摘要:
A control system adjusts the exposure of a wafer according to the transfer error of a pattern line width caused when a certain integrated exposure over the whole shot areas is made a desired value when a pattern is transferred to a wafer and according to information corresponding to the desired value of the integrated exposure stored in a storage device, then performing scanning exposure. As a result, influences such as of fog exposure due to flare are mitigated, and the uniformity of line width distribution with high precision is ensure over the shot regions on the wafer, achieving pattern transfer to each shot region.
摘要:
A digital demodulator which will need no absolute phasing circuit is provided. A known-pattern BPSK signal generating circuit 6 generates the same known-pattern BPSK signal as a known-pattern BPSK signal in a received digital modulated wave in synchronism with the known-pattern BPSK signal in the received digital modulated wave, a carrier-reproducing phase error detecting circuit 7 has a phase error table where one of reference phases in a signal point position of a demodulation baseband signal is made a convergence point, a phase error voltage corresponding to a phase error between a phase determined from the signal point position of the demodulation baseband signals and a phase convergence point is sent out, by enable-controlling a carrier-reproducing loop filter 8 according to the known-pattern BPSK signal outputted from the known-pattern BPSK signal generating circuit 6, the phase error voltage is smoothed, and carrier reproduction is performed while controlling the frequency of a reproduced carrier according to the smoothed output so that the phase in the signal point position coincides with the phase convergence point.
摘要:
A received signal phase detecting circuit in provided in which the circuit scale is small. The circuit functions so as to capture a frame synchronizing signal from a demodulated baseband signal, extract a symbol stream during the period of frame synchronizing signal from the demodulated baseband signal through delay circuits (41, 42) at a timing matching the bit stream of the captured synchronizing signal, rotating the phase of a corresponding symbol extracted from the symbol stream when the big in the bit in the bit stream is logic “0” by 80°, outputting the symbol after the phase rotation and a corresponding symbol extracted from the symbol stream when the bit in the bit stream is logic “1” from a 0°/180° phase rotating circuit (43), operating the cumulative average of the output from the 0°/180° phase rotating circuit (43) for a specific period through cumulative averaging circuits (45, 46), rotating the phase of the outputs therefrom through a 22.5° phase rotating circuit (48), and determining the phase of the output therefrom by a phase determining circuit (49).
摘要:
A small-scale absolute-phasing synchronization capturing circuit for absolute phasing of a received signal by selectively transmitting a baseband signal demodulated through a demodulator (1), a baseband signal subjected to phase rotation through a remapper (11), a baseband signal output from a first inverting means, a baseband signal output from a second inverting means based on the phase angle of the received signal relative to the phase rotation of the transmission signal. The most significant bit in the demodulated baseband signal and the most significant bit in the baseband signal subjected to phase rotation through the remapper (11) are extracted and a frame synchronization signal is captured according to the extracted significant bit.
摘要:
The present invention provides an AM modulated wave eliminating circuit which is capable of extracting a digital modulated wave by cancelling an AM modulated wave from an AM data multiplex modulated wave. A composite wave is composed of an AM carrier wave in-phase signal, an AM carrier wave reverse-phase signal and a digital modulated wave is extracted from an AM data multiplex modulated wave composed of an AM stereo modulated wave multiplexed with a digital modulated wave within the same frequency band, values corresponding to different phase deflection angles of an AM stereo output from a phase level generator (21) are multiplied by the AM carrier wave in-phase signal with multipliers (221 through 22n), multiplication outputs are added to the composite wave with adders (231 through 23n), a phase deflection angle corresponding to an output at a minimum level out of addition outputs is determined with a phase presumer (24), a value corresponding to a determined phase deflection angle is selected from an output of a phase level generator (21) with a phase level selector (25), a selected value is multiplied by an AM carrier wave in-phase signal component with a multiplier (26), a multiplication output is added to the composite wave with an adder (27) and an addition output is used as a digital modulated wave.
摘要:
A printer in which a rolled recording paper is housed in a recording paper cassette formed integrally with a printer proper and openably with respect thereto, and one of a thermal recording head or a platen roller is disposed at an openable free end of the cassette with the other disposed in the printer proper, whereby printing onto the recording paper is effected by conducting electrical current to the recording head while the recording paper being clamped by the recording head and platen roller.
摘要:
A facsimile apparatus has a single conveying roller in it, above which an image sensor is set and below which a printing head is set. Pressing pins are set respectively near the upper and lower ends of components supporting the conveying roller to freely rotate. In transmission, the lower pressing pins keep away the printing head from the conveying roller and the image sensor presses an original document onto the conveying roller. In reception, the upper pressing pins keep away the image sensor from the conveying roller and the printing head presses the recording paper onto the conveying roller. In this way, structure of the facsimile apparatus is simplified.
摘要:
A liquid immersion device that has an mixing mechanism that mixes and dissolves a predetermined substance for adjusting specific resistance of the liquid, which is supplied onto a liquid repellent film on the surface of an object (member) of a projection optical system placed on the light emitting side of projection optical system, and an liquid immersion area is formed by supplying the liquid in which the predetermined liquid is dissolved onto the liquid repellent film.
摘要:
A lithography apparatus includes a part having a photocatalytic coating. The lithography apparatus can be an extreme ultraviolet lithography apparatus or an immersion lithography apparatus.
摘要:
An exposure apparatus includes an immersion space forming member (70) which fills an optical path space (K1) for exposure light (EL) with a first liquid (LQ) to form an immersion space, and a temperature regulating mechanism (60) which suppresses a change in the temperature of the immersion space forming member (70) accompanying deactivation of formation of the immersion space.