MAGNETS FOR USE IN MAGNETIC RESONANCE IMAGING
    71.
    发明申请
    MAGNETS FOR USE IN MAGNETIC RESONANCE IMAGING 有权
    用于磁共振成像的磁铁

    公开(公告)号:US20100079144A1

    公开(公告)日:2010-04-01

    申请号:US12447070

    申请日:2007-10-26

    IPC分类号: G01R33/24

    CPC分类号: G01R33/3815 G01R33/421

    摘要: A magnetic resonance system uses a shielded superconducting magnet to produce a dsv useful for specialist imaging in an overall short magnet system at field strengths 1.5 Tesla and above. The magnet includes at least a first central coil C1, which has a length of at least 25% of the overall length of the magnet, and is used in concert with a series of symmetric primary coils, at least one set of which carry current in a direction opposite to that of the central coil. Force balancing is advantageously used in the design of the coils. The primary coils are shielded by at least one shielding coil, which carries current in a direction opposite to the majority of the primary coils. The magnet resonance system can be used for orthopedic imaging.

    摘要翻译: 磁共振系统使用屏蔽超导磁体产生一个dsv,用于整个短磁体系统中的专家成像,场强为1.5特斯拉及以上。 该磁体包括至少一个第一中心线圈C1,该中心线圈C1的长度至少为磁铁整体长度的25%,并与一系列对称的初级线圈一致使用,至少一组载体电流 与中心线圈相反的方向。 力平衡有利地用于线圈的设计中。 初级线圈由至少一个屏蔽线圈屏蔽,该屏蔽线圈沿与大部分初级线圈相反的方向承载电流。 磁共振系统可用于矫形成像。

    EFFECTIVE TASK DISTRIBUTION IN COLLABORATIVE SOFTWARE DEVELOPMENT
    72.
    发明申请
    EFFECTIVE TASK DISTRIBUTION IN COLLABORATIVE SOFTWARE DEVELOPMENT 审中-公开
    协同软件开发中的有效任务分配

    公开(公告)号:US20100057514A1

    公开(公告)日:2010-03-04

    申请号:US12201073

    申请日:2008-08-29

    IPC分类号: G06F7/00 G06F7/36

    CPC分类号: G06Q10/06 G06Q50/188

    摘要: A method, system and computer program product are disclosed to support the dynamic (just-in-time) task distribution in the context of globally collaborative software development. Embodiments of the invention provide a method, system and computer program product for distributing tasks in a collaborative software development project, where said project has a multitude of work packets. An embodiment of the invention includes generating bidding request forms, and broadcasting the bidding request forms to a multitude of distributed teams; collecting completed bidding request forms having real-time information about attributes of the distributed teams; and matching eligible teams to the work packets. This embodiment further comprise optimizing a distribution plan of the work packets; ranking results of the distribution plan to give a final distribution plan; and notifying each of the distributed teams of any work packets assigned to them.

    摘要翻译: 公开了一种方法,系统和计算机程序产品,用于在全球协作软件开发的背景下支持动态(即时)任务分配。 本发明的实施例提供了一种用于在协作软件开发项目中分发任务的方法,系统和计算机程序产品,其中所述项目具有多个工作分组。 本发明的实施例包括生成投标请求表格,并向多个分布式团队广播投标请求表单; 收集具有关于分布式团队属性的实时信息的已完成投标请求表; 并将符合条件的团队与工作包进行匹配。 该实施例还包括优化工作分组的分配计划; 分配计划的排名结果给出最终分配方案; 并通知每个分布式团队分配给他们的任何工作包。

    System and Method for Re-home Sequencing Optimization
    73.
    发明申请
    System and Method for Re-home Sequencing Optimization 审中-公开
    用于重新排序优化的系统和方法

    公开(公告)号:US20100017247A1

    公开(公告)日:2010-01-21

    申请号:US12443956

    申请日:2007-03-30

    IPC分类号: G06Q10/00 G06Q50/00

    摘要: A system and method for rehome sequencing optimization of a telecommunications network. In a preferred embodiment, a practicable optimized rehome sequencing plan is determined for a rehome plan in order to migrate the network topology from an initial state to a final state while minimizing the costs incurred during the network state transitions across multiple time periods. Constraints that may be considered include specific market restrictions such as the limit on the number of network elements in a cluster, the limit on the number of clusters in a sequencing step, the limit on the number of sequencing steps, and the immobility limit on the network elements. Constraints also may include cost restrictions incurred during network transitions, such as individual cost limits during each network transition state and an overall cost limit of network transitions from the initial state to the final state.

    摘要翻译: 一种用于电信网络重新测序优化的系统和方法。 在优选实施例中,针对重新设计方案确定可行的优化的重新排序顺序计划,以便将网络拓扑从初始状态迁移到最终状态,同时最小化在多个时间段内的网络状态转换期间产生的成本。 可以考虑的约束包括具体的市场限制,例如集群中网络元素数量的限制,排序步骤中的集群数量限制,排序步骤数量的限制以及排序步骤的不动点限制 网络元素。 限制也可能包括在网络转换过程中产生的成本限制,例如每个网络过渡状态期间的单个成本限制以及从初始状态到最终状态的网络转换的总体成本限制。

    POLARIZER FILMS AND METHODS OF MAKING THE SAME
    74.
    发明申请
    POLARIZER FILMS AND METHODS OF MAKING THE SAME 审中-公开
    极化膜及其制造方法

    公开(公告)号:US20090041971A1

    公开(公告)日:2009-02-12

    申请号:US12191965

    申请日:2008-08-14

    IPC分类号: B32B3/10

    摘要: In general, in one aspect, the invention features an article that includes a layer including a plurality of spaced-apart portions of a first material extending along a first direction. The layer transmits about 20% or more of light of wavelength λ having a first polarization state incident on the layer along a path. The layer transmits about 2% or less of light of wavelength λ having a second polarization state incident on the layer along the path, the first and second polarization states being orthogonal. For wavelength λ, the first material has a refractive index of 1.8 or more and an extinction coefficient of 1.8 or more, and λ is 300 nm or less.

    摘要翻译: 通常,在一个方面,本发明的特征在于一种制品,其包括包含沿着第一方向延伸的第一材料的多个间隔开的部分的层。 该层沿着路径透射大约20%或更多具有入射在该层上的具有第一偏振状态的波长λ的光。 层沿着路径透射大约2%以下的具有入射在层上的具有第二偏振态的波长λ的光,第一和第二偏振态是正交的。 对于波长λ,第一材料的折射率为1.8以上,消光系数为1.8以上,λ为300nm以下。

    Method for Ensuring Service Class of Packet Service and Method of Rate Limitation
    75.
    发明申请
    Method for Ensuring Service Class of Packet Service and Method of Rate Limitation 有权
    确保分组业务的业务类别和速率限制方法的方法

    公开(公告)号:US20090010161A1

    公开(公告)日:2009-01-08

    申请号:US11568311

    申请日:2006-05-17

    申请人: Fan Zhang Feng Liu

    发明人: Fan Zhang Feng Liu

    IPC分类号: H04L12/43

    摘要: The present invention discloses a method for ensuring service classes of packet services, which includes limiting the rate of services with different service classes uploaded to a ringlet from an RPR station in accordance with the RPR physical packet lengths; monitoring, in real time, the rate of non-class A0 services uploaded to the ringlet from the RPR station and forwarded by the RPR station in accordance with the RPR physical packet lengths, and when the rate of the non-class A0 services exceeds the un-reserved rate of the RPR network, reporting a congestion message and adjusting the rate of the non-class A0 services uploaded to the ringlet from the RPR stations in the congestion domain. A method of rate limitation is also disclosed, by which rate limitation is conducted based on a Token Bucket according to the total length of the sent packet after encapsulation. The methods, by means of rate limitation and rate monitoring of the services uploaded to the ringlet from each RPR station according to the RPR physical packet length, can effectively overcome the shortcoming that the reserved bandwidth in the RPR can not be ensured because forwarded services unexpected occupy the bandwidth of the services uploaded to the ringlet at a downstream RPR station due to the physical layer encapsulation overhead.

    摘要翻译: 本发明公开了一种确保分组业务等级的方法,其中包括根据RPR物理分组长度,限制从RPR站上传到小环的不同业务类别的业务速率; 实时监控从RPR站上传到小环的非A0类业务的速率,并根据RPR物理分组长度由RPR站转发,当非A0业务的速率超过 RPR网络的未保留速率,报告拥塞消息,并调整从拥塞域中的RPR站上传到小环的非A0级业务的速率。 还公开了速率限制的方法,通过该方法,根据封装后发送的分组的总长度,基于令牌桶进行速率限制。 根据RPR物理分组长度,通过对每个RPR站上传到小环的业务的速率限制和速率监控方法,可以有效地克服RPR中保留带宽无法保证的缺点,因为转发业务意外 占用由于物理层封装开销而在下游RPR站上载到小环的业务的带宽。

    Method and apparatus for electrochemical mechanical polishing of cu with higher liner velocity for better surface finish and higher removal rate during clearance
    76.
    发明申请
    Method and apparatus for electrochemical mechanical polishing of cu with higher liner velocity for better surface finish and higher removal rate during clearance 审中-公开
    用于电化学机械抛光的方法和装置,具有更高的衬垫速度以更好的表面光洁度和更高的清除率

    公开(公告)号:US20070251832A1

    公开(公告)日:2007-11-01

    申请号:US11413493

    申请日:2006-04-27

    IPC分类号: B23H9/00

    摘要: The present invention relates to an apparatus and a method for polishing a semiconductor substrate with high throughput. One embodiment of the present invention provides an apparatus for electro-chemical mechanical polishing a conductive surface on a substrate. The apparatus comprises a fluid basin having a fluid volume for retaining a polishing solution, a linear polishing station disposed in the fluid basin, wherein the linear polishing station having at least one electrode and a conductive top surface with a linear movement, the conductive top surface is configured to provide an electrical bias to the conductive surface on the substrate, and a carrier head configured to retain the substrate and position the conductive surface of the substrate to be in contact with the conductive top surface of the linear polishing station.

    摘要翻译: 本发明涉及一种以高产量抛光半导体衬底的装置和方法。 本发明的一个实施例提供了一种用于对基底上的导电表面进行电化学机械抛光的装置。 该装置包括具有用于保持抛光溶液的流体体积的流体池,设置在流体池中的线性抛光站,其中线性抛光站具有至少一个电极和具有线性运动的导电顶表面,导电顶表面 被配置为向衬底上的导电表面提供电偏压,以及被配置为保持衬底并且将衬底的导电表面定位成与线性抛光站的导电顶表面接触的载体头。

    Method for electrochemically polishing a conductive material on a substrate
    77.
    发明申请
    Method for electrochemically polishing a conductive material on a substrate 审中-公开
    在基板上电化学研磨导电材料的方法

    公开(公告)号:US20070187258A1

    公开(公告)日:2007-08-16

    申请号:US11355769

    申请日:2006-02-15

    IPC分类号: B23H5/00

    摘要: Methods are provided for removing conductive materials from a substrate surface. In one aspect, a method includes providing a substrate comprising dielectric feature definitions formed between substrate field regions, a barrier material disposed in the feature definitions and on the substrate field regions, and a conductive material disposed on the barrier material, polishing the substrate to substantially remove a bulk portion of the conductive material with a direct current bias, and polishing the substrate to remove a residual portion of the conductive material with a pulse bias.

    摘要翻译: 提供了从衬底表面去除导电材料的方法。 在一个方面,一种方法包括提供包括在衬底场区域之间形成的介电特征定义的衬底,设置在特征定义中的衬底场区域上的阻挡材料和设置在阻挡材料上的导电材料, 以直流偏压去除导电材料的主体部分,并抛光衬底以用脉冲偏压去除导电材料的剩余部分。

    Optical retarders and related devices and systems
    78.
    发明授权
    Optical retarders and related devices and systems 有权
    光阻器及相关设备及系统

    公开(公告)号:US07203001B2

    公开(公告)日:2007-04-10

    申请号:US10918299

    申请日:2004-08-13

    IPC分类号: G02B5/30

    CPC分类号: G02B5/3083

    摘要: In certain aspects, the disclosure relates to articles that include a plurality of walls configured to form a grating. Each of the plurality of walls can include a layer of a first material and a layer of a second material different from the first material. The articles can retard incident radiation at wavelengths λ1 and λ2 by amounts Γ1 and Γ2, respectively, where |λ1−λ2| is about 15 nm or more and Γ1 is substantially equal to Γ2.

    摘要翻译: 在某些方面,本公开涉及包括被配置为形成光栅的多个壁的物品。 多个壁中的每一个可以包括第一材料层和不同于第一材料的第二材料层。 这些制品可以分别以波长λ1和λ2和2分别阻止入射辐射的量γγ1和γ2 2 ,其中|λ1> 2 2 大约等于或大于15nm,并且伽玛1< 1>基本上等于γ2。

    Safe baby bathub
    79.
    发明申请
    Safe baby bathub 审中-公开
    安全宝宝浴缸

    公开(公告)号:US20070033727A1

    公开(公告)日:2007-02-15

    申请号:US11202839

    申请日:2005-08-12

    申请人: Feng Liu

    发明人: Feng Liu

    IPC分类号: A47K3/024

    摘要: A safe baby bathtub includes a tub base having a tank formed therein, a warning unit disposed on the tub base, at least one warning device and a temperature sensor disposed inside the tank of the tub base. The temperature sensor has a signal wire connected to the warning unit so that a signal of the water's temperature is transferred from the temperature sensor to the warning unit. The warning device displays the water's temperature.

    摘要翻译: 一个安全的婴儿浴缸包括一个其中形成有罐的桶底座,设置在洗衣桶底座上的警告单元,至少一个警告装置和设置在洗衣桶底座内的温度传感器。 温度传感器具有连接到警告单元的信号线,使得水温的信号从温度传感器传递到警告单元。 警告装置显示水的温度。

    Method and composition for polishing a substrate
    80.
    发明申请
    Method and composition for polishing a substrate 审中-公开
    抛光基材的方法和组合物

    公开(公告)号:US20060175298A1

    公开(公告)日:2006-08-10

    申请号:US11350051

    申请日:2006-02-07

    摘要: Polishing compositions and methods for removing barrier materials from a substrate surface are provided. In one aspect, a composition is provided for removing at least a barrier material from a substrate surface including an acid based electrolyte system, one or more chelating agents, one or more pH adjusting agents to provide a pH between about 3 and about 11, and a solvent. The composition may be used in an electrochemical mechanical planarization process. The polishing compositions and methods described herein improve the effective removal rate of barrier materials from the substrate surface with a reduction in planarization type defects.

    摘要翻译: 提供了用于从衬底表面去除阻挡材料的抛光组合物和方法。 一方面,提供一种组合物,用于从基材表面至少除去阻挡材料,所述基材表面包括酸性电解质体系,一种或多种螯合剂,一种或多种pH调节剂以提供约3至约11的pH,以及 溶剂。 该组合物可用于电化学机械平面化工艺中。 本文所述的抛光组合物和方法通过减小平坦化型缺陷来提高阻挡材料从衬底表面的有效去除速率。