摘要:
A leak inspection device for inspecting leaks from a work by sealing a gas inside the work or sucking the gas therefrom includes: a depressurizing device that reduces the pressure of the gas inside the work; a pressurizing device that pressurizes the gas inside the work; a temperature sensor that detects the temperature of the work; a pressure sensor that detects the pressure of the gas inside the work; and a controller. The controller calculates the saturation vapor pressure at the same temperature as the temperature of the work, controls the depressurizing device to thereby reduce the pressure of the gas inside the work to the saturation vapor pressure, sucks the water vapor that has vaporized inside the work, controls the pressurizing device to thereby seal the gas inside the work and pressurize the gas inside the work until the temperature of the work detected by the temperature sensor reaches a predetermined temperature.
摘要:
According to one embodiment, a back side illumination solid-state image sensing device which comprises a pixel region where a plurality of pixels each including a photoelectric converter and a signal scanning circuit are arranged on a semiconductor substrate, and in which a light illumination surface is formed on a substrate surface opposite to a surface of the semiconductor substrate on which the signal scanning circuit is formed, includes a silicon oxide film formed on the semiconductor substrate on the light illumination surface side, a p-type amorphous silicon compound layer formed on the silicon oxide film, and a hole storage layer formed by the p-type amorphous silicon compound layer near an interface between the semiconductor substrate on the light illumination surface side and the silicon oxide film.
摘要:
Each of the unit cells provided on a semiconductor substrate of a solid-state imaging device comprises a first p-type well which isolates the semiconductor substrate into an n-type photoelectric conversion region, a second p-type well which is formed in the surface of the photoelectric conversion region and in which a signal scanning circuit section is formed, and a signal storage section which is comprised of a highly doped n-type layer which is formed in the surface of the photoelectric conversion region apart from the second p-type well and higher in impurity concentration than the photoelectric conversion region. The signal storage section having its part placed under a signal readout gate adapted to transfer a packet of signal charge from the storage section to the signal scanning circuit section and its part at which the potential becomes deepest located under the readout gate.
摘要:
An n/p−/p+ substrate where a p−-type epitaxial layer and an n-type epitaxial layer have been deposited on a p+-type substrate is provided. In the surface region of the n-type epitaxial layer, the n-type region of a photoelectric conversion part has been formed. Furthermore, a barrier layer composed of a p-type semiconductor region has been formed so as to enclose the n-type region of the photoelectric conversion part in a plane and reach the p−-type epitaxial layer from the substrate surface. A p-type semiconductor region has also been formed at a chip cutting part for dividing the substrate into individual devices so as to reach the p−-type epitaxial layer from the substrate surface.
摘要翻译:提供了p型外延层和n型外延层已经沉积在p +型衬底上的n / p- / p +衬底。 在n型外延层的表面区域中,形成了光电转换部的n型区域。 此外,已经形成了由p型半导体区域构成的阻挡层,以将光电转换部件的n型区域包围在平面内并从衬底表面到达p型外延层。 在芯片切割部分还形成了p型半导体区域,用于将衬底分成各个器件,从衬底表面到达p型外延层。
摘要:
A method of designing a wiring structure of an LSI is capable of reducing a capacitance variation ratio ΔC/C or a resistance-by-capacitance variation ratio Δ(RC)/(RC) of the wiring structure. The method sets a process-originated variation ratio (δP) for the wiring structure, a tolerance (ξC) for the capacitance variation ratio (ΔC/C), and a tolerance (ξRC) for the resistance-by-capacitance variation ratio (Δ(RC)/(RC)), evaluates a fringe capacitance ratio (F=CF/CP) according to a fringe capacitance CF and parallel-plate capacitance CP of the wiring structure, and determines the wiring structure so that the fringe capacitance ratio (F) may satisfy the following: For Δ C C ≤ ξ C , F ≥ δ P ξ C - 1 ( 1 ) For Δ ( RC ) RC ≤ ξ RC , F ≤ ( 1 - δ P ) δ P δ P - ξ RC - 1 ( 2 ) The method employs an equivalent-variations condition defined as |ΔC/C|=|Δ(RC)/(RC)| to determine the shape parameters of each wire of the wiring structure.
摘要翻译:设计LSI的布线结构的方法能够降低布线结构的电容变化率&Dgr; C / C或电容 - 电容变化率&(RC)/(RC)。 该方法设置了布线结构的过程起始变化率(δP),电容变化率(&Dgr; C / C)的公差(&xgr; C)和电阻的公差(&xgr RC) 电容变化率(&Dgr;(RC)/(RC))根据布线结构的边缘电容CF和平行板电容CP评估边缘电容比(F = CF / CP),并确定布线结构 使得条纹电容比(F)可以满足以下条件:ForüüDgr; çC≤&x x C,F≥δP&xgr; C-1(1)For唔&Dgr; (RC)RC骸≤&xgr RC,F≤(1-δP)δPδP - &xgr; RC-1(2)该方法采用等效变量条件定义为|&Dgr; C / C | = |&Dgr;(RC)/(RC)| 以确定布线结构的每根导线的形状参数。
摘要:
A solid-state image pickup device includes a semiconductor substrate including a substrate main body having P-type impurities and a first N-type semiconductor layer provided on the substrate main body, an image pickup area including a plurality of photoelectric converters in which the plurality of photoelectric converters include second N-type semiconductor layers, the second N-type semiconductor layers being provided on a surface portion of the first N-type semiconductor layer independently of one another, and a first peripheral circuit area including a first P-type semiconductor layer formed on the first N-type semiconductor layer. The solid-state image pickup device further includes a second peripheral circuit area including a second P-type semiconductor layer formed on the first N-type semiconductor layer and connected to the substrate main body.
摘要:
A hydraulic control apparatus, provided with a manual shift valve that outputs a forward range pressure and a reverse range pressure, and a linear solenoid valve that outputs an engagement pressure to the hydraulic servo that engages during reverse travel when energized, includes a fourth clutch relay valve that is interposed between the linear solenoid valve and the hydraulic servo. The fourth clutch relay valve communicates an engagement pressure of the linear solenoid valve to the hydraulic servo by locking in the normal position when a signal pressure of the solenoid valve is input, and communicates a reverse range pressure to the hydraulic servo by being switched to a fail position by the reverse range pressure during a failure in which the fourth clutch relay valve is de-energized. Thereby, it is possible to establish a reverse speed during a failure in which the solenoid valve is de-energized.
摘要:
An image forming apparatus including: an output image forming section for forming an image and a pattern on a supporting medium under a prescribed condition; an output section for transferring the formed image on a recording sheet; a correction section for performing reading of the formed pattern and correcting the condition based on a result of the reading; and a correction control section for controlling operations of the output image forming section, the output section, and the correction section, wherein the correction control section identifies whether or not an area where the image is to be formed and an area where the pattern is to be formed overlap each other, and when the areas are identified that they do not overlap each other, the correction control section controls the output image forming section to simultaneously form the image and the pattern in parallel on the supporting medium.
摘要:
A cleaning device is provided with a cleaning unit (35) disposed downstream from a position at which a toner image is transferred to a paper. The cleaning unit (35) is provided with a cleaning blade (35c) for scraping off residual toner attached to an image bearing member and a toner catching sheet (35e) for preventing the residual toner or paper dust which have been scraped off from falling outside the cleaning unit. The free length in the toner catching sheet (35e) between affixed positions of a first end portion which is affixed to the cleaning unit (35) and a second end portion which abuts an outer circumferential portion of the image bearing member is determined by an amount of paper dust buildup on the outer circumferential portion of the image bearing member.
摘要:
The present invention provides a solid-state image pickup apparatus which is able to easily discharge signal charges in a signal accumulating section and which is free from reduction in the dynamic range of the element, thermal noise in a dark state, an image-lag and so forth even if the pixel size of the MOS solid-state image pickup apparatus is reduced, the voltage of a reading gate is lowered and the concentration in the well is raised. The solid-state image pickup apparatus according to the present invention incorporates a p-type silicon substrate having a surface on which a p+ diffusion layer for constituting a photoelectric conversion region and a drain of a reading MOS field effect transistor are formed. A signal accumulating section formed by an n-type diffusion layer is formed below the p+ diffusion layer. A gate electrode of the MOS field effect transistor is, on the surface of the substrate, formed between the p+ diffusion layer and the drain. The position of an end of the signal accumulating section adjacent to the gate electrode of the MOS transistor extends over the end of the reading gate electrode of the p+ diffusion layer to a position below the gate electrode.