公开(公告)号：US07014545B2

公开(公告)日：2006-03-21

申请号：US10754997

申请日：2004-01-10

申请人： Hung Chih Chen ,  John M. White ,  Shijian Li ,  Fred C. Redeker ,  Ramin Emami

发明人： Hung Chih Chen ,  John M. White ,  Shijian Li ,  Fred C. Redeker ,  Ramin Emami

IPC分类号： B24B7/00

CPC分类号： B24B37/30 ,  B24B37/12 ,  B24B37/32 ,  B24B41/007

摘要： A carrier head for chemical mechanical polishing, includes a base, a support structure attached to the base having a surface for contacting a substrate, and a retaining structure attached to the base to prevent the substrate from moving along the surface. The retaining structure and the surface define a cavity for receiving the substrate. The retaining structure includes an upper portion in contact with the base, a lower portion, and a vibration damper separating the upper portion and the lower portion. The vibration damper, the vibration damper includes a material that does not rebound to its original shape when subjected to a deformation.

摘要翻译： 用于化学机械抛光的载体头包括基底，附着到具有用于接触基底的表面的基部的支撑结构以及附接到基部的保持结构，以防止基底沿着表面移动。 保持结构和表面限定用于接收基底的空腔。 保持结构包括与基座接触的上部，下部和分隔上部和下部的振动阻尼器。 振动阻尼器，减震器包括当经受变形时不能反弹到其原始形状的材料。

公开(公告)号：US07001245B2

公开(公告)日：2006-02-21

申请号：US10384247

申请日：2003-03-07

申请人： Hung Chih Chen

发明人： Hung Chih Chen

IPC分类号： B24B49/00 ,  B24B51/00

CPC分类号： B24B37/30

摘要： A carrier head for a chemical mechanical polishing apparatus includes a membrane with an exterior grooved surface for improved chemical mechanical polishing. The exterior grooved surface provides a path for the flow of air from the portion between the membrane and a substrate.

摘要翻译： 用于化学机械抛光装置的载体头包括具有用于改进化学机械抛光的外部开槽表面的膜。 外部沟槽表面提供了用于从膜和衬底之间的部分流出空气的路径。

公开(公告)号：US06722965B2

公开(公告)日：2004-04-20

申请号：US09903226

申请日：2001-07-10

申请人： Steven M. Zuniga ,  Hung Chih Chen ,  Ming Kuie Tseng

发明人： Steven M. Zuniga ,  Hung Chih Chen ,  Ming Kuie Tseng

IPC分类号： B24B100

CPC分类号： B24B37/30 ,  B24B49/16

摘要： A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane that applies a controllable load to a substrate in an area with a controllable inner diameter.

摘要翻译： 用于化学机械抛光装置的载体头包括柔性膜，其在可控内径的区域中对基底施加可控制的载荷。

公开(公告)号：US06676497B1

公开(公告)日：2004-01-13

申请号：US09658417

申请日：2000-09-08

申请人： Hung Chih Chen ,  John M. White ,  Shijian Li ,  Fred C. Redeker ,  Ramin Emami

发明人： Hung Chih Chen ,  John M. White ,  Shijian Li ,  Fred C. Redeker ,  Ramin Emami

IPC分类号： B24B700

CPC分类号： B24B37/30 ,  B24B37/12 ,  B24B37/32 ,  B24B41/007

摘要： A carrier head for chemical mechanical polishing, includes a base, a support structure attached to the base having a surface for contacting a substrate, and a retaining structure attached to the base to prevent the substrate from moving along the surface. The retaining structure and the surface define a cavity for receiving the substrate. The retaining structure includes an upper portion in contact with the base, a lower portion, and a vibration damper separating the upper portion and the lower portion. The vibration damper, the vibration damper includes a material that does not rebound to its original shape when subjected to a deformation.

摘要翻译： 用于化学机械抛光的载体头包括基底，附着到具有用于接触基底的表面的基部的支撑结构以及附接到基部的保持结构，以防止基底沿着表面移动。 保持结构和表面限定用于接收基底的空腔。 保持结构包括与基座接触的上部，下部和分隔上部和下部的振动阻尼器。 振动阻尼器，减震器包括当经受变形时不能反弹到其原始形状的材料。

公开(公告)号：US06450868B1

公开(公告)日：2002-09-17

申请号：US09535575

申请日：2000-03-27

申请人： Steven M. Zuniga ,  Hung Chih Chen ,  Ming Kuie Tseng

发明人： Steven M. Zuniga ,  Hung Chih Chen ,  Ming Kuie Tseng

IPC分类号： B24B4700

CPC分类号： B24B37/30 ,  F16J3/02

摘要： A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane that applies a load to a substrate. A central portion of the flexible membrane is formed of a first material with a different rigidity than a second material that forms the annular portion of the flexible membrane.

摘要翻译： 用于化学机械抛光装置的载体头包括向基底施加载荷的柔性膜。 柔性膜的中心部分由与形成柔性膜的环形部分的第二材料刚度不同的第一材料形成。

公开(公告)号：US06436228B1

公开(公告)日：2002-08-20

申请号：US09080094

申请日：1998-05-15

申请人： Steven M. Zuniga ,  Hung Chih Chen

发明人： Steven M. Zuniga ,  Hung Chih Chen

IPC分类号： C23F102

CPC分类号： B24B37/32 ,  B24B37/28

摘要： A retainer is used with an apparatus for polishing a substrate. The substrate has upper and lower surfaces and a lateral, substantially circular, perimeter. The apparatus has a polishing pad with an upper polishing surface for contacting and polishing the lower face of the substrate. The retainer has an inward facing retaining face for engaging and retaining the substrate against lateral movement during polishing of the substrate. The retaining face engages a substrate perimeter at more than substantially a single discrete circumferential location along the perimeter.

摘要翻译： 保持器用于抛光衬底的装置。 衬底具有上表面和下表面以及侧面，基本上圆形的周边。 该装置具有抛光垫，该抛光垫具有用于接触和抛光基底下表面的上抛光表面。 保持器具有向内的保持面，用于在衬底的抛光期间接合和保持衬底以防止横向移动。 保持面在沿着周边的基本上一个单独的离散圆周位置处接合基底周边。

公开(公告)号：US6050882A

公开(公告)日：2000-04-18

申请号：US330243

申请日：1999-06-10

申请人： Hung Chih Chen

发明人： Hung Chih Chen

IPC分类号： B24B37/30 ,  H01L21/304 ,  B24B5/00

CPC分类号： B24B37/30

摘要： A carrier head for a chemical mechanical polishing apparatus has a plurality of independently movable rods. The rods both apply pressure a substrate and surround the substrate to provide a retainer.

摘要翻译： 用于化学机械抛光装置的承载头具有多个可独立移动的杆。 杆都对衬底施加压力并围绕衬底以提供保持器。

公开(公告)号：US10226853B2

公开(公告)日：2019-03-12

申请号：US13801127

申请日：2013-03-13

申请人： Rajeev Bajaj ,  Hung Chih Chen

发明人： Rajeev Bajaj ,  Hung Chih Chen

IPC分类号： B24B53/017 ,  B23K26/38 ,  B24B37/34

摘要： A method and apparatus for conditioning a polishing pad is provided. In one embodiment, a pad conditioning device for a substrate polishing process is provided. The pad conditioning device includes an optical device coupled to a portion of a polishing station adjacent a polishing pad, the optical device comprising a laser emitter adapted to emit a beam toward a polishing surface of the polishing pad, the beam having a wavelength range that is substantially non-reactive with a polishing fluid utilized in the polishing process, but is reactive with the polishing pad.

公开(公告)号：US09254547B2

公开(公告)日：2016-02-09

申请号：US12751743

申请日：2010-03-31

申请人： Yin Yuan ,  Hung Chih Chen ,  Shou-Sung Chang

发明人： Yin Yuan ,  Hung Chih Chen ,  Shou-Sung Chang

IPC分类号： B24B53/017 ,  B24B37/005 ,  B24B37/10 ,  B24B37/34

CPC分类号： B24B53/017 ,  B24B37/005 ,  B24B37/10

摘要： A method and apparatus for facilitating equalized conditioning of a polishing surface of a polishing pad is described. The apparatus includes an extension device coupled to a base adjacent a peripheral edge of a polishing pad that is adapted to support a conditioning device, the extension device includes a body that is movable relative to the polishing pad, and a sacrificial pad comprising a polishing material coupled to a mounting surface of the body.

摘要翻译： 描述了一种用于促进抛光垫的抛光表面的均匀调节的方法和装置。 该装置包括连接到邻近抛光垫的外围边缘的基座的延伸装置，其适于支撑调节装置，该延伸装置包括可相对于抛光垫移动的主体，以及包括抛光材料的牺牲垫 联接到主体的安装表面。

公开(公告)号：US08721391B2

公开(公告)日：2014-05-13

申请号：US13204571

申请日：2011-08-05

申请人： Hung Chih Chen ,  Samuel Chu-Chiang Hsu ,  Yin Yuan ,  Huanbo Zhang ,  Gautam Shashank Dandavate

发明人： Hung Chih Chen ,  Samuel Chu-Chiang Hsu ,  Yin Yuan ,  Huanbo Zhang ,  Gautam Shashank Dandavate

IPC分类号： B24B37/32

CPC分类号： B24B41/06 ,  B24B37/32 ,  B24B41/067

摘要： A carrier head for a chemical mechanical polisher includes base, a substrate mounting surface, an annular inner ring, and an annular outer ring. The inner ring has an inner surface configured to circumferentially surround the edge of a substrate positioned on the substrate mounting surface, an outer surface, and a lower surface to contact a polishing pad. The inner ring is vertically movable relative to the substrate mounting surface. The outer ring has an inner surface circumferentially surrounding the inner ring, an outer surface, and a lower surface to contact the polishing pad. The outer ring is vertically movable relative to and independently of the substrate mounting surface and the inner ring. The lower surface of the inner ring has a first width, and the lower surface of the outer ring has a second width greater than the first width.

摘要翻译： 用于化学机械抛光机的载体头包括基底，基底安装表面，环形内环和环形外环。 内环具有被构造为周向地围绕位于基板安装表面上的基板的边缘的内表面，外表面和与抛光垫接触的下表面。 内环可相对于基板安装表面垂直移动。 外环具有围绕内环的内表面，外表面和与抛光垫接触的下表面。 外环可相对于基板安装表面和内圈而相对并且独立于其上下移动。 内圈的下表面具有第一宽度，并且外环的下表面具有大于第一宽度的第二宽度。