METHOD FOR DETECTING PARTICLES AND DEFECTS AND INSPECTION EQUIPMENT THEREOF
    71.
    发明申请
    METHOD FOR DETECTING PARTICLES AND DEFECTS AND INSPECTION EQUIPMENT THEREOF 失效
    检测颗粒和缺陷的方法及其检测设备

    公开(公告)号:US20090066941A1

    公开(公告)日:2009-03-12

    申请号:US12266079

    申请日:2008-11-06

    IPC分类号: G01N21/88

    摘要: A method and equipment which includes an illustrated-spot illumination-distribution data table for storing an illumination distribution within an illustrated spot and which calculates a coordinate position for a particle or a defect and the diameter of the particle on the basis of detection light intensity data about the particle or defect and the illustrated-spot illumination-distribution data table. Thus, even when the illumination distribution within the illustrated spot based on an actual illumination optical system is not a Gaussian distribution, the calculation of the particle diameter of the detected particle or defect and the calculation of a coordinate position on the surface of an object to be inspected can be attained with an increased accuracy.

    摘要翻译: 一种方法和设备,其包括用于存储所示斑点内的照明分布的示出点照度分布数据表,并且基于检测光强度数据计算颗粒或缺陷的坐标位置和颗粒的直径 关于颗粒或缺陷以及所示的点光照度分布数据表。 因此,即使在基于实际的照明光学系统的所示光点内的照明分布不是高斯分布的情况下,检测出的粒子或缺陷的粒径的计算以及物体表面上的坐标位置的计算 被检查可以提高准确度。

    Appearance Inspection Apparatus
    72.
    发明申请
    Appearance Inspection Apparatus 有权
    外观检查装置

    公开(公告)号:US20080024765A1

    公开(公告)日:2008-01-31

    申请号:US11830320

    申请日:2007-07-30

    IPC分类号: G01N21/00 G06F19/00

    CPC分类号: G01N21/8851 G01N21/9501

    摘要: It is an object of the present invention to provide an appearance inspection apparatus capable of analyzing a difference in detection characteristics of detection signals obtained by a plurality of detectors, and capable of flexibly meeting various inspection purposes without changing a circuit or software.An appearance inspection apparatus including a sample stage 101 for supporting a sample 100, an illumination light source 103 for irradiating the sample 100 on the sample stage 101 with illumination light 111, a plurality of detectors 120a to 120d which are disposed at different positions from each other with respect to an illumination light spot of the illumination light source 103, and which detect scattered light 112 generated from a surface of the sample 100, a signal synthesizing section 105 which synthesizes detection signals from the plurality of detectors 120a to 120d in accordance with a set condition, an input operating section 109 for setting a synthesizing condition of the detection signal by the signal synthesizing section 105, and an information display section 108 for displaying a synthesizing map 220a structured based on a synthesized signal which is synthesized by the signal synthesizing section 105 in accordance with a condition set by the input operating section 109.

    摘要翻译: 本发明的目的是提供一种外观检查装置,其能够分析由多个检测器获得的检测信号的检测特性的差异,并且能够灵活地满足各种检查目的而不改变电路或软件。 一种外观检查装置,包括用于支撑样品100的样品台101,用于用照明光111照射样品台101上的样品100的照明光源103,设置在不同位置的多个检测器120a至120d 相对于照明光源103的照明光点,检测从样品100的表面产生的散射光112的信号合成部105,其合成来自多个检测器120a〜120的检测信号 d,根据设定条件设置用于设置信号合成部分105的检测信号的合成条件的输入操作部分109和用于显示基于合成信号构成的合成图220a的信息显示部分108a 由信号合成部105根据由输入操作部设定的条件合成 109。

    Apparatus and method for defect inspection

    公开(公告)号:US20060262297A1

    公开(公告)日:2006-11-23

    申请号:US11437643

    申请日:2006-05-22

    IPC分类号: G01N21/88

    CPC分类号: G01N21/8806 G01N21/956

    摘要: In the conventional methods for enhancing defect detection sensitivity by improving the resolving power, if a microscopic pattern, which is a high spatial-frequency structure as is the case with a microscopic defect, has become the brightest portion, the gray-scale contrast of the microscopic defect will be enhanced. At the same time, however, the gray-scale contrast of the microscopic pattern will also be enhanced simultaneously. Consequently, there has existed a problem that it is impossible to enhance the microscopic-defect detection sensitivity further than that. In the present invention, an aperture stop which is divided into a plurality of small apertures is located on an illumination pupil plane. Then, light-shield/light-transmission for each small aperture is controlled independently of each other. This control allows an inspection-target object to be illuminated at only an incident angle at which the gray-scale contrast of the microscopic defect will be emphasized more sharply.

    Image viewing method for microstructures and defect inspection system using it
    75.
    发明申请
    Image viewing method for microstructures and defect inspection system using it 审中-公开
    使用它的微结构和缺陷检测系统的图像查看方法

    公开(公告)号:US20060072106A1

    公开(公告)日:2006-04-06

    申请号:US11243188

    申请日:2005-10-05

    IPC分类号: G01N21/88

    CPC分类号: G01N21/956 G01N21/21

    摘要: A non-polarization beam splitter is used for splitting optical paths of an illumination system and an image formation system. MTF characteristics independent of an orientation of a pattern on a sample is obtained by illumination with a circularly-polarized light by combining a polarizer and a λ/4 plate. A partial polarizer is put in the image formation system immediately after the non-polarization beam splitter, and high-order diffraction lights are taken in with the maximum efficiency and the transmission efficiency of the zero-order light is controlled to improve high frequency part of MTF.

    摘要翻译: 非偏振分束器用于分离照明系统和图像形成系统的光路。 通过组合偏振器和λ/ 4板,通过用圆偏振光进行照明来获得与样品上的图案的取向无关的MTF特性。 在非偏振光束分离器之后立即将部分偏振片放入图像形成系统中,并且以最大效率吸收高阶衍射光,并且控制零级光的透射效率以改善高频部分的高频部分 MTF。

    Pattern defect inspection method and apparatus
    76.
    发明申请
    Pattern defect inspection method and apparatus 失效
    图案缺陷检查方法和装置

    公开(公告)号:US20050117796A1

    公开(公告)日:2005-06-02

    申请号:US10995512

    申请日:2004-11-24

    摘要: The pattern defect inspection apparatus is operable to detect defects by comparing a detection image, which is obtained through scanning by an image sensor those patterns that have the identical shape and are continuously disposed on the object under tested at equal intervals in row and column directions, with a reference image obtained by scanning neighboring identical shape patterns in the row and column directions. This apparatus has a unit for generating an average reference image by statistical computation processing from the images of identical shape patterns lying next to the detection image including at least eight nearest chips on the up-and-down and right-and-left sides and at diagonal positions with the detection image being intermediately situated. The apparatus also includes a unit that detects a defect by comparing the detection image to the average reference image thus generated.

    摘要翻译: 图案缺陷检查装置可以通过将通过图像传感器进行扫描而得到的检测图像进行比较来检测缺陷,所述检测图像具有相同形状且连续设置在被检测物体上的行和列方向上等间隔的那些图案, 具有通过扫描行和列方向上的相邻相同形状图案而获得的参考图像。 该装置具有用于通过统计计算处理从邻近检测图像的相同形状图案的图像生成平均参考图像的单元,该检测图像包括上下左右侧至少八个最近的码片,以及在 对角位置,检测图像位于中间位置。 该装置还包括通过将检测图像与由此生成的平均参考图像进行比较来检测缺陷的单元。

    Method for measuring crystal defect and equipment using the same
    78.
    发明授权
    Method for measuring crystal defect and equipment using the same 有权
    测量晶体缺陷的方法及使用其的设备

    公开(公告)号:US6108079A

    公开(公告)日:2000-08-22

    申请号:US245195

    申请日:1999-02-05

    摘要: In order to measure an inner defect of a sample with a certain high accuracy even if the sample surface of the moved up and down by flatness irregularity of the sample and problem on accuracy of the sample movement stage, incident light beams having two wavelength and respective different penetration depths for the sample are slantingly irradiated on the surface of the moving sample 15 from irradiation optical systems 4, 8, and the inner defect of the sample is measured by detecting the scattering light occurred from the interior of the sample with a detection optical system 9 arranged over the sample surface. A distance measurement means 14 is located in an upstream of a movement direction of said sample than said irradiation optical system 4, 8 and said detection optical system 9, thereby a surface height of said sample is measured. When a measured point on sample measured by the distance measurement means 14 is arrived at a lower part of the detection optical system 9, height positions of the irradiation optical system and the detection optical system are controlled by piezo electric elements 11,12,13 so that the irradiation optical system and the detection optical system are located at predetermined positions relating to the measured point.

    摘要翻译: 为了以一定的高精度测量样品的内部缺陷,即使样品的平坦度不均匀性上下移动的样品表面和样品移动台的精度问题,具有两个波长的入射光束和相应的 样品的不同穿透深度从照射光学系统4,8倾斜地照射在移动样品15的表面上,并且通过用检测光学检测从样品内部发生的散射光来测量样品的内部缺陷 系统9布置在样品表面上。 距离测量装置14位于所述样品的移动方向的上游,比所述照射光学系统4,8和所述检测光学系统9,从而测量所述样品的表面高度。 当通过距离测量装置14测量的样品上的测量点到达检测光学系统9的下部时,照射光学系统和检测光学系统的高度位置由压电元件11,12,13所控制 照射光学系统和检测光学系统位于与测量点相关的预定位置处。

    Spectrophotometer with a system for calibrating a monochromator
    79.
    发明授权
    Spectrophotometer with a system for calibrating a monochromator 失效
    分光光度计,带有校准单色仪的系统

    公开(公告)号:US5557404A

    公开(公告)日:1996-09-17

    申请号:US405652

    申请日:1995-03-17

    CPC分类号: G01J3/18 G01J2003/2866

    摘要: Irregular mechanical imperfections caused by constituent parts of a monochromator in connection with wavelength setting are compensated by calibrating the monochromator according to the present invention. A whole measurable spectral range in the monochromator is divided into a plurality of spectral regions by a plurality of calibration wavelengths. Errors between apparent wavelengths set theoretically and their true wavelengths are obtained with respect to the respective calibration wavelengths. Error functions in connection with the respective spectral regions are calculated on the basis of the array of the obtained errors. An element to be detected in a sample is measured under a wavelength the error of which has been compensated for by use of an error function in a spectral region associated with a wavelength to be detected.

    摘要翻译: 通过校准本发明的单色仪来补偿由与单色仪的波长设定有关的组成部分引起的不规则的机械缺陷。 单色仪中的整个可测量光谱范围被多个校准波长分成多个光谱区域。 理论上设定的表观波长与其相应校准波长之间的真实波长的误差。 基于获得的误差的阵列来计算与相应的光谱区域相关的误差函数。 通过在与要检测的波长相关联的光谱区域中使用误差函数对其误差进行了补偿的波长进行测量。