Method and apparatus for detecting defects
    71.
    发明申请
    Method and apparatus for detecting defects 失效
    检测缺陷的方法和装置

    公开(公告)号:US20060068512A1

    公开(公告)日:2006-03-30

    申请号:US11206209

    申请日:2005-08-18

    IPC分类号: H01L21/66 G01R31/26

    摘要: An inspection apparatus projects a laser beam on the surface of a SOI wafer and detects foreign matter on and defects in the surface of the SOI wafer by receiving scattered light reflected from the surface of the SOI wafer. The wavelength of the laser beam used by the inspection apparatus is determined so that a penetration depth of the laser beam in a Si thin film may be 10 nm or below to detect only foreign matter on and defects in the outermost surface and not to detect foreign matter and defects in a BOX layer. Only the foreign matter on and defects in the outermost surface layer can be detected without being influenced by thin-film interference by projecting the laser beam on the surface of the SOI wafer and receiving scattered light rays.

    摘要翻译: 检查装置将激光束投射在SOI晶片的表面上,通过接收从SOI晶片的表面反射的散射光来检测SOI晶片的异物和表面的缺陷。 确定检查装置使用的激光束的波长,使得Si薄膜中的激光束的穿透深度可以为10nm以下,仅检测异物和最外表面的缺陷,并且不检测外部 BOX层的物质和缺陷。 只有通过将激光束投射在SOI晶片的表面上并且接收散射光线,才能够检测出最外层的异物和缺陷,而不受薄膜干涉的影响。

    Method of and apparatus for detecting foreign substances
    72.
    发明授权
    Method of and apparatus for detecting foreign substances 失效
    异物检测方法及装置

    公开(公告)号:US5225886A

    公开(公告)日:1993-07-06

    申请号:US584120

    申请日:1990-09-18

    IPC分类号: G01N21/94

    CPC分类号: G01N21/94

    摘要: Disclosed herein are method of and apparatus for detecting a foreign substance on an object by illuminating said object, detecting via an optical system light reflected from said object and detecting said foreign substance in distinction from a background. The object is exposed to first illumination such that light reflected from said background is suppressed but light reflected from said foreign substance is highlighted relative to the light reflected from said background. The light reflected from said object as a result of said first illumination is detected, thereby obtaining a first detection signal. The object is exposed to second illumination such that light reflected from said background is free from suppression relative to the light reflected from said substance as a result of said second illumination. The light reflected from said object as a result of said second illumination is detected, thereby obtaining a second detection signal. Foreign-substance-highlighting processing is performed on said first detection signal by using said second detection signal, whereby said substance is detected.

    摘要翻译: 本文公开了通过照射所述物体来检测物体上的异物的方法和装置,通过光学系统检测从所述物体反射的光并检测所述异物与背景的区别。 对象被暴露于第一照明,使得从所述背景反射的光被抑制,而从所述异物反射的光相对于从所述背景反射的光被突出显示。 检测由于所述第一照明而从所述物体反射的光,从而获得第一检测信号。 物体暴露于第二照明,使得从所述背景反射的光相对于作为所述第二照明的结果从所述物质反射的光没有抑制。 检测作为所述第二照明的结果从所述物体反射的光,从而获得第二检测信号。 通过使用所述第二检测信号对所述第一检测信号进行异物突出处理,从而检测所述物质。

    Detection of surface particles by dual semiconductor lasers having
stable illumination intensities
    73.
    发明授权
    Detection of surface particles by dual semiconductor lasers having stable illumination intensities 失效
    通过具有稳定照明强度的双重半导体激光器检测表面颗粒

    公开(公告)号:US4814596A

    公开(公告)日:1989-03-21

    申请号:US74858

    申请日:1987-07-17

    CPC分类号: G01N21/94

    摘要: Disclosed is an apparatus for detecting particles comprising semiconductor laser drive means for performing feedback control of semiconductor lasers, each thereof incorporating a sensor therewith for monitoring laser-output thereof, by using the output of the sensor, means for holding the feedback voltage, illuminating means including a plurality of optical means disposed to oppose each other so that the laser-outputs from the semiconductor lasers are obliquely applied onto a specimen, and detection means for detecting the light scattered from the particles present on the specimen.

    摘要翻译: 公开了一种用于检测粒子的装置,包括用于执行半导体激光器的反馈控制的半导体激光器驱动装置,每个半导体激光器结合有传感器,用于监视其激光输出,通过使用传感器的输出,用于保持反馈电压的装置,照明装置 包括设置成彼此相对的多个光学装置,使得来自半导体激光器的激光输出倾斜地施加到样本上;以及检测装置,用于检测从存在于样本上的颗粒散射的光。

    Method and apparatus for detecting defects on a wafer
    74.
    发明授权
    Method and apparatus for detecting defects on a wafer 有权
    用于检测晶片上的缺陷的方法和装置

    公开(公告)号:US07567343B2

    公开(公告)日:2009-07-28

    申请号:US11500421

    申请日:2006-08-08

    IPC分类号: G01N21/88

    摘要: As circuit patterns become finer in recent years, improvement in detection sensitivity of defects is required. To answer this, sensitivity is being enhanced using a laser with a wavelength of the UV band as the laser for irradiation. A pulse oscillation laser is often used as the UV laser. However, a peak (maximum output) of the pulse oscillation laser becomes very large to an average output power required. For example, in the case of a laser of average output power 2 W, pulse interval 10 ns, and pulse width 10 ps, the peak (maximum output) becomes as high as 2 kW, and there is the possibility of causing a damage to a sample. Therefore, it is necessary to reduce the peak (maximum output) with the average output power being maintained, so that it may not cause a damage to the sample. In this invention, the device is configured in such a way that pulsed light is optically divided into several pulses and these pulses are given respective paths whose lengths are set different from one another, whereby the peak (maximum output) is reduced while the average output value are maintained.

    摘要翻译: 随着近年来电路图案变得越来越精细,需要提高缺陷检测灵敏度。 为了解决这个问题,使用具有UV波段波长的激光作为照射用激光,正在提高灵敏度。 经常使用脉冲振荡激光器作为UV激光器。 然而,脉冲振荡激光器的峰值(最大输出)变得非常大,达到所需的平均输出功率。 例如,在平均输出功率2W,脉冲间隔10ns,脉冲宽度10ps的激光器的情况下,峰值(最大输出)变得高达2kW,并且存在对 一个样品。 因此,需要在保持平均输出功率的同时降低峰值(最大输出),从而不会对样品造成损害。 在本发明中,器件被配置成使得脉冲光被光学地分成几个脉冲,并且这些脉冲被给予各自的长度彼此不同的路径,从而峰值(最大输出)减小,而平均输出 保持价值。

    Method of and apparatus for inspecting surface defects
    75.
    发明授权
    Method of and apparatus for inspecting surface defects 失效
    检查表面缺陷的方法和装置

    公开(公告)号:US5135303A

    公开(公告)日:1992-08-04

    申请号:US658258

    申请日:1991-02-20

    CPC分类号: G11B5/84 G01N21/88 G11B33/10

    摘要: The present invention relates to a method of inspecting a defect on a surface of a test piece, and to an apparatus using this method. The method comprises the steps of dividing the surface of the test piece into a plurality of inspection regions so as to detect image signals from said plurality of inspection regions thus divided; measuring feature values of background levels from image signals detected at divided inspection regions adjacent to the plurality of inspection regions thus divided; and representing the image signals detected at the adjacent divided inspection regions in binary form on the basis of threshold values set based on the measured feature values, thereby detecting fine defects on the surface of the test piece based on the image signals represented in binary form.

    摘要翻译: 本发明涉及一种检查试件表面上的缺陷的方法以及使用该方法的装置。 该方法包括以下步骤:将测试片的表面划分成多个检查区域,以便检测来自所分割的所述多个检查区域的图像信号; 从与所分割的多个检查区域相邻的划分的检查区域检测到的图像信号测量背景级别的特征值; 并且基于基于测量的特征值设置的阈值来表示在相邻的分割检查区域检测到的图像信号,从而基于以二进制形式表示的图像信号来检测测试片表面上的细小缺陷。

    Method and apparatus for detecting defects
    76.
    发明授权
    Method and apparatus for detecting defects 有权
    检测缺陷的方法和装置

    公开(公告)号:US07426023B2

    公开(公告)日:2008-09-16

    申请号:US11296290

    申请日:2005-12-08

    IPC分类号: G01N21/00

    摘要: There is disclosed a defect detecting apparatus that focuses a laser beam, irradiates it onto the surface of a sample to be examined, and detects a foreign substance/defect existing on the surface from the scattered light as a result of the irradiation of the beam onto the sample surface. In order to stably detect defects such as foreign substance, the defect detecting apparatus according to the invention is constructed to use a beam shape optical system by which the laser beam emitted from a laser source is shaped to change the illumination intensity from its Gauss distribution to a flat distribution so that the detected signal can be stably produced even if the relative position of a defect/foreign substance to the laser beam irradiation position is changed.

    摘要翻译: 公开了一种将激光束聚焦并将其照射到待检查样品的表面上的缺陷检测装置,并且由于将光束照射到散射光上而检测存在于表面上的异物/缺陷 样品表面。 为了稳定地检测异物等缺陷,根据本发明的缺陷检测装置的结构是使用光束形状光学系统,通过该光束系统将从激光源发射的激光束成形为将照射强度从其高斯分布改变为 平坦分布,使得即使改变了缺陷/异物与激光束照射位置的相对位置,也能够稳定地产生检测信号。

    Focusing position detecting device in optical magnifying and observing
apparatus
    78.
    发明授权
    Focusing position detecting device in optical magnifying and observing apparatus 失效
    聚焦位置检测装置在光学放大和观察装置中

    公开(公告)号:US4433235A

    公开(公告)日:1984-02-21

    申请号:US310240

    申请日:1981-10-09

    IPC分类号: G02B21/24 G01J1/20 G01J1/32

    CPC分类号: G02B21/245

    摘要: A focusing position detecting device in which a laser beam is directed through an objective lens toward the surface of an object to form a minute spot on the surface of the object, and the beam reflected from the surface of the object is led through the objective lens again toward a concentrating point, so as to detect the focusing position of the objective lens by measuring the position of the concentrating point. In the device, a photoelectric element is provided to detect the intensity of the reflected beam, and the intensity of the laser beam is so controlled that the output of the photoelectric element is maintained constant.

    摘要翻译: 一种聚焦位置检测装置,其中激光束被引导通过物镜朝向物体的表面,以在物体的表面上形成微小的点,并且从物体的表面反射的光束被引导通过物镜 再次朝向集中点,以便通过测量集中点的位置来检测物镜的聚焦位置。 在该装置中,设置光电元件以检测反射光束的强度,并且控制激光束的强度使得光电元件的输出保持恒定。

    Method and apparatus for detecting defects on a wafer
    79.
    发明申请
    Method and apparatus for detecting defects on a wafer 有权
    用于检测晶片上的缺陷的方法和装置

    公开(公告)号:US20070070337A1

    公开(公告)日:2007-03-29

    申请号:US11500421

    申请日:2006-08-08

    IPC分类号: G01N21/88

    摘要: As circuit patterns become finer in recent years, improvement in detection sensitivity of defects is required. To answer this, sensitivity is being enhanced using a laser with a wavelength of the UV band as the laser for irradiation. A pulse oscillation laser is often used as the UV laser. However, a peak (maximum output) of the pulse oscillation laser becomes very large to an average output power required. For example, in the case of a laser of average output power 2 W, pulse interval 10 ns, and pulse width 10 ps, the peak (maximum output) becomes as high as 2 kW, and there is the possibility of causing a damage to a sample. Therefore, it is necessary to reduce the peak (maximum output) with the average output power being maintained, so that it may not cause a damage to the sample. In this invention, the device is configured in such a way that pulsed light is optically divided into several pulses and these pulses are given respective paths whose lengths are set different from one another, whereby the peak (maximum output) is reduced while the average output value are maintained.

    摘要翻译: 随着近年来电路图案变得越来越精细,需要提高缺陷检测灵敏度。 为了解决这个问题,使用具有UV波段波长的激光作为照射用激光,正在提高灵敏度。 经常使用脉冲振荡激光器作为UV激光器。 然而,脉冲振荡激光器的峰值(最大输出)变得非常大,达到所需的平均输出功率。 例如,在平均输出功率2W,脉冲间隔10ns,脉冲宽度10ps的激光器的情况下,峰值(最大输出)变得高达2kW,并且存在对 一个样品。 因此,需要在保持平均输出功率的同时降低峰值(最大输出),从而不会对样品造成损害。 在本发明中,器件被配置成使得脉冲光被光学地分成几个脉冲,并且这些脉冲被给予各自的长度彼此不同的路径,从而峰值(最大输出)减小,而平均输出 保持价值。

    Method and apparatus for detecting defects
    80.
    发明申请
    Method and apparatus for detecting defects 有权
    检测缺陷的方法和装置

    公开(公告)号:US20060139629A1

    公开(公告)日:2006-06-29

    申请号:US11296290

    申请日:2005-12-08

    IPC分类号: G01N21/88

    摘要: There is disclosed a defect detecting apparatus that focuses a laser beam, irradiates it onto the surface of a sample to be examined, and detects a foreign substance/defect existing on the surface from the scattered light as a result of the irradiation of the beam onto the sample surface. In order to stably detect defects such as foreign substance, the defect detecting apparatus according to the invention is constructed to use a beam shape optical system by which the laser beam emitted from a laser source is shaped to change the illumination intensity from its Gauss distribution to a flat distribution so that the detected signal can be stably produced even if the relative position of a defect/foreign substance to the laser beam irradiation position is changed.

    摘要翻译: 公开了一种将激光束聚焦并将其照射到待检查样品的表面上的缺陷检测装置,并且由于将光束照射到散射光上而检测存在于表面上的异物/缺陷 样品表面。 为了稳定地检测异物等缺陷,根据本发明的缺陷检测装置的结构是使用光束形状光学系统,通过该光束系统将从激光源发射的激光束成形为将照射强度从其高斯分布改变为 平坦分布,使得即使改变了缺陷/异物与激光束照射位置的相对位置,也能够稳定地产生检测信号。