Abstract:
A pixel structure including a scan line, a data line, an active device, a shielding electrode, and a pixel electrode is provided on a substrate. The data line includes an upper conductive wire and a bottom conductive wire. The upper conductive wire is disposed over and across the scan line. The bottom conductive wire is electrically connected to the upper conductive wire. The active device is electrically connected to the scan line and the upper conductive wire. The shielding electrode is disposed over the bottom conductive wire. The pixel electrode disposed over the shielding electrode is electrically connected to the active device. In addition, parts of the pixel electrode and parts of the shielding electrode form a storage capacitor.
Abstract:
A reflective type touch-sensing display panel including a front substrate, scan lines, data lines, pixel structures, photo-sensors, readout devices, a rear substrate and a reflective display medium is provided. The front substrate has an inner surface. The scan lines and the data lines are on the inner surface of the front substrate and intersected to each other. The pixel structures are disposed on the inner surface of the front substrate, and each pixel structure is electrically connected to one of the scan lines and one of the data lines correspondingly. The photo-sensors are disposed on the inner surface of the front substrate. Each readout device is electrically connected to one of the photo-sensor correspondingly. The rear substrate is disposed opposite to the front substrate. The reflective display medium is sealed between the front substrate and the rear substrate.
Abstract:
A pixel structure of a fringe field switching liquid crystal display (FFS-LCD) and a method for manufacturing the pixel structure are provided. Compared to the conventional method of using seven photolithography-etching processes for manufacturing a pixel structure, the method of the present invention uses only six photolithography-etching processes that save manufacturing costs and time. Furthermore, the pixel structure thereby only comprises two insulating layers, and thus, the light transmittance thereof can be increased in comparison to the conventional pixel structure comprising three insulating layers.
Abstract:
An active device array substrate and its fabricating method are provided. According to the subject invention, the elements of an array substrate such as the thin film transistors, gate lines, gate pads, data lines, data pads and storage electrodes, are provided by forming a patterned first metal layer, an insulating layer, a patterned semiconductor layer and a patterned metal multilayer. Furthermore, the subject invention uses the means of selectively etching certain layers. Using the aforesaid means, the array substrate of the subject invention has some layers with under-cut structures, and thus, the number of the time-consuming and complicated mask etching process involved in the production of an array substrate can be reduced. The subject invention provides a relatively simple and time-saving method for producing an array substrate.
Abstract:
A pixel structure is provided. The pixel structure comprises a lower substrate with a transistor and pixel area; a first patterned conductive layer, which has a data line and a gate within the transistor area that is disposed on the lower substrate; a patterned insulator layer covering the first patterned conductive layer; an active layer disposed on the patterned insulator layer above the gate; a second patterned conductive layer with a gate line disposed on the patterned insulator layer, source and drain, wherein the source and the drain are disposed on the active layer; a pixel electrode disposed on the patterned insulator layer and electrically connected to the drain; a patterned passivation layer disposed on the patterned insulator layer, gate line, source, drain and pixel electrode; and a third patterned conductive layer, which has a data line connecting electrode, a gate line connecting electrode, at least one alignment electrode and a common electrode. The data line is electrically connected to the source through the data line connecting electrode; the gate line is electrically connected to the gate through the gate line connecting electrode; the alignment electrode is electrically connected to the pixel electrode; and a portion of the common electrode is disposed above the data line.
Abstract:
An active matrix array structure, disposed on a substrate, includes a first patterned conductive layer, a patterned gate insulating layer, a patterned semiconductor layer, a second patterned conductive layer, a patterned overcoat layer and a transparent conductive layer. The patterned gate insulating layer has first openings that expose a part of the first patterned conductive layer. The patterned semiconductor layer is disposed on the patterned gate insulating layer. The second patterned conductive layer is disposed on the patterned semiconductor layer. The patterned overcoat layer has second openings that expose a part of the first patterned conductive layer and a part of the second patterned conductive layer. The transparent conductive layer is completely disposed on the substrate. The transparent conductive layer disposed in the first openings and the second openings is broken off at a position that is in between the substrate and the patterned overcoat layer.
Abstract:
A liquid crystal display (LCD) panel and a manufacturing method thereof are provided. The manufacturing method includes providing a panel including a first substrate having scan lines, data lines, an active device electrically connecting the scan and data lines, and a pixel electrode electrically connecting the active device, a second substrate having an opposite electrode, and a liquid crystal (LC) layer disposed between the first and the second substrates and having a monomer material. A first curing voltage and a second curing voltage are applied to the scan and data lines, respectively. The second curing voltage is thus transmitted to the pixel electrode. The first curing voltage is higher than an absolute value of the second curing voltage. The monomer material is polymerized to form a first polymer stabilized alignment (PSA) layer between the LC layer and the first substrate and a second PSA layer between the LC layer and the second substrate. The electrical field is then removed.
Abstract:
A method of manufacturing a pixel structure is provided. A first patterned conductive layer including a gate and a data line is formed on a substrate. A gate insulating layer is formed to cover the first patterned conductive layer and a semiconductor channel layer is formed on the gate insulating layer above the gate. A second patterned conductive layer including a scan line, a common line, a source and a drain is formed on the gate insulating layer and the semiconductor channel layer. The scan line is connected to the gate and the common line is located above the data line. The source and drain are located on the semiconductor channel layer, and the source is connected to the data line. A passivation layer is formed on the substrate to cover the second patterned conductive layer. A pixel electrode connected to the drain is formed on the passivation layer.
Abstract:
A liquid crystal display panel is provided. The liquid crystal display panel includes an active device array substrate, an opposite substrate, a plurality of scan lines, a plurality of data patterns, a plurality of connecting patterns, a plurality of active devices, a plurality of transparent pixel electrodes, a plurality of common lines, at least one polymer layer, and a liquid crystal layer. The opposite substrate is disposed above the active device array substrate. The scan lines, the data patterns and the connecting patterns are disposed on the active device array substrate, and the data patterns and the connecting patterns form data lines via contact holes. The common lines are disposed between the transparent pixel electrodes and the data lines, and a part of each common line overlaps the corresponding data pattern. The polymer layer is disposed on at least one of the active device array substrate and the opposite substrate.
Abstract:
A pixel structure includes a scan line, a data line, an active element, a first passivation layer, a second passivation layer and a pixel electrode. The data line includes a first data metal segment and a second data metal layer. The active element includes a gate electrode, an insulating layer, a channel layer, a source and a drain. The channel layer is positioned on the insulating layer above the gate electrode. The source and the drain are positioned on the channel layer. The source is coupled to the data line. The first passivation layer and the second passivation layer cover the active element and form a first contact hole to expose a part of the drain. The second passivation layer covers a part edge of the drain. The pixel electrode is disposed across the second passivation layer and coupled to the drain via the first contact hole.