公开(公告)号：US08605756B2

公开(公告)日：2013-12-10

申请号：US12769143

申请日：2010-04-28

申请人： Akira Shimamura ,  Koichi Mita ,  Takashi Arai ,  Hideshi Fujishima ,  Akira Endo

发明人： Akira Shimamura ,  Koichi Mita ,  Takashi Arai ,  Hideshi Fujishima ,  Akira Endo

IPC分类号： H04J3/06

CPC分类号： H04J3/06 ,  H04L12/40006 ,  H04L12/40032 ,  H04L2012/40241

摘要： A signal processor includes a period detection section which detects that a period is currently used for communication of a frame; a pattern detection section which detects, from the received signal, a first signal pattern by which the end of communication of the frame is recognized; and an output processing section which outputs the received signal to a controller, configured to instruct, upon detection of the first signal pattern in the period being currently used for communication of a frame, the controller to halt startup of communication action of the next frame, until the period being currently used for communication of a frame comes to the end, to thereby reduce an event such that frames are transmitted from a plurality of communication devices simultaneously, and to thereby allow the communication action for the next frame to proceed correctly.

摘要翻译： 信号处理器包括周期检测部分，其检测当前用于帧的通信的周期; 模式检测部，其从所接收的信号检测识别所述帧的通信结束的第一信号模式; 以及输出处理部，其将接收到的信号输出到控制器，被配置为在当前用于帧的通信的时段中检测到第一信号模式时指示，控​​制器停止启动下一帧的通信动作， 直到当前用于帧的通信的时间段结束为止，从而减少了从多个通信设备同时发送帧的事件，从而允许下一帧的通信动作正确地进行。

公开(公告)号：US08586954B2

公开(公告)日：2013-11-19

申请号：US13419177

申请日：2012-03-13

申请人： Takeshi Asayama ,  Kouji Kakizaki ,  Akira Endo ,  Shinji Nagai

发明人： Takeshi Asayama ,  Kouji Kakizaki ,  Akira Endo ,  Shinji Nagai

IPC分类号： G01N21/00 ,  G01N21/33 ,  H05G2/00

CPC分类号： H05G2/008 ,  H05G2/003 ,  H05G2/005

摘要： An extreme ultraviolet light source apparatus generating an extreme ultraviolet light from plasma generated by irradiating a target material with a laser light within a chamber, and controlling a flow of ions generated together with the extreme ultraviolet light using a magnetic field or an electric field, the extreme ultraviolet light source apparatus comprises an ion collector device collecting the ion via an aperture arranged at a side of the chamber, and an interrupting mechanism interrupting movement of a sputtered particle in a direction toward the aperture, the sputtered particle generated at an ion collision surface collided with the ion in the ion collector device.

摘要翻译： 一种极紫外光源装置，通过在室内产生通过用激光照射目标材料而产生的等离子体的极紫外光，并且利用磁场或电场来控制与极紫外光一起产生的离子的流动， 极紫外光源装置包括离子收集器装置，该离子收集器装置通过布置在腔室一侧的孔收集离子，以及中断机构阻止溅射颗粒朝向孔的方向移动，溅射粒子在离子碰撞面 与离子收集器装置中的离子相撞。

公开(公告)号：US08436328B2

公开(公告)日：2013-05-07

申请号：US12638571

申请日：2009-12-15

申请人： Tatsuya Yanagida ,  Akira Endo ,  Hiroshi Komori ,  Shinji Nagai ,  Kouji Kakizaki ,  Tamotsu Abe ,  Hideo Hoshino

发明人： Tatsuya Yanagida ,  Akira Endo ,  Hiroshi Komori ,  Shinji Nagai ,  Kouji Kakizaki ,  Tamotsu Abe ,  Hideo Hoshino

IPC分类号： A61N5/06 ,  G01J3/10 ,  H05G2/00

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008

摘要： In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.

摘要翻译： 在EUV光源装置中，集光镜受到保护，不会损坏镜面涂层。 EUV光源装置包括：产生极紫外光的室; 目标供应单元，用于将目标材料供应到所述室中; 等离子体产生激光器单元，用于用等离子体产生激光束照射室内的目标材料以产生等离子体; 电离激光单元，用于用电离激光束照射在等离子体产生时产生的中性粒子，以将中性粒子转化为离子; 用于收集从等离子体辐射的极紫外光的收集镜; 以及用于在室内形成磁场或电场以捕获离子的磁场或电场形成单元。

公开(公告)号：US08399867B2

公开(公告)日：2013-03-19

申请号：US12566170

申请日：2009-09-24

申请人： Akira Endo ,  Shinji Nagai ,  Kouji Kakizaki ,  Osamu Wakabayashi ,  Yoshifumi Ueno

发明人： Akira Endo ,  Shinji Nagai ,  Kouji Kakizaki ,  Osamu Wakabayashi ,  Yoshifumi Ueno

IPC分类号： H04H1/04

CPC分类号： H05G2/003 ,  H05G2/001 ,  H05G2/008

摘要： An EUV light source apparatus in which contamination or damage of optical elements and other component elements by debris can be suppressed to realize longer lives of them. The EUV light source apparatus is an apparatus for radiating extreme ultraviolet light by generating plasma of a target material within a chamber, and includes: a first laser unit for applying a first laser beam to the target material to generate pre-plasma; a second laser unit for applying a second laser beam to the pre-plasma to generate a main plasma for radiating the extreme ultraviolet light; and a magnetic field generating unit for generating a magnetic field within the chamber to control a state of at least one of the pre-plasma and the main plasma.

摘要翻译： EUV光源装置，可以抑制光学元件和其他元件被碎屑污染或损坏，从而实现更长寿命。 EUV光源装置是通过在室内产生目标材料的等离子体来辐射极紫外光的装置，包括：第一激光单元，用于向目标材料施加第一激光束以产生预等离子体; 用于将第二激光束施加到所述预等离子体以产生用于辐射所述极紫外光的主等离子体的第二激光单元; 以及用于在所述室内产生磁场以控制所述预等离子体和所述主等离子体中的至少一个的状态的磁场产生单元。

公开(公告)号：US08288743B2

公开(公告)日：2012-10-16

申请号：US12406388

申请日：2009-03-18

申请人： Yoshifumi Ueno ,  Osamu Wakabayashi ,  Tamotsu Abe ,  Akira Sumitani ,  Hideo Hoshino ,  Akira Endo ,  Georg Soumagne

发明人： Yoshifumi Ueno ,  Osamu Wakabayashi ,  Tamotsu Abe ,  Akira Sumitani ,  Hideo Hoshino ,  Akira Endo ,  Georg Soumagne

IPC分类号： B01D59/44

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70916 ,  G03F7/70983 ,  G21K1/093 ,  G21K2201/00 ,  H05G2/005 ,  H05G2/008

摘要： An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.

摘要翻译： 一种离子提取装置，其在EUV光产生装置中从在等离子体状态的激光照射EUV光产生点的靶，并且靶射出EUV光的EUV光产生装置中，从等离子体发射的离子， 其包括：收集器反射镜，其设置在与激光入射方向相反的方向上以收集EUV光，并具有用于离子通过的孔; 磁力线产生装置意味着产生在EUV光产生点处或附近平行或近似平行于激光入射方向的磁力线; 以及离开收集反射镜与EUV光产生点相反的一侧的离子提取装置，并且离子退出。

公开(公告)号：US08273919B2

公开(公告)日：2012-09-25

申请号：US12738909

申请日：2009-01-30

申请人： Akira Endo ,  Kimihiko Urata

发明人： Akira Endo ,  Kimihiko Urata

IPC分类号： C07C231/02

CPC分类号： C07C231/02 ,  C10M147/04 ,  C10M2213/003 ,  C10M2213/04 ,  C10N2230/08 ,  C10M2215/06 ,  C07C235/16

摘要： Problem: To provide a novel compound capable of preventing pyrolysis of fluorinated oils when it is used as an additive for the fluorinated oils.Solution Means: A compound represented by Formula (1): wherein Y represents an oxygen atom (O), a sulfur atom (S), a CO group, a SO group, or a SO2 group; k is an integer from 1 to 5; m is an integer from 1 to 10; and n is an integer of 1 or more; and wherein two substituents on each phenyl group may be in any of ortho-, meta-, and para-positions.

摘要翻译： 问题：提供一种能够防止氟化油在用作氟化油的添加剂时的热解的新型化合物。 溶液装置：由式（1）表示的化合物：其中Y表示氧原子（O），硫原子（S），CO基，SO基或SO 2基; k是1至5的整数; m为1〜10的整数; n为1以上的整数， 并且其中每个苯基上的两个取代基可以是邻位，间位和对位中的任一个。

公开(公告)号：US20120097869A1

公开(公告)日：2012-04-26

申请号：US13274991

申请日：2011-10-17

申请人： Yoshifumi Ueno ,  Georg Soumagne ,  Shiniji Nagai ,  Akira Endo ,  Tatsuya Yanagida

发明人： Yoshifumi Ueno ,  Georg Soumagne ,  Shiniji Nagai ,  Akira Endo ,  Tatsuya Yanagida

IPC分类号： G01J3/10

CPC分类号： H05G2/003 ,  H05G2/008

摘要： In an extreme ultraviolet light source apparatus generating an extreme ultraviolet light from a plasma generated by irradiating a target, which is a droplet D of molten Sn, with a laser light, and controlling the flow direction of ion generated at the generation of the extreme ultraviolet light by a magnetic field or an electric field, an ion collection cylinder 20 is arranged for collecting the ion, and ion collision surfaces Sa and Sb of the ion collection cylinder 20 are provided with or coated with Si, which is a metal whose sputtering rate with respect to the ion is less than one atom/ion.

摘要翻译： 在极紫外光源装置中，通过用激光照射作为熔融Sn的液滴D而产生的等离子体产生极紫外光，并且控制在产生极紫外光时产生的离子的流动方向 通过磁场或电场照射光，离子收集筒20被布置成用于收集离子，离子收集筒20的离子碰撞表面Sa和Sb设置有或涂覆有Si，溅射速率 相对于离子小于一个原子/离子。

公开(公告)号：US08093571B2

公开(公告)日：2012-01-10

申请号：US12566865

申请日：2009-09-25

申请人： Akira Endo ,  Krzysztof Nowak ,  Hideo Hoshino ,  Tatsuya Ariga ,  Masato Moriya ,  Osamu Wakabayashi

发明人： Akira Endo ,  Krzysztof Nowak ,  Hideo Hoshino ,  Tatsuya Ariga ,  Masato Moriya ,  Osamu Wakabayashi

IPC分类号： G02B26/02

CPC分类号： H05G2/003 ,  H01S3/005 ,  H01S3/0064 ,  H01S3/2316 ,  H05G2/008

摘要： An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.

摘要翻译： 本发明的EUV光源能够在高热负荷状态下稳定且连续地使用饱和吸收体。 可饱和吸收体（SA）装置设置在激光束线上以吸收诸如自激振荡光，寄生振荡光或返回光的微弱光。 来自SA气瓶的SA气体和来自缓冲气瓶的缓冲气体混合成混合气体。 混合气体经由供给管路供给到SA气室，吸收激光束中包含的微弱光。 混合气体通过排气管道排出，并被送到热交换器。 由热交换器冷却的混合气体通过循环泵送回到SA气室。

公开(公告)号：US20100208755A1

公开(公告)日：2010-08-19

申请号：US12769143

申请日：2010-04-28

申请人： Akira SHIMAMURA ,  Koichi Mita ,  Takashi Arai ,  Hideshi Fujishima ,  Akira Endo

发明人： Akira SHIMAMURA ,  Koichi Mita ,  Takashi Arai ,  Hideshi Fujishima ,  Akira Endo

IPC分类号： H04J3/00

CPC分类号： H04J3/06 ,  H04L12/40006 ,  H04L12/40032 ,  H04L2012/40241

摘要： A signal processor includes a period detection section which detects that a period is currently used for communication of a frame; a pattern detection section which detects, from the received signal, a first signal pattern by which the end of communication of the frame is recognized; and an output processing section which outputs the received signal to a controller, configured to instruct, upon detection of the first signal pattern in the period being currently used for communication of a frame, the controller to halt startup of communication action of the next frame, until the period being currently used for communication of a frame comes to the end, to thereby reduce an event such that frames are transmitted from a plurality of communication devices simultaneously, and to thereby allow the communication action for the next frame to proceed correctly.

摘要翻译： 信号处理器包括周期检测部分，其检测当前用于帧的通信的周期; 模式检测部，其从所接收的信号检测识别所述帧的通信结束的第一信号模式; 以及输出处理部，其将接收到的信号输出到控制器，被配置为在当前用于帧的通信的时段中检测到第一信号模式时指示，控​​制器停止启动下一帧的通信动作， 直到当前用于帧的通信的时间段结束为止，从而减少了从多个通信设备同时发送帧的事件，从而允许下一帧的通信动作正确地进行。

公开(公告)号：US20090316746A1

公开(公告)日：2009-12-24

申请号：US12482824

申请日：2009-06-11

申请人： Krzysztof NOWAK ,  Takashi Suganuma ,  Osamu Wakabayashi ,  Akira Endo

发明人： Krzysztof NOWAK ,  Takashi Suganuma ,  Osamu Wakabayashi ,  Akira Endo

IPC分类号： H01S3/22 ,  H01S3/08

CPC分类号： H01S3/076 ,  G03F7/70025 ,  G03F7/70033 ,  H01S3/005 ,  H01S3/0971 ,  H01S3/115 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/2325 ,  H01S3/235 ,  H01S3/2375 ,  H01S5/141 ,  H01S5/4087

摘要： A slab type laser apparatus has a slab type gas laser medium part formed in a region defined by a pair of electrode flat plates oppositely disposed in parallel with each other in a space to be filled with a gas laser medium which is excited by high-frequency electric power. The apparatus includes an oscillator part including a pair of resonator mirrors oppositely disposed with a part of the gas laser medium part in between, and for amplifying a laser beam to have predetermined light intensity to emit the laser beam, and the amplifier part including a plurality of return mirrors oppositely disposed with a part of the gas laser medium part in between. The incident laser beam goes and returns plural times between the return mirrors, and the laser beam is amplified to have predetermined power.

摘要翻译： 平板型激光装置具有板状气体激光介质部，该平板型气体激光介质部形成在由一对电极平板限定的区域中，该对电极平板彼此平行配置，以填充由高频激发的气体激光介质 电力。 该装置包括：振荡器部分，包括一对谐振器反射镜，该谐振器反射镜与气体激光介质部分的一部分相对设置，并且用于放大激光束以具有预定的光强度以发射激光束，并且放大器部件包括多个 的反射镜与气体激光介质部分的一部分相对设置。 入射激光束在返回镜之间返回多次，激光束被放大成具有预定的功率。