FILM FOR FORMING PROTECTIVE LAYER
    62.
    发明申请
    FILM FOR FORMING PROTECTIVE LAYER 有权
    形成保护层的电影

    公开(公告)号:US20130217187A1

    公开(公告)日:2013-08-22

    申请号:US13855629

    申请日:2013-04-02

    Abstract: The present invention aims to provide a film for forming a protective layer that is capable of preventing cracks in a low dielectric material layer of a semiconductor wafer while suppressing an increase in the number of steps in the manufacture of a semiconductor device. This object is achieved by a film for forming a protective layer on a bumped wafer in which a low dielectric material layer is formed, including a support base, an adhesive layer, and a thermosetting resin layer, laminated in this order, wherein the melt viscosity of the thermosetting resin layer is 1×102 Pa·S or more and 2×104 Pa·S or less, and the shear modulus of the adhesive layer is 1×103 Pa or more and 2×106 Pa or less, when the thermosetting resin layer has a temperature in a range of 50 to 120° C.

    Abstract translation: 本发明的目的在于提供一种形成保护层的膜,其能够防止半导体晶片的低电介质材料层中的裂纹,同时抑制半导体器件的制造中的步骤数量的增加。 该目的通过在其上形成低介电材料层的凸起晶片上形成保护层的膜来实现,该薄膜包括依次层叠的支撑基底,粘合层和热固性树脂层,其中熔体粘度 的热固性树脂层的摩尔比为1×102Pa·S以上且2×104Pa·S以下,粘合剂层的剪切模量为1×10 3 Pa以上2×10 6 Pa以下时, 树脂层的温度为50〜120℃。

    Method for Sealing Surfaces
    65.
    发明申请
    Method for Sealing Surfaces 审中-公开
    密封面的方法

    公开(公告)号:US20110236586A1

    公开(公告)日:2011-09-29

    申请号:US13129754

    申请日:2009-11-09

    CPC classification number: C09D175/04 C08G65/336

    Abstract: The invention relates to a method for sealing surfaces using single-component, moisture-curing coating compositions (C) containing 5 to 75 wt % of one or more silane-terminated polymers (P) having end groups of the formula (I) —O—C(=O) —NH—A—Si (OR1) (I), wherein A stands for a linear or branched alkylene group having 1 to 10 carbon atoms, R1 stands for a linear or branched, possibly halogenated alkyl group having 1 to 10 carbon atoms, R2 stands for a linear or branched, possibly halogenated alkyl group having 1 to 10 carbon atoms, and X is 1, 2, or 3, 1 to 80 wt % of one or more fillers (F), 0.1 to 10 wt % of one or more water catchers (W), 0.01 to 5 wt % of one or more hardening catalysts (K), 0.01 to 10 wt % of one or more adhesion promoters (A), and possibly further substances common in moisture-curing coating compositions, wherein the weight amounts total 100%.

    Abstract translation: 本发明涉及一种使用含有5至75重量%的具有式(I)端基的一个或多个硅烷封端的聚合物(P)的单组分,湿固化涂料组合物(C) - 密封表面的方法-O -C(= O)-NH-A-Si(OR 1)(I)其中A代表具有1-10个碳原子的直链或支链亚烷基,R1代表具有1个 至10个碳原子,R2代表具有1-10个碳原子的直链或支链的可能卤化的烷基,X是1,2或3,1-80重量%的一种或多种填料(F),0.1至 10重量%的一种或多种吸水剂(W),0.01至5重量%的一种或多种硬化催化剂(K),0.01至10重量%的一种或多种助粘剂(A),以及可能的其它常用于水分 固化涂料组合物,其中总重量为100%。

    Poly (hydroxy ether)
    68.
    发明授权
    Poly (hydroxy ether) 失效
    聚(羟基醚)

    公开(公告)号:US4657954A

    公开(公告)日:1987-04-14

    申请号:US857396

    申请日:1986-04-21

    CPC classification number: C08L71/00 C08G59/621 C08G65/2612

    Abstract: Poly(hydroxy ether) having a repeat unit of the formula, ##STR1## wherein R is a dihydric mononuclear phenol residue, R' is a dihydric polynuclear phenol residue, n is a positive number and n' is 0 or a positive number, provided that n and n' satisfy 35.ltoreq.n+n'.ltoreq.400. The poly(hydroxy ether) is useful for the production of paints for metal, wood, glass and plastics as well as varnishes, primers, films, fibers, resin-modifying agents, and molding materials and it is particularly useful for zinc dust paints.

    Abstract translation: 具有下式重复单元的聚(羟基醚)其中R是二元单核酚残基,R'是二元多核酚残基,n是正数,n'是0或正数,提供 n和n'满足35

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