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公开(公告)号：US20060176458A1
公开(公告)日：2006-08-10
申请号：US11375039
申请日：2006-03-15
申请人： Antonius Maria Derksen , Sjoerd Donders , Christiaan Hoogendam , Joeri Lof , Erik Loopstra , Jeroen Maria Mertens , Johannes Mulkens , Timotheus Sengers , Alexander Straaijer , Bob Streefkerk
发明人： Antonius Maria Derksen , Sjoerd Donders , Christiaan Hoogendam , Joeri Lof , Erik Loopstra , Jeroen Maria Mertens , Johannes Mulkens , Timotheus Sengers , Alexander Straaijer , Bob Streefkerk
IPC分类号： G03B27/42
CPC分类号： G03F7/707 , G03F7/70341 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
摘要： In a lithographic projection apparatus, a liquid supply system provides liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to contain liquid in the liquid supply system during, for example, substrate exchange.
摘要翻译： 在光刻投影设备中，液体供应系统在投影系统的最终元件和光刻投影设备的基板之间的空间中提供液体。 提供挡板构件以在例如基板交换期间容纳液体供应系统中的液体。
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公开(公告)号：US20060268250A1
公开(公告)日：2006-11-30
申请号：US11499780
申请日：2006-08-07
申请人： Antonius Maria Derksen , Sjoerd Donders , Christiaan Hoogendam , Joeri Lof , Erik Loopstra , Johannes Mulkens , Hans Jansen , Jacobus Johannus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
发明人： Antonius Maria Derksen , Sjoerd Donders , Christiaan Hoogendam , Joeri Lof , Erik Loopstra , Johannes Mulkens , Hans Jansen , Jacobus Johannus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
IPC分类号： G03B27/42
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
摘要： A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
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公开(公告)号：US07116404B2
公开(公告)日：2006-10-03
申请号：US10879522
申请日：2004-06-30
CPC分类号： G03F7/70291 , G03F7/70275
摘要： A system and method for use in a lithographic environment include an illumination system, an array of individually controllable elements, a projection system, and a substrate. The projection system comprises an array of lenses. The apparatus also includes a sensor system and a positioning system controllable to adjust a position and/or an orientation of at least one of the array of elements; a component of the projection system; and the illumination system. The apparatus also includes a control system which controls the array of elements to pattern the beam, and which also receives the intensity signal and controls the positioning system according to the detected intensity distribution to adjust the projected radiation pattern.
摘要翻译： 在光刻环境中使用的系统和方法包括照明系统，独立可控元件的阵列，投影系统和衬底。 投影系统包括透镜阵列。 该装置还包括传感器系统和可控制的调整位置和/或元件阵列中的至少一个的取向的定位系统; 投影系统的一个组件; 和照明系统。 该装置还包括一个控制系统，该控制系统控制元件阵列以对光束进行图案化，并且还接收强度信号并根据检测到的强度分布来控制定位系统以调整投影辐射图。
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公开(公告)号：US07274029B2
公开(公告)日：2007-09-25
申请号：US11022923
申请日：2004-12-28
CPC分类号： G03F7/70275 , G03F7/70258 , G03F7/70291
摘要： A projection system comprises an array of lenses MLA, each lens transmitting a unique part of a patterned beam. Measuring devices measure a distance between the array of lenses MLA and a substrate W. A controller controls an actuator to adjust a position (e.g., height and/or tilt) of the microlens array MLA.
摘要翻译： 投影系统包括透镜阵列MLA，每个透镜透射图案化束的唯一部分。 测量装置测量透镜阵列MLA和基底W之间的距离。控制器控制致动器来调节微透镜阵列MLA的位置（例如，高度和/或倾斜）。
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75.发明申请公开(公告)号：US20100195071A1
公开(公告)日：2010-08-05
申请号：US12598377
申请日：2008-04-29
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70483 , G03F9/7088
摘要： The invention relates to an image for detection of an aerial pattern comprising spatial differences in radiation intensity in a cross section of a beam of radiation in a lithographic apparatus for exposing a substrate. The image sensor comprises a lens (5) arranged to form a detection image of the aerial pattern and an image detector (6) arranged to measure radiation intensities in a plurality, of positions in the detection image.
摘要翻译： 本发明涉及一种用于检测天线图案的图像，其包括用于曝光基板的光刻设备中的辐射束的横截面中的辐射强度的空间差异。 图像传感器包括布置成形成天线图案的检测图像的透镜（5）和布置成测量检测图像中的多个位置中的辐射强度的图像检测器（6）。
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76.发明授权Lithographic apparatus configured to reconstruct an aerial pattern and to compare the reconstructed aerial pattern with an aerial pattern detected by an image sensor 有权所述平版印刷装置被配置为重构天线图案并且将所述重建的天线图案与由图像传感器检测到的天线图案进行比较公开(公告)号：US09329500B2
公开(公告)日：2016-05-03
申请号：US12598377
申请日：2008-04-29
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70483 , G03F9/7088
摘要： The invention relates to an image for detection of an aerial pattern comprising spatial differences in radiation intensity in a cross section of a beam of radiation in a lithographic apparatus for exposing a substrate. The image sensor comprises a lens (5) arranged to form a detection image of the aerial pattern and an image detector (6) arranged to measure radiation intensities in a plurality, of positions in the detection image.
摘要翻译： 本发明涉及一种用于检测天线图案的图像，其包括用于曝光基板的光刻设备中的辐射束的横截面中的辐射强度的空间差异。 图像传感器包括布置成形成天线图案的检测图像的透镜（5）和布置成测量检测图像中的多个位置中的辐射强度的图像检测器（6）。
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77.发明申请Image sensor, lithographic apparatus comprising an image sensor and use of an image sensor in a lithographic apparatus 有权图像传感器，包括图像传感器的光刻设备和光刻设备中的图像传感器的使用公开(公告)号：US20080273183A1
公开(公告)日：2008-11-06
申请号：US11797505
申请日：2007-05-03
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70483 , G03F9/7088
摘要： The invention relates to an image sensor for detection of an aerial image formed by a beam of radiation in a lithographic projection apparatus for exposing a pattern onto a substrate held in a substrate plane by a substrate holder. The image sensor has an image detector and a lens. The lens is arranged to project at least part of the aerial image onto the image detector. The image sensor is positioned such within the substrate holder that the lens is positioned proximate the substrate plane.
摘要翻译： 本发明涉及一种用于检测由光刻投影设备中的辐射束形成的空间图像的图像传感器，用于通过基板保持器将图案曝光在保持在基板平面中的基板上。 图像传感器具有图像检测器和透镜。 透镜布置成将至少一部分空间图像投影到图像检测器上。 图像传感器被定位在衬底保持器内，透镜位于衬底平面附近。
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78.发明授权Image sensor, lithographic apparatus comprising an image sensor and use of an image sensor in a lithographic apparatus 有权图像传感器，包括图像传感器的光刻设备和光刻设备中的图像传感器的使用公开(公告)号：US08975599B2
公开(公告)日：2015-03-10
申请号：US11797505
申请日：2007-05-03
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70483 , G03F9/7088
摘要： The invention relates to an image sensor for detection of an aerial image formed by a beam of radiation in a lithographic projection apparatus for exposing a pattern onto a substrate held in a substrate plane by a substrate holder. The image sensor has an image detector and a lens. The lens is arranged to project at least part of the aerial image onto the image detector. The image sensor is positioned such within the substrate holder that the lens is positioned proximate the substrate plane.
摘要翻译： 本发明涉及一种用于检测由光刻投影设备中的辐射束形成的空间图像的图像传感器，用于通过基板保持器将图案曝光在保持在基板平面中的基板上。 图像传感器具有图像检测器和透镜。 透镜布置成将至少一部分空间图像投影到图像检测器上。 图像传感器被定位在衬底保持器内，透镜位于衬底平面附近。
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公开(公告)号：US07359030B2
公开(公告)日：2008-04-15
申请号：US10724402
申请日：2003-12-01
CPC分类号： B82Y30/00 , B01J2219/00353 , B01J2219/00432 , B01J2219/00434 , B01J2219/00439 , B01J2219/00448 , B01J2219/00711 , B01J2219/0072 , C40B60/14 , G03F7/708
摘要： A flowcell including a plurality of separate chambers is provided on the substrate table so that a fluid can be brought into contact with exposed areas of the substrate to interact therewith. A series of exposures and chemical processes can thereby be carried out without removing the substrate from the substrate table.
摘要翻译： 在衬底台上设置包括多个分离室的流动池，使得流体可以与衬底的暴露区域接触以与其相互作用。 由此可以在不从衬底台移除衬底的情况下进行一系列曝光和化学处理。
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80.发明授权Alignment method and apparatus, lithographic apparatus, device manufacturing method, and alignment tool 失效对准方法和装置，光刻设备，装置制造方法和对准工具公开(公告)号：US07292339B2
公开(公告)日：2007-11-06
申请号：US10887311
申请日：2004-07-09
申请人： Joeri Lof
发明人： Joeri Lof
IPC分类号： G01B11/00
CPC分类号： G03F9/7084 , G03F9/7003 , G03F9/7015
摘要： In one embodiment, front to back side alignment optics are used to project a mark on the back side of a substrate. The front to back side alignment optics are arranged such that the image projected into the image window of the front to back side alignment optics is a translational replica of the mark on the back side of the substrate. One potential advantage of such an arrangement is that any slight inaccuracies in the location of the optical axis do not result in inaccuracies in the image of the substrate mark. The translational replica image can be used for alignment of the substrate.
摘要翻译： 在一个实施例中，前后对准光学器件用于在衬底的背面上投影标记。 前后对准光学元件被布置为使得投射到前后对准光学器件的图像窗口中的图像是基板背面上的标记的平移复本。 这种布置的一个潜在优点是光轴位置上的任何轻微的不准确性不会导致基板标记图像的不准确。 平移复制图像可用于基板的对准。
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