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公开(公告)号：US5272540A
公开(公告)日：1993-12-21
申请号：US759518
申请日：1991-09-13
申请人： Koji Hirata , Hiroki Yoshikawa , Tooru Numata , Kiyoshi Wada , Masayuki Muranaka , Isao Yoshizaki , Takahiko Yoshida , Shigeru Inaoka
发明人： Koji Hirata , Hiroki Yoshikawa , Tooru Numata , Kiyoshi Wada , Masayuki Muranaka , Isao Yoshizaki , Takahiko Yoshida , Shigeru Inaoka
摘要： In a projection lens device having at least two plastic lenses for magnification-projecting an original image displayed on a display screen onto a screen, one of the two plastic lens is convex at a center thereof toward the screen and concave at a periphery thereof, and the other lens has a weak positive refractive power toward the screen at a center thereof and a stronger positive refractive power at a periphery thereof. A variation of a lens power due to a change of a surrounding environment is cancelled out by the concave shape at the periphery of the one lens and the positive refractive power at the periphery of the other lens.
摘要翻译： 在具有至少两个用于将显示屏上显示的原始图像放大投影到屏幕上的塑料透镜的投影透镜装置中，两个塑料透镜中的一个在其中心处朝向屏幕凸出并在其周边凹陷，并且 另一个透镜在其中心处具有朝向屏幕的弱正的屈光力，并且在其周边具有更强的正折射光焦度。 由于周围环境的变化引起的透镜光焦度的变化通过在一个透镜的周边处的凹形形状和另一个透镜的周边处的正屈光力被抵消。
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82.发明授权Photomask blank, process for production of photomask, and chromium-containing material film 有权光掩模坯料，光掩模生产工艺和含铬材料膜公开(公告)号：US08968972B2
公开(公告)日：2015-03-03
申请号：US13883850
申请日：2011-11-18
CPC分类号： G03F1/80 , B32B15/01 , C22C27/06 , C23C14/0641 , C23C14/0676 , G03F1/00 , G03F1/30 , G03F1/50 , G03F1/54
摘要： In the chromium-containing material film of the present invention, an element is added thereto and is capable of bringing a mixture of the element and the chromium into a liquid phase at a temperature of 400° C. or lower. The use of such a chromium-containing material film as an optical film (e.g., a light-shielding film, an etching mask film, or an etching stopper film) of a photo mask blank can achieve an improvement in chlorine-dry etching while retaining the same optical characteristics and the like as those of the conventional chromium-containing material film, thereby increasing the patterning precision.
摘要翻译： 在本发明的含铬材料膜中，添加元素，能够使元素和铬的混合物在400℃以下的温度下成为液相。 使用这种含铬材料膜作为光掩模坯料的光学膜（例如遮光膜，蚀刻掩模膜或蚀刻阻挡膜）可以实现氯干蚀刻的改进，同时保持 与常规含铬材料膜相同的光学特性等，从而提高图案形成精度。
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公开(公告)号：US08007964B2
公开(公告)日：2011-08-30
申请号：US12709116
申请日：2010-02-19
申请人： Hiroki Yoshikawa , Yukio Inazuki , Satoshi Okazaki , Takashi Haraguchi , Masahide Iwakata , Mikio Takagi , Yuichi Fukushima , Tadashi Saga
发明人： Hiroki Yoshikawa , Yukio Inazuki , Satoshi Okazaki , Takashi Haraguchi , Masahide Iwakata , Mikio Takagi , Yuichi Fukushima , Tadashi Saga
IPC分类号： G03F1/00
摘要： A photomask blank to be used as a material for a photomask is provided with a mask pattern having a transparent area and an effectively opaque area to exposure light on a transparent substrate. On the transparent board, one or more layers of light shielding films are formed with or without other film (A) in between, at least one layer (B) which constitutes the light shielding film includes silicon and a transition metal as main component, and a molar ratio of silicon to the transition metal is silicon:metal=4-15:1 (atomic ratio). The photomask provided with the mask pattern having the transparent area and the effectively opaque area to exposure light on the transparent board is also provided.
摘要翻译： 用作光掩模材料的光掩模坯料设置有对透明基板上的曝光光具有透明区域和有效不透明区域的掩模图案。 在透明板上，形成有一层或多层遮光膜，其中有或没有其它膜（A），构成遮光膜的至少一层（B）包括硅和过渡金属作为主要成分，以及 硅与过渡金属的摩尔比为硅：金属= 4-15:1（原子比）。 还提供了具有掩模图案的光掩模，该掩模图案具有透明区域和透明板上曝光光线的有效不透明区域。
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84.发明授权公开(公告)号：US07904836B2
公开(公告)日：2011-03-08
申请号：US11785802
申请日：2007-04-20
申请人： Hiroki Yoshikawa , Masahiro Ogawa
发明人： Hiroki Yoshikawa , Masahiro Ogawa
IPC分类号： G06F3/048
CPC分类号： G06F3/0485 , G06F3/0482
摘要： An image reproduction method includes: a reduced-size image reading step of reading a plurality of reduced-size images from a recording medium and storing the reduced-size images in a memory; a display step of multi-displaying the plurality of reduced-size images on a monitor; a cursor movement detection step of detecting a moving speed of a cursor indicating a selected reduced-size image from the plurality of reduced-size images displayed on the monitor; and an image read-ahead step of reading images from the recording medium according to the moving speed of the cursor and storing the image in the memory.
摘要翻译： 一种图像再现方法包括：缩小尺寸图像读取步骤，从记录介质读取多个缩小尺寸图像并将缩小尺寸图像存储在存储器中; 显示步骤，在监视器上多次显示所述缩小尺寸的图像; 光标移动检测步骤，从显示在监视器上的多个缩小尺寸图像中检测指示所选择的缩小图像的光标的移动速度; 以及根据光标的移动速度从记录介质读取图像并将图像存储在存储器中的图像预读步骤。
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公开(公告)号：US07771893B2
公开(公告)日：2010-08-10
申请号：US11489477
申请日：2006-07-20
申请人： Hiroki Yoshikawa , Hiroshi Kubota , Yoshinori Kinase , Satoshi Okazaki , Tamotsu Maruyama , Takashi Haraguchi , Masahide Iwakata , Yuichi Fukushima , Tadashi Saga
发明人： Hiroki Yoshikawa , Hiroshi Kubota , Yoshinori Kinase , Satoshi Okazaki , Tamotsu Maruyama , Takashi Haraguchi , Masahide Iwakata , Yuichi Fukushima , Tadashi Saga
IPC分类号： G03F1/00
CPC分类号： G03F1/32 , G03F1/46 , G03F1/54 , G03F1/58 , Y10T428/24917 , Y10T428/31616
摘要： A light-shielding film for exposure light is formed on one principal plane of a transparent substrate made of quartz or the like that serves as a photomask substrate. The light-shielding film can serve not only as the so-called “light-shielding film” but also as an anti-reflection film. In addition, the light-shielding film has a total thickness of 100 nm or less, 70% or more of which is accounted for by the thickness of a chromium compound that has an optical density (OD) per unit thickness of 0.025 nm−1 for light having a wavelength of 450 nm. In the case where the photomask blank is used for fabricating a mask designed for ArF exposure, the thickness and composition of the light-shielding film are selected in such a manner that the OD of the light-shielding film is 1.2 to 2.3 for 193 or 248 nm wavelength light.
摘要翻译： 在作为光掩模基板的石英等的透明基板的一个主面上形成曝光用遮光膜。 遮光膜不仅可以用作所谓的“遮光膜”，而且可以用作抗反射膜。 此外，遮光膜的总厚度为100nm以下，其中70％以上的铬化合物的厚度为0.025nm-1，每单位厚度的光密度（OD） 对于波长为450nm的光。 在光掩模坯料用于制造用于ArF曝光的掩模的情况下，遮光膜的厚度和组成选择为使得遮光膜的OD为193或193的屏蔽膜的OD为1.2至2.3 248 nm波长的光。
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公开(公告)号：US20100143831A1
公开(公告)日：2010-06-10
申请号：US12709116
申请日：2010-02-19
申请人： Hiroki Yoshikawa , Yukio Inazuki , Satoshi Okazaki , Takashi Haraguchi , Masahide Iwakata , Mikio Takagi , Yuichi Fukushima , Tadashi Saga
发明人： Hiroki Yoshikawa , Yukio Inazuki , Satoshi Okazaki , Takashi Haraguchi , Masahide Iwakata , Mikio Takagi , Yuichi Fukushima , Tadashi Saga
IPC分类号： G03F1/00
摘要： A photomask blank to be used as a material for a photomask is provided with a mask pattern having a transparent area and an effectively opaque area to exposure light on a transparent substrate. On the transparent board, one or more layers of light shielding films are formed with or without other film (A) in between, at least one layer (B) which constitutes the light shielding film includes silicon and a transition metal as main component, and a molar ratio of silicon to the transition metal is silicon:metal=4-15:1 (atomic ratio). The photomask provided with the mask pattern having the transparent area and the effectively opaque area to exposure light on the transparent board is also provided.
摘要翻译： 用作光掩模材料的光掩模坯料设置有对透明基板上的曝光光具有透明区域和有效不透明区域的掩模图案。 在透明板上，形成有一层或多层遮光膜，其中有或没有其它膜（A），构成遮光膜的至少一层（B）包括硅和过渡金属作为主要成分，以及 硅与过渡金属的摩尔比为硅：金属= 4-15:1（原子比）。 还提供了具有掩模图案的光掩模，该掩模图案具有透明区域和透明板上曝光光线的有效不透明区域。
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87.发明授权Screen, Fresnel lens sheet used for the same, and image display apparatus using the same 有权用于其的屏幕，菲涅尔透镜片和使用其的图像显示装置公开(公告)号：US07403335B2
公开(公告)日：2008-07-22
申请号：US11011188
申请日：2004-12-15
申请人： Hiroki Yoshikawa , Tetsu Ohishi , Koji Hirata , Daisuke Imafuku
发明人： Hiroki Yoshikawa , Tetsu Ohishi , Koji Hirata , Daisuke Imafuku
CPC分类号： G03B21/10 , G03B21/625
摘要： The present invention provides a screen suitable for reducing the longitudinal dimension of a set. The present invention includes two prism sections. One is a totally reflective prism section (10) provided at the image generation source side of a Fresnel lens sheet (6). The other is a refractive prism section (11) provided at the image-watching side of the Fresnel lens sheet. The refractive prism section (11) includes a refractive face (e) for refracting incident light and making the light exit toward the image-watching side, a plane (f) approximately parallel to the principal plane of the Fresnel lens sheet, and a connection face (g) for continuously forming the face (e) and the plane (f).
摘要翻译： 本发明提供了一种适于减小组的纵向尺寸的屏幕。 本发明包括两个棱镜部分。 一个是设置在菲涅耳透镜片（6）的图像生成源侧的全反射棱镜部（10）。 另一个是设置在菲涅尔透镜片的图像观看侧的折射棱镜部分（11）。 折射棱镜部分（11）包括用于折射入射光并使光从摄像侧射出的折射面（e），大致平行于菲涅尔透镜片的主平面的平面（f），以及连接 面（g）用于连续地形成面（e）和平面（f）。
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公开(公告)号：US20070259276A1
公开(公告)日：2007-11-08
申请号：US11662479
申请日：2005-08-10
申请人： Hiroki Yoshikawa , Yukio Inazuki , Yoshinori Kinase , Satoshi Okazaki , Takashi Haraguchi , Masahide Iwakata , Mikio Takagi , Yuichi Fukushima , Tadashi Saga
发明人： Hiroki Yoshikawa , Yukio Inazuki , Yoshinori Kinase , Satoshi Okazaki , Takashi Haraguchi , Masahide Iwakata , Mikio Takagi , Yuichi Fukushima , Tadashi Saga
IPC分类号： G03F1/08 , C23F4/00 , G03F1/14 , H01L21/027
摘要： A metal film is provided as a light shielding layer on one principle surface of a photomask substrate. The metal film cannot be substantially etched by chlorine-based dry etching containing oxygen ((Cl+O)-based dry etching) and can be etched by chlorine-based dry etching not containing oxygen (Cl-based dry etching) and fluorine-based dry etching (F-based dry etching). On the light shielding layer, a metal compound film as an antireflective layer. The metal compound film cannot be substantially etched by chlorine-based dry etching not containing oxygen (Cl based) and can be etched by at least one of chlorine-based dry etching containing oxygen ((Cl+O) based) and fluorine-based dry etching (F based).
摘要翻译： 在光掩模基板的一个主表面上设置金属膜作为遮光层。 通过含有氧（（Cl + O）基干蚀刻）的基于氯的干蚀刻，不能基本上蚀刻金属膜，并且可以通过不含氧的氯基干法蚀刻（基于Cl的干蚀刻）和氟基 干蚀刻（F-干蚀刻）。 在遮光层上，作为抗反射层的金属化合物膜。 金属化合物膜不能通过不含氧（Cl基）的氯基干蚀刻基本上被蚀刻，并且可以通过含氧（（Cl + O）基）的氯基干蚀刻和氟基干法中的至少一种进行蚀刻 蚀刻（基于F）。
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89.发明申请公开(公告)号：US20070258695A1
公开(公告)日：2007-11-08
申请号：US11785802
申请日：2007-04-20
申请人： Hiroki Yoshikawa , Masahiro Ogawa
发明人： Hiroki Yoshikawa , Masahiro Ogawa
IPC分类号： H04N5/91
CPC分类号： G06F3/0485 , G06F3/0482
摘要： An image reproduction method includes: a reduced-size image reading step of reading a plurality of reduced-size images from a recording medium and storing the reduced-size images in a memory; a display step of multi-displaying the plurality of reduced-size images on a monitor; a cursor movement detection step of detecting a moving speed of a cursor indicating a selected reduced-size image from the plurality of reduced-size images displayed on the monitor; and an image read-ahead step of reading images from the recording medium according to the moving speed of the cursor and storing the image in the memory.
摘要翻译： 一种图像再现方法包括：缩小尺寸图像读取步骤，从记录介质读取多个缩小尺寸图像并将缩小尺寸图像存储在存储器中; 显示步骤，在监视器上多次显示所述缩小尺寸的图像; 光标移动检测步骤，从显示在监视器上的多个缩小尺寸图像中检测指示所选择的缩小图像的光标的移动速度; 以及根据光标的移动速度从记录介质读取图像并将图像存储在存储器中的图像预读步骤。
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公开(公告)号：US20070212618A1
公开(公告)日：2007-09-13
申请号：US11715346
申请日：2007-03-08
申请人： Hiroki Yoshikawa , Yukio Inazuki , Satoshi Okazaki , Takashi Haraguchi , Tadashi Saga , Yosuke Kojima , Kazuaki Chiba , Yuichi Fukushima
发明人： Hiroki Yoshikawa , Yukio Inazuki , Satoshi Okazaki , Takashi Haraguchi , Tadashi Saga , Yosuke Kojima , Kazuaki Chiba , Yuichi Fukushima
摘要： A photomask blank is provided comprising an etch stop film which is disposed on a transparent substrate and is resistant to fluorine dry etching and removable by chlorine dry etching, a light-shielding film disposed on the etch stop film and including at least one layer composed of a transition metal/silicon material, and an antireflective film disposed on the light-shielding film. When the light-shielding film is dry etched to form a pattern, pattern size variation arising from pattern density dependency is reduced, so that a photomask is produced at a high accuracy.
摘要翻译： 提供一种光掩模坯料，其包括设置在透明基板上的耐蚀刻干蚀刻和通过氯干蚀刻除去的蚀刻停止膜，设置在蚀刻停止膜上的遮光膜，并且包括至少一层由 过渡金属/硅材料和设置在遮光膜上的抗反射膜。 当光屏蔽膜被干蚀刻以形成图案时，由图案密度依赖性引起的图案尺寸变化减小，使得以高精度产生光掩模。
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