公开(公告)号：US20060275547A1

公开(公告)日：2006-12-07

申请号：US11421385

申请日：2006-05-31

Applicant: Chung Lee ,  Atul Kumar ,  George Tzeng ,  Oanh Nguyen

Inventor： Chung Lee ,  Atul Kumar ,  George Tzeng ,  Oanh Nguyen

IPC: C23C16/00

CPC classification number: C23C14/50 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/68721 ,  H01L21/68778

Abstract: A system for depositing a vapor phase organic compound onto a substrate, comprising a vacuum chamber comprising a wall, a wall heater in thermal communication with the wall of the vacuum chamber, at least one of an evaporative source and a transport polymerization source configured to introduce the vapor phase organic compound into the chamber, and a substrate holder disposed within the vacuum chamber, wherein the substrate holder comprises a cooled chuck, a heat transfer gas source for introducing a heat transfer gas to a space between the cooled chuck and the substrate, and a substrate clamping mechanism comprising at least one of an electrostatic, mechanical and magnetic clamping mechanism.

Abstract translation: 一种用于将气相有机化合物沉积到基底上的系统，包括真空室，包括壁，与真空室的壁热连通的壁加热器，蒸发源和运输聚合源中的至少一个，其配置成引入 所述气相有机化合物进入所述室，以及衬底保持器，其设置在所述真空室内，其中所述衬底保持器包括冷却的卡盘，用于将传热气体引入所述冷却的卡盘和所述衬底之间的空间的传热气体源， 以及包括静电，机械和磁性夹紧机构中的至少一个的衬底夹持机构。

公开(公告)号：US20060274474A1

公开(公告)日：2006-12-07

申请号：US11421389

申请日：2006-05-31

Applicant: Chung Lee ,  Atul Kumar ,  George Tzeng ,  Oanh Nguyen

Inventor： Chung Lee ,  Atul Kumar ,  George Tzeng ,  Oanh Nguyen

IPC: H01H47/00

CPC classification number: C23C14/12 ,  C23C14/50 ,  C23C14/541 ,  H01L21/67109 ,  H01L21/68721 ,  H01L21/68778

Abstract: A substrate holder for holding and cooling a substrate during a film deposition process is disclosed, wherein the substrate holder comprises a cooled chuck, and a clamping member movably associated with the cooled chuck, wherein the clamping member is movable between an unclamped position in which a substrate is removable from the substrate holder and a clamped position in which a substrate is clamped to the substrate holder substantially adjacent the cooled chuck.

Abstract translation: 公开了一种用于在膜沉积工艺期间保持和冷却衬底的衬底保持器，其中衬底保持器包括冷却的卡盘以及与冷却卡盘可移动地相关联的夹紧构件，其中夹紧构件可在松开位置之间移动， 衬底可从衬底保持器和夹持位置移除，其中衬底被夹持到衬底保持器基本上邻近冷却的卡盘。

公开(公告)号：US20060201426A1

公开(公告)日：2006-09-14

申请号：US11419985

申请日：2006-05-23

Applicant: Chung Lee ,  Atul Kumar ,  Chang Liu ,  Michael Solomensky

Inventor： Chung Lee ,  Atul Kumar ,  Chang Liu ,  Michael Solomensky

IPC: C23C16/00

CPC classification number: F28F1/24 ,  B01J3/006 ,  B01J8/067 ,  B01J19/0066 ,  B01J2219/00038 ,  B01J2219/00132 ,  B01J2219/00135 ,  B01J2219/00153 ,  B01J2219/00768 ,  B01J2219/00772 ,  B01J2219/00777 ,  B05D1/60

Abstract: A reactor system for removing a leaving group from a gas-phase precursor to form a gas-phase radical species for transport polymerization is disclosed, wherein the reactor system comprises a reactor body, a plurality of reactor passages extending at least partially through the reactor body, and a heater body disposed in each reactor passage.

Abstract translation: 公开了一种用于从气相前体除去离去基团以形成用于运输聚合的气相自由基物质的反应器系统，其中反应器系统包括反应器主体，多个反应器通道至少部分延伸穿过反应器主体 和设置在每个反应器通道中的加热器主体。

公开(公告)号：US20060047240A1

公开(公告)日：2006-03-02

申请号：US11211489

申请日：2005-08-26

Applicant: Atul Kumar ,  Alka Kumar

Inventor： Atul Kumar ,  Alka Kumar

IPC: A61M1/00 ,  A61M31/00

CPC classification number: A61B1/015 ,  A61B1/00094 ,  A61M1/0058 ,  A61M3/0258

Abstract: The present invention provides a system and a method for distending a body tissue cavity of a subject by continuous flow irrigation by using a dynamic pump, such as a centrifugal pump, on the inflow side and a positive displacement pump, such as a peristaltic pump, on the outflow side, such that the amplitude of the pressure pulsations created by a the said outflow positive displacement pump inside the said tissue cavity is substantially dampened to almost negligible levels. The present invention also provides a method for accurately determining the rate of fluid loss, into the subject's body system, during any endoscopic procedure without utilizing any deficit weight or fluid volume calculation, the same being accomplished by using two fluid flow rate sensors. The present invention also provides a system of creating and maintaining any desired pressure in a body tissue cavity for any desired cavity outflow rate. The system and the methods of the present invention described above can be used in any endoscopic procedure requiring continuous flow irrigation few examples of such endoscopic procedures being hysteroscopic surgery, arthroscopic surgery, trans uretheral surgery, endoscopic surgery of the brain and endoscopic surgery of the spine.

公开(公告)号：US20050223989A1

公开(公告)日：2005-10-13

申请号：US10816179

申请日：2004-03-31

Applicant: Chung Lee ,  Atul Kumar ,  Chieh Chen ,  Yuri Pikovsky

Inventor： Chung Lee ,  Atul Kumar ,  Chieh Chen ,  Yuri Pikovsky

IPC: B05D1/18 ,  B05D3/06 ,  B05D7/00 ,  B05D7/24 ,  C23C16/00 ,  H01L21/312

CPC classification number: H01L21/0212 ,  B05D1/185 ,  B05D1/60 ,  B05D3/065 ,  B05D3/067 ,  B05D7/52 ,  H01L21/02263 ,  H01L21/02304 ,  H01L21/02337 ,  H01L21/02362 ,  H01L21/3121 ,  H01L21/3127

Abstract: A system for depositing a composite polymer dielectric film on a substrate is disclosed, wherein the composite polymer dielectric film includes a low dielectric constant polymer layer disposed between a first silane-containing layer and a second silane-containing layer. The system includes a process module having a processing chamber and a monomer delivery system configured to admit a gas-phase monomer into the processing chamber for deposition of the low dielectric constant polymer layer, a post-treatment module for annealing the composite polymer dielectric film, and a silane delivery system configured to admit a vapor flow containing a silane precursor into at least one of the process module and the post-treatment module for the formation of the first silane-containing layer and the silane-containing layer.

Abstract translation: 公开了一种用于在基板上沉积复合聚合物电介质膜的系统，其中复合聚合物电介质膜包括设置在第一含硅烷层和第二含硅烷层之间的低介电常数聚合物层。 该系统包括具有处理室和单体输送系统的处理模块，该单体输送系统构造成将气相单体进入处理室以沉积低介电常数聚合物层，用于退火复合聚合物电介质膜的后处理模块， 以及硅烷输送系统，其被构造成允许含有硅烷前体的蒸汽流进入至少一个工艺模块和后处理模块中，用于形成第一含硅烷层和含硅烷层。

公开(公告)号：US20050146267A1

公开(公告)日：2005-07-07

申请号：US11009285

申请日：2004-12-08

Applicant: Chung Lee ,  Chieh Chen ,  Atul Kumar

Inventor： Chung Lee ,  Chieh Chen ,  Atul Kumar

IPC: B05D3/02 ,  B05D7/24 ,  B29C71/02 ,  C08G61/02 ,  C08J5/18 ,  H01L21/312 ,  H05B33/00

CPC classification number: B05D1/60 ,  B05D3/0254 ,  B29C71/02 ,  B29C2071/022 ,  B29C2071/025 ,  B29C2071/027 ,  C08G61/02 ,  C08G61/025 ,  C08G2261/3424 ,  C08J5/18 ,  H01L21/0212 ,  H01L21/02271 ,  H01L21/31058 ,  H01L21/3127 ,  Y10T428/269 ,  Y10T428/3154 ,  Y10T428/31544 ,  Y10T428/31855

Abstract: A method of forming a protective barrier in an organic light emitting device is disclosed, wherein the organic light emitting device is formed on a substrate and includes a plurality of layers of materials, the plurality of layers of materials including an organic light emitting layer. The method includes forming an inorganic layer and a semi-crystalline parylene-based polymer layer over an underlying layer, wherein the semi-crystalline parylene-based polymer layer is formed via transport polymerization of a reactive intermediate species. Organic light emitting devices having barriers are also disclosed.

Abstract translation: 公开了一种在有机发光器件中形成保护屏障的方法，其中所述有机发光器件形成在衬底上，并且包括多层材料，所述多层材料包括有机发光层。 该方法包括在下层上形成无机层和半结晶聚对二甲苯基聚合物层，其中半结晶聚对二甲苯基聚合物层通过反应性中间体物质的转运聚合形成。 还公开了具有屏障的有机发光器件。

公开(公告)号：US06881447B2

公开(公告)日：2005-04-19

申请号：US10116724

申请日：2002-04-04

Applicant: Chung J. Lee ,  Atul Kumar

Inventor： Chung J. Lee ,  Atul Kumar

IPC: B05D3/02 ,  B05D7/24 ,  B29C71/02 ,  C08G61/02 ,  C08J5/18 ,  H01L21/312 ,  C23C16/56

CPC classification number: B05D1/60 ,  B05D3/0254 ,  B29C71/02 ,  B29C2071/022 ,  B29C2071/025 ,  B29C2071/027 ,  C08G61/02 ,  C08G61/025 ,  C08G2261/3424 ,  C08J5/18 ,  H01L21/0212 ,  H01L21/02271 ,  H01L21/31058 ,  H01L21/3127 ,  Y10T428/269 ,  Y10T428/3154 ,  Y10T428/31544 ,  Y10T428/31855

Abstract: Preparation methods and stabilization processes for low k polymers that consist of sp2C—X and HC-sp3Cα—X bonds. A preparation method is achieved by controlling the substrate temperature and feed rate of the polymer precursors. One stabilization process includes a post annealing of as-deposited polymer films under the presence of hydrogen under high temperatures. The reductive annealing of these films is conducted at temperatures from −20° C. to −50° C. to +20° C. to +50° C. of their Reversible Crystal Transformation (“CRT”) temperatures, then quenching the resulting films to −20° C. to −50° C. below their “CRT” temperatures. The reductive annealing is conducted before the as-deposited film was removed from a deposition system and still under the vacuum. “Re-stabilization” processes of polymer surfaces that are exposed to reactive plasma etching are also disclosed; thus, further coating by barrier metal, cap layer or etch-stop layer can be safely applied.

Abstract translation: 由k-S-X和HC-sp-3-α-X键组成的低k聚合物的制备方法和稳定化方法。 通过控制聚合物前体的基板温度和进料速率来实现制备方法。 一种稳定化方法包括在氢气存在下在高温下对沉积的聚合物膜进行后退火。 这些膜的还原退火在其可逆晶体转变（“CRT”）温度的-20℃至-50℃至+ 20℃至+ 50℃的温度下进行，然后淬灭所得 在-20℃至-50℃的温度下低于它们的“CRT”温度。 还原退火在沉积膜从沉积系统中移除之前仍然在真空下进行。 还公开了暴露于反应性等离子体蚀刻的聚合物表面的“再稳定化”工艺; 因此，可以安全地施加通过阻挡金属，盖层或蚀刻停止层的进一步涂覆。

公开(公告)号：US06512382B1

公开(公告)日：2003-01-28

申请号：US09908034

申请日：2001-07-17

Applicant: Yiping Hsiao ,  Ciaran A. Fox ,  Atul Kumar

Inventor： Yiping Hsiao ,  Ciaran A. Fox ,  Atul Kumar

IPC: G01R2708

CPC classification number: G01N17/006 ,  G11B5/40 ,  G11B5/455

Abstract: A method of corrosion susceptibility testing of a magnetic recording head is disclosed. The method includes applying simulated disk corrosion products containing cobalt salts to the recording head. The recording head is then placed in an environmental chamber with elevated temperature and humidity. The resistance of the sensor on the recording head is measured after removal from the chamber and compared with the resistance before placement in the chamber. A significant change in resistance indicates a corrosion failure. This component level testing gives a more accurate indication of the corrosion performance of the recording head when placed in a disk drive.

Abstract translation: 公开了一种磁记录头的腐蚀敏感性试验方法。 该方法包括将含有钴盐的模拟盘腐蚀产物应用于记录头。 然后将记录头放置在具有升高的温度和湿度的环境室中。 传感器在记录头上的电阻在从室中取出后测量，并与放置在室内的电阻进行比较。 电阻的显着变化表明腐蚀失效。 该组件级别测试可以更准确地指示当放置在磁盘驱动器中时记录头的腐蚀性能。

公开(公告)号：US06330571B1

公开(公告)日：2001-12-11

申请号：US09231722

申请日：1999-01-15

Applicant: Raymond Bills ,  Atul Kumar

Inventor： Raymond Bills ,  Atul Kumar

IPC: G06F1730

CPC classification number: G06F17/30067 ,  Y10S707/99931 ,  Y10S707/99956

Abstract: A method and computer program product are provided for implementing datalink path protection. A datalink designation is created in the computer system and a datalink indicator is turned on. A corresponding datalink path for the datalink designation is stored in a predefined prefix table. The datalink indicator is used for processing a directory rename or remove operation.

Abstract translation: 提供了一种用于实现数据链路路径保护的方法和计算机程序产品。 在计算机系统中创建数据链路指定，并打开数据链路指示灯。 用于数据链路指定的相应数据链路径存储在预定义的前缀表中。 数据链路指示器用于处理目录重命名或删除操作。