公开(公告)号：US20060237668A1

公开(公告)日：2006-10-26

申请号：US11411971

申请日：2006-04-25

申请人： Peter Silverman ,  Michael Goldstein

发明人： Peter Silverman ,  Michael Goldstein

IPC分类号： G21G5/00

CPC分类号： G03F7/70175

摘要： A system and method for collecting radiation, which may be used in a lithography illumination system. The system comprises a first surface shaped to reflect radiation in a first hemisphere of a source to illuminate in a second hemisphere of the source; and a second surface shaped to reflect radiation in the second hemisphere of the source to an output plane.

公开(公告)号：US20060137969A1

公开(公告)日：2006-06-29

申请号：US11026644

申请日：2004-12-29

申请人： Gerald Feldewerth ,  John Barnak ,  Michael Goldstein

发明人： Gerald Feldewerth ,  John Barnak ,  Michael Goldstein

IPC分类号： C23C14/00

CPC分类号： H01J37/3429 ,  C23C14/3407 ,  H01J37/3491

摘要： The present invention relates to a composite sputtering target comprising a plurality of bonded metal pieces. The composite sputtering target further comprises a bonded region between the metal pieces. The bonded region may comprise an inter-metallic region upon bonding. The composite sputter target of the present invention may be used in conjunction with an apparatus for sputtering alloy films on substrates.

摘要翻译： 复合溅射靶技术领域本发明涉及一种复合溅射靶，其包括多个接合金属片。 复合溅射靶还包括金属片之间的接合区域。 接合区域在结合时可以包括金属间区域。 本发明的复合溅射靶可以与用于在基板上溅射合金膜的装置结合使用。

公开(公告)号：US07057262B2

公开(公告)日：2006-06-06

申请号：US10782297

申请日：2004-02-18

申请人： Michael Goldstein

发明人： Michael Goldstein

IPC分类号： H01L23/58

CPC分类号： B81C1/00666 ,  B81B2201/042 ,  B81C2201/0167 ,  G02B5/0833 ,  G02B26/0833 ,  Y10S438/954

摘要： An optical device having a high reflector tunable stress coating includes a micro-electromechanical system (MEMS) platform, a mirror disposed on the MEMS platform, and a multiple layer coating disposed on the mirror. The multiple layer coating includes a layer of silver (Ag), a layer of silicon dioxide (SiO2) deposited on the layer of Ag, a layer of intrinsic silicon (Si) deposited on the layer of SiO2, and a layer of silicon oxynitride (SiOxNy) deposited on the layer of Si. The concentration of nitrogen is increased and/or decreased to tune the stress (e.g., tensile, none, compressive).

公开(公告)号：US20060093972A1

公开(公告)日：2006-05-04

申请号：US11293594

申请日：2005-12-02

申请人： Michael Goldstein ,  Manish Chandhok ,  Eric Panning ,  Robert Bristol ,  Bryan Rice

发明人： Michael Goldstein ,  Manish Chandhok ,  Eric Panning ,  Robert Bristol ,  Bryan Rice

IPC分类号： G03F7/00

CPC分类号： G03F7/091 ,  G03F7/11

摘要： In an implementation, energy reaching the lower surface of a photoresist may be redirected back into the photoresist material. This may be done by, for example, reflecting and/or fluorescing the energy from a hardmask provided on the wafer surface back into the photoresist.

公开(公告)号：US07033739B2

公开(公告)日：2006-04-25

申请号：US10423466

申请日：2003-04-24

申请人： Michael Goldstein ,  Manish Chandhok ,  Eric Panning ,  Robert Bristol ,  Bryan J. Rice

发明人： Michael Goldstein ,  Manish Chandhok ,  Eric Panning ,  Robert Bristol ,  Bryan J. Rice

IPC分类号： G03F7/20

CPC分类号： G03F7/091 ,  G03F7/11

摘要： In an implementation, energy reaching the lower surface of a photoresist may be redirected back into the photoresist material. This may be done by, for example, reflecting and/or fluorescing the energy from a hardmask provided on the wafer surface back into the photoresist.

公开(公告)号：US20050263724A1

公开(公告)日：2005-12-01

申请号：US11196231

申请日：2005-08-02

申请人： Michael Goldstein ,  Peter Silverman

发明人： Michael Goldstein ,  Peter Silverman

IPC分类号： G03F7/20 ,  G01J1/00

CPC分类号： G03F7/7005 ,  G03F7/201

摘要： An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.

摘要翻译： 用于极紫外（EUV）光刻系统的照明系统可以包括多个EUV光源。 当照射面罩时，系统可以组合来自多个源的光。

公开(公告)号：US06923394B2

公开(公告)日：2005-08-02

申请号：US10412809

申请日：2003-04-11

申请人： Michael Goldstein

发明人： Michael Goldstein

IPC分类号： B62D43/04 ,  B66D1/34 ,  B66D1/00

CPC分类号： B62D43/045 ,  B66D1/34

摘要： The invention provides a reeling device for a hoisting system, including a flexible member having a lower end and an upper end, a rotatable drum on which the flexible member is windable, disk means rotatably mounted on said drum, to which disk means the upper end of the flexible member is anchored, and a stop mechanism activated by the disk means once the flexible member has completely unreeled from the drum.

摘要翻译： 本发明提供了一种用于起重系统的卷取装置，其包括具有下端和上端的柔性构件，可旋转滚筒，柔性构件可卷绕在其上，盘装置可旋转地安装在所述滚筒上，盘装置为上端 所述柔性构件被固定，并且一旦所述柔性构件从所述滚筒完全退出，则由所述盘装置启动的止动机构。

公开(公告)号：US06884361B2

公开(公告)日：2005-04-26

申请号：US09964876

申请日：2001-09-26

申请人： Michael Goldstein

发明人： Michael Goldstein

IPC分类号： C03C17/27 ,  C03C17/36 ,  G03F7/20 ,  G21K1/06 ,  C23F1/00

CPC分类号： C03C17/3636 ,  C03C17/27 ,  C03C17/36 ,  C03C17/3663 ,  C03C2217/213 ,  C03C2218/31 ,  C03C2218/322 ,  C03C2218/33 ,  G03F7/70958 ,  G21K1/06 ,  G21K2201/067

摘要： A method for making a substrate for a mirror used in photolithography is described. That method comprises forming a crystalline layer on a first layer, which has a low coefficient of thermal expansion. Part of the crystalline layer is then removed to form on the first layer a second layer that has a high quality surface finish.

摘要翻译： 描述了制造用于光刻中的反射镜用基板的方法。 该方法包括在具有低热膨胀系数的第一层上形成晶体层。 然后去除部分晶体层以在第一层上形成具有高质量表面光洁度的第二层。

公开(公告)号：US06801298B2

公开(公告)日：2004-10-05

申请号：US10206779

申请日：2002-07-25

申请人： Michael Goldstein

发明人： Michael Goldstein

IPC分类号： G03B2754

CPC分类号： G03F7/702 ,  G03B27/42

摘要： A light condenser suitable for EUV lithography that includes reflective rings concentric to an optical axis. Each ring has a reflective surface to reflect light rays emanating from a light source so that the light rays converge towards a mask to produce Köhler illumination on the mask. The reflective surface has a curve segment that includes a section of a parabolic curve that is rotated relative to an optical axis and has a focal point at the light source.

公开(公告)号：US06700700B2

公开(公告)日：2004-03-02

申请号：US10408033

申请日：2003-04-03

申请人： Michael Goldstein

发明人： Michael Goldstein

IPC分类号： F21V906

CPC分类号： G03F7/70575 ,  G03F7/70158 ,  G03F7/70191 ,  G03F7/702

摘要： In one embodiment of the invention, a grating structure etched on a mirror substrate has a grating period causing diffracting, out of an optical path, a first incident radiation within a first band around a first wavelength. A multi-layer coating deposited on the grating structure reflects the first incident radiation, in the optical path, within the first band and a second incident radiation within a second band around a second wavelength. In another embodiment, a first multi-layer coating deposited on a mirror substrate reflects a first incident radiation within a first band around a first wavelength and a second incident radiation, in an optical path, within a second band around a second wavelength. A grating structure is deposited on the first multi-layer coating. The grating structure is etched to have a grating period causing diffracting, out of the optical path, the second incident radiation within the second band.

摘要翻译： 在本发明的一个实施例中，蚀刻在镜面基板上的光栅结构具有光栅周期，从而在光路内衍射围绕第一波长的第一波段内的第一入射辐射。 沉积在光栅结构上的多层涂层反射在光路内的第一入射辐射在第一波段内，第二入射辐射在第二波段内反射第二波长。 在另一个实施例中，沉积在反射镜基板上的第一多层涂层在围绕第二波长的第二波段内围绕第一波长和第二入射辐射在第一波段内反射第一入射辐射。 光栅结构沉积在第一多层涂层上。 光栅结构被蚀刻以具有光栅周期，从而使光路中的第二入射辐射在第二波段内衍射。