公开(公告)号：US5077618A

公开(公告)日：1991-12-31

申请号：US431775

申请日：1989-11-06

申请人： Katsuyuki Sakai ,  Kenichi Shiraishi ,  Motohiko Hayashi ,  Sadaaki Shimonaga

发明人： Katsuyuki Sakai ,  Kenichi Shiraishi ,  Motohiko Hayashi ,  Sadaaki Shimonaga

IPC分类号： H04N1/00 ,  H04N1/04 ,  H04N1/12 ,  H04N1/193

CPC分类号： H04N1/0461 ,  H04N1/1215 ,  H04N1/0464 ,  H04N1/193

摘要： A facsimile apparatus has a single conveying roller in it, above which an image sensor is set and below which a printing head is set. Pressing pins are set respectively near the upper and lower ends of components supporting the conveying roller to freely rotate. In transmission, the lower pressing pins keep away the printing head from the conveying roller and the image sensor presses an original document onto the conveying roller. In reception, the upper pressing pins keep away the image sensor from the conveying roller and the printing head presses the recording paper onto the conveying roller. In this way, structure of the facsimile apparatus is simplified.

公开(公告)号：US5265152A

公开(公告)日：1993-11-23

申请号：US750058

申请日：1991-08-27

申请人： Matahira Kotani ,  Motohiko Hayashi ,  Ryoichi Kawai ,  Katsuyuki Sakai ,  Kenichi Shiraishi ,  Shigeru Kida

发明人： Matahira Kotani ,  Motohiko Hayashi ,  Ryoichi Kawai ,  Katsuyuki Sakai ,  Kenichi Shiraishi ,  Shigeru Kida

IPC分类号： H04N1/00 ,  H04N1/04 ,  H04N1/23

CPC分类号： H04N1/00302 ,  H04N1/00281 ,  H04N2201/0063

摘要： A facsimile apparatus having a housing (10) for the apparatus and a telephone placing portion (12) disposed at an upper part of the housing, on which a telephone (11) connected to a public telephone network can be placed. The facsimile apparatus further including elements (18) for scanning an original by feeding the original to generate electrical signals representing image information of the original and elements (19) for recording image information applied to the apparatus through the public telephone network on a sheet. Both the scanning elements and the recording elements are disposed side by side along the direction of feeding of the original. The telephone placing portion is disposed above both the scanning elements and the recording elements to cover the upper portion of both the scanning elements and the recording elements. The apparatus further includes a first passage (32) disposed between the telephone placing portion and the scanning elements for feeding the original and second passage (33) disposed between the telephone placing portion and the recording elements, for feeding the original passed through the first passage. Both the first passage and the second passage can be opened to the outside by opening the placing portion.

公开(公告)号：US5201588A

公开(公告)日：1993-04-13

申请号：US857769

申请日：1992-03-26

申请人： Katsuyuki Sakai ,  Kenichi Shiraishi ,  Shigeru Kida ,  Ryoichi Kawai

发明人： Katsuyuki Sakai ,  Kenichi Shiraishi ,  Shigeru Kida ,  Ryoichi Kawai

IPC分类号： B41J2/32 ,  B41J11/14 ,  B41J15/04 ,  B65H16/02

CPC分类号： B41J15/042 ,  B65H2301/4137

摘要： A printer in which a rolled recording paper is housed in a recording paper cassette formed integrally with a printer proper and openably with respect thereto, and one of a thermal recording head or a platen roller is disposed at an openable free end of the cassette with the other disposed in the printer proper, whereby printing onto the recording paper is effected by conducting electrical current to the recording head while the recording paper being clamped by the recording head and platen roller.

公开(公告)号：US08780327B2

公开(公告)日：2014-07-15

申请号：US13064867

申请日：2011-04-21

申请人： Naoyuki Kobayashi ,  Akikazu Tanimoto ,  Yasushi Mizuno ,  Kenichi Shiraishi ,  Katsushi Nakano ,  Soichi Owa

发明人： Naoyuki Kobayashi ,  Akikazu Tanimoto ,  Yasushi Mizuno ,  Kenichi Shiraishi ,  Katsushi Nakano ,  Soichi Owa

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03F7/20

CPC分类号： G03F7/7085 ,  G03B27/52 ,  G03F7/00 ,  G03F7/2041 ,  G03F7/70316 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70958 ,  G03F9/7015 ,  G03F9/7088 ,  G03F9/7096

摘要： An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a flow passage in which exposure liquid flows, the flow passage being in fluidic communication with the space. The apparatus also includes a cleaning system which cleans the member.

摘要翻译： 曝光装置包括光学元件，通过该光学元件，图案化的光束通过填充在光学元件和基板之间的空间中的曝光液体投影到基板上。 该装置还包括具有流动通道的构件，曝气液体在该流动通道中，流动通道与该空间流体连通。 该装置还包括清洁构件的清洁系统。

公开(公告)号：US08384880B2

公开(公告)日：2013-02-26

申请号：US12232064

申请日：2008-09-10

申请人： Soichi Owa ,  Nobutaka Magome ,  Shigeru Hirukawa ,  Yoshihiko Kudo ,  Jiro Inoue ,  Hirotaka Kohno ,  Masahiro Nei ,  Motokatsu Imai ,  Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Yasufumi Nishii ,  Hiroaki Takaiwa

发明人： Soichi Owa ,  Nobutaka Magome ,  Shigeru Hirukawa ,  Yoshihiko Kudo ,  Jiro Inoue ,  Hirotaka Kohno ,  Masahiro Nei ,  Motokatsu Imai ,  Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Yasufumi Nishii ,  Hiroaki Takaiwa

IPC分类号： G03B27/58 ,  G03B27/52 ,  G03B27/42 ,  G03B27/32

CPC分类号： G03F7/70341 ,  G03B27/58 ,  G03F7/2041 ,  G03F7/707 ,  G03F7/70716

摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

公开(公告)号：US08125612B2

公开(公告)日：2012-02-28

申请号：US11603078

申请日：2006-11-22

申请人： Naoyuki Kobayashi ,  Yasushi Mizuno ,  Kenichi Shiraishi

发明人： Naoyuki Kobayashi ,  Yasushi Mizuno ,  Kenichi Shiraishi

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/7085 ,  G03B27/52 ,  G03F7/00 ,  G03F7/2041 ,  G03F7/70316 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70958 ,  G03F9/7015 ,  G03F9/7088 ,  G03F9/7096

摘要： There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.

摘要翻译： 提供了一种曝光装置，其能够通过经由投影光学系统和液体将图案投影到基板上时通过去除不需要的液体来形成期望的装置图案。 曝光装置经由投影光学系统和液体将图案的图像投影到基板P上，以露出基板P.曝光装置包括：液体移除机构40，其去除残留在布置在基板 投影光学系统的像平面附近。

公开(公告)号：US07995187B2

公开(公告)日：2011-08-09

申请号：US11767425

申请日：2007-06-22

申请人： Naoyuki Kobayashi ,  Akikazu Tanimoto ,  Yasushi Mizuno ,  Kenichi Shiraishi ,  Katsushi Nakano ,  Soichi Owa

发明人： Naoyuki Kobayashi ,  Akikazu Tanimoto ,  Yasushi Mizuno ,  Kenichi Shiraishi ,  Katsushi Nakano ,  Soichi Owa

IPC分类号： G03B27/52 ,  G03B27/42

摘要： A lithographic apparatus includes a substrate table which holds a substrate, a projection system which projects a patterned beam of radiation onto the substrate, the projection system having a final optical element adjacent the substrate, a liquid supply system which provides a liquid to a space between the projection system and the substrate table, and a cleaning system which cleans the substrate table.

公开(公告)号：US20100134772A1

公开(公告)日：2010-06-03

申请号：US12656456

申请日：2010-01-29

申请人： Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Soichi Owa ,  Shigeru Hirukawa

发明人： Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Soichi Owa ,  Shigeru Hirukawa

IPC分类号： G03B27/52

CPC分类号： G03F7/70916 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70925

摘要： An exposure apparatus forms an immersion area of a liquid on the side of the image plane of a projection optical system and performs exposure of a substrate via the projection optical system and the liquid of the immersion region. The exposure apparatus has an optical cleaning unit which irradiates a predetermined irradiation light, having an optical cleaning effect, onto, for example, the upper surface of the substrate stage which makes contact with the liquid for forming the immersion area. Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy due to pollution of the member in contact with the liquid in the immersion region.

摘要翻译： 曝光装置在投影光学系统的像面一侧形成液体的浸没区域，并通过投影光学系统和浸没区域的液体进行基板的曝光。 曝光装置具有光学清洁单元，其将具有光学清洁效果的预定照射光照射到例如与用于形成浸没区域的液体接触的基底台的上表面。 因此，可以防止由于与浸没区域中的液体接触的构件的污染导致的曝光精度和测量精度的劣化。

公开(公告)号：US20090225286A1

公开(公告)日：2009-09-10

申请号：US11630110

申请日：2005-06-21

申请人： Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Soichi Owa ,  Shigeru Hirukawa

发明人： Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Soichi Owa ,  Shigeru Hirukawa

IPC分类号： G03B27/52

CPC分类号： G03F7/70916 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70925

摘要： An exposure apparatus forms an immersion area of a liquid on the side of the image plane of a projection optical system and performs exposure of a substrate via the projection optical system and the liquid of the immersion region. The exposure apparatus has an optical cleaning unit which irradiates a predetermined irradiation light, having an optical cleaning effect, onto, for example, the upper surface of the substrate stage which makes contact with the liquid for forming the immersion area. Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy due to pollution of the member in contact with the liquid in the immersion region.

摘要翻译： 曝光装置在投影光学系统的像面一侧形成液体的浸没区域，并通过投影光学系统和浸没区域的液体进行基板的曝光。 曝光装置具有光学清洁单元，其将具有光学清洁效果的预定照射光照射到例如与用于形成浸没区域的液体接触的基底台的上表面。 因此，可以防止由于与浸没区域中的液体接触的构件的污染导致的曝光精度和测量精度的劣化。

公开(公告)号：US20090153813A1

公开(公告)日：2009-06-18

申请号：US11883319

申请日：2007-01-27

申请人： Kenichi Shiraishi

发明人： Kenichi Shiraishi

IPC分类号： G03B27/52

CPC分类号： G03F7/70858 ,  G03F7/70341 ,  G03F7/70425

摘要： An exposure condition is determined in accordance with a moving condition of a substrate (P) relative to a projection optical system so that a pattern image is projected on the substrate (P) in a desired projection state, and the substrate (P) is exposed in the determined exposure condition.

摘要翻译： 根据基板（P）相对于投影光学系统的移动状态确定曝光条件，使得图案图像以期望的投影状态投影在基板（P）上，并且基板（P）暴露 在确定的暴露条件下。