公开(公告)号：US20090066941A1

公开(公告)日：2009-03-12

申请号：US12266079

申请日：2008-11-06

Applicant: Takahiro TOGASHI ,  Shigeru Matsui

Inventor： Takahiro TOGASHI ,  Shigeru Matsui

IPC: G01N21/88

CPC classification number: G01N21/9501 ,  G01N21/94 ,  G01N2021/8861 ,  G01N2021/8874 ,  G01N2021/95676

Abstract: A method and equipment which includes an illustrated-spot illumination-distribution data table for storing an illumination distribution within an illustrated spot and which calculates a coordinate position for a particle or a defect and the diameter of the particle on the basis of detection light intensity data about the particle or defect and the illustrated-spot illumination-distribution data table. Thus, even when the illumination distribution within the illustrated spot based on an actual illumination optical system is not a Gaussian distribution, the calculation of the particle diameter of the detected particle or defect and the calculation of a coordinate position on the surface of an object to be inspected can be attained with an increased accuracy.

Abstract translation: 一种方法和设备，其包括用于存储所示斑点内的照明分布的示出点照度分布数据表，并且基于检测光强度数据计算颗粒或缺陷的坐标位置和颗粒的直径 关于颗粒或缺陷以及所示的点光照度分布数据表。 因此，即使在基于实际的照明光学系统的所示光点内的照明分布不是高斯分布的情况下，检测出的粒子或缺陷的粒径的计算以及物体表面上的坐标位置的计算 被检查可以提高准确度。

公开(公告)号：US20090066940A1

公开(公告)日：2009-03-12

申请号：US12207536

申请日：2008-09-10

Applicant: Shigeru MATSUI

Inventor： Shigeru MATSUI

IPC: G01N21/88

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N21/9505

Abstract: A surface inspection apparatus capable of acquiring scattered light intensity distribution information for each scattering azimuth angle, and detecting foreign matters and defects with high sensitivity. A concave mirror for condensation and another concave mirror for image formation are used to cope with a broad cubic angle. Since mirrors for condensation and image formation are used, a support for clamping the periphery of a lens is unnecessary, and an effective aperture area does not decrease. A plurality of azimuth-wise detection optical systems is disposed and reflected light at all azimuths can be detected by burying the entire periphery without calling for specific lens polishing. A light signal unification unit sums digital data from a particular system corresponding to a scattering azimuth designated in advance in the systems for improving an S/N ratio.

公开(公告)号：US20080024765A1

公开(公告)日：2008-01-31

申请号：US11830320

申请日：2007-07-30

Applicant: Kenji OKA ,  Shigeru Matsui

Inventor： Kenji OKA ,  Shigeru Matsui

IPC: G01N21/00 ,  G06F19/00

CPC classification number: G01N21/8851 ,  G01N21/9501

Abstract: It is an object of the present invention to provide an appearance inspection apparatus capable of analyzing a difference in detection characteristics of detection signals obtained by a plurality of detectors, and capable of flexibly meeting various inspection purposes without changing a circuit or software.An appearance inspection apparatus including a sample stage 101 for supporting a sample 100, an illumination light source 103 for irradiating the sample 100 on the sample stage 101 with illumination light 111, a plurality of detectors 120a to 120d which are disposed at different positions from each other with respect to an illumination light spot of the illumination light source 103, and which detect scattered light 112 generated from a surface of the sample 100, a signal synthesizing section 105 which synthesizes detection signals from the plurality of detectors 120a to 120d in accordance with a set condition, an input operating section 109 for setting a synthesizing condition of the detection signal by the signal synthesizing section 105, and an information display section 108 for displaying a synthesizing map 220a structured based on a synthesized signal which is synthesized by the signal synthesizing section 105 in accordance with a condition set by the input operating section 109.

Abstract translation: 本发明的目的是提供一种外观检查装置，其能够分析由多个检测器获得的检测信号的检测特性的差异，并且能够灵活地满足各种检查目的而不改变电路或软件。 一种外观检查装置，包括用于支撑样品100的样品台101，用于用照明光111照射样品台101上的样品100的照明光源103，设置在不同位置的多个检测器120a至120d 相对于照明光源103的照明光点，检测从样品100的表面产生的散射光112的信号合成部105，其合成来自多个检测器120a〜120的检测信号 d，根据设定条件设置用于设置信号合成部分105的检测信号的合成条件的输入操作部分109和用于显示基于合成信号构成的合成图220a的信息显示部分108a 由信号合成部105根据由输入操作部设定的条件合成 109。

公开(公告)号：US20080013084A1

公开(公告)日：2008-01-17

申请号：US11776912

申请日：2007-07-12

Applicant: Shigeru MATSUI ,  Masayuki HACHIYA

Inventor： Shigeru MATSUI ,  Masayuki HACHIYA

IPC: G01N21/88

CPC classification number: G01N21/9501 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: In order to realize a surface inspection apparatus capable of inspecting a contaminant particle and a defect with a uniform sensitivity without depending on a rotation angle in a primary scan direction even in the case where intensity of scattered light, which is generated derived from the contaminant particle and the defect existing on the surface of a semiconductor wafer or adjacent to the surface, has anisotropy which depends on an illumination direction; light from a light source 11 becomes two illumination beams 21 and 22 by a beam splitter 12, the beams being irradiated onto a semiconductor wafer 100 from two mutually substantially orthogonal azimuthal angles having substantially equal elevation angles to form illumination spots 3 and 4. When the sum of scattered, diffracted, and reflected lights due to the illumination beams 21 and 22 is detected; influence of the anisotropy which a contaminant particle and a defect existing in the wafer 100 itself or thereon have with respect to an illumination direction, can be eliminated. This makes it possible to inspect a contaminant particle, defect, and the like with a uniform sensitivity without depending on a rotation angle in a primary scan direction even in the case where intensity of the scattered light generated derived from the contaminant particle, defect, and the like depends on the illumination direction.

Abstract translation: 为了实现能够在不影响初级扫描方向的旋转角度的情况下检测污染物质和缺陷的表面检查装置，即使在从污染物粒子产生的散射光强度的情况下， 并且存在于半导体晶片的表面上或与表面相邻的缺陷具有取决于照明方向的各向异性; 来自光源11的光通过分束器12变成两个照明光束21和22，这些光束从具有基本相等的仰角的两个相互基本上正交的方位角照射到半导体晶片100上，以形成照明点3和4.当 检测由于照明光束21和22引起的散射，衍射和反射光的总和; 可以消除晶片100本身或其上存在的污染颗粒和缺陷相对于照明方向的各向异性的影响。 这使得可以在不依赖于主扫描方向上的旋转角度的情况下以均匀的灵敏度检查污染物颗粒，缺陷等，即使在由污染物颗粒产生的散射光的强度，缺陷和 这取决于照明方向。

公开(公告)号：US20060262297A1

公开(公告)日：2006-11-23

申请号：US11437643

申请日：2006-05-22

Applicant: Shigeru Matsui ,  Masaaki Ito

Inventor： Shigeru Matsui ,  Masaaki Ito

IPC: G01N21/88

CPC classification number: G01N21/8806 ,  G01N21/956

Abstract: In the conventional methods for enhancing defect detection sensitivity by improving the resolving power, if a microscopic pattern, which is a high spatial-frequency structure as is the case with a microscopic defect, has become the brightest portion, the gray-scale contrast of the microscopic defect will be enhanced. At the same time, however, the gray-scale contrast of the microscopic pattern will also be enhanced simultaneously. Consequently, there has existed a problem that it is impossible to enhance the microscopic-defect detection sensitivity further than that. In the present invention, an aperture stop which is divided into a plurality of small apertures is located on an illumination pupil plane. Then, light-shield/light-transmission for each small aperture is controlled independently of each other. This control allows an inspection-target object to be illuminated at only an incident angle at which the gray-scale contrast of the microscopic defect will be emphasized more sharply.

公开(公告)号：US20060100804A1

公开(公告)日：2006-05-11

申请号：US11302145

申请日：2005-12-14

Applicant: Takanori Ninomiya ,  Seiji Isogai ,  Shigeru Matsui ,  Toshiei Kurosaki

Inventor： Takanori Ninomiya ,  Seiji Isogai ,  Shigeru Matsui ,  Toshiei Kurosaki

IPC: G06F19/00

CPC classification number: H01L21/67288 ,  G01N21/9501 ,  G01N23/22 ,  G01N2021/8861 ,  G06T7/0004 ,  G06T7/73 ,  G06T2207/30148 ,  H01J37/28 ,  H01J2237/24592

Abstract: Based on a plurality of defects' position-coordinates and attribute detected by an inspecting apparatus, defects that are easily detectable by an observing apparatus are selected. With these selected defects employed as the indicator, the observing apparatus detects and observes the defects. Moreover, creating a coordinate transformation formula for representing a correlated relationship in the defects' position-coordinates between both the apparatuses, the observing apparatus transforms the defects' position-coordinates so as to observe the defects.

公开(公告)号：US20060072106A1

公开(公告)日：2006-04-06

申请号：US11243188

申请日：2005-10-05

Applicant: Shigeru Matsui ,  Kei Shimura

Inventor： Shigeru Matsui ,  Kei Shimura

IPC: G01N21/88

CPC classification number: G01N21/956 ,  G01N21/21

Abstract: A non-polarization beam splitter is used for splitting optical paths of an illumination system and an image formation system. MTF characteristics independent of an orientation of a pattern on a sample is obtained by illumination with a circularly-polarized light by combining a polarizer and a λ/4 plate. A partial polarizer is put in the image formation system immediately after the non-polarization beam splitter, and high-order diffraction lights are taken in with the maximum efficiency and the transmission efficiency of the zero-order light is controlled to improve high frequency part of MTF.

Abstract translation: 非偏振分束器用于分离照明系统和图像形成系统的光路。 通过组合偏振器和λ/ 4板，通过用圆偏振光进行照明来获得与样品上的图案的取向无关的MTF特性。 在非偏振光束分离器之后立即将部分偏振片放入图像形成系统中，并且以最大效率吸收高阶衍射光，并且控制零级光的透射效率以改善高频部分的高频部分 MTF。

公开(公告)号：US20050117796A1

公开(公告)日：2005-06-02

申请号：US10995512

申请日：2004-11-24

Applicant: Shigeru Matsui ,  Katsuya Suzuki

Inventor： Shigeru Matsui ,  Katsuya Suzuki

IPC: G01N21/956 ,  G06K9/00 ,  G06T1/00 ,  G06T5/50 ,  G06T7/00 ,  H01L21/66

CPC classification number: G06T7/001 ,  G01N21/95607 ,  G03F7/7065 ,  G06T2207/30148

Abstract: The pattern defect inspection apparatus is operable to detect defects by comparing a detection image, which is obtained through scanning by an image sensor those patterns that have the identical shape and are continuously disposed on the object under tested at equal intervals in row and column directions, with a reference image obtained by scanning neighboring identical shape patterns in the row and column directions. This apparatus has a unit for generating an average reference image by statistical computation processing from the images of identical shape patterns lying next to the detection image including at least eight nearest chips on the up-and-down and right-and-left sides and at diagonal positions with the detection image being intermediately situated. The apparatus also includes a unit that detects a defect by comparing the detection image to the average reference image thus generated.

Abstract translation: 图案缺陷检查装置可以通过将通过图像传感器进行扫描而得到的检测图像进行比较来检测缺陷，所述检测图像具有相同形状且连续设置在被检测物体上的行和列方向上等间隔的那些图案， 具有通过扫描行和列方向上的相邻相同形状图案而获得的参考图像。 该装置具有用于通过统计计算处理从邻近检测图像的相同形状图案的图像生成平均参考图像的单元，该检测图像包括上下左右侧至少八个最近的码片，以及在 对角位置，检测图像位于中间位置。 该装置还包括通过将检测图像与由此生成的平均参考图像进行比较来检测缺陷的单元。

公开(公告)号：US06421308B1

公开(公告)日：2002-07-16

申请号：US09241411

申请日：1999-02-02

Applicant: Naoki Kizu ,  Kazuhiro Sugiyama ,  Shigeru Matsui ,  Noboru Yashima ,  Yukari Hiratsuka

Inventor： Naoki Kizu ,  Kazuhiro Sugiyama ,  Shigeru Matsui ,  Noboru Yashima ,  Yukari Hiratsuka

IPC: G11B2010

CPC classification number: G11B27/36 ,  G11B7/00718 ,  G11B7/00745 ,  G11B20/1833 ,  G11B27/24 ,  G11B27/3027 ,  G11B2220/216 ,  G11B2220/2575

Abstract: For recording data on and reproducing data from an optical disk of a single spiral land/groove configuration, a header detector detects header regions on the optical disk, a PID error detector judges whether the address information read from the header regions is erroneous, using error detection codes, and detects the number of errors per sector. An error count comparator compares the number of errors per sector with a predetermined value, and a state judging circuit identifies the state of the optical disk device by causing transition to a higher or lower state according to the output of the error count comparator. The recording and reproduction are controlled according to the state thus identified.

Abstract translation: 为了在单个螺旋纹/纹槽配置的光盘上记录数据和再现数据，标题检测器检测光盘上的标题区，PID错误检测器判断从标题区读出的地址信息是否错误，使用错误 检测代码，并检测每个扇区的错误数。 误差计数比较器将每个扇区的误差数与预定值进行比较，状态判断电路根据误差计数比较器的输出，通过转变到更高或更低的状态来识别光盘装置的状态。 根据所识别的状态来控制记录和再现。

公开(公告)号：US06384909B2

公开(公告)日：2002-05-07

申请号：US09842929

申请日：2001-04-27

Applicant: Koji Tomita ,  Muneo Maeshima ,  Shigeru Matsui ,  Yoshitaka Kodama ,  Hitoshi Komuro ,  Kazuo Takeda

Inventor： Koji Tomita ,  Muneo Maeshima ,  Shigeru Matsui ,  Yoshitaka Kodama ,  Hitoshi Komuro ,  Kazuo Takeda

IPC: G01N2188

CPC classification number: G01N21/9505 ,  G01N21/9501

Abstract: A defect inspection apparatus for detecting defects existing on a surface of a semiconductor sample and/or inside the sample based on light information from the sample obtained by irradiating a light beam onto the sample is provided, which comprises a detecting means for detecting positions in the depth direction where the defects exist and distribution of the defects based on the light information; a setting means for setting a position in the depth direction where defects exist; and a means for displaying the distribution of the defects obtained by the detecting means, the displaying means displaying the distribution of the defects corresponding to the position in the depth direction set by the setting means.