Diffusers and Methods of Manufacture
    71.
    发明申请
    Diffusers and Methods of Manufacture 有权
    扩散器和制造方法

    公开(公告)号:US20090226628A1

    公开(公告)日:2009-09-10

    申请号:US12127272

    申请日:2008-05-27

    申请人: Zhijian Lu

    发明人: Zhijian Lu

    IPC分类号: B05D3/06

    摘要: Diffusers including of a plurality of protruded structures with each structure containing multiple rugged facets are disclosed. The diffuser may be fabricated by coating a mixture of materials on a carrier film, the mixture of materials including at least a first material that polymerizes upon irradiation and at least a second material that is incompatible with the first material in polymerized form, then selectively irradiating the mixture of materials to polymerize a portion of the mixture of materials to form polymerized structures, and finally removing that part of the mixture of materials not forming part of the structures. A transparent material may be coated over the structures. The overcoat material may further contain scattering elements such as glass beads or polymeric particles

    摘要翻译: 公开了包括多个突出结构的扩散器,每个结构包含多个坚固小面。 扩散器可以通过在载体膜上涂覆材料的混合物来制造,所述材料的混合物至少包括在照射时聚合的第一材料和至少第二种与聚合形式的第一材料不相容的材料,然后选择性地照射 聚合材料混合物的一部分以形成聚合结构的材料的混合物,最后除去不形成结构部分的材料混合物的那部分。 可以在结构上涂覆透明材料。 外涂层材料可以进一步包含散射元件,例如玻璃珠或聚合物颗粒

    Diffusers and methods of manufacturing
    74.
    发明申请
    Diffusers and methods of manufacturing 审中-公开
    扩散器和制造方法

    公开(公告)号:US20070041211A1

    公开(公告)日:2007-02-22

    申请号:US11432713

    申请日:2006-05-12

    IPC分类号: G02B5/02

    摘要: A structure including an integrally formed diffuser may be formed by depositing a first layer including a first polymerizable material and another material, and depositing a second layer including a second polymerizable material adjacent the first layer. The first and second layers are simultaneously irradiated with light that causes the first polymerizable material and the second polymerizable material to polymerize. There is not an optical boundary between the first and second layers since the first and second materials are polymerized together.

    摘要翻译: 可以通过沉积包括第一可聚合材料和另一种材料的第一层,以及沉积包含邻近第一层的第二可聚合材料的第二层来形成包括整体形成的漫射体的结构。 第一层和第二层同时用引起第一可聚合材料和第二可聚合材料聚合的光照射。 由于第一和第二材料聚合在一起,所以第一和第二层之间不存在光学边界。

    General charging method
    75.
    发明申请
    General charging method 有权
    一般充电方式

    公开(公告)号:US20060253292A1

    公开(公告)日:2006-11-09

    申请号:US10558620

    申请日:2003-12-31

    IPC分类号: G06Q99/00 H04L9/00 H04K1/00

    摘要: The present invention provides a general charging method applicable to a charging system in the communication field, comprising steps of establishing a charging strategy and performing the charging based upon the charging strategy. The charging strategy comprises a plurality of priorities each of which comprises a plurality of periods of time, and each of the periods of time corresponds to a type of rate segmentation and is provided a plurality of rate segments in each of which there are a plurality of rates. The step of performing the charging comprises steps of: searching for the highest priority in the charging strategy; searching for a corresponding period of time in the priority based upon the time a subscriber uses a service, and if found, performing the charging based upon the rate segments in the period of time; when the charging has been completed or the priorities have been searched through, and if there is any usage quantity that can't be charged, recording it and terminating the charging. With such a structure of general charging strategy, the present invention can satisfy various charging demands and provide generality and adequate expansibility. Also, the present invention enables subscribers to configure different charging methods as needed.

    摘要翻译: 本发明提供了一种适用于通信领域中的计费系统的通用计费方法,其特征在于包括基于计费策略建立计费策略和执行计费的步骤。 充电策略包括多个优先级,每个优先级包括多个时间段,并且时间段中的每个时间段对应于速率分段的类型,并且被提供多个速率段,每个速率段中有多个速率段 价格。 执行充电的步骤包括以下步骤:在充电策略中搜索最高优先级; 基于用户使用服务的时间,优先搜索相应的时间段,并且如果发现,则在该时间段内基于速率段执行计费; 当充电已经完成或已经搜索到优先级,并且如果存在不能充电的任何使用量,记录并终止充电。 通过这种一般充电策略的结构,本发明可以满足各种充电需求,并提供通用性和充分的可扩展性。 而且,本发明使订户能够根据需要配置不同的计费方法。

    Minimizing resist poisoning in the manufacture of semiconductor devices
    76.
    发明申请
    Minimizing resist poisoning in the manufacture of semiconductor devices 有权
    最大限度地减少半导体器件制造中的抗蚀剂中毒

    公开(公告)号:US20060110901A1

    公开(公告)日:2006-05-25

    申请号:US10993791

    申请日:2004-11-19

    IPC分类号: H01L21/44

    CPC分类号: H01L21/76808 H01L21/31144

    摘要: The present invention provides a method for manufacturing an interconnect and a method for manufacturing an integrated circuit including the interconnect. The method of manufacturing an interconnect, among other steps, includes forming a via (160) in a substrate (130) and then forming a base getter material (210) in the via (160). The method further includes forming a photoresist layer (410) over the base getter material (210), the photoresist layer (410) having an opening (420) therein positioned over the via (160), and etching a trench (510) into the substrate (130) using the opening (420) in the photoresist layer (410).

    摘要翻译: 本发明提供了一种用于制造互连的方法和用于制造包括该互连的集成电路的方法。 制造互连的方法以及其它步骤包括在衬底(130)中形成通孔(160),然后在通路(160)中形成基底吸气材料(210)。 该方法还包括在基底吸气材料(210)上形成光致抗蚀剂层(410),光致抗蚀剂层(410)在其上具有位于通孔(160)上方的开口(420),并且将沟槽(510)蚀刻到 使用光致抗蚀剂层(410)中的开口(420)的衬底(130)。

    Strongly water-soluble photoacid generator resist compositions
    80.
    发明授权
    Strongly water-soluble photoacid generator resist compositions 有权
    强力水溶性光酸发生剂抗蚀剂组合物

    公开(公告)号:US06383715B1

    公开(公告)日:2002-05-07

    申请号:US09605571

    申请日:2000-06-28

    IPC分类号: G03F7004

    CPC分类号: G03F7/0045 G03F7/0392

    摘要: A chemically amplified resist composition that eliminates blob defects when used to produce semiconductor devices comprising: a base polymer with a protected group; a solvent; and a photoacid generator comprising an iodonium salt containing a water-soluble group of a sulphonium group containing a water-soluble group.

    摘要翻译: 一种在用于制造半导体器件时消除斑点缺陷的化学放大抗蚀剂组合物,包括:具有受保护基团的基础聚合物; 溶剂; 以及含有含有水溶性基团的锍基的水溶性基团的碘鎓盐的光酸发生剂。