公开(公告)号：US20070041410A1

公开(公告)日：2007-02-22

申请号：US11588387

申请日：2006-10-27

申请人： Mikio Hongo ,  Sachio Uto ,  Mineo Nomoto ,  Toshihiko Nakata ,  Mutsuko Hatano ,  Shinya Yamaguchi ,  Makoto Ohkura

发明人： Mikio Hongo ,  Sachio Uto ,  Mineo Nomoto ,  Toshihiko Nakata ,  Mutsuko Hatano ,  Shinya Yamaguchi ,  Makoto Ohkura

IPC分类号： H01S3/10 ,  G02B27/10

CPC分类号： H01L21/02683 ,  H01L21/0268 ,  H01L21/02691 ,  H01L21/2026 ,  H01L21/268 ,  H01L27/1285 ,  H01L29/04 ,  H01L29/66757

摘要： Apparatus for fabricating a display device includes a stage capable of mounting an insulating substrate of the display device and moving the insulating substrate, linear scales which detect a position or moving distance of the substrate, a laser oscillator which generates continuous-waves laser light, a modulator which turns ON/OFF the continuous-wave laser light, a beam forming optic which shapes the continuous-wave laser light passing through the modulator into a linear or rectangular form, an objective lens which projects the at least one of the laser light on the insulating substrate so as to irradiate the insulating substrate with the laser light. The controller counts signals generated by the linear scales for every movement of the stage for a given distance, causes the modulator to turn the generated continuous-wave laser light in an ON state at time when a position of the insulating substrate on which the laser light irradiation is to be started reaches an area on which the laser light is projected, and causes the modulator to turn the generated continuous-wave laser light in an OFF state at another time.

摘要翻译： 用于制造显示装置的装置包括能够安装显示装置的绝缘基板并移动绝缘基板的台，检测基板的位置或移动距离的线性标尺，产生连续波激光的激光振荡器， 将连续波激光切换为ON / OFF的调制器，将通过调制器的连续波激光成形为直线或矩形的光束形成光学器件，将至少一个激光投射到的物镜 绝缘基板，以激光照射绝缘基板。 控制器对于给定距离的级的每次移动来对由线性标尺产生的信号进行计数，使得调制器将产生的连续波激光在其上的激光的绝缘基板的位置处于接通状态 照射开始到达投射激光的区域，并且使得调制器在另一时间将所产生的连续波激光转为OFF状态。

公开(公告)号：US20060290930A1

公开(公告)日：2006-12-28

申请号：US11434070

申请日：2006-05-16

申请人： Hidetoshi Nishiyama ,  Yukihiro Shibata ,  Shunji Maeda ,  Sachio Uto

发明人： Hidetoshi Nishiyama ,  Yukihiro Shibata ,  Shunji Maeda ,  Sachio Uto

IPC分类号： G01N21/00

CPC分类号： G01N21/95623

摘要： The present invention relates to a pattern defect inspection apparatus, wherein light emitted from an illumination source capable of outputting a plurality of wavelengths is linearly illuminated by an illuminating optical system. Diffracted or scattered light due to a circuit pattern or defect on a wafer is collected by an imaging optical system onto a line sensor and converted into a digital signal, and the defect is detected by a signal processing section. Then, the defect can be detected with high sensitivity since a surface to be formed by an optical axis of the illuminating optical system and an optical axis of the imaging optical system is almost collimated to a direction of a wiring pattern and further since an angle to be formed by the optical axis of the imaging optical system and the wafer is set to an angle with less diffracted light from the pattern. Thereby, the pattern defect inspection detecting various defects on the wafer with high sensitivity at high speed can be achieved.

摘要翻译： 本发明涉及一种图案缺陷检查装置，其中从能够输出多个波长的照明源发射的光线由照明光学系统线性地照亮。 由于晶片上的电路图案或缺陷导致的衍射或散射光被成像光学系统收集到线传感器上并转换成数字信号，并且由信号处理部分检测缺陷。 然后，由于要由照明光学系统的光轴和成像光学系统的光轴形成的表面几乎准直到布线图案的方向，因此可以以高灵敏度检测缺陷，并且进一步由于与 由成像光学系统的光轴形成，并且将晶片设置成与来自图案的较少衍射光的角度。 由此，可以实现以高速度高灵敏度地检测晶片上的各种缺陷的图案缺陷检查。

公开(公告)号：US06943876B2

公开(公告)日：2005-09-13

申请号：US10223423

申请日：2002-08-20

申请人： Minoru Yoshida ,  Sachio Uto ,  Shunji Maeda ,  Toshihiko Nakata

发明人： Minoru Yoshida ,  Sachio Uto ,  Shunji Maeda ,  Toshihiko Nakata

IPC分类号： G01B11/30 ,  G01N21/956 ,  H01L21/66 ,  G02N21/88

CPC分类号： G01N21/95684

摘要： A method and apparatus for detecting pattern defects which includes annularly scanning of a laser beam emitted from a laser light source on a pupil of an objective lens, illuminating the scanned laser beam, through the objective lens, onto a sample on which there is formed a pattern coated with an optically transparent thin film, acquiring an optical image of the illuminated sample, and processing the acquired image to find defects in the pattern. The annular scan diameter of the laser beam is determined based on the thickness of the optically transparent thin film.

摘要翻译： 一种用于检测图案缺陷的方法和装置，其包括从物镜的瞳孔上的激光光源发射的激光束的环状扫描，将扫描的激光束通过物镜照射到其上形成有 涂覆有光学透明薄膜的图案，获取照射样品的光学图像，以及处理所获取的图像以发现图案中的缺陷。 基于光学透明薄膜的厚度确定激光束的环形扫描直径。

公开(公告)号：US06765201B2

公开(公告)日：2004-07-20

申请号：US09764457

申请日：2001-01-19

申请人： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunji Maeda

发明人： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunji Maeda

IPC分类号： G21K700

CPC分类号： G01N21/956 ,  G01N21/33 ,  G02F2001/3505 ,  G02F2001/3542 ,  H01S3/0092

摘要： An ultraviolet laser-generating device, for use in a defect inspection apparatus and a method thereof, etc., comprising: a laser ray source for irradiating and emitting a basic wave of laser ray therefrom; a wavelength converter device for receiving the basic wave of laser ray emitted from the laser ray source and for converting it into an ultraviolet laser ray composed of a multiplied high harmonic light of the basic wave of laser ray; and a container having an inlet window, upon which the basic wave of laser ray emitted from the laser ray source is incident upon, and an outlet window for emitting the ultraviolet laser ray composed of the multiplied high harmonic light of the basic wave of laser ray, and installing the wavelength converter device therein, wherein the container is hermetically sealed and is filled up with an inert gas, such as nitrogen or argon gas, therein.

摘要翻译： 一种用于缺陷检查装置及其方法的紫外线激光发生装置，包括：用于从其照射和发射激光光线的基本波的激光束源; 波长转换器装置，用于接收从激光射线源发射的激光的基波，并将其转换为由激光的基波的相乘的高次谐波构成的紫外激光; 以及具有入射窗的容器，从激光射线源发射的激光的基波入射到该入口窗口，以及用于发射由激光的基波的倍增的高次谐波构成的紫外线激光的出射窗 并且在其中安装波长转换器装置，其中容器被气​​密密封，并在其中填充有惰性气体，例如氮气或氩气。

公开(公告)号：US4669875A

公开(公告)日：1987-06-02

申请号：US548516

申请日：1983-11-03

申请人： Masataka Shiba ,  Sachio Uto ,  Mitsuyoshi Koizumi

发明人： Masataka Shiba ,  Sachio Uto ,  Mitsuyoshi Koizumi

IPC分类号： G01N15/02 ,  G01N21/94 ,  G01N21/32

CPC分类号： G01N21/94 ,  G01N2015/0238 ,  G01N2021/4792 ,  G01N2201/1053

摘要： The foreign particle detecting method and apparatus are disclosed wherein a polarized laser beam emitted by a laser beam irradiating system from a direction inclined with respect to the direction perpendicular to the surface of a substrate is used by a scanning means to linearly scan the substrate surface from a direction approximately 90.degree. with respect to the laser light irradiating direction; and the laser light reflected from a foreign particle on the substrate surface is detected by a polarized light analyzer and a photoelectric conversion device from a direction set approximately equal to said scanning direction and inclined with respect to the direction perpendicular to the substrate surface.

摘要翻译： 公开了一种外来粒子检测方法和装置，其中通过扫描装置使用激光束照射系统从相对于垂直于衬底表面的方向倾斜的方向发射的偏振激光束线性扫描衬底表面 相对于激光照射方向大约90°的方向; 并且通过偏振光分析仪和光电转换装置从基本上等于所述扫描方向的方向检测从基板表面上的异物引起的反射的激光，并且相对于垂直于基板表面的方向倾斜。

公开(公告)号：US07911601B2

公开(公告)日：2011-03-22

申请号：US12263682

申请日：2008-11-03

申请人： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunzi Maeda ,  Atsushi Shimoda

发明人： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunzi Maeda ,  Atsushi Shimoda

IPC分类号： G01N21/00

CPC分类号： G01N21/21 ,  G01N21/33 ,  G01N21/55 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/151 ,  G01N2021/95615 ,  G01N2201/06113 ,  G01N2201/1035

摘要： A method and apparatus for inspecting defects includes emitting an ultraviolet light from an ultraviolet light source, illuminating a specimen with the ultraviolet light in which a polarization condition of the ultraviolet light is controlled, controlling a polarization condition of light reflected from the specimen which is illuminated by the polarization condition controlled ultraviolet light, detecting the light reflected from the specimen, processing the detected light so as to detect defects, and outputting information about the defects. The ultraviolet light source is disposed in a clean environment supplied with clean gas and separated from outside.

摘要翻译： 用于检查缺陷的方法和装置包括从紫外线光源发射紫外光，用紫外光的紫外线照射样本，其中控制紫外光的偏振条件，控制从被照射的样本反射的光的偏振状态 通过偏光条件控制的紫外光，检测从样本反射的光，处理检测到的光以检测缺陷，并输出关于缺陷的信息。 紫外光源设置在清洁环境中，并提供清洁气体并与外界分离。

公开(公告)号：US20110001972A1

公开(公告)日：2011-01-06

申请号：US12876709

申请日：2010-09-07

申请人： Hiroaki Shishido ,  Yasuhiro Yoshitake ,  Toshihiko Nakata ,  Shunji Maeda ,  Minoru Yoshida ,  Sachio Uto

发明人： Hiroaki Shishido ,  Yasuhiro Yoshitake ,  Toshihiko Nakata ,  Shunji Maeda ,  Minoru Yoshida ,  Sachio Uto

IPC分类号： G01J4/00

CPC分类号： G01N21/9501 ,  G01J3/0218 ,  G01J3/0224 ,  G01J3/10 ,  G01N21/8851 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/479 ,  G01N2021/95676 ,  G01N2201/06113 ,  G02B5/09 ,  G02B21/365 ,  G02B26/12

摘要： An inspection apparatus and method includes a light source, an illuminating unit having a polarization controller and an object lens for illuminating a specimen with light emitted from the light source and passed through the polarization controller and the object lens, a detection unit having a sensor for detecting light from the specimen illuminated by the illuminating unit, a processor which processes a signal output from the sensor so as to detect a defect on the specimen, and a display which displays information output from the processor. The processor processes an image formed from the signal output from the sensor in which the image is reduced in speckle pattern.

摘要翻译： 一种检查装置和方法，包括光源，具有偏振控制器和物镜的照明单元，用于利用从光源发射并通过偏振控制器和物镜的光照射样本;检测单元，具有用于 检测由所述照明单元照射的样本的光;处理器，其处理从所述传感器输出的信号以检测所述样本上的缺陷;以及显示器，其显示从所述处理器输出的信息。 处理器处理从传感器输出的信号形成的图像，其中图像以斑点图案被减少。

公开(公告)号：US07218389B2

公开(公告)日：2007-05-15

申请号：US10223422

申请日：2002-08-20

申请人： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunji Maeda

发明人： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunji Maeda

IPC分类号： G02N21/88

CPC分类号： G01N21/956 ,  G01N21/94 ,  G01N2021/9513 ,  G01N2201/10 ,  G01N2201/1045

摘要： A pattern defect inspection apparatus is capable of detecting defects, without being affected by non-uniform thickness of a thin film formed on a sample, even when using monochromatic light, such as a laser. The apparatus comprises a laser to illuminate a sample, coherence suppression optics to reduce laser beam coherence, a condenser to condense the laser beam onto a pupil plane of an objective lens, and a detector to detect the light reflected from a circuit pattern formed on a sample. The condenser is designed so that the intensity of light illuminating the sample under test can be partially adjusted according to the type of laser beam illumination condensed on the pupil of the objective lens. Variations in reflected light intensity caused by non-uniform film thickness on the surface of the sample are therefore reduced, and shading is minimized in the detected image to allow detecting of fine defects.

摘要翻译： 即使使用激光等单色光，图案缺陷检查装置也能够不受样品上形成的薄膜的不均匀的厚度的影响而检测缺陷。 该装置包括用于照亮样品的激光器，减少激光束相干性的相干抑制光学器件，将激光束冷凝到物镜的光瞳平面上的冷凝器，以及用于检测从形成在物镜上的电路图案反射的光的检测器 样品。 冷凝器被设计成使得照射待测试样品的光的强度可以根据在物镜的瞳孔上聚集的激光束照明的类型来部分地调节。 因此，在样品表面上由不均匀膜厚引起的反射光强度的变化因此减少，并且在检测图像中使阴影最小化以允许检测细小缺陷。

公开(公告)号：US20070057184A1

公开(公告)日：2007-03-15

申请号：US11478618

申请日：2006-07-03

申请人： Sachio Uto ,  Shunji Maeda

发明人： Sachio Uto ,  Shunji Maeda

IPC分类号： H01J37/22 ,  G01N21/01 ,  H01J37/28

CPC分类号： H01J37/226 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/8825 ,  G06T7/001 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/28 ,  H01J2237/2817

摘要： The invention provides an apparatus and a method each capable of highly accurately reviewing at a high speed very small foreign matters and pattern defects occurring during a device production process for forming a circuit pattern on a substrate of semiconductor devices, etc. An objective lens having high NA is installed inside a vacuum chamber for an inspection object having a transparent film formed on the surface thereof and an illumination optical path is formed inside the objective lens so that dark visual field illumination can be made and reflected and scattered light of foreign matters or defects on the surface of the inspection object can be detected with high sensitivity.

摘要翻译： 本发明提供一种能够高精度地高精度地检查在半导体器件等的基板上形成电路图案的器件制造工序中产生的非常小的异物和图案缺陷的装置和方法。具有高 NA被安装在用于具有形成在其表面上的透明膜的检查对象的真空室内，并且在物镜内部形成照明光路，使得可以进行暗视野照明和异物的反射和散射光 检测对象的表面可以灵敏度高。

公开(公告)号：US20060256328A1

公开(公告)日：2006-11-16

申请号：US11488620

申请日：2006-07-19

申请人： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunzi Maeda ,  Atsushi Shimoda

发明人： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunzi Maeda ,  Atsushi Shimoda

IPC分类号： G01N21/88

CPC分类号： G01N21/21 ,  G01N21/33 ,  G01N21/55 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/151 ,  G01N2021/95615 ,  G01N2201/06113 ,  G01N2201/1035

摘要： An apparatus for inspecting defects including a table which mounts a specimen to be inspected and which is movable in a plane, an ultraviolet light source for emitting ultraviolet light, an illuminating unit for illuminating the specimen mounted on the table with light emitted from the ultraviolet light source, a detecting unit for forming an image of the specimen illuminated by the illuminating unit and for detecting the image with an image sensor, and an image processing unit for processing the image detected by the image sensor and for outputting information about defects detected on the specimen. The illuminating unit and detecting unit are disposed in a clean environment which is supplied therein with clean gas and which is separated from outside by a wall.