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公开(公告)号：US20100073540A1
公开(公告)日：2010-03-25
申请号：US12628709
申请日：2009-12-01
申请人： David Wells , Ulrich C. Boettiger
发明人： David Wells , Ulrich C. Boettiger
CPC分类号： G02B3/0018 , G02B3/0037 , G02B3/0056 , H01L27/14627
摘要： An imager or display system with multiple lenses, which are formed, patterned and shaped over one or more pixels in an imager or display array. The multiple lenses provide for an improved concentration of light being refracted onto a photosensitive area or light diffused from a display pixel.
摘要翻译： 具有多个透镜的成像器或显示系统，其在成像器或显示器阵列中的一个或多个像素上形成，图案化和成形。 多个透镜提供改进的光被折射到感光区域上的光或者从显示像素扩散的光。
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72.发明申请MICROELECTRONIC IMAGERS WITH STACKED LENS ASSEMBLIES AND PROCESSES FOR WAFER-LEVEL PACKAGING OF MICROELECTRONIC IMAGERS 审中-公开具有堆叠透镜组件的微电子成像器和用于微电子成像器的水平包装的工艺公开(公告)号：US20090321861A1
公开(公告)日：2009-12-31
申请号：US12147421
申请日：2008-06-26
IPC分类号： H01L31/0232 , H01L31/18
CPC分类号： H04N5/2254 , H01L27/14618 , H01L27/14625 , H01L27/14627 , H01L27/14632 , H01L27/14634 , H01L27/14636 , H01L27/14685 , H01L27/14687 , H01L27/1469 , H01L31/0203 , H01L31/0232 , H01L2924/16235 , H04N5/2257
摘要： Microelectronic imagers including stacked lens assemblies and process for wafer-level packaging of microelectronic imagers. One embodiment of a method for manufacturing stacked lens assemblies for integrated imagers comprises attaching a first lens substrate to a base spacer, fixing an intermediate spacer to the first lens substrate, and mounting a second lens substrate to the intermediate spacer. In a specific embodiment, the first lens substrate can be a component of a first lens unit and the second lens substrate can be a component of a second lens unit. Additionally, the first and second lens substrates can have one or more lens elements, aperture layers and/or filters on the substrates as described above or in other combinations.
摘要翻译： 包括堆叠透镜组件的微电子成像器和用于微电子成像器的晶片级封装的工艺。 用于制造用于集成成像器的叠层透镜组件的方法的一个实施例包括将第一透镜基板附接到基板间隔件，将中间间隔件固定到第一透镜基板，以及将第二透镜基板安装到中间间隔件。 在具体实施例中，第一透镜基板可以是第一透镜单元的部件，第二透镜基板可以是第二透镜单元的部件。 另外，第一透镜基板和第二透镜基板可以具有如上所述的基板上的一个或多个透镜元件，开口层和/或滤光器或其它组合。
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73.发明申请公开(公告)号：US20090256228A1
公开(公告)日：2009-10-15
申请号：US12490182
申请日：2009-06-23
申请人： Ulrich C. Boettiger , Jin Li
发明人： Ulrich C. Boettiger , Jin Li
IPC分类号： H01L31/0232
CPC分类号： G02B3/0031 , B29D11/00375 , G02B3/0043 , H01L27/14627 , H01L27/14685 , H01L31/02327
摘要： A micro-lens and a method for forming the micro-lens is provided. A micro-lens includes a substrate and lens material located within the substrate, the substrate having a recessed area serving as a mold for the lens material. The recessed can be shaped such that the lens material corrects for optical aberrations. The micro-lens can be part of a micro-lens array. The recessed area can serve as a mold for lens material for the micro-lens array and can be shaped such that the micro-lens array includes arcuate, non-spherical, or non-symmetrical micro-lenses.
摘要翻译： 提供微透镜和形成微透镜的方法。 微透镜包括位于衬底内的衬底和透镜材料，衬底具有用作透镜材料的模具的凹陷区域。 凹陷部分可以成形为使得透镜材料校正光学像差。 微透镜可以是微透镜阵列的一部分。 凹陷区域可以用作用于微透镜阵列的透镜材料的模具，并且可以被成形为使得微透镜阵列包括弓形，非球形或非对称微透镜。
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公开(公告)号：US07502058B2
公开(公告)日：2009-03-10
申请号：US10456585
申请日：2003-06-09
CPC分类号： H01L27/14685 , H01L27/14621 , H01L27/14625 , H04N5/335 , H04N9/045
摘要： An optimized color filter array is formed in, above or below a one or more damascene layers. The color filter array includes filter regions which are configured to optimize the combined optical properties of the layers of the device to maximize the intensity of the particular wavelength of light incident to a respective underlying photodiode.
摘要翻译： 在一个或多个镶嵌层的上方或下方形成优化的滤色器阵列。 滤色器阵列包括滤波器区域，其被配置为优化器件的层的组合光学性质，以使入射到相应的下面光电二极管的光的特定波长的强度最大化。
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公开(公告)号：US07476562B2
公开(公告)日：2009-01-13
申请号：US11209758
申请日：2005-08-24
申请人： Ulrich C. Boettiger , Jin Li
发明人： Ulrich C. Boettiger , Jin Li
IPC分类号： H01L21/00
CPC分类号： B29D11/00278 , B29D11/00365 , G02B3/0018 , G02B3/0043 , G02B3/005 , G02B3/0056 , H01L27/14605 , H01L27/14621 , H01L27/14627 , H01L27/14685
摘要： A microlens array with reduced or no empty space between individual microlenses and a method for forming the same. The microlens array is formed by patterning a first set of microlens precursors in a checkerboard pattern on a substrate. The first set of microlens precursors is reflowed and cured into first microlenses impervious to subsequent reflows. Then, a second set of microlens precursors is patterned in spaces among the first microlenses, reflowed and cured into second microlenses. The reflows and cures can be conducted under different conditions, and the microlenses may be differently sized. The conditions of the reflows can be chosen to ensure that the focal lengths of microlenses are optimized for maximum sensor signal.
摘要翻译： 微透镜阵列，其在单个微透镜之间具有减少或不空的空间，以及用于形成微透镜的方法。 微透镜阵列通过在衬底上以棋盘图案形成第一组微透镜前体而形成。 第一组微透镜前体被回流并固化成第一微透镜，其不受后续回流的影响。 然后，将第二组微透镜前体图案化在第一微透镜之间的空间中，回流并固化成第二微透镜。 可以在不同的条件下进行回流和固化，并且微透镜的尺寸可以不同。 可以选择回流的条件，以确保微透镜的焦距被优化用于最大传感器信号。
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公开(公告)号：US07375892B2
公开(公告)日：2008-05-20
申请号：US11213816
申请日：2005-08-30
申请人： Ulrich C. Boettiger , Jin Li
发明人： Ulrich C. Boettiger , Jin Li
IPC分类号： G02B27/10
CPC分类号： B29D11/00365 , B29D11/00278 , G02B3/0018 , G02B3/0056 , H01L27/14627 , H01L27/14685
摘要： Ellipse-shaped microlenses focus light onto unbalanced photosensitive areas, increase area coverage for a gapless layout of microlenses, and allow pair-wise or other individual shifts of the microlenses to account for asymmetrical pixels and pixel layout architectures. The microlenses may be fabricated in sets, with one set oriented differently from another set, and may be arranged in various patterns, for example, in a checkerboard pattern or radial pattern. The microlenses of at least one set may be substantially elliptical in shape. To fabricate a first set of microlenses, a first set of microlens material is patterned onto a support, reflowed under first reflow conditions, and cured. To fabricate a second set of microlenses, a second set of microlens material is patterned onto the support, reflowed under second reflow conditions, which may be different from the first conditions, and cured.
摘要翻译： 椭圆形微透镜将光聚焦到不平衡光敏区域上，增加了无间隙布局的微透镜的面积覆盖，并允许微透镜的成对或其他单独移位来解释不对称像素和像素布局架构。 微透镜可以以组合制成，其中一组与另一组取向不同，并且可以以各种图案布置，例如以棋盘图案或径向图案。 至少一组的微透镜的形状可以是基本上椭圆形。 为了制造第一组微透镜，将第一组微透镜材料图案化到支撑件上，在第一回流条件下回流并固化。 为了制造第二组微透镜，将第二组微透镜材料图案化到载体上，在第二回流条件下回流，其可以不同于第一条件并固化。
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公开(公告)号：US07352511B2
公开(公告)日：2008-04-01
申请号：US11476041
申请日：2006-06-28
申请人： Ulrich C. Boettiger , Jin Li
发明人： Ulrich C. Boettiger , Jin Li
CPC分类号： G02B3/0031 , G02B3/0043 , G02B3/005 , G02B3/0068 , G02B13/002 , G02B13/0055 , G03F7/0005 , H01L27/14627 , H01L27/14632
摘要： A micro-lens and a method for forming the micro-lens is provided. A micro-lens includes a substrate and lens material located within the substrate, the substrate having a recessed area serving as a mold for the lens material. The recessed can be shaped such that the lens material corrects for optical aberrations. The micro-lens can be part of a micro-lens array. The recessed area can serve as a mold for lens material for the micro-lens array and can be shaped such that the micro-lens array includes arcuate, non-spherical, or non-symmetrical micro-lenses.
摘要翻译： 提供微透镜和形成微透镜的方法。 微透镜包括位于衬底内的衬底和透镜材料，衬底具有用作透镜材料的模具的凹陷区域。 凹陷部分可以成形为使得透镜材料校正光学像差。 微透镜可以是微透镜阵列的一部分。 凹陷区域可以用作用于微透镜阵列的透镜材料的模具，并且可以被成形为使得微透镜阵列包括弓形，非球形或非对称微透镜。
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公开(公告)号：US07307788B2
公开(公告)日：2007-12-11
申请号：US11002231
申请日：2004-12-03
申请人： Ulrich C. Boettiger , Jin Li
发明人： Ulrich C. Boettiger , Jin Li
IPC分类号： G02B27/10
CPC分类号： G02B3/0018 , G02B3/0056 , H01L27/14627
摘要： A microlens array having first and second sets of spherically-shaped microlenses. The second set of spherically-shaped microlenses are located in the areas between individual microlenses of the first set in such a way that there is minimized gapping over the entire microlens array. A semiconductor-based imager includes a pixel array having embedded pixel cells, each with a photosensor, and a microlens array having spherically-shaped microlenses as just described.
摘要翻译： 具有第一组和第二组球形微透镜的微透镜阵列。 第二组球形微透镜位于第一组的单个微透镜之间的区域中，使得在整个微透镜阵列上的间隙最小化。 基于半导体的成像器包括具有嵌入像素单元的像素阵列，每个像素单元具有光电传感器，以及具有如前所述的球形微透镜的微透镜阵列。
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公开(公告)号：US07298453B2
公开(公告)日：2007-11-20
申请号：US11378666
申请日：2006-03-17
CPC分类号： G03F7/70333 , G03F7/70358
摘要： A method and apparatus for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation. The method can include directing the radiation along a radiation path in a first direction toward a reticle, passing the radiation from the reticle and to the microlithographic substrate along the radiation path in a second direction, and moving the reticle relative to the radiation path along a reticle path generally normal to the first direction. The microlithographic substrate can move relative to the radiation path along a substrate path having a first component generally parallel to the second direction, and a second component generally perpendicular to the second direction. The microlithographic substrate can move generally parallel to and generally perpendicular to the second direction in a periodic manner while the reticle moves along the reticle path to change a relative position of a focal plane of the radiation.
摘要翻译： 一种用于将微光刻基板的辐射敏感材料暴露于所选择的辐射的方法和装置。 该方法可以包括将辐射沿第一方向沿着辐射路径引导到光罩，使辐射沿着第一方向沿着辐射路径从光罩传递到微光刻基片，并且沿着辐射路径沿着辐射路径移动标线片 标线路径通常垂直于第一方向。 微光刻基片可以沿着具有大致平行于第二方向的第一部件的基板路径相对于辐射路径移动，以及大致垂直于第二方向的第二部件。 当光栅基板沿着标线路径移动以改变辐射的焦平面的相对位置时，微平版印刷基板可以以周期性的方式大致平行于并且大致垂直于第二方向移动。
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80.发明授权Method and apparatus for controlling radiation beam intensity directed to microlithographic substrates 有权用于控制指向微光刻基片的辐射束强度的方法和装置公开(公告)号：US07230679B2
公开(公告)日：2007-06-12
申请号：US11397176
申请日：2006-04-04
CPC分类号： G03F7/70083 , G03F7/70108 , G03F7/70141 , G03F7/70191 , G03F7/70558 , Y10S430/143
摘要： A method and apparatus for controlling an intensity distribution of a radiation beam directed to a microlithographic substrate. The method can include directing a radiation beam from a radiation source along the radiation path, with the radiation beam having a first distribution of intensity as the function of location in a plane generally transverse to the radiation path. The radiation beam impinges on an adaptive structure positioned in the radiation path and an intensity distribution of the radiation beam is changed from the first distribution to a second distribution by changing a state of the first portion of the adaptive structure relative to a second portion of the adaptive structure. For example, the transmissivity of the first portion, or inclination of the first portion can be changed relative to the second portion. The radiation is then directed away from the adaptive structure to impinge on the microlithographic substrate.
摘要翻译： 一种用于控制指向微光刻基片的辐射束的强度分布的方法和装置。 该方法可以包括沿着辐射路径引导来自辐射源的辐射束，其中辐射束具有作为大致横向于辐射路径的平面中的位置的函数的强度的第一分布。 辐射束照射位于辐射路径中的自适应结构，并且辐射束的强度分布从第一分布改变到第二分布，通过改变自适应结构的第一部分相对于第二部分的第二部分的状态 自适应结构。 例如，第一部分的透射率或第一部分的倾斜度可以相对于第二部分改变。 然后将辐射导向远离自适应结构以照射到微光刻基板上。
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