公开(公告)号：US09411250B2

公开(公告)日：2016-08-09

申请号：US13062872

申请日：2009-04-30

申请人： Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Vladimir Vitalevich Ivanov ,  Vladimir Mihailovitch Krivtsun

发明人： Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Vladimir Vitalevich Ivanov ,  Vladimir Mihailovitch Krivtsun

IPC分类号： G03F7/20 ,  H05G2/00

CPC分类号： G03F7/70916 ,  G03F7/70175 ,  G03F7/70858 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/005

摘要： A radiation system is configured to generate a radiation beam. The radiation system includes a radiation source configured to generate a plasma that emits radiation and debris, and a radiation collector configured to direct collected radiation to a radiation beam emission aperture. A magnetic field generator is configured to generate a magnetic field with a gradient in magnetic field strength to direct the plasma away from the radiation collector.

摘要翻译： 辐射系统被配置为产生辐射束。 辐射系统包括被配置为产生发射辐射和碎屑的等离子体的辐射源，以及被配置为将收集的辐射引导到辐射束发射孔径的辐射收集器。 磁场发生器被配置为产生具有磁场强度梯度的磁场，以将等离子体引导离开辐射收集器。

公开(公告)号：US08685632B2

公开(公告)日：2014-04-01

申请号：US13058788

申请日：2009-07-13

申请人： Antonius Theodorus Wilhelmus Kempen ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Erik Roelof Loopstra

发明人： Antonius Theodorus Wilhelmus Kempen ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Erik Roelof Loopstra

IPC分类号： G03F7/20 ,  G21K1/00

CPC分类号： G03F7/2008 ,  G03F7/70575 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70983 ,  G21K1/00

摘要： A lithographic apparatus includes a source configured to generate a radiation beam comprising desired radiation and undesired radiation using a plasma, an illumination system configured to condition the radiation beam and to receive hydrogen gas during operation of the lithographic apparatus, and a support structure constructed to hold a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. A substrate table is constructed to hold a substrate, and a projection system is configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus is configured such that the radiation beam on entering the projection system includes at least 50% of the undesired radiation that is generated by the plasma and includes wavelengths of radiation that interact with the hydrogen gas to generate hydrogen radicals.

摘要翻译： 光刻设备包括被配置为产生包含期望辐射和使用等离子体的不期望辐射的辐射束的源，被配置为调节辐射束并在光刻设备操作期间接收氢气的照明系统，以及构造成保持 图案形成装置。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 衬底台被构造成保持衬底，并且投影系统被配置为将图案化的辐射束投影到衬底的目标部分上。 光刻设备被配置为使得进入投影系统的辐射束包括由等离子体产生的不期望辐射的至少50％，并且包括与氢气相互作用以产生氢自由基的辐射波长。

公开(公告)号：US20110170079A1

公开(公告)日：2011-07-14

申请号：US13062872

申请日：2009-04-30

申请人： Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Vladimir Vitalevich Ivanov ,  Vladimir Mihailovitch Krivtsun

发明人： Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Vladimir Vitalevich Ivanov ,  Vladimir Mihailovitch Krivtsun

IPC分类号： G03B27/54 ,  H01J1/50

CPC分类号： G03F7/70916 ,  G03F7/70175 ,  G03F7/70858 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/005

摘要： A radiation system is configured to generate a radiation beam. The radiation system includes a radiation source configured to generate a plasma that emits radiation and debris, and a radiation collector configured to direct collected radiation to a radiation beam emission aperture. A magnetic field generator is configured to generate a magnetic field with a gradient in magnetic field strength to direct the plasma away from the radiation collector.

摘要翻译： 辐射系统被配置为产生辐射束。 辐射系统包括被配置为产生发射辐射和碎屑的等离子体的辐射源，以及被配置为将收集的辐射引导到辐射束发射孔径的辐射收集器。 磁场发生器被配置为产生具有磁场强度梯度的磁场，以将等离子体引导离开辐射收集器。

公开(公告)号：US07170586B2

公开(公告)日：2007-01-30

申请号：US11335681

申请日：2006-01-20

申请人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Jeroen Jonkers ,  Erik Roelof Loopstra

发明人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Jeroen Jonkers ,  Erik Roelof Loopstra

IPC分类号： G03B24/54

CPC分类号： G03F7/70008 ,  G03F7/7005

摘要： A lithographic apparatus includes an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, a substrate table and a projection system. Furthermore, the lithographic apparatus includes a plurality of EUV sources for providing EUV radiation to the illumination system and a distributor which is arranged to convert the EUV radiation from each of the EUV sources into an intermediate beam of radiation. The intermediate beam of radiation is directed from the distributor in a first direction by a mirror surface. The distributor may include a rotationally driven mirror arrangement, the axis of rotation being non-parallel to the mirror surface.

摘要翻译： 光刻设备包括被配置为提供辐射束的照明系统，被配置为支撑图案形成装置的支撑件，衬底台和投影系统。 此外，光刻设备包括用于向照明系统提供EUV辐射的多个EUV源和布置成将来自每个EUV源的EUV辐射转换成中间辐射束的分配器。 辐射的中间束通过镜面从第一方向从分配器引导。 分配器可以包括旋转驱动的反射镜布置，旋转轴线不平行于镜面。

公开(公告)号：US09726989B2

公开(公告)日：2017-08-08

申请号：US13643265

申请日：2011-02-22

申请人： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Andrei Mikhailovich Yakunin ,  Martin Jacobus Johan Jak

发明人： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Andrei Mikhailovich Yakunin ,  Martin Jacobus Johan Jak

IPC分类号： G02B5/20 ,  G03F7/20

CPC分类号： G03F7/70891 ,  G02B5/208 ,  G03F7/70191 ,  G03F7/70575

摘要： A spectral purity filter includes a body of material, through which a plurality of apertures extend. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The body of material is formed from a material having a bulk reflectance of substantially greater than or equal to 70% at the first wavelength of radiation. The material has a melting point above 1000° C.

公开(公告)号：US20140160455A1

公开(公告)日：2014-06-12

申请号：US14181076

申请日：2014-02-14

申请人： Andrei Mikhailovich YAKUNIN ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Harmen Klaas Ven Der Schoot ,  Lucas Henricus Johannes Stevens ,  Maarten Van Kampen

发明人： Andrei Mikhailovich YAKUNIN ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Harmen Klaas Ven Der Schoot ,  Lucas Henricus Johannes Stevens ,  Maarten Van Kampen

IPC分类号： G03F7/20

CPC分类号： G03F1/64 ,  B82Y10/00 ,  B82Y40/00 ,  C01B32/20 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/204 ,  G02B5/208 ,  G02B27/0006 ,  G03B27/54 ,  G03F1/24 ,  G03F1/62 ,  G03F7/70058 ,  G03F7/702 ,  G03F7/70916 ,  G03F7/70958 ,  G03F7/70983 ,  G21K1/062 ,  G21K2201/061 ,  H01B1/04 ,  H01B1/24

摘要： A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.

摘要翻译： 包括石墨烯的防护薄膜组件被构造并布置成用于EUV掩模版。 多层反射镜包括石墨烯作为最外层。

公开(公告)号：US20140002805A1

公开(公告)日：2014-01-02

申请号：US14004199

申请日：2012-01-18

申请人： Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Theodorus Petrus Maria Cadee ,  Johannes Antonius Gerardus Akkermans ,  Luigi Scaccabarozzi ,  Christiaan Louis Valentin

发明人： Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Theodorus Petrus Maria Cadee ,  Johannes Antonius Gerardus Akkermans ,  Luigi Scaccabarozzi ,  Christiaan Louis Valentin

IPC分类号： H01L21/683

CPC分类号： H01L21/6833 ,  G03F7/70691 ,  G03F7/70708 ,  G03F7/70783 ,  G03F9/7034

摘要： Disclosed is an electrostatic clamp apparatus (500) constructed to support a patterning device (505) of a lithographic apparatus, comprising a support structure against which said patterning device is supported, clamping electrodes (525) for providing a clamping force between the support structure and patterning device, and an array of capacitive sensors (660) operable to measure the shape of said patterning device.

摘要翻译： 公开了一种构造成支撑光刻设备的图案形成装置（505）的静电夹紧装置（500），其包括支撑所述图案形成装置的支撑结构，夹持电极（525），用于在支撑结构和 图案形成装置，以及可操作以测量所述图案形成装置的形状的电容传感器阵列（660）。

公开(公告)号：US20130038926A1

公开(公告)日：2013-02-14

申请号：US13643265

申请日：2011-02-22

申请人： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Andrei Mikhailovich Yakunin ,  Martin Jacobus Johan Jak

发明人： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Andrei Mikhailovich Yakunin ,  Martin Jacobus Johan Jak

IPC分类号： G02B27/42 ,  B29C39/02 ,  B44C1/22 ,  B82B1/00

CPC分类号： G03F7/70891 ,  G02B5/208 ,  G03F7/70191 ,  G03F7/70575

摘要： A spectral purity filter includes a body of material, through which a plurality of apertures extend. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The body of material is formed from a material having a bulk reflectance of substantially greater than or equal to 70% at the first wavelength of radiation. The material has a melting point above 1000° C.

摘要翻译： 光谱纯度滤光器包括一组材料，多个孔通过它们延伸。 孔被布置成抑制具有第一波长的辐射并且允许具有第二波长的辐射的至少一部分透射通过孔。 辐射的第二波长比辐射的第一波长短。 材料体在第一波长辐射下由体积反射率基本上大于或等于70％的材料形成。 该材料的熔点高于1000℃

公开(公告)号：US08242471B2

公开(公告)日：2012-08-14

申请号：US12431423

申请日：2009-04-28

申请人： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Tjarko Adriaan Rudolf Van Empel ,  Erik Roelof Loopstra ,  Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Tjarko Adriaan Rudolf Van Empel ,  Erik Roelof Loopstra ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： G01J3/10

CPC分类号： G03F7/70916 ,  G21K2201/064 ,  H05G2/005

摘要： A radiation source includes a radiation emitter configured to emit radiation, a collector configured to collect the radiation, and a contamination trap configured to trap contamination emitted by the radiation source. The contamination trap includes a plurality of foils that extend substantially radially, a first magnet ring configured to lie outside of an outer conical trajectory of radiation that is collected by the collector, and a second magnet ring configured to lie within the trajectory of radiation that is collected by the collector. The magnet rings are configured to provide a magnetic field that includes a component that is parallel to the foils.

摘要翻译： 辐射源包括被配置为发射辐射的辐射发射器，被配置为收集辐射的收集器以及被配置为捕获由辐射源发射的污染的污染阱。 污染物捕集器包括大致径向延伸的多个箔片，构造成位于由收集器收集的辐射的外锥形轨迹之外的第一磁环，以及构造成位于辐射轨迹内的第二磁环， 由收藏者收集。 磁环被配置成提供包括与箔片平行的部件的磁场。

公开(公告)号：US20110143288A1

公开(公告)日：2011-06-16

申请号：US13058788

申请日：2009-07-13

申请人： Antonius Theodorus Wilhelmus Kempen ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Erik Roelof Loopstra

发明人： Antonius Theodorus Wilhelmus Kempen ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Erik Roelof Loopstra

IPC分类号： G03F7/20 ,  G03B27/54

CPC分类号： G03F7/2008 ,  G03F7/70575 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70983 ,  G21K1/00

摘要： A lithographic apparatus includes a source configured to generate a radiation beam comprising desired radiation and undesired radiation using a plasma, an illumination system configured to condition the radiation beam and to receive hydrogen gas during operation of the lithographic apparatus, and a support structure constructed to hold a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. A substrate table is constructed to hold a substrate, and a projection system is configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus is configured such that the radiation beam on entering the projection system includes at least 50% of the undesired radiation that is generated by the plasma and includes wavelengths of radiation that interact with the hydrogen gas to generate hydrogen radicals.

摘要翻译： 光刻设备包括被配置为产生包含期望辐射和使用等离子体的不期望辐射的辐射束的源，被配置为调节辐射束并在光刻设备操作期间接收氢气的照明系统，以及构造成保持 图案形成装置。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 衬底台被构造成保持衬底，并且投影系统被配置为将图案化的辐射束投影到衬底的目标部分上。 光刻设备被配置为使得进入投影系统的辐射束包括由等离子体产生的不期望辐射的至少50％，并且包括与氢气相互作用以产生氢自由基的辐射波长。