中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

102 records (took 0.023 seconds)

    PIEZOELECTRIC FILM ELEMENT, AND MANUFACTURING METHOD OF THE SAME AND PIEZOELECTRIC FILM DEVICE
    86.
    发明申请
    PIEZOELECTRIC FILM ELEMENT, AND MANUFACTURING METHOD OF THE SAME AND PIEZOELECTRIC FILM DEVICE 有权
    压电薄膜元件及其制造方法及压电薄膜器件

    公开(公告)号：US20110187237A1

    公开(公告)日：2011-08-04

    申请号：US13018693

    申请日：2011-02-01

    Applicant: Kazufumi SUENAGA ,  Kenji Shibata ,  Kazutoshi Watanabe ,  Akira Nomoto

    Inventor： Kazufumi SUENAGA ,  Kenji Shibata ,  Kazutoshi Watanabe ,  Akira Nomoto

    IPC: H01L41/047

    CPC classification number: H01L41/187 ,  H01L41/0477 ,  H01L41/0805 ,  H01L41/094 ,  H01L41/1873 ,  H01L41/29 ,  H01L41/316

    Abstract: A piezoelectric film element is provided, which is capable of improving piezoelectric properties, having on a substrate at least a lower electrode, a lead-free piezoelectric film, and an upper electrode, wherein at least the lower electrode out of the lower electrode and the upper electrode has a crystal structure of a cubic crystal system, a tetragonal crystal system, an orthorhombic crystal system, a hexagonal crystal system, a monoclinic crystal system, a triclinic crystal system, a trigonal crystal system, or has a composition in which one of these crystals exists or two or more of them coexist, and crystal axes of the crystal structure are preferentially oriented to a specific axis smaller than or equal to two axes of these crystals, and a ratio c/a′ is set in a range of 0.992 or more and 0.999 or less, which is the ratio of a crystal lattice spacing c in a direction of a normal line to the substrate surface, with respect to a crystal lattice spacing a′ whose inclination angle from the substrate surface is in a range of 10° or more and 30° or less.

    Abstract translation: 提供一种能够改善压电性能的压电膜元件，其在基板上至少具有下电极，无铅压电膜和上电极，其中至少下电极中的下电极和 上电极具有立方晶系，四方晶系，正交晶系，六方晶系，单斜晶系，三斜晶系，三
    晶体系的晶体结构，或其组成为： 这些晶体存在或其中的两种以上共存，并且晶体结构的晶轴优先取向小于或等于这些晶体的两个轴的特定轴，并且将比率c / a'设定在0.992的范围内 以上且0.999以下，其是法线方向的晶格间距c与基板表面的比率，相对于晶格间距a'，其倾斜角 从基板表面的厚度为10°以上且30°以下的范围。

    Softening point measuring apparatus and thermal conductivity measuring apparatus
    88.
    发明申请
    Softening point measuring apparatus and thermal conductivity measuring apparatus 有权
    软化点测量仪和热导率测量仪

    公开(公告)号：US20110038392A1

    公开(公告)日：2011-02-17

    申请号：US12806364

    申请日：2010-08-11

    Applicant: Kazunori Ando ,  Masayuki Iwasa ,  Masatsugu Shigeno ,  Hiroumi Momota ,  Kazutoshi Watanabe

    Inventor： Kazunori Ando ,  Masayuki Iwasa ,  Masatsugu Shigeno ,  Hiroumi Momota ,  Kazutoshi Watanabe

    IPC: G01N25/02 ,  G01N25/18

    CPC classification number: G01N25/18 ,  G01N25/04 ,  G01Q60/58

    Abstract: In a local softening point measuring apparatus and thermal conductivity measuring apparatus using a probe microscope as a base, environment of the prob˜ and a sample surface is set to 1/100 atmospheric pressure (103 Pa) or lower. Otherwise, a side surface of the probe is coated with a thermal insulation material having a thickness that enables thermal dissipation to be reduced to 1/100 or lower, to thereby reduce the thermal dissipation from the side surface of the probe, and exchange heat substantially only at the contacting portion between the probe and the sample surface.

    Abstract translation: 在使用探针显微镜作为基础的局部软化点测定装置和热导率测定装置中，将试样表面的环境设定为1/100大气压（103Pa）以下。 否则，探针的侧表面涂覆有能够使散热减小到1/100或更低的厚度的绝热材料，从而减少从探针侧表面的散热，并且基本上交换热量 仅在探针和样品表面之间的接触部分处。

    Optical displacement-detecting mechanism and probe microscope using the same
    89.
    发明授权
    Optical displacement-detecting mechanism and probe microscope using the same 有权
    光学位移检测机构和探针显微镜使用相同

    公开(公告)号：US07787133B2

    公开(公告)日：2010-08-31

    申请号：US11840549

    申请日：2007-08-17

    Applicant: Masato Iyoki ,  Hiroyoshi Yamamoto ,  Kazutoshi Watanabe

    Inventor： Masato Iyoki ,  Hiroyoshi Yamamoto ,  Kazutoshi Watanabe

    IPC: G01B11/14

    CPC classification number: G01Q20/02

    Abstract: The optical displacement-detecting mechanism has: a light source for irradiating a target for measurement with light; a light source-driving circuit for driving the light source; an optical detector made from a semiconductor for receiving light after the irradiation of the target for measurement by the light source and converting the light into an electric signal thereby to detect an intensity of light; and an amplifier including a current-voltage conversion circuit for performing current-to-voltage conversion on a detection signal of the optical detector with a predetermined amplification factor. In the optical displacement-detecting mechanism, a light source having a spectrum half width of 10 nm or larger is used, whereby the light source can be driven with an output power of 2 mW or larger without generating mode hop noise and optical feedback noise.

    Abstract translation: 光学位移检测机构具有：用光照射被测物的光源; 用于驱动光源的光源驱动电路; 由半导体制成的光检测器，用于在由光源照射测量目标物之后接收光，并将光转换成电信号从而检测光的强度; 以及放大器，其包括用于以预定的放大系数对光学检测器的检测信号进行电流 - 电压转换的电流 - 电压转换电路。 在光学位移检测机构中，使用光谱半宽度为10nm以上的光源，由此可以以2mW以上的输出功率驱动光源，而不产生模式跳噪声和光反馈噪声。

    Method of correcting opaque defect of photomask using atomic force microscope fine processing device
    90.
    发明授权
    Method of correcting opaque defect of photomask using atomic force microscope fine processing device 有权
    使用原子力显微镜精细加工装置校正光掩模不透明缺陷的方法

    公开(公告)号：US07571639B2

    公开(公告)日：2009-08-11

    申请号：US11796996

    申请日：2007-04-27

    Applicant: Toshio Doi ,  Kazutoshi Watanabe ,  Osamu Takaoka ,  Atsushi Uemoto

    Inventor： Toshio Doi ,  Kazutoshi Watanabe ,  Osamu Takaoka ,  Atsushi Uemoto

    IPC: H01J37/352

    CPC classification number: G03F1/72 ,  G01Q10/06 ,  G01Q30/06 ,  G01Q80/00

    Abstract: An opaque defect is processed by scanning with a high load or height fixed mode using a probe harder than a pattern material of a photomask at the time of going scanning, and is observed by scanning with a low load or intermittent contact mode at the time of returning scanning so as to detect an ending point of the opaque defect by the height information. When there is a portion reaching to a glass substrate as an ending point, this portion is not scanned by the high load or height fixed mode in the next processing, and only a portion not reaching to the ending point is scanned by the high load or height fixed mode.

    Abstract translation: 通过使用在扫描时比光掩模的图案材料更硬的探针，以高负载或高度固定模式进行扫描来处理不透明缺陷，并且通过在低负载或间歇接触模式下扫描来观察不透明缺陷 返回扫描，以便通过高度信息检测不透明缺陷的终点。 当到达玻璃基板的部分为终点时，在下一个处理中该部分不被高负载或高度固定模式扫描，并且只有未到达终点的部分被高负载扫描 高度固定模式。

Patent Agency Ranking