公开(公告)号：US07859644B2

公开(公告)日：2010-12-28

申请号：US12000774

申请日：2007-12-17

申请人： Jan-Gerard Cornelis Van Der Toorn ,  Hans Butler ,  Henrikus Herman Marie Cox ,  Evert Hendrik Jan Draaijer ,  Nicolaas Ten Kate ,  Frits Van Der Meulen ,  Mark Johannes Hermanus Frencken ,  Martijn Houkes ,  Antonius Henricus Arends ,  Minne Cuperus

发明人： Jan-Gerard Cornelis Van Der Toorn ,  Hans Butler ,  Henrikus Herman Marie Cox ,  Evert Hendrik Jan Draaijer ,  Nicolaas Ten Kate ,  Frits Van Der Meulen ,  Mark Johannes Hermanus Frencken ,  Martijn Houkes ,  Antonius Henricus Arends ,  Minne Cuperus

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341

摘要： A control system configured to control a position of a fluid supply system, the fluid supply system constructed and arranged to supply a fluid between a substrate and a projection system, the substrate positioned with a substrate stage, the control system including a controller configured to determine a desired position of the fluid supply system based on a position signal to be provided to the substrate stage and a position offset, the position offset added to the position signal to be provided to the substrate stage.

摘要翻译： 控制系统，被配置为控制流体供应系统的位置，所述流体供应系统构造和布置成在基板和投影系统之间提供流体，所述基板定位在基板台上，所述控制系统包括控制器，所述控制器被配置为确定 基于要提供给衬底台的位置信号和位置偏移的流体供应系统的期望位置，位置偏移被添加到要提供给衬底台的位置信号。

公开(公告)号：US07760324B2

公开(公告)日：2010-07-20

申请号：US11378627

申请日：2006-03-20

申请人： Jozef Petrus Henricus Benschop ,  Hans Butler ,  Nicolaas Rudolf Kemper ,  Bartholomeus Hendricus Koek ,  Frits Van Der Meulen ,  Harmen Klaas Van Der Schoot

发明人： Jozef Petrus Henricus Benschop ,  Hans Butler ,  Nicolaas Rudolf Kemper ,  Bartholomeus Hendricus Koek ,  Frits Van Der Meulen ,  Harmen Klaas Van Der Schoot

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： An immersion lithographic projection apparatus includes a shutter member is employed to block a liquid supply system during substrate swap to ensure that liquid remains in contact with an element of the projection system during substrate swap. The shutter member is connected to a metrology frame which also supports the projection system. In this way the position of the shutter member is always known.

摘要翻译： 浸没式光刻投影装置包括闸板构件，以在衬底交换期间阻挡液体供应系统，以确保在衬底互换期间液体保持与投影系统的元件接触。 挡板构件连接到也支撑投影系统的计量框架。 以这种方式，挡板部件的位置总是已知的。

公开(公告)号：US20100157264A1

公开(公告)日：2010-06-24

申请号：US12627118

申请日：2009-11-30

申请人： Hans Butler ,  Marc Wilhelmus Maria Van Der Wijst

发明人： Hans Butler ,  Marc Wilhelmus Maria Van Der Wijst

IPC分类号： G03B27/42 ,  G03B27/54 ,  G03B27/32

CPC分类号： F16F15/002 ,  G03F7/709

摘要： A method for damping an object in two or more degrees of freedom, including measuring a position quantity at each of the two or more measurement locations; extracting from the measured position quantities a measurement signal for each dynamic mode; feeding the measurement signal of a dynamic mode to a controller unit associated with the respective dynamic mode, the controller unit providing for each dynamic mode an output signal on the basis of the respective measurement signal; and providing a control signal to each of the two or more actuators, the control signal for each actuator being based on output signals of one or more controller units.

摘要翻译： 一种用于在两个或多个自由度中阻尼物体的方法，包括测量两个或更多个测量位置中的每一个处的位置量; 从测量位置数量提取每个动态模式的测量信号; 将动态模式的测量信号馈送到与相应动态模式相关联的控制器单元，所述控制器单元基于相应的测量信号为每个动态模式提供输出信号; 并且向所述两个或更多个致动器中的每一个提供控制信号，每个致动器的控制信号基于一个或多个控制器单元的输出信号。

公开(公告)号：US07593093B2

公开(公告)日：2009-09-22

申请号：US11710408

申请日：2007-02-26

申请人： Joeri Lof ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Aleksey Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Helmar Van Santen

发明人： Joeri Lof ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Aleksey Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Helmar Van Santen

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

公开(公告)号：US20090207393A1

公开(公告)日：2009-08-20

申请号：US12268622

申请日：2008-11-11

申请人： Hans Butler ,  Marc Wilhelmus Maria Van Der Wijst ,  Joost De Pee ,  Cornelius Adrianus Lambertus De Hoon ,  Stijn Boschker

发明人： Hans Butler ,  Marc Wilhelmus Maria Van Der Wijst ,  Joost De Pee ,  Cornelius Adrianus Lambertus De Hoon ,  Stijn Boschker

IPC分类号： G03B27/42

CPC分类号： G03F7/709 ,  F16F7/1005 ,  F16F15/02

摘要： An active damping system assembly is configured to dampen a vibration of at least part of a structure. The assembly includes a plurality of active dampers each including a sensor configured to measure a position quantity of an interface mass mounted on the structure; and an actuator configured to exert a force on the interface mass in dependency of a signal provided by the sensor, wherein each of the plurality of active damping systems is connected to the interface mass. The structure may be a projection system of a lithographic apparatus.

摘要翻译： 主动阻尼系统组件被配置为抑制结构的至少一部分的振动。 组件包括多个有源阻尼器，每个活动阻尼器包括被配置为测量安装在结构上的接口质量的位置量的传感器; 以及致动器，其被配置为根据由传感器提供的信号对接口质量施加力，其中多个主动阻尼系统中的每一个连接到界面质量块。 该结构可以是光刻设备的投影系统。

公开(公告)号：US20090122284A1

公开(公告)日：2009-05-14

申请号：US12249399

申请日：2008-10-10

申请人： Hans Butler ,  Erik Roelof Loopstra ,  Marc Wilhelmus Maria Van Der Wijst ,  Joost De Pee ,  Cornelius Adrianus Lambertus De Hoon ,  Stijn Boschker

发明人： Hans Butler ,  Erik Roelof Loopstra ,  Marc Wilhelmus Maria Van Der Wijst ,  Joost De Pee ,  Cornelius Adrianus Lambertus De Hoon ,  Stijn Boschker

IPC分类号： G03B27/42 ,  F16F7/10

CPC分类号： G03F7/709 ,  G03F7/70883

摘要： A lithographic apparatus includes a projection system to project a patterned radiation beam onto a substrate, and a damping system to dampen a vibration of at least part of the projection system, the damping system including an interface damping mass and an active damping subsystem to dampen a vibration of at least part of the interface damping mass, the interface damping mass connected to the projection system, and the active damping subsystem connected to the interface damping mass, the active damping subsystem including a sensor to measure a position quantity of the interface damping mass and an actuator to exert a force on the interface damping mass based on a signal provided by the sensor. The damping system further includes an interface damping device connected to the interface damping mass and configured to damp a movement of the interface damping mass at an eigenfrequency of the interface damping mass.

摘要翻译： 光刻设备包括将图案化的辐射束投影到衬底上的投影系统和用于抑制至少部分投影系统的振动的阻尼系统，所述阻尼系统包括界面阻尼块和主动阻尼子系统，以阻尼 界面阻尼块的至少一部分的振动，连接到投影系统的界面阻尼质量以及连接到界面阻尼块的主动阻尼子系统，主动阻尼子系统包括测量接口阻尼块的位置量的传感器 以及致动器，其基于由传感器提供的信号对接口阻尼质量施加力。 阻尼系统还包括连接到界面阻尼块的接口阻尼装置，并且被配置为在接口阻尼块的本征频率处阻尼接口阻尼块的运动。

公开(公告)号：US07525643B2

公开(公告)日：2009-04-28

申请号：US11228464

申请日：2005-09-19

申请人： Hans Butler

发明人： Hans Butler

IPC分类号： G03B27/58 ,  G03B27/62 ,  H01H47/00

CPC分类号： G03F7/70825 ,  G03F7/7025

摘要： A lithographic apparatus has a mechanism with a movable element, at least partially made from a magnetizable material. The movable element is movable between a first position and a second position. A pretensioner exerts a pretension force on the movable element urging it to the first position. A permanent magnet produces a magnetic field exerting a force on the movable element urging it to the second position. A coil produces, when energized in a first direction, a magnetic field exerting a force on the movable element urging it to the second position. The combined magnetic field of the magnet and the coil exerts a force on the movable element which is higher than the pretension force.

摘要翻译： 光刻设备具有至少部分地由可磁化材料制成的具有可移动元件的机构。 可移动元件可在第一位置和第二位置之间移动。 预紧器对可移动元件施加预紧力，将其推动到第一位置。 永磁体产生一个向可移动元件施加力的磁场，从而将其推到第二位置。 当线圈在第一方向上被激励时，产生一个向可动元件施力的第二位置的磁场。 磁体和线圈的组合磁场对可动元件施加大于预紧力的力。

公开(公告)号：US20080239264A1

公开(公告)日：2008-10-02

申请号：US11730189

申请日：2007-03-29

申请人： Hans Butler

发明人： Hans Butler

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70725 ,  G03F7/70775

摘要： An optical component of the lithographic apparatus is moved. A substrate support is moved so as to be synchronous with the motion of the optical component. A momentary position of the optical component is measured. A momentary position of the substrate support is measured at a first sampling rate. The measured momentary position of the optical component is compared with a desired momentary position of the optical component to generate an optical component position error signal in accordance with a difference between the two optical component positions. The measured momentary position of the substrate support is compared with a desired momentary position of the substrate support to generate a substrate support position error signal in accordance with a difference between the two substrate support positions. The momentary position of the optical component is adjusted so as to compensate for the difference between the two substrate support positions.

摘要翻译： 移动光刻设备的光学部件。 移动基板支撑件以与光学部件的运动同步。 测量光学部件的瞬时位置。 以第一采样率测量衬底支撑件的瞬时位置。 将光学部件的测量的瞬时位置与光学部件的期望的瞬时位置进行比较，以根据两个光学部件位置之间的差异产生光学部件位置误差信号。 将基板支撑件的测量的瞬时位置与基板支撑件的期望的瞬时位置进行比较，以根据两个基板支撑位置之间的差异产生基板支撑位置误差信号。 调整光学部件的瞬时位置，以便补偿两个基板支撑位置之间的差异。

公开(公告)号：US07382439B2

公开(公告)日：2008-06-03

申请号：US11139992

申请日：2005-05-31

申请人： Hans Butler

发明人： Hans Butler

IPC分类号： G03B27/72 ,  G03B27/42 ,  G03B27/32

CPC分类号： G03F7/70066

摘要： A lithographic apparatus includes a mask or reticle masking device configured to block radiation. The masking device includes a reflective blade. The reflective blade may include a mirrored blade, which may be used in the scanning (Y) direction, and which moves across the beam of radiation in use. The reflective blade provides within an illumination system an effective slit for a mask or reticle within the lithographic apparatus.

摘要翻译： 光刻设备包括被配置为阻挡辐射的掩模或掩模掩模装置。 掩模装置包括反射片。 反射刮板可以包括可以在扫描（Y）方向上使用并且在使用中穿过辐射束的镜面刀片。 反射片在照明系统内提供用于光刻设备内的掩模或掩模版的有效狭缝。

公开(公告)号：US07352436B2

公开(公告)日：2008-04-01

申请号：US11155883

申请日：2005-06-20

申请人： Hans Butler ,  Evert Hendrik Jan Draaijer ,  Marcus Joseph Elisabeth Godfried Breukers

发明人： Hans Butler ,  Evert Hendrik Jan Draaijer ,  Marcus Joseph Elisabeth Godfried Breukers

IPC分类号： G03B27/32 ,  G03B27/42 ,  G03B27/58

CPC分类号： G03F7/70725

摘要： A control system to control a position of a substrate table for a lithographic apparatus, including: a first detection device to generate a position signal representative of the position of the projection system, a second detection device to generate a projection system feed-forward signal, a comparative unit to generate a servo error signal by subtracting a signal representative of an actual substrate table position from a substrate table position reference signal and adding the projection system position signal, a control unit to generate a first control signal on the basis of the servo error signal, an addition unit to generate a second control signal by adding the feed-forward signal and the first control signal, and an actuator unit to actuate the substrate table to a desired substrate table position on the basis of the second control signal. The control system further includes a projection system position signal filter unit.

摘要翻译： 一种用于控制用于光刻设备的衬底台的位置的控制系统，包括：第一检测装置，用于产生表示投影系统的位置的位置信号;第二检测装置，用于产生投影系统前馈信号; 比较单元，用于通过从衬底台位置参考信号中减去表示实际衬底台位置的信号并相加所述投影系统位置信号来产生伺服误差信号;控制单元，基于所述伺服系统产生第一控制信号 误差信号，通过增加前馈信号和第一控制信号来产生第二控制信号的加法单元，以及基于第二控制信号将基板台致动到期望的基板台位置的致动器单元。 控制系统还包括投影系统位置信号滤波器单元。