公开(公告)号：US20120312104A1

公开(公告)日：2012-12-13

申请号：US13593171

申请日：2012-08-23

申请人： Akira HAMAMATSU ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Hidetoshi Nishiyama ,  Kenji Oka ,  Takanori Ninomiya ,  Maki Tanaka ,  Kenji Watanabe ,  Tetsuya Watanabe ,  Yoshio Morishige

发明人： Akira HAMAMATSU ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Hidetoshi Nishiyama ,  Kenji Oka ,  Takanori Ninomiya ,  Maki Tanaka ,  Kenji Watanabe ,  Tetsuya Watanabe ,  Yoshio Morishige

IPC分类号： G01N21/88

CPC分类号： G06T7/001 ,  G01N21/8851 ,  G01N21/9501 ,  G01N2021/8861 ,  G01N2021/8867 ,  G06T7/97 ,  G06T2207/10152 ,  G06T2207/30148

摘要： A method and apparatus of inspecting a sample, in which the sample is inspected under a plurality of inspection conditions, and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions, are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined.

摘要翻译： 在多个检查条件下对样本进行检查的检查方法和装置以及在多个检查条件下检查样本而获得的检查数据和对应于检查日期样本的位置信息 具有相应的检查条件。 多个检查条件中的每一个的检查数据通过使用关于样本的位置信息彼此相对来确定待检查的位置，并且在待检查位置处的样本的图像是详细的 获得。 对所获得的图像进行分类，确定通过使用图像分类信息的样本的检查条件。

公开(公告)号：US20120128230A1

公开(公告)日：2012-05-24

申请号：US13362151

申请日：2012-01-31

申请人： Shunji Maeda ,  Kenji Oka ,  Yukihiro Shibata ,  Minoru Yoshida ,  Chie Shishido ,  Yuji Takagi ,  Atsushi Yoshida ,  Kazuo Yamaguchi

发明人： Shunji Maeda ,  Kenji Oka ,  Yukihiro Shibata ,  Minoru Yoshida ,  Chie Shishido ,  Yuji Takagi ,  Atsushi Yoshida ,  Kazuo Yamaguchi

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G01N21/9501 ,  G01N21/95607 ,  G06T7/0004 ,  G06T2207/30148

摘要： An inspection method, including: illuminating a light on a wafer on which plural chips having identical patterns are formed; imaging corresponding areas of two chips formed on the wafer to obtain inspection images and reference images with an image sensor; and processing the obtained inspection image and the reference image to produce a difference image which indicates a difference between the inspection image and the reference image and detect a defect by comparing the difference image with a threshold, wherein a threshold applied to a difference image which is produced by comparing the inspection image and the reference image obtained by imaging peripheral portion of the wafer is different from a threshold applied to a difference image which is produced by comparing the inspection image and the reference image obtained by imaging central portion of the wafer.

摘要翻译： 一种检查方法，包括：在其上形成有多个具有相同图案的芯片的晶片上照射光; 对形成在晶片上的两个芯片的对应区域进行成像，以获得具有图像传感器的检查图像和参考图像; 并且处理所获得的检查图像和参考图像以产生指示检查图像和参考图像之间的差异的差异图像，并且通过将差异图像与阈值进行比较来检测缺陷，其中应用于差分图像的阈值是 通过比较检查图像和通过对晶片的周边部分进行成像获得的参考图像而产生的参考图像与通过比较检查图像和通过对晶片的中心部分进行成像而获得的参考图像而产生的差分图像的阈值不同。

公开(公告)号：US20110276299A1

公开(公告)日：2011-11-10

申请号：US13127051

申请日：2009-10-15

申请人： Kazunori Nemoto ,  Akira Hamamatsu ,  Hideo Ota ,  Kenji Oka ,  Takahiro Jingu

发明人： Kazunori Nemoto ,  Akira Hamamatsu ,  Hideo Ota ,  Kenji Oka ,  Takahiro Jingu

IPC分类号： G06F19/00

CPC分类号： G01B11/303 ,  B82Y35/00 ,  G01N21/93 ,  G01N21/9501 ,  G01N2021/8822 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： A technology capable of ensuring measurement results of a dark-field inspection apparatus up to a microscopic area is provided. A dark-field inspection apparatus is calibrated using a bulk wafer as a reference wafer, the bulk wafer having microroughness of an irregular asperity pattern accurately formed on a surface, and the microroughness of the surface having an ensured microroughness degree. The microroughness can be more accurately formed by a chemical treatment with a chemical solution. This microroughness is measured by using an AFM, and an expected haze value is obtained based on the measured value. Then, haze of the surface of the reference wafer is measured by the dark-field inspection apparatus to be inspected to obtain an actually-measured haze value, and a difference between the expected haze value and the actually-measured haze value is obtained. Based on this difference, a haze measurement parameter of the dark-field inspection apparatus is adjusted so that the actually-measured haze value and the expected haze value match each other.

摘要翻译： 提供了一种能够确保暗视场检测装置到微观区域的测量结果的技术。 使用体晶片作为参考晶片校准暗视场检查装置，该体晶片具有精确地形成在表面上的不规则凹凸图案的微粗糙度，并且具有确保的微粗糙度的表面的微粗糙度。 通过化学溶液的化学处理可以更精确地形成微粗糙度。 通过使用AFM测量该微粗糙度，并且基于测量值获得预期雾度值。 然后，通过需要检查的暗视野检查装置测量参考晶片的表面的雾度，以获得实际测得的雾度值，并获得预期雾度值和实际测得的雾度值之间的差。 基于该差异，调整暗场检查装置的雾度测量参数，使得实际测量的雾度值和预期雾度值彼此匹配。

公开(公告)号：US07821447B2

公开(公告)日：2010-10-26

申请号：US12232067

申请日：2008-09-10

申请人： Kenji Oka ,  Hiroshi Ito ,  Jun Ito

发明人： Kenji Oka ,  Hiroshi Ito ,  Jun Ito

IPC分类号： G01S13/00

CPC分类号： G01S7/4004 ,  G01S7/032

摘要： Disclosed is a method of bias adjustment for a millimeter wave radar apparatus that can efficiently and highly accurately adjust the bias of an MMIC used in a radio frequency circuit in the millimeter wave radar apparatus. The method comprises: providing a DA converter in a bias circuit in the millimeter wave radar apparatus comprising an antenna, a radio frequency unit, and a processing unit for performing transmission and reception processing of the radio frequency unit; connecting a signal generator in place of the antenna; and connecting a test processing unit and a control apparatus to the radio frequency unit, wherein the control apparatus applies an initial bias value in the form of a digital value to the MMIC, calculates the target value for the digital bias value based on the result of the measurement of the received signal, and takes the target value as the digital bias value for the production processing unit when the radio frequency characteristic of the received signal obtained by applying the target value to the MMIC lies within specified limits.

摘要翻译： 公开了一种毫米波雷达装置的偏置调整方法，其能够高效且高精度地调整毫米波雷达装置中用于射频电路的MMIC的偏置。 该方法包括：在毫米波雷达装置的偏置电路中设置DA转换器，该雷达装置包括天线，射频单元和用于执行射频单元的发送和接收处理的处理单元; 连接信号发生器代替天线; 以及将测试处理单元和控制装置连接到所述射频单元，其中，所述控制装置将数字值形式的初始偏置值应用于所述MMIC，基于所述MMIC的结果来计算所述数字偏置值的目标值 当通过将目标值应用于MMIC而获得的接收信号的射频特性位于规定的限度内时，接收信号的测量，并将目标值作为生产处理单元的数字偏置值。

公开(公告)号：US07786036B2

公开(公告)日：2010-08-31

申请号：US11795128

申请日：2006-03-24

申请人： Kazuhiro Komatsu ,  Kazuki Hirata ,  Atsuo Nagai ,  Tadashi Onomi ,  Kenji Oka

发明人： Kazuhiro Komatsu ,  Kazuki Hirata ,  Atsuo Nagai ,  Tadashi Onomi ,  Kenji Oka

IPC分类号： C04B35/468

CPC分类号： C04B35/4682 ,  C04B35/62685 ,  C04B2235/3206 ,  C04B2235/3215 ,  C04B2235/3217 ,  C04B2235/3224 ,  C04B2235/3239 ,  C04B2235/3263 ,  C04B2235/3418 ,  C04B2235/5409 ,  C04B2235/5445 ,  C04B2235/658 ,  C04B2235/6582 ,  C04B2235/6588 ,  C04B2235/663 ,  C04B2235/79 ,  C04B2235/96 ,  H01B3/12 ,  H01G4/1227 ,  H01G4/30

摘要： A dielectric ceramic composition containing at least 0.15 to 2.5 mol of a Mg compound in terms of MgO, 0 to 1.6 mol of a Ba compound in terms of BaCO3, 0.1 to 3.0 mol of a Ln (Ln includes two or three kinds of elements selected from Er, Dy, and Ho with Er being essential) compound in terms of Ln2O3, 0.01 to 0.4 mol of a Mn compound in terms of MnO4/3, 0.01 to 0.26 mol of a V compound in terms of V2O5, 0.3 to 3.5 mol of a Si compound in terms of SiO2, and 0.01 to 2.5 mol of an Al compound in terms of Al2O3 to 100 mol of barium titanate adjusted for a Ba/Ti molar ratio of 0.997 to 1.007.

摘要翻译： 一种电介质陶瓷组合物，其包含至少0.15至2.5摩尔的Mg化合物，以MgO计，0至1.6摩尔Ba化合物，以BaCO 3计，0.1至3.0摩尔的Ln（Ln包括选择的两种或三种元素 从Er，Dy和Ho与Er是必需的）化合物以Ln 2 O 3计，0.01〜0.4mol的Mn化合物换算成MnO 4/3，0.01〜0.26mol V化合物，V2O5为0.3〜3.5mol 的Si化合物，以SiO 2为0.01〜2.5摩尔的Al化合物，以Ba 2 Ti摩尔比为0.997〜1.007调节的Al 2 O 3〜100摩尔的钛酸钡。

公开(公告)号：US07729516B2

公开(公告)日：2010-06-01

申请号：US11839701

申请日：2007-08-16

申请人： Nobukazu Shima ,  Akihiro Oota ,  Kenji Oka

发明人： Nobukazu Shima ,  Akihiro Oota ,  Kenji Oka

IPC分类号： G06K9/32 ,  G06K9/48 ,  H04N7/18 ,  H04N13/02

CPC分类号： G06K9/00805 ,  B60W2420/42 ,  G06K9/3241 ,  G06K2209/23 ,  G06T7/97

摘要： An image size changing section obtains a size changed image by changing the size of one of two original images captured by a pair of cameras. If an edge of an object has many oblique components, the edge is difficult to detect as a vertical edge but, when the image is horizontally reduced, an oblique edge becomes close to a vertical edge. For this reason, feature end points are extracted with reliability by a feature extracting section and, thereby, an object is recognized and the distance to the object is determined reliably.

摘要翻译： 图像尺寸改变部通过改变由一对相机拍摄的两个原始图像中的一个的尺寸来获得尺寸改变图像。 如果物体的边缘具有许多倾斜分量，则边缘难以被检测为垂直边缘，但是当图像水平减小时，倾斜边缘变得接近垂直边缘。 因此，通过特征提取部分可靠地提取特征终点，从而识别对象并且可靠地确定到对象的距离。

公开(公告)号：US07612706B2

公开(公告)日：2009-11-03

申请号：US11630040

申请日：2005-07-15

申请人： Kanako Honda ,  Kenji Oka ,  Kimihisa Yoneda

发明人： Kanako Honda ,  Kenji Oka ,  Kimihisa Yoneda

IPC分类号： G01S13/00

CPC分类号： G01S13/931 ,  G01S13/4445 ,  G01S13/4454 ,  H01Q25/02

摘要： An antenna unit includes at least one transmission antenna and plural reception antennas. A receiver detects information including azimuth information for a target, based on an output from the antenna unit. An antenna switching unit switches connections between a transmitter and the transmission antenna and between the reception antenna and the receiver. The antenna unit includes a wide-beam array antenna and plural narrow-beam array antennas having a narrower beam width than the array antenna. A monopulse process is performed based on an output of a predetermined pair of array antennas from among the array antennas formed as the narrow-beam array antennas.

摘要翻译： 天线单元包括至少一个发射天线和多个接收天线。 接收机基于天线单元的输出来检测包括目标的方位信息的信息。 天线切换单元切换发射机与发射天线之间以及接收天线与接收机之间的连接。 天线单元包括宽阵列天线和具有比阵列天线窄的波束宽度的多个窄波束阵列天线。 基于形成为窄束阵列天线的阵列天线中的预定阵列天线的输出执行单脉冲处理。

公开(公告)号：US20090141264A1

公开(公告)日：2009-06-04

申请号：US12363856

申请日：2009-02-02

申请人： Yukihiro Shibata ,  Shunji Maeda ,  Kazuo Yamaguchi ,  Minoru Yoshida ,  Atsushi Yoshida ,  Kenji Oka ,  Kenji Watanabe

发明人： Yukihiro Shibata ,  Shunji Maeda ,  Kazuo Yamaguchi ,  Minoru Yoshida ,  Atsushi Yoshida ,  Kenji Oka ,  Kenji Watanabe

IPC分类号： G01N21/21 ,  G01J4/00

CPC分类号： G01N21/21 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G02B21/0016

摘要： A defect inspecting apparatus includes a sample mounting device for mounting a sample; lighting and detecting apparatus for illuminating a patterned sample mounted on a mount and detecting the optical image of the reflected light obtained therefrom. Also included is a display for displaying the optical image detected by this lighting and detecting apparatus; an optical parameter setting device for setting and displaying optical parameters for the lighting and detecting apparatus on the display; and optical parameter adjusting apparatus for adjusting optical parameters set for the lighting and detecting apparatus according to the optical parameters set by the optical parameter setting apparatus; a storage device for storing comparative image data; and a defect detecting device for detecting defects from patterns formed on the sample by comparing the optical image detected by the optical image detecting apparatus with the comparative image data stored in the storage.

摘要翻译： 缺陷检查装置包括用于安装样品的样品安装装置; 照明和检测装置，用于照亮安装在安装件上的图案样品，并检测由其获得的反射光的光学图像。 还包括用于显示由该照明和检测装置检测的光学图像的显示器; 用于在显示器上设置和显示照明和检测装置的光学参数的光学参数设置装置; 以及光学参数调整装置，用于根据由所述光学参数设定装置设定的光学参数来调整对所述照明和检测装置设定的光学参数; 用于存储比较图像数据的存储装置; 以及缺陷检测装置，用于通过将由光学图像检测装置检测的光学图像与存储在存储器中的比较图像数据进行比较来检测在样本上形成的图案的缺陷。

公开(公告)号：US20090062580A1

公开(公告)日：2009-03-05

申请号：US12226356

申请日：2007-04-11

申请人： Hideyuki Takai ,  Kenji Oka ,  Kyuhei Kitao

发明人： Hideyuki Takai ,  Kenji Oka ,  Kyuhei Kitao

IPC分类号： C07C1/24 ,  C07C13/28

CPC分类号： C07C13/28 ,  C07C1/24 ,  C07C2527/03 ,  C07C2527/054 ,  C07C2527/173 ,  C07C2601/16

摘要： Disclosed is a method for producing a cyclic olefin compound having two or more cyclohexene rings per molecule via intramolecular dehydration of an alicyclic alcohol having two or more hydroxylated cyclohexane rings per molecule. The method includes the step (i) of heating the alicyclic alcohol at a temperature of 130° C. to 230° C. and a pressure greater than 20 Torr in an organic solvent in the presence of a dehydration catalyst, to carry out dehydration of the alicyclic alcohol while distilling off by-product water, which dehydration catalyst is liquid or soluble in a liquid reaction mixture under the reaction conditions; and the subsequent step (ii) of heating the resulting reaction mixture at a temperature of 50° C. to 220° C. and a pressure of 200 Torr or less to recover the cyclic olefin compound as a distillate. According to the method, side reactions such as isomerization are suppressed, and high-purity cyclic olefin compounds with less impurities can be simply and efficiently obtained in high yields.

摘要翻译： 公开了通过每分子具有两个或更多个羟基化环己烷环的脂环醇的分子内脱水来制备每分子具有两个或更多个环己烯环的环状烯烃化合物的方法。 该方法包括在脱水催化剂存在下，在有机溶剂中，在130℃至230℃的温度和大于20托的压力下加热脂环醇的步骤（i），以进行脱水 在反应条件下蒸馏出副产物水的脂环醇，该脱水催化剂为液体或可溶于液体反应混合物; 和随后的步骤（ii）在50℃至220℃的温度和200托或更低的压力下加热所得反应混合物以回收作为馏出物的环状烯烃化合物。 根据该方法，可以抑制异构化等副反应，能够以高收率简单高效地得到杂质较少的高纯度环状烯烃化合物。

公开(公告)号：US07499162B2

公开(公告)日：2009-03-03

申请号：US11475667

申请日：2006-06-26

申请人： Yukihiro Shibata ,  Shunji Maeda ,  Kazuo Yamaguchi ,  Minoru Yoshida ,  Atsushi Yoshida ,  Kenji Oka ,  Kenji Watanabe

发明人： Yukihiro Shibata ,  Shunji Maeda ,  Kazuo Yamaguchi ,  Minoru Yoshida ,  Atsushi Yoshida ,  Kenji Oka ,  Kenji Watanabe

IPC分类号： G01J4/00

CPC分类号： G01N21/21 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G02B21/0016

摘要： A defect inspecting apparatus includes a sample mounting device for mounting a sample; lighting and detecting apparatus for illuminating a patterned sample mounted on a mount and detecting the optical image of the reflected light obtained therefrom. Also included is a display for displaying the optical image detected by this lighting and detecting apparatus; an optical parameter setting device for setting and displaying optical parameters for the lighting and detecting apparatus on the display; and optical parameter adjusting apparatus for adjusting optical parameters set for the lighting and detecting apparatus according to the optical parameters set by the optical parameter setting apparatus; a storage device for storing comparative image data; and a defect detecting device for detecting defects from patterns formed on the sample by comparing the optical image detected by the optical image detecting apparatus with the comparative image data stored in the storage.

摘要翻译： 缺陷检查装置包括用于安装样品的样品安装装置; 照明和检测装置，用于照亮安装在安装件上的图案样品，并检测由其获得的反射光的光学图像。 还包括用于显示由该照明和检测装置检测的光学图像的显示器; 用于在显示器上设置和显示照明和检测装置的光学参数的光学参数设置装置; 以及光学参数调整装置，用于根据由所述光学参数设定装置设定的光学参数来调整对所述照明和检测装置设定的光学参数; 用于存储比较图像数据的存储装置; 以及缺陷检测装置，用于通过将由光学图像检测装置检测的光学图像与存储在存储器中的比较图像数据进行比较来检测在样本上形成的图案的缺陷。