公开(公告)号：US3814276A

公开(公告)日：1974-06-04

申请号：US28034472

申请日：1972-08-14

Applicant: M & T CHEMICALS INC

Inventor： VAN GORDON D ,  MC NALLY P

IPC: B65D41/28 ,  B65D41/04

CPC classification number: B65D41/28

Abstract: The tendency of threaded closures for metal containers employing metal caps or plugs to become inoperative as a result of corrosion or excessive wearing away of the threads is significantly reduced by employing a hollow, non-metallic member that is removably engaged with both the perimeter of the container aperture and the cap or plug. A metallic cover forms part of the closure assembly and conceals all non-metallic members, thereby conforming to the requirement for a container exhibiting a completely metallic exterior surface.

Abstract translation: 使用金属盖或塞子的金属容器的螺纹封闭件由于腐蚀或螺纹过度磨损而变得不起作用的趋势通过使用中空非金属构件而显着减少，该中空非金属构件可拆卸地与 容器孔和盖或插头。 金属盖形成封闭组件的一部分并且隐藏所有非金属构件，从而符合对呈现完全金属外表面的容器的要求。

公开(公告)号：US3804768A

公开(公告)日：1974-04-16

申请号：US9463470

申请日：1970-12-02

Applicant: M & T CHEMICALS INC

Inventor： EPPENSTEINER F

IPC: C23F1/40 ,  C23F1/44 ,  C09K3/00

CPC classification number: C23F1/40 ,  C23F1/44

Abstract: A METHOD IS PROVIDED FOR IMPARTING DECORATIVE, LIGHT DIFFUSING AND/OR NON-REFLECTIVE ETCHING TO NICKEL SURFACES WHICH INCLUDES IMMERSING OBJECTS HAVING CLEAN NICKEL SURFACES IN A SOLUTION HAVING A PH WITHHIN THE RANFE OF 9-12 AND CONTAINING A NICKEL OXIDANT, ETHYLENEDIAMINE AND A SOURCE OF SULFATE ION, FOR A PERIOD OF TIME SUFFICIENT TO FORM CRYSTALS ON THE NICKEL SURFACES, WITHDRAWING THE OBJECTS WITH THE CRYSTAL FORMATION THEREON FROM THE NICKEL TION, REMOVING ANY REMAINING SOLUTION FROM THE NICKEL SURFACES, AND IMMERSING THE OBJECTS IN A CRYSTAL SOLVENT TO DISSOLVE THE CRYSTALS, AND REMOVING THE OBJECTS WITH THE ETCHED NICKEL SURFACES THEREON, THE PATTERN OF THE ETCHING BEING SUBSTANTIALLY THE SAME AS THE ORIGINAL CRYSTAL FORMATION THEREON, FURTHER, SOLUTIONS ARE PROVIDED FOR IMPARTING THE DECORATIVE, LIGHT DIFFUSING AND/OR NON-REFLECTIVE ETCH AND OBJECTS HAVING DISPOSED THEREON DECORATIVE, LIGHT DIFFUSING AND/OR NON-REFLECTIVE ETCHED NICKEL SURFACES.

公开(公告)号：US3716394A

公开(公告)日：1973-02-13

申请号：US3716394D

申请日：1971-03-09

Applicant: M & T CHEMICALS INC

Inventor： WAGGONER T ,  SEYB E

IPC: C23C18/20 ,  C23C3/02

CPC classification number: C23C18/30 ,  C23C18/2033 ,  C23C18/2086 ,  C23C18/285

Abstract: This invention relates to a method of modifying a hydrohalogen polymer surface wherein said hydrohalogen polymer is selected from the group consisting of polyvinyl chloride, polyvinylidene chloride, and polyvinyl dichloride which comprises contacting the hydrohalogen polymer surface with an alkali metal alkoxide MOR wherein M is an alkali metal and R is an alkyl group at a temperature of 2* to 106* C for a time increment of 5 minutes to 300 minutes thereby forming an alkoxide-activated surface thereof; contacting said surface with an oxygen-containing oxidizing agent of sufficient strength to convert an olefinic double bond to the corresponding aldehyde or carboxyl group to form an oxygen-activated, alkoxide-activated surface; and electrolessly depositing onto said surface a metal deposit.

Abstract translation: 本发明涉及一种改变氢卤素聚合物表面的方法，其中所述氢卤素聚合物选自聚氯乙烯，聚偏二氯乙烯和聚氯乙烯，其包括使氢卤素聚合物表面与碱金属醇盐MOR接触，其中M是碱 金属，R为2〜106℃的烷基，时间增量为5分钟〜300分钟，由此形成其醇盐活化表面; 使所述表面与足够强度的含氧氧化剂接触以将烯属双键转化成相应的醛或羧基以形成氧活化的醇盐活化表面; 以及在所述表面上无电沉积金属沉积物。

公开(公告)号：US3702809A

公开(公告)日：1972-11-14

申请号：US3702809D

申请日：1969-05-01

Applicant: M & T CHEMICALS INC

Inventor： BEDI RAM DEV

IPC: C25D5/00 ,  C23F13/00 ,  C25D5/02 ,  C25D17/10 ,  C23B5/48

CPC classification number: C25D5/02 ,  Y10S204/07

Abstract: THIS INVENTION RELATES TO NOVEL COMPOSITIONS AND TO THE PROCESS FOR ELECTROPLATING A PLATE METAL ONTO A CATHODE OF HIGH HYDROGEN OVERVOLTAGE BASIS METAL HAVING AREAS OF LOW CATHODIC CURRENT DENSITY WHEREON PLATING DOES NOT OCCUR AND SELECTED AREAS OF HIGH CATHODE CURRENT DENSITY WHICH COMPRISES PLACING ONLY THE CATHODE AREAS OF LOW CATHODE CURRENT DENSITY IN ITIMATE ELECTRICAL CONTACT WITH A LOW HYDROGEN OVERVOLTAGE METAL HAVING A HYDROGEN OVERVOLTAGE OF LESS THAN ABOUT 0.3 VOLT AT A CURRENT DENSITY OF 0.1 AMPERE PER SQUARE DECIMETER; AND PLATING THE PLATE METAL ONTO SAID SELECTED AREAS OF THE SURFACE OF SAID CATHODE, THE SAID CATHODE AREAS OF LOW CURRENT DENSITY REMAINING SUBSTANTIALLY FREE OF ETCHING DURING SAID PLATING.

公开(公告)号：US3699985A

公开(公告)日：1972-10-24

申请号：US3699985D

申请日：1971-03-03

Applicant: M & T CHEMICALS INC

Inventor： FAUST ELBERT R

IPC: B65G27/00 ,  B65G49/04 ,  C25D17/28 ,  B65G49/02 ,  B08B3/04

CPC classification number: C25D17/28 ,  B65G27/00 ,  B65G49/0427

Abstract: A system for the continuous plating, cleaning or rinsing of articles wherein all surfaces of the articles are uniformly and entirely exposed to the fluid through which they are conveyed. A trough suspended within a fluid bath is operative to cyclically move forward and upward and abruptly return to its initial position thereby to cause articles in the trough to inertially fall to positions successively forward of the trough and in new positions with respect to the trough and other articles.

公开(公告)号：US3699138A

公开(公告)日：1972-10-17

申请号：US3699138D

申请日：1971-06-18

Applicant: M & T CHEMICALS INC

Inventor： DEBRECZENI EUGENE J ,  KUSHLEFSKY BERNARD G

IPC: C07F7/22

CPC classification number: C07F7/2292

Abstract: Distannanes of the formula R3Sn-SnR3, wherein R represents a monovalent hydrocarbon radical, are prepared in high yield and purity by reacting the corresponding triorganotin halide with molten metallic sodium at elevated temperature in the absence of any solvent or diluent other than the reactants.

Abstract translation: 在不存在除反应物之外的任何溶剂或稀释剂的情况下，通过使相应的三有机锡卤化物与熔融金属钠在升高的温度下反应，以高产率和纯度制备式R3Sn-SnR3（其中R表示一价烃基）的二烷基。

公开(公告)号：US3693020A

公开(公告)日：1972-09-19

申请号：US3693020D

申请日：1969-11-04

Applicant: M & T CHEMICALS INC

Inventor： ACKERMAN HERVEY W JR

IPC: G01N17/00 ,  G01N21/33 ,  G01N21/30

CPC classification number: G01N21/33 ,  G01N17/004

Abstract: Methods and apparatus are provided for the simultaneous impartation and measurement of photoinitiated degradation of a plurality of resin samples by the application thereto of actinic radiation while continuously measuring the radiation passing through the resins so as to determine constantly the effectiveness quantitatively of different stabilizer components contained in the resins from initial exposure through the maximum rate of discoloration, and during a period of time substantially reduced from corresponding conditions produced under natural weather conditions. In addition, single means are provided for producing the radiation and the photodegradation, as well as means for constantly monitoring and measuring the radiation intensity alone and the degrading effects thereof on the resin samples, and under constantly maintained temperature conditions.

Abstract translation: 提供了通过应用光化辐射同时赋予和测量多个树脂样品的光引发降解的方法和装置，同时连续测量通过树脂的辐射，以便定期地确定包含在其中的不同稳定剂组分的有效性 最初暴露于最大变色速率下的树脂，以及在自然天气条件下产生的相应条件下的一段时间内。 另外，提供了用于产生辐射和光降解的单一装置，以及用于不断监测和测量单独的辐射强度及其对树脂样品的降解作用以及在恒定的温度条件下的手段。

公开(公告)号：US3682788A

公开(公告)日：1972-08-08

申请号：US3682788D

申请日：1970-07-28

Applicant: M & T CHEMICALS INC

Inventor： KARDOS OTTO ,  ARCILESI DONALD ALLAN ,  TOMSON ARTHUR JAMES ,  VALAYIL SYLVESTER PAUL

IPC: C25D3/38 ,  C23B5/20 ,  C23B5/46

CPC classification number: C25D3/38

Abstract: IN ACCORDANCE WITH CERTAIN OF ITS ASPECTS, THIS INVENTION RELATES TO NOVEL COMPOSITIONS AND TO A PROCESS FOR ELECTRODEPOSITING BRIGHT, STRONGLY LEVELED, DUCTILE COPPER FROM AN AQUEOUS ACIDIC COPPER PLATING BATH CONTAINING CHLORIDE IONS AND AT LEAST ONE MEMBER INDEPENDENTLY SELECTED FROM EACH OF THE FOLLOWING GROUPS: (A) A POLYSULFIDE COMPOUND OF THE FORMULA

R''-(S)N-R-SO3M

(B) AN OPEN-THIOUREA COMPOUND OF THE FORMULA

R1-N(-R2)-C(=S)-N(-R3)-R4

AND/OR TAUTOMERS THEREOF; AND

(C) A POLYETHER CONTAINING AT LEAST 5 ETHER OXYGEN ATOMS PER MOLECULE; WHEREIN EACH R IS INDEPENDENTLY A DIVALENT ALIPHATIC OR AROMATIC NON-HETERCYCLIC GROUP OF 1-10 CARBON ATOMS; R'' IS HYDROGEN, A METAL CATION, A MONOVALENT ALIPHATIC OR AROMATIC GROUP OF 1-20 CARBON ATOMS, OR THE GROUPS -R-SO3M OR -R-(S)Q-RSO3M WHEREIN Q IS AN INTEGER 2-5; M IS A CATION; EACH OF R1, R2, R3, AND R4 IS INDEPENDENTLY HYDROGEN OR AN ALKYL, ARYL, ALKENYL, ACETYL, ALDEHYDOALKYL, AMINO, HETERO GROUP HAVING A RING CONTAINING 5-7 RING ATOMS AND AT LEAT ONE HETER-ATOM SELECTED FROM THE GROUP CONSISTING OF OXYGEN, NITROGEN, AND SULFUR; HYDROXYALKYL OR AMINOALKYL GROUP OF 1-6 CARBON ATOMS; WITH AT LEAST ONE R1-4 A HYDROGEN ATOMS; EACH OF R1-2 AND R3-4 MAY FROM A RING WITH EACH OF THE NITROGEN ATOMS; AND N IS AN INTEGER 2-5.

公开(公告)号：US3668506A

公开(公告)日：1972-06-06

申请号：US3668506D

申请日：1971-04-16

Applicant: M & T CHEMICALS INC

Inventor： BEASLEY JACK O ,  MOHARY PAUL J

IPC: H01F27/40 ,  H01L23/473 ,  H02M7/00

CPC classification number: H01F27/40 ,  H01L23/473 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Apparatus is provided for the rectification of a power source for the use ultimately in such applications as electroplating, with the apparatus utilizing electrical conducting materials in the form of tubing for conveying simultaneously cooling fluids directly to areas adjacent parts requiring cooling during operation, and electrical current over substantial portions of the circuitry of the apparatus. In addition, new heat sink arrangements are provided for more even distribution of cooling fluids over parts to be cooled, and new clamping arrangements are provided for even distribution of pressure on parts being held and which clamping arrangements are readily manipulated by a single adjustment.

Abstract translation: 提供了用于整流电源的设备，用于最终在诸如电镀的应用中使用的电源，该设备利用导管形式的导电材料，以同时将冷却流体直接传送到在运行期间需要冷却的区域的相邻区域，以及电流 在设备的电路的大部分上。 另外，提供了新的散热器装置，用于在要冷却的部件上更均匀地分配冷却流体，并且提供了新的夹紧装置，用于在保持的部件上均匀分布压力，并且通过单次调节容易地操纵夹紧装置。

公开(公告)号：US3665025A

公开(公告)日：1972-05-23

申请号：US3665025D

申请日：1969-12-29

Applicant: M & T CHEMICALS INC

Inventor： WOWK ANATOLE

IPC: C08K5/00 ,  C07F7/22 ,  C08K5/56 ,  C08K5/58 ,  C08L1/00 ,  C08L27/00 ,  C08L33/00 ,  C08L33/02

CPC classification number: C08K5/58 ,  C07F7/2268

Abstract: This invention comprises novel compounds exhibiting one direct carbon to tin bond, one direct halogen to tin bond and two direct sulfur to tin bonds, methods of preparing these novel compounds, and to polymers stabilized by these novel compounds against the deteriorative effects of heat and light.