Method of processing on-press developable lithographic printing plate
    71.
    发明授权
    Method of processing on-press developable lithographic printing plate 有权
    加工可印刷平版印刷版的方法

    公开(公告)号:US07358034B2

    公开(公告)日:2008-04-15

    申请号:US11356911

    申请日:2006-02-18

    Abstract: A method of deactivating and on-press developing an exposed lithographic printing plate is disclosed. The plate comprises on a substrate a photosensitive layer developable with ink and/or fountain solution and capable of hardening upon exposure to a radiation. The plate is exposed with the radiation, deactivated, and then on-press developed with ink and/or fountain solution. The deactivation of the exposed plate allows the handling of the plate under regular office light or any other light without causing the hardening of the non-exposed areas of the photosensitive layer.

    Abstract translation: 公开了一种使曝光的平版印刷版钝化和按压显影的方法。 该板在基板上包括可用油墨和/或润版液显影的感光层,并且能够在暴露于辐射时硬化。 板用辐射曝光,停用,然后用油墨和/或润版液进行印刷。 暴露板的停用允许在常规办公室光或任何其他光下处理板,而不会引起感光层的未曝光区域的硬化。

    Method of treating on-press developable lithographic printing plate
    77.
    发明申请
    Method of treating on-press developable lithographic printing plate 有权
    处理印刷可印刷平版印刷版的方法

    公开(公告)号:US20070254241A1

    公开(公告)日:2007-11-01

    申请号:US11825576

    申请日:2007-07-06

    Applicant: Gary Teng

    Inventor: Gary Teng

    Abstract: A method of treating an on-press developable lithographic printing plate with a treating solution after imagewise exposure and before on-press development is described. The plate comprises on a substrate a photosensitive layer developable with ink and/or fountain solution and capable of hardening upon exposure to a radiation. The plate is imagewise exposed with a radiation, overall treated with a treating solution to cause at least one chemical or physical change in the photosensitive layer or on the substrate surface, and then on-press developed with ink and/or fountain solution. Such a treatment allows improvement on the performance of the imagewise exposed plate by, for example, improving the white light stability, forming visible imaging, increasing the hydrophilicity of the substrate, or increasing the developability of the photosensitive layer.

    Abstract translation: 描述了在成像曝光之后和在印刷前发展之前用处理溶液处理印刷可印刷的平版印刷版的方法。 该板在基板上包括可用油墨和/或润版液显影的感光层,并且能够在暴露于辐射时硬化。 用辐射对板进行成像曝光,总体上用处理溶液处理以在感光层或基材表面上引起至少一种化学或物理变化,然后用油墨和/或润版液进行压制显影。 这样的处理可以通过例如改善白光稳定性,形成可视成像,增加基底的亲水性或提高感光层的显影性来改善成像曝光的印版的性能。

    Image formation process and planographic printing plate material
    78.
    发明授权
    Image formation process and planographic printing plate material 失效
    图像形成过程和平版印刷版材料

    公开(公告)号:US07288365B2

    公开(公告)日:2007-10-30

    申请号:US11435244

    申请日:2006-05-15

    Abstract: Disclosed is an image forming method possessing the steps of producing a planographic printing plate via a development treatment of exposing a hydrophilic surface of an aluminum support by removing a thermosensitive image formation layer provided on the hydrophilic surface, that is not imagewise heated on a printing press, after imagewise heating a planographic printing plate material having the thermosensitive image formation layer provided on the hydrophilic surface of the aluminum support, and of treating the planographic printing plate with an ink cleaning agent after printing, wherein the hydrophilic surface is colored by a colorant having a solubility of 5-100 g, based on 1 liter of n-decane, and the colorant on the hydrophilic surface exposed after removing the thermosensitive image formation layer is removed in the above step of treating the planographic printing plate with an ink cleaning agent.

    Abstract translation: 公开了一种图像形成方法,其具有以下步骤:通过显影处理来生产平版印刷版,所述显影处理通过除去设置在亲水表面上的热敏图像形成层,而不是在印刷机上成像加热 在图像加热后,将具有设置在铝支架的亲水表面上的热敏图像形成层的平版印刷版材料和在印刷后用油墨清洁剂处理平版印刷版,其中亲水表面由着色剂着色, 在用油墨清洁剂处理平版印刷版的上述步骤中,除去5-100g基于1升正癸烷的溶解度和除去热敏图像形成层之后暴露的亲水性表面上的着色剂。

    Lithographic printing process
    79.
    发明授权
    Lithographic printing process 有权
    平版印刷工艺

    公开(公告)号:US07288361B2

    公开(公告)日:2007-10-30

    申请号:US10921837

    申请日:2004-08-20

    Abstract: A lithographic printing process which comprises the steps of: imagewise exposing to infrared light a presensitized lithographic plate which comprises a hydrophilic support and a removable image-forming layer containing an infrared absorbing agent having the absorption maximum within an infrared region and a dye precursor having substantially no absorption within a visible region to change the dye precursor to a visible dye having an absorption within a visible region within the exposed area, and to make the image-forming layer irremovable within the exposed area; removing the image-forming layer within the unexposed area of the lithographic plate mounted on a cylinder of a printing press; and then printing an image with the lithographic plate mounted on the cylinder of the printing press. The other processes are also disclosed.

    Abstract translation: 一种平版印刷方法,其包括以下步骤:将具有亲水性载体和含有在红外区域内具有最大吸收的红外线吸收剂的可除去图像形成层的预定平版印刷版成像曝光于红外光,以及具有基本上 在可见区域内没有吸收将染料前体改变为在曝光区域内具有可见区域内的吸收的可见染料,并使图像形成层在暴露区域内不可移动; 去除安装在印刷机的滚筒上的平版印刷板的未曝光区域内的图像形成层; 然后用安装在印刷机滚筒上的平版印刷机印刷图像。 还公开了其他方法。

    Radiation-sensitive elements and their storage stability
    80.
    发明授权
    Radiation-sensitive elements and their storage stability 有权
    辐射敏感元件及其储存稳定性

    公开(公告)号:US07285372B2

    公开(公告)日:2007-10-23

    申请号:US10536514

    申请日:2003-11-28

    Abstract: Radiation-sensitive element comprising (a) a substrate with at least one hydrophilic surface and (b) a radiation-sensitive coating on at least one hydrophilic surface of the substrate, wherein the coating comprises: (i) at least one free-radical polymerizable monomer and/or oligomer and/or polymer with at least one ethylenically unsaturated group each, (ii) at least one absorber selected from photoinitiators and sensitizers, which is capable of absorbing radiation of a wavelength in the range of 250 to 1,200 nm and (iii) at least one stabilizer comprising in its molecule at least one group capable of inhibiting free-radical polymerization, and at least one other group capable of sorption at the hydrophilic surface of the substrate.

    Abstract translation: 辐射敏感元件包括(a)具有至少一个亲水表面的基底和(b)基底的至少一个亲水表面上的辐射敏感涂层,其中所述涂层包括:(i)至少一种可自由基聚合的 具有至少一个烯键式不饱和基团的单体和/或低聚物和/或聚合物,(ii)至少一种选自光引发剂和敏化剂的吸收剂,其能够吸收波长在250-1200nm范围内的辐射和( iii)至少一种稳定剂在其分子中包含至少一个能够抑制自由基聚合的基团,以及至少一种能够在基材亲水表面吸附的其它基团。

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