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87 条记录 (耗时 0.038 秒)

    Golf club head
    81.
    发明授权
    Golf club head 失效
    高尔夫球杆头

    公开(公告)号：US07749099B2

    公开(公告)日：2010-07-06

    申请号：US12238159

    申请日：2008-09-25

    申请人： Wataru Ban ,  Fumiaki Sato

    发明人： Wataru Ban ,  Fumiaki Sato

    IPC分类号： A63B53/04

    CPC分类号： A63B53/047 ,  A63B53/0466 ,  A63B2053/0408 ,  A63B2053/0445

    摘要： This invention provides a golf club head including a plurality of score lines on the face. In the golf club head according to this invention, the score line includes a pair of side surfaces and a bottom portion having a protruding portion protruding toward the face. An angle between the side surface and the face is not less than 60 degrees. A cross-sectional area A (inch2) of the score line, a width W (inch) of the score line measured based on the 30 degrees measurement method, and a distance S (inch) between the score lines adjacent to one another satisfy A/(W+S)≦0.003.

    摘要翻译： 本发明提供一种在脸部上包括多个刻痕线的高尔夫球杆头。 在根据本发明的高尔夫球杆头中，刻痕线包括一对侧表面和具有朝向脸面突出的突出部分的底部。 侧面与脸部之间的角度不小于60度。 刻痕线的横截面积A（英寸2），基于30度测量方法测量的刻痕线的宽度W（英寸）和彼此相邻的刻痕线之间的距离S（英寸）满足A /(W+S)≦̸0.003。

    GOLF CLUB HEAD
    82.
    发明申请
    GOLF CLUB HEAD 有权
    高尔夫俱乐部头

    公开(公告)号：US20100056295A1

    公开(公告)日：2010-03-04

    申请号：US12355326

    申请日：2009-01-16

    申请人： Wataru Ban ,  Fumiaki Sato ,  Kozue Wada

    发明人： Wataru Ban ,  Fumiaki Sato ,  Kozue Wada

    IPC分类号： A63B53/04

    CPC分类号： A63B53/047 ,  A63B53/0466 ,  A63B2053/0408 ,  A63B2053/0445

    摘要： A golf club head according to the present invention comprises a plurality of score lines on a face, and a stair-shaped portion comprising a plurality of steps formed on a side wall of the score line from a face side end of the side wall in a depth direction of the score line.

    摘要翻译： 根据本发明的高尔夫球杆头包括在面部上的多个刻痕线，以及台阶形部分，其包括多个台阶，所述台阶形状部分形成在刻痕线的侧壁上，从侧壁的面侧端部 评分线的深度方向。

    Golf Club Head
    83.
    发明申请
    Golf Club Head 失效
    高尔夫俱乐部主管

    公开(公告)号：US20090197700A1

    公开(公告)日：2009-08-06

    申请号：US12238159

    申请日：2008-09-25

    申请人： Wataru Ban ,  Fumiaki Sato

    发明人： Wataru Ban ,  Fumiaki Sato

    IPC分类号： A63B53/04

    CPC分类号： A63B53/047 ,  A63B53/0466 ,  A63B2053/0408 ,  A63B2053/0445

    摘要： This invention provides a golf club head including a plurality of score lines on the face. In the golf club head according to this invention, the score line includes a pair of side surfaces and a bottom portion having a protruding portion protruding toward the face. An angle between the side surface and the face is not less than 60 degrees. A cross-sectional area A (inch2) of the score line, a width W (inch) of the score line measured based on the 30 degrees measurement method, and a distance S (inch) between the score lines adjacent to one another satisfy A/(W+S)≦0.003.

    摘要翻译： 本发明提供一种在脸部上包括多个刻痕线的高尔夫球杆头。 在根据本发明的高尔夫球杆头中，刻痕线包括一对侧表面和具有朝向脸面突出的突出部分的底部。 侧面与脸部之间的角度不小于60度。 刻痕线的横截面积A（英寸2），基于30度测量方法测量的刻痕线的宽度W（英寸）和彼此相邻的刻痕线之间的距离S（英寸）满足A /(W+S)<=0.003。

    Mover device and semiconductor manufacturing apparatus and method
    84.
    发明授权
    Mover device and semiconductor manufacturing apparatus and method 有权
    移动装置及半导体制造装置及方法

    公开(公告)号：US07187143B2

    公开(公告)日：2007-03-06

    申请号：US10781756

    申请日：2004-02-20

    申请人： Keiji Okada ,  Yoshitomo Hidaka ,  Michiro Sugitani ,  Junichi Murakami ,  Fumiaki Sato ,  Mitsukuni Tsukihara ,  Suguru Hirokawa ,  Masamitsu Shinozuka

    发明人： Keiji Okada ,  Yoshitomo Hidaka ,  Michiro Sugitani ,  Junichi Murakami ,  Fumiaki Sato ,  Mitsukuni Tsukihara ,  Suguru Hirokawa ,  Masamitsu Shinozuka

    IPC分类号： H02P1/00

    CPC分类号： H01L21/67709 ,  Y10T74/15

    摘要： A mover device and an ion implanter apparatus having a processing base that reciprocates at a high speed without undesirable noise and vibration are provided. The mover device includes: a fixed base; a movable base that is linearly movable with respect to the fixed base; a processing base that is linearly movable with respect to the movable base; a main linear motor that generates a moving force to move the processing base with respect to the movable base, thereby moving the processing base with respect to the fixed base; and a velocity control unit that controls the moving velocity of the processing base with respect to the fixed base. In this mover device, the movable base is moved by virtue of a reaction force caused by the moving force to move the processing base.

    摘要翻译： 提供了具有处理基座的移动装置和离子注入机装置，该处理基座高速往复运动而没有不期望的噪声和振动。 动子装置包括：固定基座; 可移动基座，其相对于固定基座线性移动; 处理基座，其相对于所述可动基座线性移动; 主线性电动机，其产生相对于可移动基座移动处理基座的移动力，从而相对于固定基座移动处理基座; 以及速度控制单元，其控制所述处理基座相对于所述固定基座的移动速度。 在这种移动装置中，可移动基座由于由移动力引起的反作用力而移动，以移动处理基座。

    Wafer processing system, wafer processing method, and ion implantation system
    85.
    发明申请
    Wafer processing system, wafer processing method, and ion implantation system 有权
    晶圆处理系统，晶圆加工方法和离子注入系统

    公开(公告)号：US20060182532A1

    公开(公告)日：2006-08-17

    申请号：US11254854

    申请日：2005-10-21

    申请人： Keiji Okada ,  Fumiaki Sato ,  Hiroaki Nakaoka

    发明人： Keiji Okada ,  Fumiaki Sato ,  Hiroaki Nakaoka

    IPC分类号： B65G1/00

    CPC分类号： H01L21/67213 ,  H01L21/67201 ,  H01L21/67745

    摘要： Two load lock chambers having a load lock pedestal are provided adjacent to a vacuum process chamber through a vacuum intermediate chamber. A passage opening is provided between the vacuum process chamber and the vacuum intermediate chamber. Two wafer retaining arms are installed between a platen device in the vacuum process chamber and the vacuum intermediate chamber. The two wafer retaining arms are reciprocatingly movable between the corresponding load lock pedestals and the platen device while passing through the passage opening and crossing with an overpass each other at different levels. By retaining an unprocessed wafer by one of the wafer retaining arms and retaining a processed wafer by the other wafer retaining arm, transfer of the unprocessed wafer from one of the load lock pedestals to the platen device and transfer of the processed wafer from the platen device to the other load lock pedestal are performed simultaneously.

    摘要翻译： 具有负载锁定基座的两个负载锁定室通过真空中间室邻近真空处理室设置。 在真空处理室和真空中间室之间设有通道开口。 两个晶片保持臂安装在真空处理室中的压板装置和真空中间室之间。 两个晶片保持臂在相应的负载锁定基座和压板装置之间可往复运动，同时穿过通道开口并与不同级别的立交桥交叉。 通过用晶片保持臂中的一个保持未加工的晶片并通过另一个晶片保持臂保持经处理的晶片，将未加工的晶片从负载锁定基座之一转移到压板装置，并将经处理的晶片从压板装置 到另一个负载锁定基座同时进行。