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公开(公告)号：US20090290135A1
公开(公告)日：2009-11-26
申请号：US12512754
申请日：2009-07-30
申请人： Joeri Lof , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Helmar San Santen
发明人： Joeri Lof , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Helmar San Santen
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
摘要： A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system configured to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface configured to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.
摘要翻译： 光刻投影装置包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 投影系统，被配置为将图案化的光束投影到基板的目标部分上; 被配置为保持所述基板的基板台，所述基板台包括支撑表面，所述支撑表面被构造成支撑所述投影系统与所述基板和位于所述基板台上的物体中的至少一个之间的中间板，并且不与所述至少一个 的基材和物体; 以及液体供应系统，其构造成在所述投影系统和所述基板和所述物体中的至少一个之间的空间中提供待投射所述光束的液体。
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公开(公告)号：US07075616B2
公开(公告)日：2006-07-11
申请号：US10705785
申请日：2003-11-12
申请人： Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Timotheus Franciscus Sengers , Alexander Straaijer , Bob Streefkerk
发明人： Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Timotheus Franciscus Sengers , Alexander Straaijer , Bob Streefkerk
CPC分类号： G03F7/707 , G03F7/70341 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
摘要： In a lithographic projection apparatus, a liquid supply system provides liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to contain liquid in the liquid supply system during, for example, substrate exchange.
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公开(公告)号：US08964164B2
公开(公告)日：2015-02-24
申请号：US13188026
申请日：2011-07-21
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
CPC分类号： G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要： In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
摘要翻译： 在光刻设备中，将投影系统下的基板表面的局部区域浸入液体中。 可以使用致动器来改变衬底表面上方的液体供应系统的高度。 控制系统使用前馈或反馈控制输入基板的表面高度，以将液体供应系统保持在基板表面上方的预定高度。
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公开(公告)号：US07593092B2
公开(公告)日：2009-09-22
申请号：US11448990
申请日：2006-06-08
申请人： Joeri Lof , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri Lof , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
摘要翻译： 公开了一种光刻投影装置，其中投影系统和基板之间的空间填充有液体。 边缘密封构件至少部分地围绕衬底台面上的衬底或其它物体，以防止衬底或其他物体的边缘部分例如成像或照亮时的液体损失。
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公开(公告)号：US20080218717A1
公开(公告)日：2008-09-11
申请号：US12068546
申请日：2008-02-07
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要： In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
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公开(公告)号：US20140002805A1
公开(公告)日：2014-01-02
申请号：US14004199
申请日：2012-01-18
申请人： Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Theodorus Petrus Maria Cadee , Johannes Antonius Gerardus Akkermans , Luigi Scaccabarozzi , Christiaan Louis Valentin
发明人： Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Theodorus Petrus Maria Cadee , Johannes Antonius Gerardus Akkermans , Luigi Scaccabarozzi , Christiaan Louis Valentin
IPC分类号： H01L21/683
CPC分类号： H01L21/6833 , G03F7/70691 , G03F7/70708 , G03F7/70783 , G03F9/7034
摘要： Disclosed is an electrostatic clamp apparatus (500) constructed to support a patterning device (505) of a lithographic apparatus, comprising a support structure against which said patterning device is supported, clamping electrodes (525) for providing a clamping force between the support structure and patterning device, and an array of capacitive sensors (660) operable to measure the shape of said patterning device.
摘要翻译： 公开了一种构造成支撑光刻设备的图案形成装置（505）的静电夹紧装置（500），其包括支撑所述图案形成装置的支撑结构，夹持电极（525），用于在支撑结构和 图案形成装置，以及可操作以测量所述图案形成装置的形状的电容传感器阵列（660）。
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公开(公告)号：US20100321651A1
公开(公告)日：2010-12-23
申请号：US12871631
申请日：2010-08-30
申请人： Carlo Cornelis Maria LUIJTEN , Sjoerd Nicolaas Lambertus Donders , Nicolaas Rudolf Kemper , Martinus Hendrickus Antonius Leenders , Erik Roelof Loopstra , Bob Streefkerk , Marcel Beckers , Herman Boom , Richard Moerman
发明人： Carlo Cornelis Maria LUIJTEN , Sjoerd Nicolaas Lambertus Donders , Nicolaas Rudolf Kemper , Martinus Hendrickus Antonius Leenders , Erik Roelof Loopstra , Bob Streefkerk , Marcel Beckers , Herman Boom , Richard Moerman
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.
摘要翻译： 浸没式光刻投影装置具有液体限制结构，其被配置为至少部分地将液体限制在投影系统和基板之间的空间上，所述约束结构在使用时具有缓冲表面，该缓冲表面位于基本上包括 衬底的上表面和保持衬底的衬底台，以限定具有流动阻力的通道。 在缓冲表面设置凹部，当使用时凹部通常充满浸没液体，以便当间隙在缓冲表面下移动时能够快速填充基板和基板台之间的间隙。 凹部可以是环形的或径向的，并且可以设置多个凹部。
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公开(公告)号：US07522261B2
公开(公告)日：2009-04-21
申请号：US10948749
申请日：2004-09-24
申请人： Carlo Cornelis Maria Luijten , Sjoerd Nicolaas Lambertus Donders , Nicolaas Rudolf Kemper , Martinus Hendrickus Antonius Leenders , Erik Roelof Loopstra , Bob Streefkerk , Marcel Beckers , Herman Boom , Richard Moerman
发明人： Carlo Cornelis Maria Luijten , Sjoerd Nicolaas Lambertus Donders , Nicolaas Rudolf Kemper , Martinus Hendrickus Antonius Leenders , Erik Roelof Loopstra , Bob Streefkerk , Marcel Beckers , Herman Boom , Richard Moerman
CPC分类号： G03F7/70341
摘要： An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.
摘要翻译： 浸没式光刻投影设备具有液体限制结构，其被配置为至少部分地将液体限制在投影系统和基板之间的空间上，所述约束结构在使用时具有缓冲表面，该缓冲表面位于基本上包括 衬底的上表面和保持衬底的衬底台，以限定具有流动阻力的通道。 在缓冲表面设置凹部，当使用时凹部通常充满浸没液体，以便当间隙在缓冲表面下移动时能够快速填充基板和基板台之间的间隙。 凹部可以是环形的或径向的，并且可以设置多个凹部。
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公开(公告)号：US07808614B2
公开(公告)日：2010-10-05
申请号：US12340362
申请日：2008-12-19
申请人： Carlo Cornelis Maria Luijten , Sjoerd Nicolaas Lambertus Donders , Nicolaas Rudolf Kemper , Martinus Hendrickus Antonius Leenders , Erik Roelof Loopstra , Bob Streefkerk , Marcel Beckers , Herman Boom , Richard Moerman
发明人： Carlo Cornelis Maria Luijten , Sjoerd Nicolaas Lambertus Donders , Nicolaas Rudolf Kemper , Martinus Hendrickus Antonius Leenders , Erik Roelof Loopstra , Bob Streefkerk , Marcel Beckers , Herman Boom , Richard Moerman
CPC分类号： G03F7/70341
摘要： An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.
摘要翻译： 浸没式光刻投影装置具有液体限制结构，其被配置为至少部分地将液体限制在投影系统和基板之间的空间上，所述约束结构在使用时具有缓冲表面，该缓冲表面位于基本上包括 衬底的上表面和保持衬底的衬底台，以限定具有流动阻力的通道。 在缓冲表面设置凹部，当使用时凹部通常充满浸没液体，以便当间隙在缓冲表面下移动时能够快速填充基板和基板台之间的间隙。 凹部可以是环形的或径向的，并且可以设置多个凹部。
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公开(公告)号：US08427629B2
公开(公告)日：2013-04-23
申请号：US12871631
申请日：2010-08-30
申请人： Carlo Cornelis Maria Luijten , Sjoerd Nicolaas Lambertus Donders , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Bob Streefkerk , Marcel Beckers , Herman Boom , Richard Moerman
发明人： Carlo Cornelis Maria Luijten , Sjoerd Nicolaas Lambertus Donders , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Bob Streefkerk , Marcel Beckers , Herman Boom , Richard Moerman
CPC分类号： G03F7/70341
摘要： An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.
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