公开(公告)号：US11767398B2

公开(公告)日：2023-09-26

申请号：US17423528

申请日：2020-02-20

Applicant: Merck Patent GmbH

Inventor： M. Dalil Rahman ,  Takashi Sekito

IPC: G03F7/09 ,  C08G8/02 ,  C08G8/30 ,  C09D161/16 ,  G03F7/11 ,  C08G61/02 ,  B05D1/00 ,  B05D3/02 ,  C08G61/12 ,  C08K5/5419 ,  C09D165/00 ,  C09D171/08 ,  G03F1/56 ,  G03F7/00

CPC classification number: C08G61/02 ,  B05D1/005 ,  B05D3/0254 ,  C08G61/12 ,  C08K5/5419 ,  C09D165/00 ,  C09D171/08 ,  B05D2518/00 ,  C08G2261/135 ,  C08G2261/1414 ,  C08G2261/1424 ,  C08G2261/312 ,  C08G2261/3142 ,  C08G2261/3242 ,  C08G2261/90 ,  G03F1/56 ,  G03F7/70283

Abstract: The present invention relates to a composition comprising; components a) b) and d); wherein, component a) is a metal compound having the structure (I), component b) is a spin on high carbon polymer, having a polymer backbone comprising mono-cyclic aromatic hydrocarbon, fused-ring ring hydrocarbon moieties, or mixtures of these, having a wt. % of carbon from about 81 wt. % to about 94 wt. %, which is soluble to at least about 5 wt. % in a spin casting solvent, and wherein at least one, of said mono-cyclic aromatic hydrocarbon or said fused-ring ring hydrocarbon moieties, present in said spin on high carbon polymer, is functionalized with at least one alkynyloxy moiety of structure (VIII), and component d) is a spin casting solvent. The present invention further relates to using this composition in methods for manufacturing electronic devices through either the formation of a patterned films of high K material comprised of a metal oxide on a semiconductor substrate, or through the formation of patterned metal oxide comprised layer overlaying a semiconductor substrate which may be used to selectively etch the semiconductor substrate with a fluorine plasma.

公开(公告)号：US20230279258A1

公开(公告)日：2023-09-07

申请号：US18116710

申请日：2023-03-02

Applicant: Roller Bearing Company of America, Inc

Inventor： Nolan Richard

IPC: C09D163/00 ,  C09D171/08 ,  C09D127/18

CPC classification number: C09D163/00 ,  C09D171/08 ,  C09D127/18

Abstract: A coating composition includes an epoxy resin including an epoxy monomer, a toughener and one or more self-lubricating fillers. The coating composition can be employed in a bearing that has an outer member that has a radially inwardly facing surface that defines an interior area. An inner member is disposed in the interior area. The inner member has a radially outward facing bearing surface. The coating composition is disposed between the radially inwardly facing surface and the radially outward facing bearing surface.

公开(公告)号：US20130253105A1

公开(公告)日：2013-09-26

申请号：US13762039

申请日：2013-02-07

Applicant: SABIC INNOVATIVE PLASTICS IP B.V.

Inventor： Wei Shan

IPC: C09D123/08 ,  H01B13/14 ,  C09D123/20 ,  C09D171/08 ,  C09D153/02

CPC classification number: C09D123/08 ,  C08K5/3492 ,  C08L53/025 ,  C08L71/12 ,  C09D123/20 ,  C09D153/02 ,  C09D171/08 ,  H01B13/148

Abstract: Disclosed are polymer compositions, comprising: (a) a poly(phenylene ether); (b) a hydrogenated block copolymer of an alkenyl aromatic compound and a conjugated diene; (c) a polybutene; (d) a flame retardant; (e) an anti-UV agent wherein the agent comprises a trisaryl-1,3,5-triazine; (f) a copolymer of ethylene and a C3-C12 alpha-olefin; and (g) a polyolefin homopolymer; wherein the polymer composition does not contain a benzotriazole-type UV absorber; all weight percents are based on the total weight of the composition; and wherein an article made from the composition: (i) is substantially stainless; (ii) exhibits a CIELAB color shift, (ΔE) of 3 or less after 168 hours of heat exposure at 75° C.; and (iii) exhibits a CIELAB color shift, (ΔE) of 12 or less after 300 hours of xenon arc exposure according to ASTM D 4459. Also disclosed are processes for making the compositions as well as articles derived therefrom.

Abstract translation: 公开了聚合物组合物，其包含：（a）聚（苯醚）; （b）链烯基芳族化合物和共轭二烯的氢化嵌段共聚物; （c）聚丁烯; （d）阻燃剂; （e）抗紫外线剂，其中所述试剂包括三芳基-1,3,5-三嗪; （f）乙烯和C 3 -C 12α-烯烃的共聚物; 和（g）聚烯烃均聚物; 其中所述聚合物组合物不含苯并三唑型UV吸收剂; 所有重量百分比均以组合物的总重量计; 并且其中由所述组合物制成的制品：（i）基本上不锈钢; （ii）在75℃下暴露168小时后，CIELAB色移（DeltaE）为3以下。 和（iii）根据ASTM D 4459在300小时的氙弧曝光后显示出12或更小的CIELAB色移（DeltaE）。还公开了制备组合物以及由其衍生的制品的方法。

公开(公告)号：US20230416560A1

公开(公告)日：2023-12-28

申请号：US18367663

申请日：2023-09-13

Applicant: AGC Inc.

Inventor： Motoshi AOYAMA ,  Masayuki Haraguchi

IPC: C09D171/08 ,  C09D161/18

CPC classification number: C09D171/08 ,  C09D161/18

Abstract: A surface treatment agent includes: a fluorine-containing compound (A) having a reactive silyl group; and at least one compound (B) selected from the group consisting of a fluorine-containing ketone compound (B1): R1COR2, a fluorine-containing cyclic ketone compound (the following B2), and a fluorine-containing polyether compound (B3): R4—[OR5]q—R6. In Formula (B1), R1 and R2 represent a fluorine-containing alkyl group having from 1 to 5 carbon atoms. In Formula (B2), R3 represents a residue that forms a 3- to 5-membered ring structure with a carbon atom of a carbonyl group and that has a fluorine atom. In Formula (B3), R4 and R6 represent a fluorine-containing alkyl group having from 1 to 3 carbon atoms, q represents an integer of 1 or more, R5 represents a perfluoroalkylene group having from 1 to 6 carbon atoms, and in a case in which q is an integer of 2 or more, plural R5s may be the same or different.

公开(公告)号：US08962096B2

公开(公告)日：2015-02-24

申请号：US13686966

申请日：2012-11-28

Applicant: Jiaxiang Ren ,  David Gerrard

Inventor： Jiaxiang Ren ,  David Gerrard

IPC: B05D1/02 ,  B05D1/06 ,  B05D1/12 ,  C09D181/06 ,  C09D165/02 ,  C09D181/04 ,  C09D171/00

CPC classification number: C09D181/06 ,  C08G2261/135 ,  C08G2261/312 ,  C08G2261/592 ,  C08G2261/598 ,  C08G2261/76 ,  C08G2650/40 ,  C09D165/02 ,  C09D171/00 ,  C09D171/08 ,  C09D181/04 ,  Y10T428/1393 ,  Y10T428/31533 ,  Y10T428/31855 ,  Y10T442/10

Abstract: A method for coating a substrate includes impacting a substrate with a plurality of particles such that the particles adhere to the substrate, bonding the particles to the substrate to form an overlayer, and crosslinking the particles in the overlayer to coat the substrate with a crosslinked polymer coating. The particles comprise a polyphenyl polymer. An article includes a substrate and a crosslinked polymer coating bonded to the substrate. The crosslinked polymer coating is a product of crosslinking polyphenylene sulfide, polyphenylsulfone, self-reinforced polyphenylene, or a combination thereof on a surface of the substrate.

Abstract translation: 一种用于涂覆基材的方法包括用多个颗粒冲击基材，使得颗粒粘附到基材上，将颗粒粘合到基材上以形成覆盖层，并且使覆盖层中的颗粒交联以用交联聚合物涂覆基材 涂层。 颗粒包含聚苯基聚合物。 一种制品包括基材和结合到基材上的交联聚合物涂层。 交联聚合物涂层是在基材的表面上交联聚苯硫醚，聚苯砜，自增强聚亚苯基或其组合的产物。

公开(公告)号：US08669333B2

公开(公告)日：2014-03-11

申请号：US13807663

申请日：2011-06-08

Applicant: Kazuo Arita ,  Etsuko Suzuki

Inventor： Kazuo Arita ,  Etsuko Suzuki

IPC: C08F283/10

CPC classification number: C08G65/48 ,  C08G59/08 ,  C08G59/42 ,  C08G59/4223 ,  C08G59/4276 ,  C08J5/24 ,  C08J2363/00 ,  C08J2371/08 ,  C08L63/00 ,  C08L67/03 ,  C08L71/08 ,  C09D171/08 ,  H01B3/40 ,  H01B3/421 ,  H05K1/0326 ,  H05K3/323 ,  H05K3/4676 ,  H05K2201/012 ,  Y10T428/31511 ,  Y10T428/31529

Abstract: A thermosetting resin composition contains an active ester resin (A) and an epoxy resin (B) as essential components, the active ester resin (A) having a resin structure which includes a polyaryleneoxy structure (I) and in which aromatic carbon atoms in a plurality of the polyaryleneoxy structures (I) are linked through a structural site (II) represented by a structural formula 1 (wherein Ar represents a phenylene group, a phenylene group nuclear-substituted by 1 to 3 alkyl groups each having 1 to 4 carbon atoms, a naphthylene group, or a naphthylene group nuclear-substituted by 1 to 3 alkyl groups each having 1 to 4 carbon atoms).

Abstract translation: 作为必要成分的热固性树脂组合物含有活性酯树脂（A）和环氧树脂（B），具有树脂结构的活性酯树脂（A）含有聚亚芳基氧基结构（I），其中芳香族碳原子 多个聚亚芳基氧基结构（I）通过由结构式1表示的结构位点（II）连接（其中Ar表示亚苯基，被1〜3个碳原子数为1〜4的烷基核取代的亚苯基） ，亚萘基或被1〜3个碳原子数为1〜4的烷基核取代的亚萘基）。

公开(公告)号：US20120208009A1

公开(公告)日：2012-08-16

申请号：US13396532

申请日：2012-02-14

Applicant: Takashi Oda ,  Naohide Takamoto ,  Takeshi Matsumura

Inventor： Takashi Oda ,  Naohide Takamoto ,  Takeshi Matsumura

IPC: B32B3/00 ,  B32B27/38

CPC classification number: C09D171/08 ,  H01L21/78 ,  H01L23/3114 ,  H01L23/3164 ,  H01L23/562 ,  H01L2924/0002 ,  Y10T428/265 ,  Y10T428/31511 ,  H01L2924/00

Abstract: The present invention aims to provide a film for forming a protective layer that is capable of preventing cracks in a low dielectric material layer of a semiconductor wafer while suppressing an increase in the number of steps in the manufacture of a semiconductor device. This object is achieved by a film for forming a protective layer on a bumped wafer in which a low dielectric material layer is formed, including a support base, an adhesive layer, and a thermosetting resin layer, laminated in this order, wherein the melt viscosity of the thermosetting resin layer is 1×102 Pa·S or more and 2×104 Pa·S or less, and the shear modulus of the adhesive layer is 1×103 Pa or more and 2×106 Pa or less, when the thermosetting resin layer has a temperature in a range of 50 to 120° C.

Abstract translation: 本发明的目的在于提供一种形成保护层的膜，其能够防止半导体晶片的低电介质材料层中的裂纹，同时抑制半导体器件的制造中的步骤数量的增加。 该目的通过在其上形成低介电材料层的凸起晶片上形成保护层的膜来实现，该薄膜包括依次层叠的支撑基底，粘合层和热固性树脂层，其中熔体粘度 的热固性树脂层的摩尔比为1×102Pa·S以上且2×104Pa·S以下，粘合剂层的剪切模量为1×10 3 Pa以上2×10 6 Pa以下时， 树脂层的温度为50〜120℃。

公开(公告)号：US11958986B2

公开(公告)日：2024-04-16

申请号：US17272026

申请日：2020-04-01

Applicant: LG CHEM, LTD.

Inventor： Jeehyon Min ,  Mingoo Kim ,  Miyeon Oh ,  Jinkyu Lee ,  Hong Shik Shim

IPC: C09D171/08 ,  C08K5/315 ,  C09D5/14 ,  C09D7/63 ,  C09D133/10 ,  C09D171/02

CPC classification number: C09D171/08 ,  C08K5/315 ,  C09D5/14 ,  C09D7/63 ,  C09D133/10 ,  C09D171/02

Abstract: The present disclosure relates to: an antibacterial polymer coating composition comprising a (meth)acrylic polyol resin, which has a number average molecular weight of 3,000-20,000, a (co)polymer containing an ethylene glycol repeating unit, and a photosensitizer; an antibacterial polymer film comprising a cured product of the antibacterial polymer coating composition; and an antibacterial polymer film which comprises a substrate layer and a photosensitizer, the substrate layer comprising a (meth)acrylic polyol resin having a number average molecular weight of 3,000-20,000 and a (co)polymer containing an ethylene glycol repeating unit, and the photosensitizer being dispersed in the substrate layer.

公开(公告)号：US20240067844A1

公开(公告)日：2024-02-29

申请号：US18271608

申请日：2022-01-13

Applicant: DH Technologies Development Pte. Ltd.

Inventor： Pei-Hsun Wei

IPC: C09D171/08 ,  G01N30/60

CPC classification number: C09D171/08 ,  G01N30/60

Abstract: The disclosure provides a series of polyol solutions that are useful in capillary gel electrophoresis methods and compositions of matter (e.g., capillaries, capillary cartridges, and kits). The polyol solutions can maintain, protect, and improve capillary integrity and useful lifespan, polymer coating rehydration characteristics, avoid damage to polymer coatings, and increase the consistency in capillary performance between multiple separations.

公开(公告)号：US20180258295A1

公开(公告)日：2018-09-13

申请号：US15914620

申请日：2018-03-07

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Jen-You CHU ,  Chia-Le WU ,  Feng-Sheng KAO ,  Chin-Ping HUANG ,  Yi-Chun CHEN

IPC: C09D5/16 ,  B32B27/14 ,  C09D129/04 ,  C09D171/08 ,  C08G83/00 ,  B32B27/30 ,  B32B27/28 ,  B32B27/36

CPC classification number: C09D5/1637 ,  B32B27/14 ,  B32B27/281 ,  B32B27/302 ,  B32B27/304 ,  B32B27/308 ,  B32B27/36 ,  C08G83/003 ,  C09D7/65 ,  C09D129/04 ,  C09D171/08 ,  C09D201/005

Abstract: A composite structure is provided, which includes a support, an active layer wrapping the support, a dendrimer grafted to the active layer through covalent bondings, and a plurality of anti-fouling groups, wherein each of the anti-fouling groups is grafted to terminals of the dendrimer through covalent bondings. The terminals of the dendrimer include amino group, hydroxyl group, or thiol group.