公开(公告)号：US10216101B2

公开(公告)日：2019-02-26

申请号：US15525626

申请日：2015-11-04

Applicant: ASML Netherlands B.V.

Inventor： Han-Kwang Nienhuys ,  Sjoerd Nicolaas Lambertus Donders ,  Gosse Charles De Vries ,  Michael Jozef Mathijs Renkens ,  Erik Roelof Loopstra

IPC: G03F7/20 ,  G02B5/18 ,  G02B7/18

Abstract: A reflector (2) comprising a plate (4) supported by a substrate (8), wherein the plate has a reflective surface (5) and is secured to the substrate by adhesive free bonding, and wherein a cooling channel array (10) is provided in the reflector. The channels (16) of the cooling channel array may be formed from open channels in a surface of the substrate, the open channels being closed by the plate to create the channels.

公开(公告)号：US10209629B2

公开(公告)日：2019-02-19

申请号：US15824686

申请日：2017-11-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcel Beckers ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Ferdy Migchelbrink ,  Elmar Evers

IPC: G03F7/20

Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.

公开(公告)号：US10180629B2

公开(公告)日：2019-01-15

申请号：US15385584

申请日：2016-12-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Joeri Lof ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Aleksey Yurievich Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Johannes Catherinus Hubertus Mulkens ,  Roelof Aeilko Siebranc Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Erik Theodorus Maria Bijlaart ,  Christian Alexander Hoogendam ,  Helmar Van Santen ,  Marcus Adrianus Van De Kerkhof ,  Mark Kroon ,  Arie Jeffrey Den Boef ,  Joost Jeroen Ottens ,  Jeroen Johannes Sophia Maria Mertens

IPC: G03F7/20

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

公开(公告)号：US10095128B2

公开(公告)日：2018-10-09

申请号：US15528187

申请日：2015-11-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Theodorus Petrus Maria Cadee ,  Benjamin Joseph De Smet ,  Sjoerd Nicolaas Lambertus Donders ,  Adrianus Marinus Verdonck

IPC: G03F7/20 ,  F25B39/02 ,  G02B7/02 ,  G02B7/18

Abstract: A method of thermally conditioning a physical object, includes guiding a two-phase cooling medium through a cooling duct of the physical object, wherein the guiding includes: guiding the two-phase cooling medium in a liquid phase via a pre-heating duct of the physical object from a supply side of the physical object at least partly towards a discharging side of the physical object, the two-phase cooling medium being pre-heated in the pre-heating duct; guiding the two-phase cooling medium from the pre-heating duct to a phase transitioning duct of the physical object, the two-phase cooling medium at least partly transitioning from the liquid phase towards a gas phase in the phase transitioning duct; guiding the two-phase cooling medium from the phase transitioning duct to a discharging duct of the physical object; and discharging at the discharging side the two-phase cooling medium from the discharging duct.

公开(公告)号：US09885965B2

公开(公告)日：2018-02-06

申请号：US15448438

申请日：2017-03-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Christiaan Alexander Hoogendam ,  Antonius Theodorus Anna Maria Derksen ,  Sjoerd Nicolaas Lambertus Donders ,  Joeri Lof ,  Erik Roelof Loopstra ,  Johannes Catharinus Hubertus Mulkens ,  Hans Jansen ,  Jacobus Johannus Leonardus Hendricus Verspay ,  Alexander Straaijer ,  Bob Streefkerk

IPC: G03B27/58 ,  G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70833 ,  G03F7/7085 ,  G03F7/70916 ,  G03F9/7088

Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

公开(公告)号：US09804509B2

公开(公告)日：2017-10-31

申请号：US15452403

申请日：2017-03-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Timotheus Franciscus Sengers ,  Sjoerd Nicolaas Lambertus Donders ,  Hans Jansen ,  Arjen Boogaard

IPC: G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/70591 ,  G03F7/7085 ,  G03F7/7095

Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.

公开(公告)号：US09753380B2

公开(公告)日：2017-09-05

申请号：US15251915

申请日：2016-08-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Johannes Sophia Maria Mertens ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Antonius Johannus Van Der Net ,  Franciscus Johannes Herman Maria Teunissen ,  Patricius Aloysius Jacobus Tinnemans ,  Martinus Cornelis Maria Verhagen ,  Jacobus Johannus Leonardus Hendricus Verspay ,  Edwin Augustinus Matheus Van Gompel

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341

Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.

公开(公告)号：US09746788B2

公开(公告)日：2017-08-29

申请号：US15293009

申请日：2016-10-13

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Nicolaas Rudolf Kemper ,  Henrikus Herman Marie Cox ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Nicolaas Ten Kate ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Franciscus Johannes Herman Maria Teunissen ,  Jan-Gerard Cornelis Van Der Toorn ,  Martinus Cornelis Maria Verhagen ,  Stefan Philip Christiaan Belfroid ,  Johannes Petrus Maria Smeulers ,  Herman Vogel

IPC: G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

Abstract: A lithographic projection apparatus, including a liquid supply system configured to supply a liquid to a space between a projection system and a movable table; a member to at least partly confine liquid in the space, the member including a recovery opening facing toward the movable table, the recovery opening including a first porous structure configured to recover fluid; and a chamber configured to receive recovered fluid and to separate liquid from gas in the recovered fluid, the chamber including a second porous structure.

公开(公告)号：US09606449B2

公开(公告)日：2017-03-28

申请号：US14975513

申请日：2015-12-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob Streefkerk ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Michel Riepen

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.

公开(公告)号：US20160370713A1

公开(公告)日：2016-12-22

申请号：US15250658

申请日：2016-08-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcel BECKERS ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Ferdy Migchelbrink ,  Elmar Evers

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/70808

Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.