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公开(公告)号：US09411250B2
公开(公告)日：2016-08-09
申请号：US13062872
申请日：2009-04-30
申请人： Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Vladimir Vitalevich Ivanov , Vladimir Mihailovitch Krivtsun
发明人： Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Vladimir Vitalevich Ivanov , Vladimir Mihailovitch Krivtsun
CPC分类号： G03F7/70916 , G03F7/70175 , G03F7/70858 , G03F7/70983 , H05G2/003 , H05G2/005
摘要： A radiation system is configured to generate a radiation beam. The radiation system includes a radiation source configured to generate a plasma that emits radiation and debris, and a radiation collector configured to direct collected radiation to a radiation beam emission aperture. A magnetic field generator is configured to generate a magnetic field with a gradient in magnetic field strength to direct the plasma away from the radiation collector.
摘要翻译： 辐射系统被配置为产生辐射束。 辐射系统包括被配置为产生发射辐射和碎屑的等离子体的辐射源，以及被配置为将收集的辐射引导到辐射束发射孔径的辐射收集器。 磁场发生器被配置为产生具有磁场强度梯度的磁场，以将等离子体引导离开辐射收集器。
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公开(公告)号：US20110170079A1
公开(公告)日：2011-07-14
申请号：US13062872
申请日：2009-04-30
申请人： Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Vladimir Vitalevich Ivanov , Vladimir Mihailovitch Krivtsun
发明人： Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Vladimir Vitalevich Ivanov , Vladimir Mihailovitch Krivtsun
CPC分类号： G03F7/70916 , G03F7/70175 , G03F7/70858 , G03F7/70983 , H05G2/003 , H05G2/005
摘要： A radiation system is configured to generate a radiation beam. The radiation system includes a radiation source configured to generate a plasma that emits radiation and debris, and a radiation collector configured to direct collected radiation to a radiation beam emission aperture. A magnetic field generator is configured to generate a magnetic field with a gradient in magnetic field strength to direct the plasma away from the radiation collector.
摘要翻译： 辐射系统被配置为产生辐射束。 辐射系统包括被配置为产生发射辐射和碎屑的等离子体的辐射源，以及被配置为将收集的辐射引导到辐射束发射孔径的辐射收集器。 磁场发生器被配置为产生具有磁场强度梯度的磁场，以将等离子体引导离开辐射收集器。
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公开(公告)号：US08755032B2
公开(公告)日：2014-06-17
申请号：US13063139
申请日：2009-07-21
申请人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Vladimir Mihailovitch Krivtsun , Gerardus Hubertus Petrus Maria Swinkels , Dzmitry Labetski
发明人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Vladimir Mihailovitch Krivtsun , Gerardus Hubertus Petrus Maria Swinkels , Dzmitry Labetski
CPC分类号： G03F7/70933 , G03F7/70033 , G03F7/70916 , G03F7/70983 , H05G2/003
摘要： A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel will be contacted by a beam of radiation to form a plasma, an outlet configured to allow gas to exit the radiation source, and a contamination trap at least partially located inside the outlet. The contamination trap is configured to trap debris particles that are generated with the formation of the plasma.
摘要翻译： 辐射源被配置成产生极紫外辐射。 辐射源包括位于燃料将被辐射束接触以形成等离子体的位置处的等离子体形成位置，被配置为允许气体离开辐射源的出口以及至少部分地位于内部的污染阱 出口。 污染阱被配置成捕集在形成等离子体时产生的碎屑颗粒。
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公开(公告)号：US20110164236A1
公开(公告)日：2011-07-07
申请号：US13063139
申请日：2009-07-21
申请人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Vladimir Mihailovitch Krivtsun , Gerardus Hubertus Petrus Maria Swinkels , Dzmitry Labetski
发明人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Vladimir Mihailovitch Krivtsun , Gerardus Hubertus Petrus Maria Swinkels , Dzmitry Labetski
CPC分类号： G03F7/70933 , G03F7/70033 , G03F7/70916 , G03F7/70983 , H05G2/003
摘要： A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel will be contacted by a beam of radiation to form a plasma, an outlet configured to allow gas to exit the radiation source, and a contamination trap at least partially located inside the outlet. The contamination trap is configured to trap debris particles that are generated with the formation of the plasma.
摘要翻译： 辐射源被配置成产生极紫外辐射。 辐射源包括位于燃料将被辐射束接触以形成等离子体的位置处的等离子体形成位置，被配置为允许气体离开辐射源的出口以及至少部分地位于内部的污染阱 出口。 污染阱被配置成捕集在形成等离子体时产生的碎屑颗粒。
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公开(公告)号：US07872244B2
公开(公告)日：2011-01-18
申请号：US11889065
申请日：2007-08-08
申请人： Vladimir Vitalevich Ivanov , Vadim Yevgenyevich Banine , Arno Jan Bleeker , Konstantin Nikolaevich Koshelev , Pavel Stanislavovich Antsiferov , Vladimir Mihailovitch Krivtsun , Dmitriy Victorovich Lopaev
发明人： Vladimir Vitalevich Ivanov , Vadim Yevgenyevich Banine , Arno Jan Bleeker , Konstantin Nikolaevich Koshelev , Pavel Stanislavovich Antsiferov , Vladimir Mihailovitch Krivtsun , Dmitriy Victorovich Lopaev
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , H05G2/005
摘要： A source configured to generate radiation for a lithographic apparatus is disclosed. The source includes an anode, and a cathode. The cathode and the anode are configured to create a discharge in a fuel in a discharge space between the anode and the cathode so as to generate a plasma, the cathode and the anode positioned relative to each other so that, in use, current lines extending between the anode and the cathode are substantially curved so as to create a force that substantially radially compresses the plasma only in a region proximate an upper surface of the cathode or of the anode.
摘要翻译： 公开了一种被配置为产生用于光刻设备的辐射的源。 源包括阳极和阴极。 阴极和阳极被配置为在阳极和阴极之间的放电空间中的燃料中产生放电，以便产生等离子体，阴极和阳极相对于彼此定位，使得在使用中，电流线延伸 在阳极和阴极之间基本上是弯曲的，从而产生基本上径向压缩等离子体的力，仅在接近阴极或阳极的上表面的区域中。
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6.发明授权Assembly for blocking a beam of radiation and method of blocking a beam of radiation 有权用于阻挡辐射束的组件和阻挡辐射束的方法公开(公告)号：US07772570B2
公开(公告)日：2010-08-10
申请号：US11643954
申请日：2006-12-22
申请人： Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Konstantin Nikolaevich Koshelev , Vladimir Mihailovitch Krivtsun
发明人： Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Konstantin Nikolaevich Koshelev , Vladimir Mihailovitch Krivtsun
IPC分类号： A61N5/00
CPC分类号： G03F7/70291 , G03F7/70041 , G03F7/7055 , G03F7/70558
摘要： An assembly is provided for blocking a beam of radiation. The assembly has a pipe arranged to transmit at least part of the beam of radiation. The pipe has an inner surface provided with an ablation material and encloses a volume. The assembly further has an ablation generation device. The ablation generation device is arranged to ablate at least a portion of the ablation material upon reception of a blocking signal. The assembly has a control unit, which is arranged to control the ablation generation device.
摘要翻译： 提供用于阻挡辐射束的组件。 组件具有布置成透射辐射束的至少一部分的管。 管道具有设置有消融材料并包围体积的内表面。 组件还具有消融产生装置。 消融产生装置被布置成在接收到阻塞信号时烧蚀消融材料的至少一部分。 组件具有控制单元，其被布置成控制消融产生装置。
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公开(公告)号：US20080266654A1
公开(公告)日：2008-10-30
申请号：US11790681
申请日：2007-04-26
申请人： Vadim Yevgenyevich Banine , Arno Jan Bleeker , Vladimir Vitalevich Ivanov , Konstantin Nikolaevich Koshelev , Frank Jeroen Pieter Schuurmans , Vladimir Mihailovitch Krivtsun , Maarten Marinus Johannes Wilhelmus Van Herpen
发明人： Vadim Yevgenyevich Banine , Arno Jan Bleeker , Vladimir Vitalevich Ivanov , Konstantin Nikolaevich Koshelev , Frank Jeroen Pieter Schuurmans , Vladimir Mihailovitch Krivtsun , Maarten Marinus Johannes Wilhelmus Van Herpen
IPC分类号： G02B21/00
CPC分类号： G21K7/00
摘要： An extreme ultraviolet (EUV) microscope configured to analyze a sample. The microscope includes a source of EUV radiation constructed and arranged to generate the EUV radiation with a wavelength at least in a range of about 2-6 nm, and an optical system constructed and arranged to illuminate the sample with the EUV radiation and to collect a radiation emanating from the sample. The optical system is arranged with at least one mirror that includes a multilayer structure for in-phase reflection of at least a portion of the radiation in the range of about 2-6 nm.
摘要翻译： 配置用于分析样品的极紫外（EUV）显微镜。 显微镜包括EUV辐射源，其被构造和布置成产生具有至少在约2-6nm范围内的波长的EUV辐射，以及构造和布置成用EUV辐射照射样品并收集一个 样品发出的辐射。 光学系统布置有至少一个反射镜，该反射镜包括多层结构，用于至少部分辐射在约2-6nm范围内的同相反射。
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公开(公告)号：US08493548B2
公开(公告)日：2013-07-23
申请号：US11882853
申请日：2007-08-06
申请人： Vladimir Vitalevich Ivanov , Vadim Yevgenyevich Banine , Konstantin Nikolaevich Koshelev , Vladimir Mihailovitch Krivtsun
发明人： Vladimir Vitalevich Ivanov , Vadim Yevgenyevich Banine , Konstantin Nikolaevich Koshelev , Vladimir Mihailovitch Krivtsun
CPC分类号： H05H1/24 , B82Y10/00 , G03F7/70033 , H05G2/003
摘要： A lithographic system includes a source configured to generate a radiation, the source including a cathode and an anode, the cathode and the anode configured to create a discharge in a fuel located in a discharge space so as to generate a plasma, the discharge space including, in use, a substance configured to adjust radiation emission by the plasma so as to control a volume defined by the plasma; a pattern support configured to hold a patterning device, the patterning device configured to pattern the radiation to form a patterned beam of radiation; a substrate support configured to support a substrate; and a projection system configured to project the patterned beam of radiation onto the substrate.
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公开(公告)号：US20090040491A1
公开(公告)日：2009-02-12
申请号：US11882853
申请日：2007-08-06
申请人： Vladimir Vitalevich Ivanov , Vadim Yevgenyevich Banine , Konstantin Nikolaevich Koshelev , Vladimir Mihailovitch Krivtsun
发明人： Vladimir Vitalevich Ivanov , Vadim Yevgenyevich Banine , Konstantin Nikolaevich Koshelev , Vladimir Mihailovitch Krivtsun
CPC分类号： H05H1/24 , B82Y10/00 , G03F7/70033 , H05G2/003
摘要： A lithographic system includes a source configured to generate a radiation, the source including a cathode and an anode, the cathode and the anode configured to create a discharge in a fuel located in a discharge space so as to generate a plasma, the discharge space including, in use, a substance configured to adjust radiation emission by the plasma so as to control a volume defined by the plasma; a pattern support configured to hold a patterning device, the patterning device configured to pattern the radiation to form a patterned beam of radiation; a substrate support configured to support a substrate; and a projection system configured to project the patterned beam of radiation onto the substrate.
摘要翻译： 光刻系统包括被配置为产生辐射的源，所述源包括阴极和阳极，所述阴极和阳极被配置为在位于放电空间中的燃料中产生放电以产生等离子体，所述放电空间包括 在使用中，配置成调整等离子体的辐射发射以控制由等离子体限定的体积的物质; 配置为保持图案形成装置的图案支撑件，所述图案形成装置被配置为对所述辐射进行图案化以形成图案化的辐射束; 衬底支撑件，其构造成支撑衬底; 以及投影系统，被配置为将所述图案化的辐射束投射到所述基板上。
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10.发明申请Assembly for blocking a beam of radiation and method of blocking a beam of radiation 有权用于阻挡辐射束的组件和阻挡辐射束的方法公开(公告)号：US20080148978A1
公开(公告)日：2008-06-26
申请号：US11643954
申请日：2006-12-22
申请人： Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Konstantin Nikolaevich Koshelev , Vladimir Mihailovitch Krivtsun
发明人： Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Konstantin Nikolaevich Koshelev , Vladimir Mihailovitch Krivtsun
CPC分类号： G03F7/70291 , G03F7/70041 , G03F7/7055 , G03F7/70558
摘要： An assembly is provided for blocking a beam of radiation. The assembly has a pipe arranged to transmit at least part of the beam of radiation. The pipe has an inner surface provided with an ablation material and encloses a volume. The assembly further has an ablation generation device. The ablation generation device is arranged to ablate at least a portion of the ablation material upon reception of a blocking signal. The assembly has a control unit, which is arranged to control the ablation generation device.
摘要翻译： 提供用于阻挡辐射束的组件。 组件具有布置成透射辐射束的至少一部分的管。 管道具有设置有消融材料并包围体积的内表面。 组件还具有消融产生装置。 消融产生装置被布置成在接收到阻塞信号时烧蚀消融材料的至少一部分。 组件具有控制单元，其被布置成控制消融产生装置。
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