Method Of Determining Optical Parameters Of An Ophthalmic Lens
    61.
    发明申请
    Method Of Determining Optical Parameters Of An Ophthalmic Lens 有权
    确定眼科镜片的光学参数的方法

    公开(公告)号:US20150286069A1

    公开(公告)日:2015-10-08

    申请号:US14442945

    申请日:2013-11-13

    IPC分类号: G02C7/02 G02C7/06 G01M11/02

    摘要: Method for determining the values of a set of n optical parameters (P1, P2, . . . , Pn) of an ophthalmic lens, n being an integer greater than or equal to 1, the method comprising: an nominal ophthalmic lens data providing step, an ophthalmic lens providing step, an optical surface measuring step, a surface errors determining step during which a set of m surface error parameters (α1, α2, . . . , αm) is determined, m being an integer greater than or equal to 1, an optical parameter determining step during which each optical parameter of the set of optical parameters is determined by: P i = P i , 0 + [ ∑ j = 1 m   ( ∂ P i ∂ α j ) 0 × Δα j ] + A i with Pi the value of the ith optical parameter of the manufactured optical lens, Pi,0 the value of the ith optical parameter of the nominal optical lens, ( ∂ P i ∂ α j ) 0 the value of the derivative of Pi with respect to the jth surface error parameter αj on the nominal surface and Δαj the value of the jth surface error parameter, and Ai a combination of terms of order greater or equal to 2 for each P1.

    摘要翻译: 用于确定眼科镜片的一组n个光学参数(P1,P2,...,Pn)的值的方法,n是大于或等于1的整数,所述方法包括:标称眼科镜片数据提供步骤 ,眼镜透镜提供步骤,光学表面测量步骤,确定一组m个表面误差参数(α1,α2,...,αm)的表面误差确定步骤,m是大于或等于 1,光学参数确定步骤,在该光学参数确定步骤中,通过以下方式确定该组光学参数的每个光学参数:P i = P i,0 + [Σj = 1 m÷(∂P i∂αj)0×&Dgr; αj] + A i,其中Pi是制造的光学透镜的第i个光学参数的值,Pi,0是标称光学透镜的第i个光学参数的值,(∂P i∂αj)0的值 Pi相对于标称表面上的第j个表面误差参数αj的导数,&Dgr;αj第j个表面的值 误差参数,Ai为每个P1大于或等于2的项的组合。

    Method and tool for measuring the geometric structure of an optical component
    62.
    发明授权
    Method and tool for measuring the geometric structure of an optical component 有权
    用于测量光学部件几何结构的方法和工具

    公开(公告)号:US09109976B2

    公开(公告)日:2015-08-18

    申请号:US14384119

    申请日:2013-03-08

    IPC分类号: G01M11/02 G01B11/24

    摘要: The subject of the present invention is a method and a system for measuring the geometric or optical structure of an optical component. In particular, the invention relates to a method for measuring the geometric structure of a component bounded by a first side (10) and a second side (20), said method comprising steps of: (S1) measuring a first signal (MS1) resulting from a first conversion of a first probe signal (PS1), by at least said first side (10); (S2) measuring a second signal (MS2) resulting from a second conversion of a second probe signal (PS2), by at least said second side (20); (S3) determining a third conversion making it possible to convert a first set of coordinates (R1) associated with the measurement of the first signal (MS1) to a second set of coordinates (R2) associated with the measurement of the second signal (MS2); (S10) estimating said first side (10) using the first signal (MS1), said first simulation and a first cost criterion (V1) quantifying a difference between the estimation (FS1) and the first signal (MS1); and (S20) estimating said second side (20) using the second signal (MS2), said second simulation, said third conversion and a second cost criterion (V2) quantifying a difference between the estimation (ES2) and the second signal (MS2).

    摘要翻译: 本发明的主题是用于测量光学部件的几何或光学结构的方法和系统。 特别地,本发明涉及一种用于测量由第一侧(10)和第二侧(20)界定的部件的几何结构的方法,所述方法包括以下步骤:(S1)测量产生的第一信号(MS1) 至少所述第一侧(10)从第一探测信号(PS1)的第一转换开始。 (S2)通过至少所述第二侧(20)测量由第二探测信号(PS2)的第二转换产生的第二信号(MS2); (S3)确定第三转换,使得可以将与第一信号(MS1)的测量相关联的第一组坐标(R1)转换为与第二信号(MS2)的测量相关联的第二坐标系(R2) ); (S10)使用第一信号(MS1),所述第一模拟和量化估计(FS1)与第一信号(MS1)之间的差的第一成本标准(V1))来估计所述第一侧(10) 以及(S20)使用第二信号(MS2),所述第二模拟,所述第三转换和第二成本标准(V2)估计所述第二侧(20),以及量化估计(ES2)和第二信号(MS2)之间的差的第二成本标准 。

    MEASUREMENT APPARATUS AND METHOD
    64.
    发明申请
    MEASUREMENT APPARATUS AND METHOD 审中-公开
    测量装置和方法

    公开(公告)号:US20150012245A1

    公开(公告)日:2015-01-08

    申请号:US14378152

    申请日:2013-02-13

    发明人: Shaojun Xiao

    IPC分类号: G01M11/02 G01B21/04 G01B21/20

    摘要: A computer implemented method of determining the surface shape of an aspheric object using a metrological apparatus includes positioning the object on a support surface of a turntable so that an axis of the object is tilted with respect to the axis of rotation of the turntable; using a measurement probe to make a first measurement of the object; rotating the turntable; after rotation of the turntable, using a measurement probe to make a second measurement of the object, diametrically opposite the first measurement, estimating a first angle based on fitting the first measurement data using a surface model including: a dependency on the axis tilt angle and a dependency on the radius of the base of the object; estimating a second angle based on fitting the second measurement data to the surface model; and determining the tilt angle based on the first angle and the second angle.

    摘要翻译: 使用计量装置确定非球面物体的表面形状的计算机实现方法包括将物体定位在转台的支撑表面上,使得物体的轴线相对于转台的旋转轴线倾斜; 使用测量探头对物体进行第一次测量; 旋转转盘; 在所述转台旋转之后,使用测量探针对所述物体进行第二测量,与所述第一测量完全相反,基于使用表面模型拟合所述第一测量数据来估计第一角度,所述表面模型包括:对所述轴倾斜角的依赖性,以及 依赖于对象的基础的半径; 基于将所述第二测量数据拟合到所述表面模型来估计第二角度; 以及基于所述第一角度和所述第二角度确定所述倾斜角度。

    Apparatus for measuring shape of test surface, and recording medium storing program for calculating shape of test surface
    65.
    发明授权
    Apparatus for measuring shape of test surface, and recording medium storing program for calculating shape of test surface 有权
    用于测量测试表面形状的设备,以及用于计算测试表面形状的记录介质存储程序

    公开(公告)号:US08843337B2

    公开(公告)日:2014-09-23

    申请号:US12948542

    申请日:2010-11-17

    申请人: Kenji Yamazoe

    发明人: Kenji Yamazoe

    IPC分类号: G01D18/00

    摘要: An apparatus includes a measurement unit and a calculation unit, wherein the calculation unit expresses a measurement error of each measurement as a polynomial including a term that has a coefficient whose value is dependent on setting of the measurement area and a term that has a coefficient whose value is not dependent on the setting of the measurement area, obtains a matrix equation with respect to the coefficients of the polynomial by applying a least-squares method to each of the measurement data items for the overlapping region, assigns data about the terms of the polynomial and each of the measurement data items for the overlapping region to the matrix equation, calculates the coefficients of the polynomial from a singular value decomposition of the matrix equation to which the data has been assigned, and corrects each of the measurement data items for the measurement areas by using the coefficients.

    摘要翻译: 一种装置,包括测量单元和计算单元,其中所述计算单元将每个测量的测量误差表示为包括具有取决于所述测量区域的设置的值的系数的项的多项式,以及具有系数的项 值不依赖于测量区域的设置,通过对于重叠区域的每个测量数据项应用最小二乘法,获得关于多项式的系数的矩阵方程,分配关于该重叠区域的条件的数据 多项式和每个重叠区域到矩阵方程的测量数据项,从数据分配到的矩阵方程的奇异值分解中计算出多项式的系数,并对每个测量数据项进行校正 测量区域通过使用系数。

    Shape measuring method
    66.
    发明授权
    Shape measuring method 失效
    形状测量方法

    公开(公告)号:US08755052B2

    公开(公告)日:2014-06-17

    申请号:US13314463

    申请日:2011-12-08

    IPC分类号: G01B11/24 G01B11/25 G01B11/30

    摘要: A shape-measuring method accurately performs fitting between measured data of a surface to be measured, which is formed based on a design shape having multiple periodical design-level differences, and a design shape. A level-difference region and a level-difference height are specified from a measured point sequence of the surface to be measured. A point sequence is moved by a level-difference height. In other words, a process for eliminating the level difference is performed, and fitting target data without a level difference is obtained. On the other hand, a reference shape without multiple design-level differences is obtained from the design shape. Fitting between the fitting target data and the reference shape is performed by the least square method or the like.

    摘要翻译: 形状测量方法精确地进行基于具有多个周期性设计级差异的设计形状形成的被测量表面的测量数据与设计形状之间的拟合。 从要测量的表面的测量点序列指定电平差区域和电平差高度。 点序列移动一个水平差高度。 换句话说,执行用于消除电平差的处理,并且获得没有电平差的拟合目标数据。 另一方面,从设计形状获得没有多个设计级别差异的参考形状。 通过最小二乘法等进行装配对象数据与基准形状之间的拟合。

    Metrology of optics with high aberrations
    67.
    发明授权
    Metrology of optics with high aberrations 有权
    具有高像差的光学计量学

    公开(公告)号:US08743373B1

    公开(公告)日:2014-06-03

    申请号:US13225467

    申请日:2011-09-04

    IPC分类号: G01B11/02

    摘要: An interferometry method and associated system and computerized media for testing samples under test including those with high aberrations, comprising: situating a sample under test between a tilt mirror and a reference mirror, the tilt mirror tiltable with at least one degree of freedom about at least one tilt mirror axis, and further translatable along an axial line defined by a direction of propagation of a test wavefront from a source thereof; propagating the test wavefront toward the tilt mirror; after the test wavefront has been reflected by the tilt mirror, further propagating the test wavefront toward a reference mirror; and deriving a substantially complete first-tilt-alignment wavefront metrology of the sample under test from a plurality of first-tilt-alignment interferograms taken with the tilt mirror held fixed at a first predetermined tilt mirror angle while discreetly varying a displacement between the sample under test and the reference mirror.

    摘要翻译: 一种用于测试包括具有高像差的测试样本的干涉测量方法和相关联的系统和计算机化介质,包括:将倾斜镜和参考反射镜之间的待测样品配置在一起,所述倾斜镜至少可以至少一个自由度 一个倾斜镜轴,并且可以沿着由测试波阵面的源的传播方向限定的轴线进一步平移; 将测试波前传播到倾斜镜; 在测试波前被倾斜镜反射之后,进一步将测试波前传播到参考镜; 并且从多个倾斜镜拍摄的多个第一倾斜对准干涉图中获得基本上完整的第一倾斜对准波前测量,所述第一倾斜对准干涉图被保持固定在第一预定倾斜镜角度,同时谨慎地改变下面的样本之间的位移 测试和参考镜。

    Method of measuring a deviation of an optical surface from a target shape using interferometric measurement results
    69.
    发明授权
    Method of measuring a deviation of an optical surface from a target shape using interferometric measurement results 有权
    使用干涉测量结果测量光学表面与目标形状的偏差的方法

    公开(公告)号:US08508749B2

    公开(公告)日:2013-08-13

    申请号:US13609084

    申请日:2012-09-10

    IPC分类号: G01B11/02

    摘要: A method of measuring a deviation of an optical surface from a target shape and a method of manufacturing an optical element. This method of measuring the deviation includes: performing a first interferometric measurement using a first diffractive measurement structure, which is arranged to cover a first area of the optical surface, to provide a first interferometric measurement result, performing a second interferometric measurement using a second diffractive measurement structure, which is arranged to cover a second area of the optical surface different from the first area, to provide a second interferometric measurement result, and determining a deviation of the optical surface from the target shape.

    摘要翻译: 测量光学表面与目标形状的偏差的方法和制造光学元件的方法。 这种测量偏差的方法包括:使用被布置成覆盖光学表面的第一区域的第一衍射测量结构来执行第一干涉测量,以提供第一干涉测量结果,使用第二衍射进行第二干涉测量 测量结构被布置成覆盖与第一区域不同的光学表面的第二区域,以提供第二干涉测量结果,以及确定光学表面与目标形状的偏差。

    Method for making optical element, and image forming apparatus
    70.
    发明授权
    Method for making optical element, and image forming apparatus 失效
    光学元件的制造方法以及图像形成装置

    公开(公告)号:US08428769B2

    公开(公告)日:2013-04-23

    申请号:US12855262

    申请日:2010-08-12

    IPC分类号: B29C45/00

    摘要: A method for injection molding an imaging optical element to be used in an optical scanning apparatus for guiding a light ray in a main scanning direction and a sub-scanning direction. In the imaging optical element, the light ray passes through at least one optical functional surface and does not pass over the meridional line including the optical axis. The imaging optical element is injection-molded through an initial molding step and other various measurement and correction steps.

    摘要翻译: 一种用于注射成型光学元件的方法,该成像光学元件用于在主扫描方向和副扫描方向上引导光线的光学扫描装置。 在成像光学元件中,光线穿过至少一个光学功能表面,并且不通过包括光轴的子午线。 成像光学元件通过初始成型步骤和其他各种测量和校正步骤注射成型。