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公开(公告)号：US07760324B2
公开(公告)日：2010-07-20
申请号：US11378627
申请日：2006-03-20
申请人： Jozef Petrus Henricus Benschop , Hans Butler , Nicolaas Rudolf Kemper , Bartholomeus Hendricus Koek , Frits Van Der Meulen , Harmen Klaas Van Der Schoot
发明人： Jozef Petrus Henricus Benschop , Hans Butler , Nicolaas Rudolf Kemper , Bartholomeus Hendricus Koek , Frits Van Der Meulen , Harmen Klaas Van Der Schoot
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion lithographic projection apparatus includes a shutter member is employed to block a liquid supply system during substrate swap to ensure that liquid remains in contact with an element of the projection system during substrate swap. The shutter member is connected to a metrology frame which also supports the projection system. In this way the position of the shutter member is always known.
摘要翻译： 浸没式光刻投影装置包括闸板构件，以在衬底交换期间阻挡液体供应系统，以确保在衬底互换期间液体保持与投影系统的元件接触。 挡板构件连接到也支撑投影系统的计量框架。 以这种方式，挡板部件的位置总是已知的。
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公开(公告)号：US20100165319A1
公开(公告)日：2010-07-01
申请号：US12642627
申请日：2009-12-18
申请人： Hernes Jacobs , Noud Jan Gilissen , Hans Jansen , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Harmen Klaas Van Der Schoot , Marco Koert Stavenga , Bob Streefkerk , Peter Paul Steijaert , Marcus Martinus Petrus Adrianus Vermeulen , Jan Cornelis Van Der Hoeven
发明人： Hernes Jacobs , Noud Jan Gilissen , Hans Jansen , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Harmen Klaas Van Der Schoot , Marco Koert Stavenga , Bob Streefkerk , Peter Paul Steijaert , Marcus Martinus Petrus Adrianus Vermeulen , Jan Cornelis Van Der Hoeven
IPC分类号： G03B27/32
CPC分类号： G03F7/70341
摘要： An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.
摘要翻译： 公开了一种浸没式光刻投影装置，其中液体移除系统围绕向投影系统和基板之间的空间提供液体的液体供应系统。 液体移除系统相对于液体供应系统是可移动的，并且被控制为相对于移动的基板台具有基本上零的速度。 可以覆盖液体供应系统和液体移除系统之间的间隙，并且可以保持液体供应系统和衬底台之上的液体去除系统之间的气氛，使得液体的蒸汽压力相对较高。
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公开(公告)号：US07679720B2
公开(公告)日：2010-03-16
申请号：US12068071
申请日：2008-02-01
申请人： Michel Pieter Dansberg , Sebastiaan Maria Johannes Cornelissen , Henrikus Herman Marie Cox , Robert Johannes Petrus Van Diesen , Nicolaas Rudolf Kemper , Robert-Han Munnig-Schmidt , Harmen Klaas Van der Schoot , Rob Jansen
发明人： Michel Pieter Dansberg , Sebastiaan Maria Johannes Cornelissen , Henrikus Herman Marie Cox , Robert Johannes Petrus Van Diesen , Nicolaas Rudolf Kemper , Robert-Han Munnig-Schmidt , Harmen Klaas Van der Schoot , Rob Jansen
CPC分类号： G03F7/70933 , G03F7/70716 , G03F7/70775 , G03F7/7095
摘要： An apparatus is configured to position a workpiece. The apparatus includes a planar base, and a movable stage configured to support the workpiece. The stage is configured to be moved over the planar base. The apparatus also includes an actuator configured to move the stage, a contactless position measurer configured to measure a position of the stage, and a first pump configured to generate a conditioned gas flow in a volume between the measurer and the stage. The base includes a plurality of gas channels provided in the base that provide a path of the conditioned gas flow through the base.
摘要翻译： 一种装置构造成定位工件。 该装置包括平面基座和被配置为支撑工件的可移动台。 该台被配置成在平面底座上移动。 该装置还包括构造成移动台的致动器，被配置为测量台的位置的非接触位置测量器以及被配置为在测量器和台之间的体积中产生经调节的气流的第一泵。 底座包括设置在基座中的多个气体通道，其提供调节气体流经基座的路径。
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公开(公告)号：US20080174750A1
公开(公告)日：2008-07-24
申请号：US12068071
申请日：2008-02-01
申请人： Michel Pieter Dansberg , Sebastiaan Maria Johannes Cornelissen , Henrikus Herman Marie Cox , Robert Johannes Petrus Van Diesen , Nicolaas Rudolf Kemper , Robert-Han Munnig-Schmidt , Harmen Klaas Van Der Schoot , Rob Jansen
发明人： Michel Pieter Dansberg , Sebastiaan Maria Johannes Cornelissen , Henrikus Herman Marie Cox , Robert Johannes Petrus Van Diesen , Nicolaas Rudolf Kemper , Robert-Han Munnig-Schmidt , Harmen Klaas Van Der Schoot , Rob Jansen
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G03F7/70716 , G03F7/70775 , G03F7/7095
摘要： An apparatus is configured to position a workpiece. The apparatus includes a planar base, and a movable stage configured to support the workpiece. The stage is configured to be moved over the planar base. The apparatus also includes an actuator configured to move the stage, a contactless position measurer configured to measure a position of the stage, and a first pump configured to generate a conditioned gas flow in a volume between the measurer and the stage. The base includes a plurality of gas channels provided in the base that provide a path of the conditioned gas flow through the base.
摘要翻译： 一种装置构造成定位工件。 该装置包括平面基座和被配置为支撑工件的可移动台。 该台被配置成在平面底座上移动。 该装置还包括构造成移动台的致动器，被配置为测量台的位置的非接触位置测量器以及被配置为在测量器和台之间的体积中产生经调节的气流的第一泵。 底座包括设置在基座中的多个气体通道，其提供调节气体流经基座的路径。
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公开(公告)号：US07359032B2
公开(公告)日：2008-04-15
申请号：US10925148
申请日：2004-08-25
申请人： Michel Pieter Dansberg , Sebastiaan Maria Johannes Cornelissen , Henrikus Herman Marie Cox , Robert Johannes Petrus Van Diesen , Nicolaas Rudolf Kemper , Robert-Han Munnig Schmidt , Harmen Klaas Van Der Schoot , Rob Jansen
发明人： Michel Pieter Dansberg , Sebastiaan Maria Johannes Cornelissen , Henrikus Herman Marie Cox , Robert Johannes Petrus Van Diesen , Nicolaas Rudolf Kemper , Robert-Han Munnig Schmidt , Harmen Klaas Van Der Schoot , Rob Jansen
CPC分类号： G03F7/70933 , G03F7/70716 , G03F7/70775 , G03F7/7095
摘要： A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, a first support structure for supporting a patterning device, a second support structure for supporting a substrate, and a projection system. At least one of the first and second support structures includes a planar base, a movable stage that can be moved over the planar base, and an actuator for moving the stage. The apparatus also includes a contactless position measuring device for measuring a position of the stage, and a first pump for generating a conditioned gas flow in a volume between the measuring device and the stage. The base includes a plurality of gas channels that provide a path for the conditioned gas to flow through the base.
摘要翻译： 公开了一种光刻投影装置。 该装置包括用于提供辐射束的辐射系统，用于支撑图案形成装置的第一支撑结构，用于支撑衬底的第二支撑结构和投影系统。 第一和第二支撑结构中的至少一个包括平面基座，可在平面基座上移动的可移动平台以及用于移动平台的致动器。 该装置还包括用于测量载物台的位置的非接触位置测量装置和用于在测量装置和载物台之间产生体积的调节气流的第一泵。 底座包括多个气体通道，其提供用于经调节的气体流过基座的路径。
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公开(公告)号：US09097992B2
公开(公告)日：2015-08-04
申请号：US13186123
申请日：2011-07-19
申请人： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederick De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrukus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelius Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Johannes Petrus Maria Smeulers , Stefan Philip Christiaan Belfroid , Herman Vogel
发明人： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederick De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrukus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelius Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Johannes Petrus Maria Smeulers , Stefan Philip Christiaan Belfroid , Herman Vogel
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
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公开(公告)号：US08446563B2
公开(公告)日：2013-05-21
申请号：US12541755
申请日：2009-08-14
申请人： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Johannes Petrus Maria Smeulers , Stefan Philip Christiaan Belfroid , Herman Vogel
发明人： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Johannes Petrus Maria Smeulers , Stefan Philip Christiaan Belfroid , Herman Vogel
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
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公开(公告)号：US20110273675A1
公开(公告)日：2011-11-10
申请号：US13186123
申请日：2011-07-19
申请人： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederick De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelius Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel , Martinus Hendrikus Antonius Leenders , Joost Jeroen Ottens
发明人： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederick De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelius Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel , Martinus Hendrikus Antonius Leenders , Joost Jeroen Ottens
IPC分类号： G03B27/52
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
摘要翻译： 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。
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公开(公告)号：US07705962B2
公开(公告)日：2010-04-27
申请号：US11330394
申请日：2006-01-12
申请人： Nicolaas Rudolf Kemper , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Frits Van Der Meulen
发明人： Nicolaas Rudolf Kemper , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Frits Van Der Meulen
CPC分类号： G03F7/70866 , G03F7/70341
摘要： A liquid confinement structure configured to contain a liquid in a space between a projection system and a substrate has a recess in its lower surface which is open to both a relatively low pressure source and a relatively high pressure source and through which liquid and/or gas from between the liquid confinement structure and the substrate is extracted.
摘要翻译： 构造成在投影系统和基板之间的空间中容纳液体的液体限制结构在其下表面中具有凹槽，该凹部对于相对低的压力源和相对高的压力源是开放的，并且液体和/或气体 从液体限制结构和基板之间提取。
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公开(公告)号：US08755028B2
公开(公告)日：2014-06-17
申请号：US13223952
申请日：2011-09-01
申请人： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
发明人： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
摘要翻译： 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。
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