摘要:
An integrated circuit die system comprises a first integrated circuit die, a second integrated circuit die and a transformer formed on a dielectric (e.g., quartz) substrate and electrically connected between the first integrated circuit die and the second integrated circuit die to provide galvanic isolation therebetween.
摘要:
A method includes forming a transistor device on a first side of a semiconductor-on-insulator structure. The semiconductor-on-insulator structure includes a substrate, a dielectric layer, and a buried layer between the substrate and the dielectric layer. The method also includes forming a conductive plug through the semiconductor-on-insulator structure. The conductive plug is in electrical connection with the transistor device. The method further includes forming a field plate on a second side of the semiconductor-on-insulator structure, where the field plate is in electrical connection with the conductive plug. The transistor device could have a breakdown voltage of at least 600V, and the field plate could extend along at least 40% of a length of the transistor device.
摘要:
In an AlGaN channel transistor formed on a orientation silicon wafer, a hole with walls slanted at 54 degrees is etched into the silicon to provide a orientation substrate surface for forming the AlGaN channel transistor.
摘要:
A modified “black box” integrated circuit simulation model is provided that is based only upon on the external steady-state and transient characteristics of a device under test (DUT). The method utilizes probe pulses as well as steady-state I-V and C-V look-up tables. In contrast to conventional black box simulation models, which support only steady-state and small signal frequency analysis, the disclosed method also supports large signal transient analysis.
摘要:
A micro-fabricated atomic clock structure is thermally insulated so that the atomic clock structure can operate with very little power in an environment where the external temperature can drop to −40° C., while at the same time maintaining the temperature required for the proper operation of the VCSEL and the gas within the vapor cell.
摘要:
A semiconductor capacitor with large area plates and a small footprint is formed on a semiconductor wafer by forming an opening in the wafer, depositing a first metal atoms through a first shadow mask that lies spaced apart from the wafer to form a first metal layer in the opening, a dielectric layer on the first metal layer, and a second metal atoms through a second shadow mask that lies spaced apart from the wafer to form a second metal layer on the dielectric layer.
摘要:
Magnetic laminations are formed in the openings of a first non-conductive structure, which is formed in the opening of a second non-conductive structure that has a maximum aspect ratio that is less than the maximum aspect ratio of the first non-conductive structure. The second non-conductive structure is more crack resistant than the first non-conductive structure, and thereby protects the first non-conductive structure and the magnetic laminations from environmental contaminants.
摘要:
The cost and size of an atomic magnetometer are reduced by attaching a vapor cell structure that has a vapor cell cavity to a base die that has a laser light source that outputs light to the vapor cell cavity, and attaching a photo detection die that has a photodiode to the vapor cell structure to detect light from the laser light source that passes through the vapor cell cavity.
摘要:
An interdigitated semiconductor capacitor with a large number of plates and a capacitance in the micro-farad range is formed on a wafer with only a single lithography step by depositing each odd layer of metal through a first shadow mask that lies spaced apart from the wafer, and each even layer of metal through a second shadow mask that lies spaced apart from the wafer.
摘要:
A lateral DMOS transistor formed on a silicon-on-insulator (SOI) structure has a higher breakdown voltage that results from a cavity that is formed in the bulk region of the SOI structure. The cavity exposes a portion of the bottom surface of the insulator layer of the SOI structure that lies directly vertically below the drift region of the DMOS transistor.