METAL SEMICONDUCTOR CONTACTS
    71.
    发明申请

    公开(公告)号:US20210305391A1

    公开(公告)日:2021-09-30

    申请号:US16831746

    申请日:2020-03-26

    IPC分类号: H01L29/45 H01L21/04 H01L29/16

    摘要: A semiconductor device is provided. The semiconductor device comprises a substrate having a first surface and a second surface, the substrate comprising a wide bandgap semiconductor material. An epitaxial layer is on the first surface of the substrate and a metal germanosilicide layer is above the second surface of the substrate. The metal germanosilicide layer forms an ohmic contact to the substrate.

    MEMORY DEVICES AND METHODS OF FORMING MEMORY DEVICES

    公开(公告)号:US20210273160A1

    公开(公告)日:2021-09-02

    申请号:US16802562

    申请日:2020-02-27

    IPC分类号: H01L45/00 H01L27/24

    摘要: A memory device may be provided including one or more bottom electrodes, one or more mask elements, one or more top electrodes and a switching layer. The bottom electrode(s) may include a first bottom electrode, the mask element(s) may include a first mask element and the top electrode(s) may include a first top electrode. The first mask element may be arranged over a first part of the first bottom electrode. The first top electrode may be arranged over and in contact with the first mask element. The switching layer may be arranged to extend over a second part of the first bottom electrode, and along a first side surface of the first mask element and further along a first side surface of the first top electrode. The first side surfaces of the first mask element and the first top electrode may face a same direction.