公开(公告)号：US20080068570A1

公开(公告)日：2008-03-20

申请号：US11523743

申请日：2006-09-20

申请人： Bob Streefkerk ,  Youri Johannes Laurentius Maria Van Dommelen ,  Richard Moerman ,  Cedric Desire Grouwstra

发明人： Bob Streefkerk ,  Youri Johannes Laurentius Maria Van Dommelen ,  Richard Moerman ,  Cedric Desire Grouwstra

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70425

摘要： A path which a substrate should take under the projection system during immersion lithography imaging of a plurality of dies on the top surface of the substrate is disclosed.

摘要翻译： 公开了一种在衬底的顶表面上的多个管芯的浸没光刻成像期间衬底应该在投影系统下面的路径。

公开(公告)号：US07248334B2

公开(公告)日：2007-07-24

申请号：US11005500

申请日：2004-12-07

申请人： Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Bob Streefkerk

发明人： Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Bob Streefkerk

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/58 ,  G03B27/32

CPC分类号： G03F7/7085 ,  G03F7/70341 ,  G03F7/70808

摘要： The lithographic apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate, a measurement system configured to measure a parameter of (a) the substrate table, or (b) the substrate, or (c) an image projected by the projection system, or (d) any combination of (a)-(c), and a liquid supply system configured to supply a liquid to a space between the substrate and the projection system. The lithographic apparatus also includes a shield disposed in a vicinity of a portion of the measurement system and configured to shield the portion of the measurement system from the liquid.

摘要翻译： 光刻设备包括构造成保持图案形成装置的支撑结构。 图案形成装置被配置成根据期望的图案对辐射束进行图案化。 所述光刻设备还包括被配置为保持基板的基板台，配置成将所述图案化的光束投影到所述基板的目标部分上的投影系统;被配置为测量（a）所述基板台的参数的测量系统，或（b ）基板，或（c）由投影系统投影的图像，或（d）（a） - （c）的任何组合，以及被配置为将液体供应到基板和投影件之间的空间的液体供应系统 系统。 光刻设备还包括设置在测量系统的一部分附近并被配置为将测量系统的部分与液体隔离的屏蔽件。

公开(公告)号：US07175968B2

公开(公告)日：2007-02-13

申请号：US10898674

申请日：2004-07-26

申请人： Marcel Mathijs Theodore Marie Dierichs ,  Johannes Catharinus Hubertus Mulkens ,  Bob Streefkerk

发明人： Marcel Mathijs Theodore Marie Dierichs ,  Johannes Catharinus Hubertus Mulkens ,  Bob Streefkerk

IPC分类号： G03F7/20 ,  G03F7/207 ,  G03F7/11 ,  G03F7/38

CPC分类号： G03F7/70958 ,  G03F7/70341

摘要： A substrate is provided with a coating of material which is substantially transparent to the wavelength of the projection beam. The coating may be thicker than the wavelength of the projection beam and have a refractive index of the coating such that the wavelength of the projection beam is shortened as it passes through it. This allows the imaging of smaller features on the substrate. Alternatively, the coating may be used with a liquid supply system and act to keep bubbles away from a radiation sensitive layer of the substrate.

公开(公告)号：US09482966B2

公开(公告)日：2016-11-01

申请号：US13615190

申请日：2012-09-13

申请人： Joeri Lof ,  Erik Theodorus Maria Bijlaart ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk

发明人： Joeri Lof ,  Erik Theodorus Maria Bijlaart ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk

IPC分类号： G03B27/58 ,  G03F7/20

CPC分类号： G03F7/70858 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/7085

摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

摘要翻译： 公开了一种光刻投影装置，其中投影系统和基板之间的空间填充有液体。 边缘密封构件至少部分地围绕衬底台面上的衬底或其它物体，以防止衬底或其他物体的边缘部分例如成像或照亮时的液体损失。 光刻投影装置包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统，被配置为向所述投影系统和所述基板之间的空间提供液体; 以及快门，被配置为隔离所述基板的空间或被基板占据的空间。

公开(公告)号：US08941811B2

公开(公告)日：2015-01-27

申请号：US13242401

申请日：2011-09-23

申请人： Hans Jansen ,  Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Marco Koert Stavenga ,  Bob Streefkerk ,  Jan Cornelis Van Der Hoeven ,  Cedric Desire Grouwstra

发明人： Hans Jansen ,  Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Marco Koert Stavenga ,  Bob Streefkerk ,  Jan Cornelis Van Der Hoeven ,  Cedric Desire Grouwstra

IPC分类号： G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/70925

摘要： A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.

摘要翻译： 公开了一种清洗浸没式光刻设备内部的方法和装置。 特别地，可以使用光刻设备的液体供应系统将清洁流体引入到投影系统和光刻设备的基板台之间的空间中。 另外或替代地，可以在衬底台上设置清洁装置，并且可以设置超声发射器以产生超声波清洗液体。

公开(公告)号：US08860922B2

公开(公告)日：2014-10-14

申请号：US13356231

申请日：2012-01-23

申请人： Christiaan Alexander Hoogendam ,  Erik Roelof Loopstra ,  Bob Streefkerk ,  Bernhard Gellrich ,  Andreas Wurmbrand

发明人： Christiaan Alexander Hoogendam ,  Erik Roelof Loopstra ,  Bob Streefkerk ,  Bernhard Gellrich ,  Andreas Wurmbrand

IPC分类号： G03F7/20

CPC分类号： G03F7/70341

摘要： Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.

摘要翻译： 将液体供应到光刻设备的投影系统和基板之间的空间。 朝向真空入口的气体流阻止湿气逸出到光刻设备的其它部分。 这可能有助于保护光刻设备的复杂部分免受潮湿气体的损坏。

公开(公告)号：US08823920B2

公开(公告)日：2014-09-02

申请号：US13287733

申请日：2011-11-02

申请人： Bob Streefkerk ,  Antonius Theodorus Anna Maria Derksen ,  Joeri Lof ,  Klaus Simon ,  Alexander Straaijer

发明人： Bob Streefkerk ,  Antonius Theodorus Anna Maria Derksen ,  Joeri Lof ,  Klaus Simon ,  Alexander Straaijer

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70875 ,  G03F7/70258 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70891

摘要： An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.

摘要翻译： 浸没式光刻设备包括温度控制器，该温度控制器被配置为朝向共同的目标温度调节投影系统，基板和液体的温度。 控制这些元件的温度并降低温度梯度可以提高成像的一致性和一般的光刻性能。 控制温度的措施可以包括例如经由反馈电路来控制浸没液体流速和液体温度。

公开(公告)号：US08755033B2

公开(公告)日：2014-06-17

申请号：US13240711

申请日：2011-09-22

申请人： Aleksey Yurievich Kolesnychenko ,  Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Felix Godfried Peter Peeters ,  Bob Streefkerk ,  Franciscus Johannes Herman Maria Teunissen ,  Helmar Van Santen

发明人： Aleksey Yurievich Kolesnychenko ,  Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Felix Godfried Peter Peeters ,  Bob Streefkerk ,  Franciscus Johannes Herman Maria Teunissen ,  Helmar Van Santen

IPC分类号： G03B27/58 ,  G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70733 ,  G03F7/70866 ,  G03F7/70908

摘要： A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

公开(公告)号：US08755027B2

公开(公告)日：2014-06-17

申请号：US13226037

申请日：2011-09-06

申请人： Matthew Lipson ,  Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Catharinus Hubertus Mulkens ,  Bob Streefkerk ,  Ronald Wilklow ,  Roel De Jonge

发明人： Matthew Lipson ,  Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Catharinus Hubertus Mulkens ,  Bob Streefkerk ,  Ronald Wilklow ,  Roel De Jonge

IPC分类号： G03B27/52 ,  G03B27/32

CPC分类号： G03F7/70341

摘要： A fluid system to provide a fluid including liquid in a part of a lithographic apparatus, the fluid system including a manifold to mix a first liquid component and a second component to form the fluid in the part of the lithographic apparatus, a controller to control a physical property of the fluid by controlling the amount of the first and/or second component used to form the fluid, and a measuring device to measure a property of the fluid and to make feedback available to the controller, wherein the controller is configured to control the physical property of the fluid based on the measured property.

摘要翻译： 一种用于在光刻设备的一部分中提供包括液体的流体的流体系统，所述流体系统包括歧管以混合第一液体组分和第二组分以在所述光刻设备的所述部分中形成所述流体;控制器， 通过控制用于形成流体的第一和/或第二部件的量来控制流体的物理性质;以及测量装置，用于测量流体的性质并使反馈可用于控制器，其中控制器被配置成控制 基于测量属性的流体的物理性质。

公开(公告)号：US08724083B2

公开(公告)日：2014-05-13

申请号：US13082038

申请日：2011-04-07

申请人： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Henrikus Herman Marie Cox ,  Antonius Theodorus Anna Maria Derksen ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Joeri Lof ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Johannes Catharinus Hubertus Mulkens ,  Gerardus Petrus Mattijs Van Nunen ,  Klaus Simon ,  Bernardus Antonius Slaghekke ,  Alexander Straaijer ,  Jan-Gerard Cornelis Van Der Toorn ,  Martijn Houkes

发明人： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Henrikus Herman Marie Cox ,  Antonius Theodorus Anna Maria Derksen ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Joeri Lof ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Johannes Catharinus Hubertus Mulkens ,  Gerardus Petrus Mattijs Van Nunen ,  Klaus Simon ,  Bernardus Antonius Slaghekke ,  Alexander Straaijer ,  Jan-Gerard Cornelis Van Der Toorn ,  Martijn Houkes

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

摘要： In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

摘要翻译： 在光刻设备中，将投影系统下的基板表面的局部区域浸入液体中。 可以使用致动器来改变衬底表面上方的液体供应系统的高度。 控制系统使用前馈或反馈控制输入基板的表面高度，以将液体供应系统保持在基板表面上方的预定高度。