可以并入STT-MRAM存储元件或包括自旋转移振荡器的自旋电子器件中。 可以在用于Ku增强的自由层中使用除尘层和类似的SAF设计,并增加存储器单元的保留时间。

    Structure and method for enhancing interfacial perpendicular anisotropy in CoFe(B)/MgO/CoFe(B) magnetic tunnel junctions
    10.
    发明授权
    Structure and method for enhancing interfacial perpendicular anisotropy in CoFe(B)/MgO/CoFe(B) magnetic tunnel junctions 有权
    在CoFe(B)/ MgO / CoFe(B)磁隧道结中增强界面垂直各向异性的结构和方法

    公开(公告)号:US08470462B2

    公开(公告)日:2013-06-25

    申请号:US12927939

    申请日:2010-11-30

    摘要: A STT-RAM MTJ is disclosed with a MgO tunnel barrier formed by natural oxidation process. A Co10Fe70B20/NCC/Co10Fe70B20, Co10Fe70B20/NCC/Co10Fe70B20/NCC, or Co10Fe70B20/NCC/Co10Fe70B20/NCC/Co10Fe70B20 free layer configuration where NCC is a nanocurrent channel layer made of Fe(20%)-SiO2 is used to minimize Jc0 while enabling higher thermal stability, write voltage, read voltage, Ho, and Hc values that satisfy 64 Mb design requirements. The NCC layer is about 10 Angstroms thick to match the minimum Fe(Si) grain diameter size. The MTJ is annealed with a temperature of about 330° C. to maintain a high magnetoresistive ratio while maximizing Hk⊥(interfacial) for the free layer thereby reducing Heff and lowering the switching current. The Co10Fe70B20 layers are sputter deposited with a low pressure process with a power of about 15 Watts and an Ar flow rate of 40 standard cubic centimeters per minute to lower Heff for the free layer.

    摘要翻译: 公开了具有通过自然氧化工艺形成的MgO隧道势垒的STT-RAM MTJ。 使用NCO是由Fe(20%) - SiO 2制成的纳米电流通道层的Co10Fe70B20 / NCC / Co10Fe70B20,Co10Fe70B20 / NCC / Co10Fe70B20 / NCC或Co10Fe70B20 / NCC / Co10Fe70B20 / NCC / Co10Fe70B20 / NCC / Co10Fe70B20自由层配置,以使Jc0最小化 实现满足64Mb设计要求的更高的热稳定性,写电压,读电压,Ho和Hc值。 NCC层的厚度约为10埃,以符合最小Fe(Si)晶粒直径尺寸。 MTJ在约330℃的温度下退火,以保持高的磁阻比,同时使自由层的Hk⊥(界面)最大化,从而降低Heff并降低开关电流。 Co10Fe70B20层用低压工艺溅射沉积,功率约为15瓦,Ar流速为40标准立方厘米每分钟,以降低自由层的Heff。