摘要:
An inspection apparatus projects a laser beam on the surface of a SOI wafer and detects foreign matter on and defects in the surface of the SOI wafer by receiving scattered light reflected from the surface of the SOI wafer. The wavelength of the laser beam used by the inspection apparatus is determined so that a penetration depth of the laser beam in a Si thin film may be 10 nm or below to detect only foreign matter on and defects in the outermost surface and not to detect foreign matter and defects in a BOX layer. Only the foreign matter on and defects in the outermost surface layer can be detected without being influenced by thin-film interference by projecting the laser beam on the surface of the SOI wafer and receiving scattered light rays.
摘要:
Disclosed herein are method of and apparatus for detecting a foreign substance on an object by illuminating said object, detecting via an optical system light reflected from said object and detecting said foreign substance in distinction from a background. The object is exposed to first illumination such that light reflected from said background is suppressed but light reflected from said foreign substance is highlighted relative to the light reflected from said background. The light reflected from said object as a result of said first illumination is detected, thereby obtaining a first detection signal. The object is exposed to second illumination such that light reflected from said background is free from suppression relative to the light reflected from said substance as a result of said second illumination. The light reflected from said object as a result of said second illumination is detected, thereby obtaining a second detection signal. Foreign-substance-highlighting processing is performed on said first detection signal by using said second detection signal, whereby said substance is detected.
摘要:
Disclosed is an apparatus for detecting particles comprising semiconductor laser drive means for performing feedback control of semiconductor lasers, each thereof incorporating a sensor therewith for monitoring laser-output thereof, by using the output of the sensor, means for holding the feedback voltage, illuminating means including a plurality of optical means disposed to oppose each other so that the laser-outputs from the semiconductor lasers are obliquely applied onto a specimen, and detection means for detecting the light scattered from the particles present on the specimen.
摘要:
As circuit patterns become finer in recent years, improvement in detection sensitivity of defects is required. To answer this, sensitivity is being enhanced using a laser with a wavelength of the UV band as the laser for irradiation. A pulse oscillation laser is often used as the UV laser. However, a peak (maximum output) of the pulse oscillation laser becomes very large to an average output power required. For example, in the case of a laser of average output power 2 W, pulse interval 10 ns, and pulse width 10 ps, the peak (maximum output) becomes as high as 2 kW, and there is the possibility of causing a damage to a sample. Therefore, it is necessary to reduce the peak (maximum output) with the average output power being maintained, so that it may not cause a damage to the sample. In this invention, the device is configured in such a way that pulsed light is optically divided into several pulses and these pulses are given respective paths whose lengths are set different from one another, whereby the peak (maximum output) is reduced while the average output value are maintained.
摘要:
The present invention relates to a method of inspecting a defect on a surface of a test piece, and to an apparatus using this method. The method comprises the steps of dividing the surface of the test piece into a plurality of inspection regions so as to detect image signals from said plurality of inspection regions thus divided; measuring feature values of background levels from image signals detected at divided inspection regions adjacent to the plurality of inspection regions thus divided; and representing the image signals detected at the adjacent divided inspection regions in binary form on the basis of threshold values set based on the measured feature values, thereby detecting fine defects on the surface of the test piece based on the image signals represented in binary form.
摘要:
There is disclosed a defect detecting apparatus that focuses a laser beam, irradiates it onto the surface of a sample to be examined, and detects a foreign substance/defect existing on the surface from the scattered light as a result of the irradiation of the beam onto the sample surface. In order to stably detect defects such as foreign substance, the defect detecting apparatus according to the invention is constructed to use a beam shape optical system by which the laser beam emitted from a laser source is shaped to change the illumination intensity from its Gauss distribution to a flat distribution so that the detected signal can be stably produced even if the relative position of a defect/foreign substance to the laser beam irradiation position is changed.
摘要:
A test apparatus for detecting defects on a plate is disclosed. An illumination light is focused to one surface of the plate and another illumination light is focused to the other surface of the plate, and scattered light from the defects on the surfaces are detected to separately detect the defects on the front and rear surfaces of the plate.
摘要:
A focusing position detecting device in which a laser beam is directed through an objective lens toward the surface of an object to form a minute spot on the surface of the object, and the beam reflected from the surface of the object is led through the objective lens again toward a concentrating point, so as to detect the focusing position of the objective lens by measuring the position of the concentrating point. In the device, a photoelectric element is provided to detect the intensity of the reflected beam, and the intensity of the laser beam is so controlled that the output of the photoelectric element is maintained constant.
摘要:
As circuit patterns become finer in recent years, improvement in detection sensitivity of defects is required. To answer this, sensitivity is being enhanced using a laser with a wavelength of the UV band as the laser for irradiation. A pulse oscillation laser is often used as the UV laser. However, a peak (maximum output) of the pulse oscillation laser becomes very large to an average output power required. For example, in the case of a laser of average output power 2 W, pulse interval 10 ns, and pulse width 10 ps, the peak (maximum output) becomes as high as 2 kW, and there is the possibility of causing a damage to a sample. Therefore, it is necessary to reduce the peak (maximum output) with the average output power being maintained, so that it may not cause a damage to the sample. In this invention, the device is configured in such a way that pulsed light is optically divided into several pulses and these pulses are given respective paths whose lengths are set different from one another, whereby the peak (maximum output) is reduced while the average output value are maintained.
摘要:
There is disclosed a defect detecting apparatus that focuses a laser beam, irradiates it onto the surface of a sample to be examined, and detects a foreign substance/defect existing on the surface from the scattered light as a result of the irradiation of the beam onto the sample surface. In order to stably detect defects such as foreign substance, the defect detecting apparatus according to the invention is constructed to use a beam shape optical system by which the laser beam emitted from a laser source is shaped to change the illumination intensity from its Gauss distribution to a flat distribution so that the detected signal can be stably produced even if the relative position of a defect/foreign substance to the laser beam irradiation position is changed.